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1. 发明授权

US09293356B2 Parallel single substrate processing system 有权
标题翻译：平行单基板加工系统
公开(公告)号：US09293356B2
公开(公告)日：2016-03-22
申请号：US13488343
申请日：2012-06-04
申请人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
发明人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
IPC分类号： B23Q1/25 , H01L21/677 , H01L21/67 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67757 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/6776 , H01L21/67781 , H01L21/68 , H01L21/68707
摘要： A system for fluid processing substrate surfaces arrayed in a fluid having a process section with a frame having a plurality of process elements to process the substrate surfaces without contacting the substrate surfaces. A substrate holder assembly having a holder frame and a number of substrate holders, each of which is coupled to the holder frame and is configured for holding a substrate so that each substrate holder holds a different substrate for transport as a unit with the substrate holder assembly to and from the process section. The substrate holder assembly and each substrate holder are removably coupled to the process section frame, and the substrate holders of the substrate holder assembly are movable relative to the holder frame and positionable in repeatable alignment with respect to a predetermined feature of the process section and independent of positioning of the holder frame with respect to the process section.
摘要翻译：一种用于流体处理衬底表面的系统，其布置在具有工艺部分的流体中，所述工艺部分具有框架，所述框架具有多个处理元件，以处理所述衬底表面而不接触所述衬底表面。一种衬底保持器组件，其具有保持器框架和多个衬底保持器，每个衬底保持器联接到保持器框架并且构造成用于保持衬底，使得每个衬底保持器保持不同的衬底以作为与衬底保持器组件往返于过程部分。衬底保持器组件和每个衬底保持器可移除地联接到处理部分框架，并且衬底保持器组件的衬底保持器相对于保持器框架可移动并且可相对于工艺段的预定特征可重复地对准并且独立地保持框架相对于处理部分的定位。

2. 发明申请

US20120306137A1 PARALLEL SINGLE SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：平行单基板加工系统
公开(公告)号：US20120306137A1
公开(公告)日：2012-12-06
申请号：US13488343
申请日：2012-06-04
申请人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
发明人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
IPC分类号： B23Q1/25
CPC分类号： H01L21/67757 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/6776 , H01L21/67781 , H01L21/68 , H01L21/68707
摘要： A system for fluid processing substrate surfaces arrayed in a fluid having a process section with a frame having a plurality of process elements to process the substrate surfaces without contacting the substrate surfaces. A substrate holder assembly having a holder frame and a number of substrate holders, each of which is coupled to the holder frame and is configured for holding a substrate so that each substrate holder holds a different substrate for transport as a unit with the substrate holder assembly to and from the process section. The substrate holder assembly and each substrate holder are removably coupled to the process section frame, and the substrate holders of the substrate holder assembly are movable relative to the holder frame and positionable in repeatable alignment with respect to a predetermined feature of the process section and independent of positioning of the holder frame with respect to the process section.
摘要翻译：一种用于流体处理衬底表面的系统，其布置在具有工艺部分的流体中，所述工艺部分具有框架，所述框架具有多个处理元件，以处理所述衬底表面而不接触所述衬底表面。一种衬底保持器组件，其具有保持器框架和多个衬底保持器，每个衬底保持器联接到保持器框架并且构造成用于保持衬底，使得每个衬底保持器保持不同的衬底以作为与衬底保持器组件往返于过程部分。衬底保持器组件和每个衬底保持器可移除地联接到处理部分框架，并且衬底保持器组件的衬底保持器相对于保持器框架可移动并且可相对于工艺段的预定特征可重复地对准并且独立地保持框架相对于处理部分的定位。

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