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21. 发明专利

JP2005305648A Pipe coupling fastening method 审中-公开
标题翻译：管接头紧固方法
公开(公告)号：JP2005305648A
公开(公告)日：2005-11-04
申请号：JP2005130897
申请日：2005-04-28
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , DOI RYOSUKE , NAGAI KUNIO , IDETA EIJI , NISHINO KOJI , YAMAJI MICHIO , SHINOHARA TSUTOMU , YASUMOTO TADASHI
IPC分类号： G01L5/24 , B25B23/14
摘要： PROBLEM TO BE SOLVED: To provide a pipe coupling fastening method capable of surely preventing fastening failure, by facilitating fastening work of a pipe coupling.
SOLUTION: This pipe coupling fastening method presets an allowable reference range of a fastening torque value in respective fastening quantities over the whole process up to the finish of fastening from the initial state of fastening, by determining a curve for indicating the relationship between the fastening quantity and the fastening torque value of a nut when normally performing fastening, by performing the fastening by using a fastener after fastening the nut in advance; and detects forgetfulness of inserting a gasket and/or a thrust bearing, by performing the detection of the fastening quantity and the fastening torque value and determination of whether or not these fall within the reference range over the whole process up to the finish of fastening from the initial stage of fastening.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够可靠地防止紧固故障的管接头固定方法，通过促进管接头的紧固工作。
解决方案：该管接头紧固方法通过确定用于指示紧固扭矩值之间的关系的曲线来预定在整个过程中的相应紧固量中的紧固扭矩值的允许参考范围，直到从紧固的初始状态到固定完成在正常执行紧固时螺母的紧固量和紧固扭矩值，通过在预先紧固螺母之后通过使用紧固件执行紧固; 并且通过执行紧固量和紧固扭矩值的检测来检测插入垫圈和/或止推轴承的健忘性，并且确定这些是否在整个过程中落在参考范围内直到紧固结束紧固的初始阶段。版权所有（C）2006，JPO＆NCIPI

22. 发明专利

JP2014234905A ダイヤフラム弁有权
标题翻译：透膜阀
公开(公告)号：JP2014234905A
公开(公告)日：2014-12-15
申请号：JP2013118008
申请日：2013-06-04
申请人：株式会社フジキン , Fujikin Inc
发明人： SHINOHARA TSUTOMU , YAMAJI MICHIO , NISHINO KOJI , DOI RYOSUKE , IKEDA NOBUKAZU , AKAGANE TOSHIO
IPC分类号： F16K7/12 , F16K7/17
CPC分类号： F16K37/0083 , F16K7/17 , G01N27/20
摘要：【課題】簡単な構成でありながら、ダイヤフラムが破断する前に、ダイヤフラムの損傷を確実に検出することができるダイヤフラム弁を提供する。【解決手段】流体流入通路2a、及び流体流出通路2bを設けたボディ2内のシート4にダイヤフラム5接離させ流体の導通、遮断を行うダイヤフラム弁1において、ダイヤフラム5を多層構造とし、最上層のダイヤフラム表面に配線を配置し、配線の断線を検出することによりダイヤフラム5の異常を検出する。【選択図】図1
摘要翻译：要解决的问题：提供一种能够在隔膜破裂之前可靠地检测膜片损坏的隔膜阀，同时采用简单的结构。解决方案：隔膜阀1通过使膜片5接触而导致流体的传导/截留将隔膜5与设置有流体流入通道2a和流体流出通道2b的主体2内的片材4分隔开。隔膜5被构造成多层结构; 布线布置在最上层的隔膜表面上; 并且通过检测布线的断裂来检测隔膜5中的异常。

