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21. 发明申请

US20100212694A1 WETTING A WORKPIECE SURFACE IN A FLUID-PROCESSING SYSTEM 有权
标题翻译：在流体加工系统中润湿工作表面
公开(公告)号：US20100212694A1
公开(公告)日：2010-08-26
申请号：US12702860
申请日：2010-02-09
申请人： Arthur Keigler
发明人： Arthur Keigler
IPC分类号： B05C13/00 , B08B3/04 , H01L21/306
CPC分类号： C25D5/003 , B05C3/09 , B05C13/02 , C25D5/08 , C25D7/123 , C25D17/001 , H01L21/2885 , H01L21/76877
摘要： A method and apparatus for wetting the surface of a workpiece is disclosed. The apparatus includes a chamber with a vacuum port and a fluid port and a workpiece holder including a body, a ring, and a port. The body includes a surface and defines a cavity extending from the surface. The ring is adapted to retain the workpiece on the surface of body over the cavity. The ring forms a fluid seal relative to the workpiece and to the workpiece holder. The port is defined in the body and in communication with the cavity. The port affects pressure in the cavity to minimize a pressure differential between the front and back surfaces of the workpiece. The fluid port is in communication with the chamber. The fluid port delivers a fluid (e.g., a substantially degassed fluid) to wet the front surface of the workpiece during operation of the chamber at a reduced pressure relative to atmosphere.
摘要翻译：公开了一种润湿工件表面的方法和装置。该装置包括具有真空端口和流体端口的腔室以及包括主体，环和端口的工件保持器。主体包括表面并且限定从表面延伸的空腔。该环适于将工件保持在空腔上的主体表面上。环形件相对于工件和工件夹持件形成流体密封。端口被定义在体内并且与空腔连通。该端口影响空腔中的压力，以最小化工件的前表面和后表面之间的压差。流体端口与腔室连通。流体端口在相对于大气的减压下在腔室的操作期间输送流体（例如，基本上脱气的流体）以润湿工件的前表面。

22. 发明授权

US09421617B2 Substrate holder 有权
标题翻译：基板支架
公开(公告)号：US09421617B2
公开(公告)日：2016-08-23
申请号：US13356252
申请日：2012-01-23
申请人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
发明人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
IPC分类号： B23B31/14 , H01L21/687 , F26B5/08 , B23B31/12
CPC分类号： B23B31/14 , B23B31/1261 , F26B5/08 , H01L21/68728 , Y10T279/18 , Y10T279/247
摘要： A rotary chuck adapted to hold a substrate. The rotary chuck has a rotatable chuck portion and an edge grip having a movable grip member movably mounted to the rotatable chuck portion, the moveable grip member being substantially free moving so that rotation of the rotating chuck portion causes the moveable grip member to move in a plane substantially aligned with a surface of the substrate to engage the substrate in a engaged position. A resilient element is coupled to the moveable grip member, the resilient member biasing the grip member to a disengaged position.
摘要翻译：适于保持基板的旋转卡盘。旋转卡盘具有可旋转卡盘部分和边缘把手，其具有可移动地安装到可旋转卡盘部分的可移动抓握构件，可移动抓握构件基本上自由移动，使得旋转卡盘部分的旋转导致可移动抓握构件在平面基本上与衬底的表面对准，以将衬底接合在接合位置。弹性元件联接到可移动握持构件，弹性构件将把手构件偏置到脱离位置。

