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21. 发明授权

US08855164B2 Laser apparatus 有权
标题翻译：激光设备
公开(公告)号：US08855164B2
公开(公告)日：2014-10-07
申请号：US13809584
申请日：2012-02-17
申请人： Yasufumi Kawasuji , Osamu Wakabayashi , Junichi Fujimoto , Hideo Iwase
发明人： Yasufumi Kawasuji , Osamu Wakabayashi , Junichi Fujimoto , Hideo Iwase
IPC分类号： H01S3/22 , H01S3/02 , G02B7/00 , H01S3/07 , H05G2/00 , H01S3/23 , H01S3/00 , H01S3/223
CPC分类号： G02B7/00 , H01S3/0071 , H01S3/02 , H01S3/076 , H01S3/2232 , H01S3/2366 , H05G2/003 , H05G2/008
摘要： A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed.
摘要翻译：激光装置可以包括：第一模块，包括被配置为输出激光束的振荡器和用于支撑振荡器的振荡器支撑部分; 第二模块，包括用于传送激光束的光束传送单元和用于支撑光束传送单元的光束传送单元支撑部分; 第三模块，包括用于放大激光束的放大器和用于支撑放大器的放大器支撑部分; 以及其上放置模块的框架，框架包括其上放置振荡器支撑部分，光束传送支撑部分和放大器支撑部分的安装件。

22. 发明授权

US08809821B2 Holder device, chamber apparatus, and extreme ultraviolet light generation system 有权
标题翻译：持有器，腔室装置和极紫外光发生系统
公开(公告)号：US08809821B2
公开(公告)日：2014-08-19
申请号：US13620589
申请日：2012-09-14
申请人： Junichi Fujimoto , Hidenobu Kameda , Osamu Wakabayashi , Kouji Ashikawa
发明人： Junichi Fujimoto , Hidenobu Kameda , Osamu Wakabayashi , Kouji Ashikawa
IPC分类号： G02B7/02
CPC分类号： G02B7/02 , G02B7/028 , G02B7/1815 , H05G2/005 , H05G2/008
摘要： A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.
摘要翻译：用于保持光学元件的保持装置包括具有夹持光学元件的第一和第二构件的保持器，以及用于在第二构件和光学元件之间形成密封的密封构件。

23. 发明申请

US20130114215A1 LASER APPARATUS 有权
标题翻译：激光装置
公开(公告)号：US20130114215A1
公开(公告)日：2013-05-09
申请号：US13809584
申请日：2012-02-17
申请人： Yasufumi Kawasuji , Osamu Wakabayashi , Junichi Fujimoto , Hideo Iwase
发明人： Yasufumi Kawasuji , Osamu Wakabayashi , Junichi Fujimoto , Hideo Iwase
IPC分类号： G02B7/00
CPC分类号： G02B7/00 , H01S3/0071 , H01S3/02 , H01S3/076 , H01S3/2232 , H01S3/2366 , H05G2/003 , H05G2/008
摘要： A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed.
摘要翻译：激光装置可以包括：第一模块，包括被配置为输出激光束的振荡器和用于支撑振荡器的振荡器支撑部分; 第二模块，包括用于传送激光束的光束传送单元和用于支撑光束传送单元的光束传送单元支撑部分; 第三模块，包括用于放大激光束的放大器和用于支撑放大器的放大器支撑部分; 以及其上放置模块的框架，框架包括其上放置振荡器支撑部分，光束传送支撑部分和放大器支撑部分的安装件。

24. 发明申请

US20120248343A1 CHAMBER APPARATUS 有权
标题翻译：橱柜设备
公开(公告)号：US20120248343A1
公开(公告)日：2012-10-04
申请号：US13494442
申请日：2012-06-12
申请人： Shinji NAGAI , Osamu WAKABAYASHI , Yutaka SHIRAISHI , Junichi FUJIMOTO
发明人： Shinji NAGAI , Osamu WAKABAYASHI , Yutaka SHIRAISHI , Junichi FUJIMOTO
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.
摘要翻译：用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。该腔室包括入口，来自激光装置的激光束通过入口进入腔室。目标供给单元被配置为将目标材料供应到室内的预定区域。收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎片进入碎片进入表面。碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。收集容器收集从收集单元流出的碎屑。

