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21. 发明专利

JP2007253308A Manufacturing method for polishing tool 审中-公开
标题翻译：抛光工具的制造方法
公开(公告)号：JP2007253308A
公开(公告)日：2007-10-04
申请号：JP2006084464
申请日：2006-03-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： CHIBA HIROSHI , INABA HIROSHI , SASAKI SHINJI , YASUI HIROTO , YO KIYOKUTO
IPC分类号： B24D3/00
摘要： PROBLEM TO BE SOLVED: To obtain a smooth polished surface in processing of an electronic device formed by various materials having different hardnesses, and to satisfy a specific characteristic required by the device.
SOLUTION: A polishing tool is manufactured through a substrate polishing process for smoothing the surface of a substrate, the process for forming a polishing grain layer used for polishing the surface of the electronic device on the substrate, and a surface processing process for making polishing grains project on the surface of the polishing grain layer. Thus, a smooth polishing of the device can be obtained so that the surface of the polishing tool and a polished section of the device are brought into contact with each other and slid with each other.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在由具有不同硬度的各种材料形成的电子装置的加工中获得光滑的抛光表面，并且满足该装置所需的特定特性。解决方案：通过用于平滑基板的表面的基板抛光工艺制造抛光工具，用于形成用于抛光基板上的电子器件的表面的抛光晶粒层的工艺，以及用于使抛光颗粒在抛光颗粒层的表面上突出。因此，可以获得装置的平滑抛光，使得抛光工具的表面和装置的抛光部分彼此接触并相互滑动。版权所有（C）2008，JPO＆INPIT

22. 发明专利

JP2002025794A PLASMA PROCESSING APPARATUS WITH REAL-TIME PARTICLE FILTER 失效
公开(公告)号：JP2002025794A
公开(公告)日：2002-01-25
申请号：JP2000207290
申请日：2000-07-07
申请人： HITACHI LTD , NANOFILM TECHNOLOGIES INT
发明人： INABA HIROSHI , SASAKI SHINJI , HIRANO SHINYA , FURUSAWA KENJI , YAMASAKA MINORU , AMATATSU ATSUSHI , SHII SHU
IPC分类号： H05H1/24 , B01J19/08 , C23C14/32 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To effectively capture and remove uncharged neutral particles and charged particles, each having a diameter of 5 μm or smaller in a plasma treatment apparatus utilizing a low pressure arc discharge. SOLUTION: In this apparatus, when the low-pressure arc discharge 5 is caused between a target 1 and a striker 4, plasma 11 is generated and is made to irradiate the surface of a treated substrate 7 inside a processing chamber 6 through a first magnetic field duct 14 and a second magnetic field duct 15. An adhesion-preventing filter 23 having a through-hole 25 in the center part for allowing passage of the plasma 11 is provided between the first duct 14 and the second duct 15 to capture the neutral particles 24 suspended in the plasma 11, while a cylindrical electric field filter 16 is provided between the second duct 15 and the treated substrate 7 to capture the negatively charged particles 17 suspended in the plasma 11. Accordingly, the plasma 11, from which the neutral particles 24 and the charged particles 17 are removed, is made to irradiate the treated substrate 7.

23. 发明专利

JPH08209352A PLASMA TREATMENT AND DEVICE THEREFOR 失效
公开(公告)号：JPH08209352A
公开(公告)日：1996-08-13
申请号：JP1768295
申请日：1995-02-06
申请人： HITACHI LTD
发明人： KOKADO YUICHI , INABA HIROSHI , SASAKI SHINJI , KATAOKA HIROYUKI , HONDA YOSHINORI , TERAKADO MASAMICHI , FURUSAWA KENJI
IPC分类号： C30B29/04 , C23C16/26 , C23C16/27 , C23C16/44 , C23C16/458 , C23C16/50 , C23C16/509 , C23C16/54 , G11B5/66 , G11B5/73 , G11B5/84
摘要： PURPOSE: To form a film of DLC, etc., uniform in thickness and properties, by surrounding the inner space of a plasma treating vessel with a continuous electrode of the same potential and keeping a disk substrate and a holder at the ground potential. CONSTITUTION: A DLC film is formed on a disk substrate 1 by using a a plasma treating device. The substrate 1 is held by a holder 2 and introduced into a treating vessel 4. The substrate 1 and holder 2 are kept at the ground potential. The inner space of the treating vessel 4 is surrounded with an electrode 5. The substrate 1 is heated to 350 deg.C from room temp., and the gas pressure in the vessel 4 is controlled to 10-500mTorr. The bias potential on the substrate 1 is adjusted to 100-1500V, and the substrate is treated with plasma. The substrate 1 is surrounded with the same potential electrode 5 to integrate the produced plasma, and a potential difference is not caused between the front and rear of the outer periphery of the substrate 1. A uniform DLC film is formed in the hole and peripheral end of the substrate 1.