23. 发明授权

US08420981B2 Apparatus for thermal processing with micro-environment 失效
标题翻译：微环境热处理设备
公开(公告)号：US08420981B2
公开(公告)日：2013-04-16
申请号：US12590852
申请日：2009-11-13
申请人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia , Matthew R. Jeffers
发明人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia , Matthew R. Jeffers
IPC分类号： H01L21/477 , F27D11/00
CPC分类号： H01L21/6719 , H01L21/67109
摘要： A substrate thermal processing system. The system has at least one substrate holding module having a housing configured for holding an isolated environment therein. A substrate heater is located in the housing and has a substrate heating surface. A substrate cooler is located in the housing and having a substrate cooling surface. A gas feed opening into the housing and feeding inert or reducing gas into the housing when the substrate is heated by the heating surface. A gas restrictor is within the housing restricting the fed gas between the substrate heating surface and a surrounding atmospheric region substantially surrounding the substrate heating surface in the housing and forming an aperture through which the fed gas communicates with the atmospheric region.
摘要翻译：基板热处理系统。该系统具有至少一个基板保持模块，该模块具有用于在其中保持隔离环境的壳体。衬底加热器位于壳体中并且具有衬底加热表面。衬底冷却器位于壳体中并且具有衬底冷却表面。当基板被加热表面加热时，气体进入开口并进入惰性气体或还原气体进入壳体。气体限制器在壳体内部，限制基板加热表面和基本上围绕壳体中的基板加热表面的周围大气区域之间的进料气体，并形成进料气体与大气区域连通的孔。

24. 发明申请

US20130011222A1 SUBSTRATE LOADER AND UNLOADER 有权
标题翻译：基座装载机和卸载器
公开(公告)号：US20130011222A1
公开(公告)日：2013-01-10
申请号：US13279432
申请日：2011-10-24
申请人： Daniel Goodman , Arthur Keigler , Freeman Fisher
发明人： Daniel Goodman , Arthur Keigler , Freeman Fisher
IPC分类号： B65G49/00
CPC分类号： H01L21/67092 , H01L21/6838 , H01L21/68764 , H01L21/68785
摘要： A substrate loader adapted to load and unload a substrate to and from a moveable holder having a seal. The substrate loader has a base and a holder support frame coupled to the base, the holder support frame adapted to repeatably position the moveable holder relative to a predetermined datum. The substrate transport is coupled to the base and having a substrate chuck and adapted to move and transport the substrate relative to the holder. The substrate transport is deterministically positioned relative to the predetermined datum and is adapted to move the substrate from a first position, with the substrate captured by the moveable holder, to a second position with the substrate disengaged from the holder and the seal, the substrate transport movement of the substrate from the first to the second position effecting disengagement from the holder and the seal substantially without contacting the substrate.
摘要翻译：一种衬底装载机，其适于将基板装载到具有密封件的可移动保持器上和从其移出。衬底装载机具有底座和联接到基座的保持器支撑框架，保持器支撑框架适于相对于预定的基准重复地定位可移动保持器。衬底输送器耦合到基座并且具有衬底卡盘并且适于相对于保持器移动和运输衬底。衬底传送相对于预定的原点确定地定位，并且适于将衬底从第一位置移动，其中衬底由可移动保持器捕获到第二位置，其中衬底与保持器和密封件脱离，衬底传送基板从第一位置到第二位置的运动实质上不与基板接触，从而保持器和密封件脱离接触。

25. 发明申请

US20120305033A1 PARALLEL SINGLE SUBSTRATE MARANGONI MODULE 有权
标题翻译：并行单基板MARANGONI模块
公开(公告)号：US20120305033A1
公开(公告)日：2012-12-06
申请号：US13488329
申请日：2012-06-04
申请人： Arthur Keigler , Daniel L. Goodman , David G. Guarnaccia
发明人： Arthur Keigler , Daniel L. Goodman , David G. Guarnaccia
IPC分类号： B08B3/00
CPC分类号： H01L21/67757 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/6776 , H01L21/67781 , H01L21/68 , H01L21/68707
摘要： A substrate drying apparatus for drying a width of a surface of a substrate in a liquid. The substrate drying apparatus has a liquid tank containing the liquid. An injection nozzle is coupled to the liquid tank, the injection nozzle having a continuous knife edge injection surface across the width of the surface of the substrate. A drain is coupled to the injection nozzle, the drain having a continuous drain surface substantially parallel to the continuous knife edge injection surface and across the width of the surface of the substrate. The liquid forms a meniscus between the continuous drain surface and the width of the surface of the substrate. The injection nozzle directs a vapor at the meniscus.
摘要翻译：一种用于干燥液体中基底表面的宽度的基片干燥装置。基板干燥装置具有容纳液体的液体槽。注射喷嘴连接到液体罐，注射喷嘴具有穿过基底表面的宽度的连续刀刃注射表面。排水口连接到注射喷嘴，排水管具有基本上平行于连续的刀刃注入表面并跨过衬底的表面宽度的连续排水表面。液体在连续排水表面和基板表面的宽度之间形成弯液面。注射喷嘴在弯液面处引导蒸气。