25. 发明申请

US20100193711A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20100193711A1
公开(公告)日：2010-08-05
申请号：US12685835
申请日：2010-01-12
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

26. 发明授权

US06905783B2 Steel sheet for porcelain enameling and method for production thereof, and enameled product and method for production thereof 失效
标题翻译：瓷釉用钢板及其制造方法，以及搪瓷制品及其制造方法
公开(公告)号：US06905783B2
公开(公告)日：2005-06-14
申请号：US10204358
申请日：2001-12-17
申请人： Fumiaki Sato , Toshihira Hamada , Shuzo Oda , Yoshihiro Jono , Takahiro Hayashida , Junichi Fujimoto , Masao Komai
发明人： Fumiaki Sato , Toshihira Hamada , Shuzo Oda , Yoshihiro Jono , Takahiro Hayashida , Junichi Fujimoto , Masao Komai
IPC分类号： C25D5/12 , B32B15/01 , C22C38/00 , C22C38/04 , C22C38/06 , C22C38/12 , C22C38/14 , C22C38/60 , C23C26/00 , C23C28/00 , C23C30/00 , C23D3/00 , C25D5/50 , B32B15/18 , C21D9/46
CPC分类号： C22C38/002 , B32B15/013 , B32B15/015 , C22C38/004 , C22C38/04 , C22C38/06 , C22C38/12 , C22C38/14 , C22C38/60 , C23C26/00 , C23C28/321 , C23C28/325 , C23C28/345 , C23C30/00 , C25D5/50 , Y10T428/12597 , Y10T428/12604 , Y10T428/12826 , Y10T428/12937 , Y10T428/12944 , Y10T428/12958
摘要： Steel sheet for porcelain enameling having excellent workability yet capable of providing an enamel layer having excellent adhesion with the steel sheet on direct-on enameling once and still free of black specks defects, a method for producing the same, as well as a porcelain enamel product and the method for producing the same are provided, in which low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet is used. A steel sheet for porcelain enameling is produced by applying Ni—Mo alloy plating to the low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet having specified components and composition ratio, and after performing heat treatment thereto to control the content of Ni, Mo, and Fe that are present on the surface of the steel sheet in a predetermined range, porcelain enamel is applied and fired.
摘要翻译：具有优异的可加工性的瓷搪瓷用钢板，能够提供一次并且仍然没有黑色斑点缺陷的直接搪瓷上具有优异粘合性的搪瓷层，其制造方法以及瓷搪瓷制品提供了其制造方法，其中低碳Al镇静钢板，高氧钢板，添加Ti的钢板，添加Nb的钢板，添加了Ti-Nb的钢板或B添加钢板用来。通过将Ni-Mo合金镀层施加到低碳Al-镇静钢板，高氧钢板，添加Ti的钢板，添加Nb的钢板，添加Ti-Nb的钢板或者添加了特定成分和组成比的B添加钢板，在进行热处理之后，将钢板表面上存在的Ni，Mo，Fe含量控制在规定范围内，进行瓷搪瓷。