23. 发明专利

JP2014186662A Flow rate control device with flow rate monitor 有权
标题翻译：流量监控器流量控制装置
公开(公告)号：JP2014186662A
公开(公告)日：2014-10-02
申请号：JP2013062537
申请日：2013-03-25
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIDAKA ATSUSHI , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , G01F1/42 , G01F1/50 , G01F15/005 , Y10T137/7761
摘要： PROBLEM TO BE SOLVED: To provide a pressure type flow rate control device with a flow rate monitor, capable of monitoring a flow rate almost in a real time, and automatically adjusting the set flow rate of a pressure type flow rate control part by using a monitor flow rate, and achieving the significant miniaturization and cost reduction of the device by combining a build-down type flow rate monitor part with the upstream side of the pressure type flow rate control part by effectively using the high pressure variation resistance characteristics of the pressure type flow rate control part.SOLUTION: A flow rate control device with a flow rate monitor comprises: a build-down type flow rate monitor part BDM installed at an upstream side; a pressure type flow rate control part FCS installed at the downstream side; a signal transmission circuit CT for connecting the build-down type flow rate monitor part BDM with the pressure type flow rate control part FCS, and for transmitting a monitor flow rate Q of the build-down type flow rate monitor part BDM to the pressure type flow rate control part FCS; and a flow rate set value adjustment mechanism QSR installed at the pressure type flow rate control part FCS for adjusting a set flow rate Qs of the pressure type flow rate control part FCS in accordance with the monitor flow rate Q from the build-down type flow rate monitor part BDM.
摘要翻译：要解决的问题：提供一种具有流量监测器的压力式流量控制装置，其能够几乎实时地监测流量，并且通过使用压力式流量控制部件自动调节压力型流量控制部件的设定流量监测流量，通过有效地利用压力型流量控制部分的高压变异电阻特性，结合压缩式流量监测部分与压力式流量控制部分的上游侧，实现装置的显着的小型化和成本降低型流量控制部分。解决方案：具有流量监测器的流量控制装置包括：安装在上游侧的建立型流量监测部分BDM; 安装在下游侧的压力式流量控制部FCS; 用于将建成型流量监视器部分BDM与压力型流量控制部分FCS连接的信号传输电路CT，以及用于将建立型流量监视器部分BDM的监测流量Q发送到压力型流量控制部分FCS; 以及安装在压力型流量控制部FCS上的流量设定值调节机构QSR，用于根据来自增压型流量的监视流量Q调整压力型流量控制部FCS的设定流量Qs 速率监视器BDM。

24. 发明专利

JP2013156801A Gas diversion supply device for semiconductor manufacturing device 有权
标题翻译：用于半导体制造设备的气体分配供应装置
公开(公告)号：JP2013156801A
公开(公告)日：2013-08-15
申请号：JP2012016266
申请日：2012-01-30
申请人： Fujikin Inc , 株式会社フジキン
发明人： NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI , HIRATA KAORU , MORISAKI KAZUYUKI
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G05D7/0664 , Y10T137/2544
摘要： PROBLEM TO BE SOLVED: To highly accurately perform the diversion supply of process gas from one gas supply source to a plurality of process chambers which simultaneously perform the same process in parallel while performing flow rate control.SOLUTION: The gas diversion supply device includes: a control valve 3 connected to a gas inlet 11; a gas supply main pipe 8 and an orifice 6 communicating with the downstream; a plurality of branch conduits 9a and 9n and branch conduit opening/closing valves 10a and 10n connected in parallel with the downstream of the gas supply main pipe; a pressure sensor 5 of a passage between the control valve and the orifice; and an arithmetic control unit 7 for calculating the total flow rate Q of gas which circulates through the orifice, outputting a signal Pd for operating the opening/closing of the control valve in a direction in which a difference between the calculated flow rate value and a set flow rate value is decreased to a valve driving part 3a, and outputting signals Od1 and Odn for successively opening and then closing each branch conduit opening/closing valve only in a fixed time. The flow rate control of gas which circulates through the orifice is performed by a pressure type flow rate control part 1a, and the diversion supply of gas is performed in accordance with the opening/closing of the branch conduit opening/closing valve.
摘要翻译：要解决的问题：高精度地执行从一个气体供应源到多个处理室的处理气体的分流供应，该多个处理室在执行流量控制的同时执行相同的处理。解决方案：气体分配供应装置包括：连接到气体入口11的控制阀3; 气体供给主管8和与下游连通的孔口6; 多个分支管道9a和9n以及与气体供应主管的下游并联连接的分支导管打开/关闭阀10a和10n; 控制阀和孔之间的通道的压力传感器5; 以及算术控制单元7，用于计算通过孔口循环的气体的总流量Q，输出用于操作控制阀的打开/关闭的信号Pd沿计算的流量值和设定流量值减少到阀驱动部3a，并且输出信号Od1和Odn，以仅在固定的时间内依次打开和关闭每个分支管道打开/关闭阀。通过孔口循环的气体的流量控制由压力型流量控制部分1a进行，并且根据分支管道打开/关闭阀的打开/关闭来执行气体的转向供应。