26. 发明授权

US08038856B2 Method and apparatus for fluid processing a workpiece 有权
标题翻译：流体处理工件的方法和装置
公开(公告)号：US08038856B2
公开(公告)日：2011-10-18
申请号：US12786219
申请日：2010-05-24
申请人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
发明人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
IPC分类号： C25B9/02 , F16J15/02
CPC分类号： C25D17/001 , C25D5/003 , C25D7/123 , C25D17/005 , C25D17/06 , C25D21/10 , C25D21/12 , H01L21/67023 , H01L21/67126
摘要： A method of fluid sealing a workpiece is provided. The method includes placing a workpiece on a ring, engaging at least one engagement feature of the ring with at least one retaining feature defined by the member and flexing the member to provide a force to the at least one engagement feature to cause the ring to form a barrier to fluid entry with the workpiece.
摘要翻译：提供了流体密封工件的方法。该方法包括将工件放置在环上，将环的至少一个接合特征与由构件限定的至少一个保持特征接合并使构件弯曲以向至少一个接合特征施加力以使环形成流体进入工件的障碍。

27. 发明授权

US07722747B2 Method and apparatus for fluid processing a workpiece 有权
标题翻译：流体处理工件的方法和装置
公开(公告)号：US07722747B2
公开(公告)日：2010-05-25
申请号：US10971729
申请日：2004-10-22
申请人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
发明人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
IPC分类号： C25B9/02
CPC分类号： C25D17/001 , C25D5/003 , C25D7/123 , C25D17/005 , C25D17/06 , C25D21/10 , C25D21/12 , H01L21/67023 , H01L21/67126
摘要： A method and apparatus for retaining a workpiece against a workpiece holder are described. A flexible member can be used to provide a substantially uniform force to securely retain the workpiece, which can allow the workpiece to be consistently positioned in a process module. In one detailed embodiment, a barrier to fluid entry is formed between the workpiece and a ring for retaining the workpiece against a workpiece holder. This provides a reliable seal during fluid processing to prevent fluid from reaching the underside of a workpiece. In various embodiments, the workpiece holder can be used to align a workpiece in a process module or to hold one or more workpieces in a configuration that allows for higher throughput.
摘要翻译：描述了将工件保持在工件保持器上的方法和装置。可以使用柔性构件来提供基本上均匀的力以牢固地保持工件，这可以使工件一致地定位在工艺模块中。在一个详细的实施例中，在工件和用于将工件保持在工件保持器上的环之间形成流体进入的障碍物。这在流体处理期间提供了可靠的密封，以防止流体到达工件的下侧。在各种实施例中，工件保持器可用于对准工件在工艺模块中或将一个或多个工件保持在允许更高生产量的构造中。