27. 发明授权

US06805975B2 Steel sheet for procelain enameling and method for production thereof, and enameled product and method for production thereof 失效
标题翻译：搪瓷用钢板及其制造方法，以及搪瓷制品及其制造方法
公开(公告)号：US06805975B2
公开(公告)日：2004-10-19
申请号：US10204348
申请日：2003-01-16
申请人： Fumiaki Sato , Toshihira Hamada , Shuzo Oda , Yoshihiro Jono , Takahiro Hayashida , Junichi Fujimoto , Masao Komai
发明人： Fumiaki Sato , Toshihira Hamada , Shuzo Oda , Yoshihiro Jono , Takahiro Hayashida , Junichi Fujimoto , Masao Komai
IPC分类号： B32B1504
CPC分类号： C22C38/002 , C22C38/004 , C22C38/04 , C22C38/08 , C22C38/12 , C22C38/14 , C23C10/30 , C23C26/00 , C23C28/321 , C23C28/34 , C23C30/00 , C23D5/00 , C25D5/50 , Y10T428/12535 , Y10T428/12611 , Y10T428/12618 , Y10T428/12806 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/12972 , Y10T428/12979
摘要： Steel sheet for porcelain enameling capable of realizing excellent enamel adhesion with the steel sheet by direct-on enameling once is provided by using a Ti-added steel sheet; there are also a method for producing the same, as well as a porcelain enamel product and the method for producing the same. A steel sheet for porcelain enameling is produced by providing a Ni—Mo alloy plating film on a Ti-added steel sheet containing 0.01% by weight (wherein, % represents “% by weight” hereinafter) or less of C, 0.5% or less of Mn, 0.04% or less of P, 0.04% or less of S, 0.01 to 0.50% of Ti, and balance Fe accompanied by unavoidable impurities, and by then performing heat treatment thereto to control the content of Ni, Mo, and Fe present in the surface of the steel sheet in a predetermined range, porcelain enamel is applied once and fired.
摘要翻译：通过使用添加Ti的钢板，提供能够通过直接搪瓷一次实现与钢板的优异搪瓷粘合性的瓷搪瓷用钢板; 还有其制造方法以及瓷搪瓷制品及其制造方法。通过在含有0.01重量％的Ti添加钢板上（其中，％表示“以重量％”表示“C”以下）为0.5％以下，提供Ni-Mo合金镀膜，制造瓷搪瓷用钢板的Mn，0.04％以下的P，0.04％以下的S，0.01〜0.50％的Ti，余量的Fe伴随着不可避免的杂质，然后进行热处理以控制Ni，Mo和Fe的含量在预定范围内存在于钢板表面，一次施加瓷釉，并进行烧制。

28. 发明授权

US08611393B2 Laser apparatus 有权
标题翻译：激光设备
公开(公告)号：US08611393B2
公开(公告)日：2013-12-17
申请号：US13421116
申请日：2012-03-15
申请人： Junichi Fujimoto , Takahito Kumazaki , Toru Suzuki , Satoshi Tanaka , Osamu Wakabayashi
发明人： Junichi Fujimoto , Takahito Kumazaki , Toru Suzuki , Satoshi Tanaka , Osamu Wakabayashi
IPC分类号： H01S3/08
CPC分类号： H01S3/106 , H01S3/005 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0971 , H01S3/2316 , H01S3/2333
摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.
摘要翻译：本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系统来切换光束宽度放大率或缩小因子的切换机构或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系统的取向反转。

29. 发明申请

US20130126761A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：室外设备和极光紫外线发光系统
公开(公告)号：US20130126761A1
公开(公告)日：2013-05-23
申请号：US13562950
申请日：2012-07-31
申请人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
发明人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G02B5/0891 , G21K5/00 , H05G2/005
摘要： A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
摘要翻译：可以与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生EUV光的室; 收集器反射镜，其具有形成在其中心的区域中的第一通孔，并且被构造成收集室内产生的EUV光，收集器反射镜被定位成使得第一通孔位于基本对应于遮蔽区; 以及蚀刻气体供给单元，设置在所述第一通孔中，并且被配置为向所述室供给蚀刻气体。

30. 发明申请

US20130075625A1 TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
标题翻译：目标供应单位和极端超紫外线发光装置
公开(公告)号：US20130075625A1
公开(公告)日：2013-03-28
申请号：US13553621
申请日：2012-07-19
申请人： Takayuki YABU , Yoshifumi UENO , Junichi FUJIMOTO , Yukio WATANABE , Toshihiro NISHISAKA
发明人： Takayuki YABU , Yoshifumi UENO , Junichi FUJIMOTO , Yukio WATANABE , Toshihiro NISHISAKA
IPC分类号： F23D11/32 , G21K5/04
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member.
摘要翻译：目标供给单元包括：输出目标材料的喷嘴;以及形成有第一开口的第一导电构件，其位于与通过喷嘴输出目标材料的方向相对的喷嘴。第一导电构件被定位成使得第一开口在重力方向上位于喷嘴下方。目标供应单元包括在目标材料和第一导电构件之间施加电压的电压发生器。

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