25. 发明专利

JP2013033782A Raw material vaporization supply apparatus 有权
标题翻译：原料气化装置
公开(公告)号：JP2013033782A
公开(公告)日：2013-02-14
申请号：JP2011167915
申请日：2011-08-01
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIDAKA ATSUSHI , HIRATA KAORU , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/4485
摘要： PROBLEM TO BE SOLVED: To make a raw material vaporization supply apparatus compact, to improve the quality of a semiconductor product, and to easily manage the remaining amount of raw material by stably supplying raw material vapor generated by heating solid raw material or liquid raw material to a process chamber while performing flow rate control using a pressure type flow controller.SOLUTION: The raw material vaporization supply apparatus comprises a source tank in which the raw material is reserved, a raw material vapor supply path which supplies the raw material vapor from an internal space of a source tank to the process chamber, the pressure type flow controller which is interposed in the raw material vapor supply path and controls the flow rate of the raw material vapor supplied to the process chamber, and a constant-temperature heating part which heats the source tank, supply path, and pressure type flow controller to set temperature, and then supplies the raw material vapor generated in the internal space of the source tank to the process chamber while performing flow rate control by the pressure type flow controller.
摘要翻译：要解决的问题：为了使原料蒸发供给装置紧凑，提高半导体产品的质量，并且通过稳定地供应通过加热固体原料产生的原料蒸汽或容易地管理原料的剩余量，或者在使用压力型流量控制器进行流量控制的同时将液态原料输送到处理室。原料蒸发供给装置包括：预备原料的源罐，将原料蒸气从源罐的内部空间供给到处理室的原料蒸气供给路径，压力型流量控制器，其插入在原料蒸气供给路径中，并控制供给到处理室的原料蒸气的流量;以及恒温加热部，其对源罐，供给路径和压力型流量控制器设定温度，然后在通过压力式流量控制器进行流量控制的同时将在源罐的内部空间中产生的原料蒸气供给到处理室。版权所有（C）2013，JPO＆INPIT

26. 发明专利

JP2013004383A Electrochemical element 有权
标题翻译：电化学元素
公开(公告)号：JP2013004383A
公开(公告)日：2013-01-07
申请号：JP2011135806
申请日：2011-06-17
申请人： Fujikin Inc , 株式会社フジキン , Optnics Precision Co Ltd , 株式会社オプトニクス精密
发明人： NISHINO ATSUSHI , DOI RYOSUKE , IKEDA SHINICHI , NISHINO KOJI , KINUTA KIYOSHIZU , SAIDA KATSUAKI , KOBAYASHI MASASHI
IPC分类号： H01M2/36 , H01G11/54 , H01G13/00
CPC分类号： H01G11/04 , H01G11/14 , H01G11/58 , H01G11/84 , H01M2/361 , Y02E60/13
摘要： PROBLEM TO BE SOLVED: To provide an electrochemical element adopting a new electrolyte supply method in which a minute amount of high viscosity electrolyte is quantitatively supplied to an ultra-compact electrochemical element with accuracy and quickness, and the penetration-diffusion to a negative electrode mixture and a positive electrode mixture is made possible.SOLUTION: An atomization spraying device has nozzles 12 on the spray outlet side 15 of a container having an electrolyte 21 as a device for supplying the electrolyte, and the electrolyte is intermittently supplied onto the surface of an electrode mixture of an element or a separator in an electrochemical element by using the device having a piezoelectric transducer 13 connected to a pulse generation circuit 14.
摘要翻译：要解决的问题：提供一种电化学元件，其采用新的电解质供应方法，其中将微量高粘度电解质定量地提供给超紧凑型电化学元件，其精度和速度，以及渗透扩散到负极混合物和正极混合物成为可能。解决方案：雾化喷涂装置在容器的喷射出口侧15上具有喷嘴12，该容器具有作为供给电解质的装置的电解质21，并将电解质间歇地供给到元件的电极混合物的表面上通过使用具有连接到脉冲发生电路14的压电换能器13的装置，电化学元件中的隔板。（C）2013，JPO和INPIT