28. 发明授权

US07445697B2 Method and apparatus for fluid processing a workpiece 有权
标题翻译：流体处理工件的方法和装置
公开(公告)号：US07445697B2
公开(公告)日：2008-11-04
申请号：US10971530
申请日：2004-10-22
申请人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
发明人： Arthur Keigler , John Harrell , Zhenqiu Liu , Qunwei Wu
IPC分类号： C25D17/06 , B05C13/02
CPC分类号： C25D17/001 , C25D5/003 , C25D7/123 , C25D17/005 , C25D17/06 , C25D21/10 , C25D21/12 , H01L21/67023 , H01L21/67126
摘要： A method and apparatus for retaining a workpiece against a workpiece holder are described. A flexible member can be used to provide a substantially uniform force to securely retain the workpiece, which can allow the workpiece to be consistently positioned in a process module. In one detailed embodiment, a barrier to fluid entry is formed between the workpiece and a ring for retaining the workpiece against a workpiece holder. This provides a reliable seal during fluid processing to prevent fluid from reaching the underside of a workpiece. In various embodiments, the workpiece holder can be used to align a workpiece in a process module or to hold one or more workpieces in a configuration that allows for higher throughput.
摘要翻译：描述了将工件保持在工件保持器上的方法和装置。可以使用柔性构件来提供基本上均匀的力以牢固地保持工件，这可以使工件一致地定位在工艺模块中。在一个详细的实施例中，在工件和用于将工件保持在工件保持器上的环之间形成流体进入的障碍物。这在流体处理期间提供了可靠的密封，以防止流体到达工件的下侧。在各种实施例中，工件保持器可用于对准工件在工艺模块中或将一个或多个工件保持在允许更高生产量的构造中。

29. 发明授权

US06251250B1 Method of and apparatus for controlling fluid flow and electric fields involved in the electroplating of substantially flat workpieces and the like and more generally controlling fluid flow in the processing of other work piece surfaces as well 有权
标题翻译：用于控制基本上平坦的工件等的电镀中涉及的流体流动和电场的方法和装置，并且更一般地控制在其它工件表面的处理中的流体流动
公开(公告)号：US06251250B1
公开(公告)日：2001-06-26
申请号：US09390110
申请日：1999-09-03
申请人： Arthur Keigler
发明人： Arthur Keigler
IPC分类号： C25D508
CPC分类号： C25D17/001 , C25D7/123
摘要： A novel method and apparatus of wet processing workpieces, such as electroplating semiconductor wafers and the like, that incorporates reciprocating processing fluid agitation to control fluid flow at the workpiece, and where electric fields are involved as in such electroplating, controlling the electric field distribution.
摘要翻译：一种湿法处理工件的新方法和装置，例如电镀半导体晶片等，其包括往复式处理流体搅拌以控制工件处的流体流动，并且在这种电镀中涉及电场，控制电场分布。

30. 发明授权

US09293356B2 Parallel single substrate processing system 有权
标题翻译：平行单基板加工系统
公开(公告)号：US09293356B2
公开(公告)日：2016-03-22
申请号：US13488343
申请日：2012-06-04
申请人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
发明人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
IPC分类号： B23Q1/25 , H01L21/677 , H01L21/67 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67757 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/6776 , H01L21/67781 , H01L21/68 , H01L21/68707
摘要： A system for fluid processing substrate surfaces arrayed in a fluid having a process section with a frame having a plurality of process elements to process the substrate surfaces without contacting the substrate surfaces. A substrate holder assembly having a holder frame and a number of substrate holders, each of which is coupled to the holder frame and is configured for holding a substrate so that each substrate holder holds a different substrate for transport as a unit with the substrate holder assembly to and from the process section. The substrate holder assembly and each substrate holder are removably coupled to the process section frame, and the substrate holders of the substrate holder assembly are movable relative to the holder frame and positionable in repeatable alignment with respect to a predetermined feature of the process section and independent of positioning of the holder frame with respect to the process section.
摘要翻译：一种用于流体处理衬底表面的系统，其布置在具有工艺部分的流体中，所述工艺部分具有框架，所述框架具有多个处理元件，以处理所述衬底表面而不接触所述衬底表面。一种衬底保持器组件，其具有保持器框架和多个衬底保持器，每个衬底保持器联接到保持器框架并且构造成用于保持衬底，使得每个衬底保持器保持不同的衬底以作为与衬底保持器组件往返于过程部分。衬底保持器组件和每个衬底保持器可移除地联接到处理部分框架，并且衬底保持器组件的衬底保持器相对于保持器框架可移动并且可相对于工艺段的预定特征可重复地对准并且独立地保持框架相对于处理部分的定位。

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