24. 发明专利

JPH0773454A PRODUCTION OF CARBON PROTECTIVE FILM AND PLASMA TREATING DEVICE 失效
公开(公告)号：JPH0773454A
公开(公告)日：1995-03-17
申请号：JP21719393
申请日：1993-09-01
申请人： HITACHI LTD
发明人： INABA HIROSHI , KOKADO YUICHI , MATSUMOTO HIROSHI , FUJIMAKI SHIGEHIKO , KITO MAKOTO
IPC分类号： B01J19/08 , C01B31/02 , C23C16/26 , G11B5/72
摘要： PURPOSE:To provide a magnetic recording medium having a high-hardness protective film by superposing a positive DC bias voltage on the output of a high-frequency power source at the time of forming plasma by using the high-frequency power source, thereby executing film formation selectively using the negative ion active species in plasma. CONSTITUTION:An electrode 1 commonly used as a vacuum chamber is evacuatable to a pressure below the atm. pressure and generates plasma when a high voltage is impressed thereto. A DC positive voltage impressing device 4 and a choke coil 9 impresses a DC positive voltage to a substrate holder 3 commonly used as a third electrode holding a disk substrate 2 to be treated. The high-frequency power source 5 supplies high-frequency electric power to the electrode 1 commonly used as the vacuum chamber via a blocking capacitor 10. As a result, the film formation selectively using the negative ions of C, CH which are ion active species without contg. many H atoms is executed to obtain the film mainly composed of the C single bond having the small quantity of H, and the magnetic recording medium having the high-hardness protective film of the quality quantitively and collectively evaluated from Raman spectra.

25. 发明专利

JPH0559542A MAGNETRON SPUTTERING ELECTRODE 失效
公开(公告)号：JPH0559542A
公开(公告)日：1993-03-09
申请号：JP21695691
申请日：1991-08-28
申请人： HITACHI LTD
发明人： INABA HIROSHI , KATAOKA HIROYUKI , FURUSAWA KENJI , ABE KATSUO
IPC分类号： C23C14/35 , H01L21/203 , H01L21/285
摘要： PURPOSE:To uniformalize the erosion of target material and to provide magnetron sputtering electrodes high in the utilizing efficiency of the target material as well as to uniformalize the film forming rate to a substrated confronted with the target. CONSTITUTION:In magnetron sputtering electrodes, target material facing on the area in which electrons are confined is arranged in such a manner that they are divided into mutually electrically insulated plural planar targets 6a, 6b and 6c, and each plural target 6a, 6b and 6c, plural DC power sources 7a, 7b and 7c capable of impressing different electric power independently are provided.

26. 发明专利

JPH0463267A SPUTTERING DEVICE AND FILM FORMATION USING SAME 失效
公开(公告)号：JPH0463267A
公开(公告)日：1992-02-28
申请号：JP17274090
申请日：1990-07-02
申请人： HITACHI LTD
发明人： KATAOKA HIROYUKI , ABE KATSUO , INABA HIROSHI , FURUSAWA KENJI
IPC分类号： C23C14/34
摘要： PURPOSE:To obtain a sputtering device forming uniform film thickness distribution independently of film forming conditions by constituting, in a still and opposed type sputtering device, target plates into strip shape, arranging these plural target plates so that they are in parallel with each other in a longitudinal direction, and regulating the distance between respective centers of these adjacent target plates so that it is longer than the distance between these target plates and a substrate. CONSTITUTION:Three rectangular target plates (referred to as strip-like target plates) 101, 102, 103 electrically connected to respective sputter electrodes are arranged in parallel so that they are practically in parallel with each other in the longitudinal direction, and a substrate 3 to be subjected to film formation is disposed in a manner to be opposed to respective surfaces, on the sides to be sputtered, of the target plates. At this time, the spacing (distance) D between the target plates 101-103, each having a width of about 120mm, and the substrate 3 is about 95mm and also is regulated to about one-half the distance (d) 200mm, between respective centers of the adjacent target plates. By this method, uniform film thickness distribution can be formed over the region from the front of the target plate 101 to the front of the target plate 103.

27. 发明专利

JP2007152545A Grinding surface plate and its manufacturing method 有权
标题翻译：研磨面板及其制造方法
公开(公告)号：JP2007152545A
公开(公告)日：2007-06-21
申请号：JP2006258237
申请日：2006-09-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI SHINJI , INABA HIROSHI , CHIBA HIROSHI , YO KIYOKUTO , YASUI HIROTO
IPC分类号： B24D3/00
CPC分类号： B24D18/0054 , B24B37/12
摘要： PROBLEM TO BE SOLVED: To reduce surface roughness occurring on a grinding portion, and thereby to reduce damage caused by machining and to improve grinding efficiency.
SOLUTION: Abrasive grains are pushed and fixed on the surface of the grinding surface plate with mechanical pressure, and then the surface of the grinding surface plate containing the abrasive grains is subjected to plasma treatment, thereby improving the adhesiveness between the abrasive grains and the surface plate, and reducing the number of rolling particles separating from the surface of the surface plate, so as to realize flat abrasive machining of the device surface consisting of a plurality of materials.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了减少在研磨部分上发生的表面粗糙度，从而减少由机械加工引起的损坏并提高研磨效率。解决方案：磨料颗粒以机械压力推压固定在研磨面板的表面上，然后对包含磨粒的研磨面板的表面进行等离子体处理，从而提高磨粒之间的粘附性和表面板，并且减少从表面板的表面分离的滚动颗粒的数量，以实现由多种材料组成的装置表面的平面磨料加工。版权所有（C）2007，JPO＆INPIT