27. 发明专利

JP2012234860A Material vaporization supply apparatus 有权
标题翻译：材料蒸发供应设备
公开(公告)号：JP2012234860A
公开(公告)日：2012-11-29
申请号：JP2011100446
申请日：2011-04-28
申请人： Fujikin Inc , 株式会社フジキン
发明人： HIDAKA ATSUSHI , HIRATA KAORU , NAGASE MASAAKI , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/45512 , C23C16/4481 , C23C16/45557 , C23C16/52 , Y10T137/7837
摘要： PROBLEM TO BE SOLVED: To provide a material vaporization supply apparatus for precisely adjusting material concentration in mixed gas, supplying the mixed gas to a process chamber in a stable manner, and facilitating the residual amount control of the material.SOLUTION: A material vaporization supply apparatus comprises: a source tank 5 for accumulating material 4; a flow channel Lfor supplying carrier gas Ggiven by a carrier gas supply source 1 to an inner-upper space 5a of the source tank 5; an automatic pressure regulator 15 for controlling the pressure in the inner-upper space 5a by adjusting an opening of a control valve CV; a flow channel Lfor supplying mixed gas G, which is mixture of material vapor produced from the material 4 and the carrier gas, to a process chamber 11; a flow rate controller 19 for automatically controlling the flow rate of the mixed gas Gwhich is supplied to the process chamber 11 by adjusting an opening of a control valve CV; and a constant-temperature heater for heating the flow channel Land flow channel Lat a set temperature. The mixed gas Gis supplied to the process chamber 11 while the inner-upper space 5a is controlled at a desired pressure.
摘要翻译：解决的问题：提供一种用于精确调整混合气体中的材料浓度的材料蒸发供给装置，以稳定的方式将混合气体供给到处理室，并且有助于材料的剩余量控制。解决方案：一种材料蒸发供应装置包括：用于堆积材料4的源罐5; 用于将载气供给源1给出的载气气体G 1 的气流通道L 1 的源罐5; 自动压力调节器15，用于通过调节控制阀CV 1 的打开来控制内部上部空间5a中的压力; 用于供应混合气体G 0 的流动通道L 2 ，这是由材料4产生的材料蒸气和载体气体到处理室11; 流量控制器19，用于通过调节控制阀的开度自动控制供给到处理室11的混合气体G 0 的流量 2 ; 以及用于在设定温度下加热流路L 1 和流路L 2 的恒温加热器。将混合气体G 0 供给到处理室11，同时将内部上部空间5a控制在期望的压力。版权所有（C）2013，JPO＆INPIT

28. 发明专利

JP2009294820A Automatic pressure regulator for flow controller 有权
标题翻译：流量控制器自动调压器
公开(公告)号：JP2009294820A
公开(公告)日：2009-12-17
申请号：JP2008146498
申请日：2008-06-04
申请人： Fujikin Inc , 株式会社フジキン
发明人： HIRATA KAORU , SUGITA KATSUYUKI , NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI
IPC分类号： G05D16/20
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： PROBLEM TO BE SOLVED: To prevent overshoot of the output flow rate of a flow controller when changing the output flow rate or changing the type of flowing gas. SOLUTION: The automatic pressure regulator 20 of a gas supply pressure supplied to a flow controller includes a piezoelectrically driven pressure regulating valve 15, a control pressure detector 14 disposed on the output side of the pressure regulating valve 15, and a controller 16 for capturing a value P 2 detected by the control pressure detector 14 and a set point Pst of control pressure and feeding a control signal by a proportional control method to a piezoelectric drive part of the pressure regulating valve 15 to regulate the valve travel. An integral action is disabled to make the proportional control system by the controller cause a residual deviation in a control pressure. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了防止在改变输出流量或改变流动气体的类型时流量控制器的输出流量的过冲。提供给流量控制器的气体供给压力的自动压力调节器20包括压电驱动压力调节阀15，设置在压力调节阀15的输出侧的控制压力检测器14和控制器16 用于捕获由控制压力检测器14检测到的值P 2 和控制压力的设定点Pst，并且通过比例控制方法将控制信号馈送到压力调节阀15的压电驱动部分，以调节阀门行程。无法使积分作用使控制器产生比例控制系统的控制压力的残留偏差。版权所有（C）2010，JPO＆INPIT

