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21. 发明申请

US20110284774A1 TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：目标输出装置和极端超紫外光源装置
公开(公告)号：US20110284774A1
公开(公告)日：2011-11-24
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： G21K5/00 , H05H1/24
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译：目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

22. 发明申请

US20110174996A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE 有权
标题翻译：极光紫外线光源装置和喷嘴保护装置
公开(公告)号：US20110174996A1
公开(公告)日：2011-07-21
申请号：US13081148
申请日：2011-04-06
申请人： Hiroshi SOMEYA , Tamotsu ABE , Hideo HOSHINO
发明人： Hiroshi SOMEYA , Tamotsu ABE , Hideo HOSHINO
IPC分类号： G21F3/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/006
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译：一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。

23. 发明申请

US20110057126A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20110057126A1
公开(公告)日：2011-03-10
申请号：US12943090
申请日：2010-11-10
申请人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
发明人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
IPC分类号： H01J27/24
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

24. 发明申请

US20100181503A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100181503A1
公开(公告)日：2010-07-22
申请号：US12638571
申请日：2009-12-15
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

25. 发明申请

US20130208742A1 OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：光学装置，激光装置和超极紫外光发生系统
公开(公告)号：US20130208742A1
公开(公告)日：2013-08-15
申请号：US13817818
申请日：2012-02-17
申请人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
发明人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
IPC分类号： H01S3/10
CPC分类号： H01S3/0071 , H01S3/0014 , H01S3/10061 , H01S3/1305 , H05G2/008
摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
摘要翻译：光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

26. 发明申请

US20130099140A1 LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR GENERATING LASER BEAM 有权
标题翻译：激光装置，极光紫外线发光系统及其生成激光束的方法
公开(公告)号：US20130099140A1
公开(公告)日：2013-04-25
申请号：US13805300
申请日：2012-03-05
申请人： Hiroaki Nakarai , Osamu Wakabayashi , Hideo Hoshino
发明人： Hiroaki Nakarai , Osamu Wakabayashi , Hideo Hoshino
IPC分类号： H01S3/00
CPC分类号： H01S3/0057 , H01S3/107 , H01S3/1305 , H01S3/134 , H01S3/2232 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S3/2391 , H05G2/008
摘要： A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.
摘要翻译：激光装置可以包括配置成输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲到脉冲基准控制所述脉冲能量调节单元，用于脉冲激光束通过其中并且控制所述至少一个电源的一组多脉冲脉冲激光束。

27. 发明授权

US08324601B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08324601B2
公开(公告)日：2012-12-04
申请号：US12943090
申请日：2010-11-10
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H05H1/00 , G01J3/10
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

28. 发明授权

US08238392B2 Temperature controller for gas laser 有权
标题翻译：气体激光器温度控制器
公开(公告)号：US08238392B2
公开(公告)日：2012-08-07
申请号：US12710722
申请日：2010-02-23
申请人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
发明人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
IPC分类号： H01S3/00 , H01S3/04 , H01S3/22 , H01S3/223
CPC分类号： H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
摘要： A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
摘要翻译：一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统，以及连接第二回火的第二管道系统所述控制部分和每个第二温度控制部分并联。

29. 发明申请

US20120119118A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

30. 发明申请

US20120091893A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20120091893A1
公开(公告)日：2012-04-19
申请号：US13336749
申请日：2011-12-23
申请人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： H05H1/46
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

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