28. 发明专利

JP2006224235A MANUFACTURING METHOD OF ELECTRONIC DEVICE AND MAGNETIC HEAD 审中-公开
公开(公告)号：JP2006224235A
公开(公告)日：2006-08-31
申请号：JP2005040195
申请日：2005-02-17
申请人： HITACHI LTD
发明人： CHIBA HIROSHI , INABA HIROSHI , SASAKI SHINJI
IPC分类号： B24B37/12 , B24D3/00 , G11B5/39 , G11B5/60 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To provide a polishing method permitting little damage to be caused by machining, which reduces machining step and surface roughness generated at the polished portion, in a manufacturing method of all of electronic devices such as a magnetic head or an optical connector ferrule made of composite material. SOLUTION: In the manufacturing method of the electronic device, the polish processing is applied to the electronic device having a polishing portion made of the composite material. The polish processing is applied to the polishing portion by contacting a group of a diamond cutting blade of a polishing tool on the polishing portion of the device to slide with the polishing tool 30 where a DLC (Diamond Like Carbon) thin film 32 within the range of 10 to 3,000 nm of thickness having the group of the diamond cutting blade 321 composed of a projection part of locally microcrystallized diamond having hardness of 60 to 100 Gpa is coated on the surface of a support board 31 having elasticity. COPYRIGHT: (C)2006,JPO&NCIPI

29. 发明专利

JP2002373477A Magnetic head slider and manufacturing method therefor 审中-公开
标题翻译：磁头滑块及其制造方法
公开(公告)号：JP2002373477A
公开(公告)日：2002-12-26
申请号：JP2001181084
申请日：2001-06-15
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： INABA HIROSHI , SASAKI SHINJI , FURUSAWA KENJI , YAMASAKA MINORU
IPC分类号： G11B5/39 , G11B5/60 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To provide a magnetic head slier where the product yield of the magnetic head slider is increased in the forming process of the magnetic head, and additionally its durability is improved significantly, and to provide its manu facturing method.
SOLUTION: In the magnetic head slider 31, having two or more steps 5, 6 in the depth direction from a magnetic floating surface 7, and the depth of the step closer to the floating surface 7 set to 300 nm or lower, protective film 11 is provided in the floating surface 7 and all the steps 5, 6. The surface of the protective film 1 will not deteriorate.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种磁头滑块，其中磁头滑块的产品产量在磁头的成形过程中增加，另外其耐久性显着提高，并提供其制造方法。解决方案：在磁头滑动器31中，在从磁浮动表面7的深度方向上具有两个或多个步骤5,6，并且更靠近浮动表面7的台阶的深度设定为300nm或更小，保护膜11 设置在浮动表面7和所有步骤5,6中。保护膜1的表面不会劣化。

30. 发明专利

JP2000322721A PRODUCTION OF MAGNETIC HEAD AND MAGNETIC HEAD 失效
公开(公告)号：JP2000322721A
公开(公告)日：2000-11-24
申请号：JP13345099
申请日：1999-05-14
申请人： HITACHI LTD
发明人： AMATATSU ATSUSHI , INABA HIROSHI , YAMASAKA MINORU , ENDO MASAYOSHI
IPC分类号： G11B5/60
摘要： PROBLEM TO BE SOLVED: To easily form a spherical surface shape of a camber/crown, etc., onto the floating surfaces of a head slider with high accuracy. SOLUTION: This magnetic head 10 includes a head element 13 consisting of a head slider 11, rails 12 projectingly disposed on the floating surfaces 11a of the head slider 11, composite thin-film heads arranged on the flanks of the head slider 11, etc., and is formed with high-hardness films 12a consisting essentially of carbon on the surfaces of the rails 12. High-stress films 20 having a residual compressive stress are formed in groove parts 11b exclusive of the rails 12 on the floating surfaces 11a with the resist at the time of formation of the rails 12 in a low bar state in a production process as a mask. The strain deformation by residual compressive stress of the high-stress films 20 is exhibited by the separation from the low bar. The spherical surface shape of the camber/crown, etc., is thus easily formed onto the floating surfaces 11a of the head slider 11 with the high accuracy.

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