29. 发明专利

JP2009265988A Pressure control valve driving circuit for pressure-type flow rate control apparatus with flow rate self-diagnosis function 有权
标题翻译：压力型流量控制装置的压力控制阀驱动电路流量自动诊断功能
公开(公告)号：JP2009265988A
公开(公告)日：2009-11-12
申请号：JP2008115479
申请日：2008-04-25
申请人： Fujikin Inc , 株式会社フジキン
发明人： SUGITA KATSUYUKI , IKEDA SHINICHI , NISHINO KOJI , DOI RYOSUKE , HIRATA KAORU , NAKATANI TAKANORI
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , Y10T137/7762
摘要： PROBLEM TO BE SOLVED: To provide a highly accurate diagnosis result by reducing the valve closing time delay in a flow rate self-diagnosis. SOLUTION: In a pressure control valve piezoelectric element driving circuit of a pressure control apparatus with a flow rate self-diagnosis function, for comparing initial pressure drop characteristic data measured and stored beforehand with pressure drop characteristic data in a flow rate diagnosis measured under the same condition as the measurement of the initial pressure drop characteristics and detecting the abnormality of flow rate control from the difference between both the characteristic data, a first discharge circuit for slowly discharging and lowering a piezoelectric drive voltage applied to a piezoelectric drive element through a pressure reduction command circuit by a pressure reduction command signal from the central processing unit of the pressure-type flow rate control apparatus, and a second discharge circuit for rapidly discharging and lowering the piezoelectric drive voltage applied to the piezoelectric drive element through a high-speed pressure reduction command circuit by a high-speed pressure reduction command signal from the central processing unit are provided in parallel with the supply circuit of a drive voltage to the piezoelectric element. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过减少流量自诊断中的阀关闭时间延迟来提供高精度的诊断结果。解决方案：在具有流量自诊断功能的压力控制装置的压力控制阀压电元件驱动电路中，用于比较在测量的流量诊断中预先测量和存储的初始压降特性数据与压降特性数据在与初始压降特性的测量相同的条件下，根据两个特性数据之间的差异检测流量控制的异常，用于缓慢放电和降低施加到压电驱动元件的压电驱动电压的第一放电电路通过来自压力型流量控制装置的中央处理单元的减压指令信号的压力降低指令电路和用于通过高压液压快速放电和降低施加到压电驱动元件的压电驱动电压的第二放电电路，速度减压comman 通过来自中央处理单元的高速减压指令信号的电路与对压电元件的驱动电压的供给电路并联设置。版权所有（C）2010，JPO＆INPIT

30. 发明专利

JP2009204045A Piezoelectric element drive-type diaphragm type control valve 有权
标题翻译：压电元件驱动型膜片式控制阀
公开(公告)号：JP2009204045A
公开(公告)日：2009-09-10
申请号：JP2008045511
申请日：2008-02-27
申请人： Fujikin Inc , 株式会社フジキン
发明人： DOI RYOSUKE , NISHINO KOJI , SAWADA YOHEI , IKEDA SHINICHI
IPC分类号： F16K31/02 , F16K7/16 , H02N2/00
摘要： PROBLEM TO BE SOLVED: To provide a piezoelectric element drive-type diaphragm type control valve for eliminating the need for individual adjustment while reducing the variation of response performance between products. SOLUTION: The piezoelectric element drive-type diaphragm type control valve comprises a valve body 3 having a flow path, a diaphragm 4 held by the valve body 3 whose flow path is opened, a valve rod 5 movably supported in the opening/closing direction of the diaphragm 4 for closing the diaphragm 4, a piezoelectric element 6 supported in a state that its movement in the closing direction of the diaphragm 4 is prohibited and its displacement caused by the deformation of the diaphragm 4 in the opening direction is permitted, an operating member 7 supported by abutting on the end of the piezoelectric element 6 whose displacement is permitted, and a plurality of lever bodies 8 radially arranged around an axis X of the valve rod 5 and rockingly supported to increase the displacement of the operating member 7 accompanied by the displacement of the piezoelectric element 6 and transmit it to the valve rod 5. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种压电元件驱动型隔膜式控制阀，用于消除对个体调节的需要，同时减少产品之间的响应性能的变化。解决方案：压电元件驱动型隔膜式控制阀包括具有流路的阀体3，由阀体3保持的隔膜4，阀体3的流动路径被打开，阀杆5可移动地支撑在开/ 用于关闭隔膜4的隔膜4的关闭方向，被抑制在隔膜4的关闭方向上的运动而被支撑的压电元件6被允许，并且允许其在打开方向上由隔膜4的变形引起的位移，通过抵接在允许位移的压电元件6的端部支撑的操作构件7和围绕阀杆5的轴线X径向布置的多个杠杆体8，并且被摇摆地支撑以增加操作构件的位移伴随着压电元件6的位移并将其传送到阀杆5.版权所有（C）2009，JPO＆INPIT

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