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21. 发明授权

US08381152B2 Method and system for model-based design and layout of an integrated circuit 有权
标题翻译：集成电路基于模型设计和布局的方法和系统
公开(公告)号：US08381152B2
公开(公告)日：2013-02-19
申请号：US12133563
申请日：2008-06-05
申请人： Ya-Chieh Lai , Frank E. Gennari , Matthew Moskewicz , Srinivas Doddi , Junjiang Lei , Weiping Fang , Kuanghao Lay
发明人： Ya-Chieh Lai , Frank E. Gennari , Matthew Moskewicz , Srinivas Doddi , Junjiang Lei , Weiping Fang , Kuanghao Lay
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.
摘要翻译：描述了一种允许电子设计，验证和优化工具实现非常有效的方法以允许工具直接解决制造过程的影响的方法，例如识别和防止由光刻处理引起的问题。采用快速模型和模式检查来集成光刻和制造感知过程，如EDA工具，如路由器。

22. 发明授权

US08091047B1 System and method for implementing image-based design rules 有权
标题翻译：用于实现基于图像的设计规则的系统和方法
公开(公告)号：US08091047B1
公开(公告)日：2012-01-03
申请号：US12644742
申请日：2009-12-22
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D MDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.
摘要翻译：公开了用于创建和实现二维（2D），基于图像的设计规则（IBDR）的系统和方法。用于创建2D IBDR的技术可以包括识别代表设计感兴趣的2D图案的搜索图案，基于搜索图案创建图案表示，为图案表示定义锚定点，以及将权重分配给模式表示。 2D MDR可用于通过将2D IBDR与设计进行比较来搜索设计的系统和方法。通过表征所需的规则几何形状，可以将许多2D IBDR合并到类似的2D IBDR的子集中，根据期望的规则几何将2D IBDR分组成组，将2D IBDR组合并成单个代表搜索模式。另外，可以从公开的二维IBDR创建标准设计规则。标准设计规则可以通过在感兴趣的2D图案内定义形状的原点，识别所关注的2D图案内的特征，导出相对于所识别的每个特征的原点的参数，从感兴趣的2D图案创建，以及使用派生参数编写标准设计规则脚本。

23. 发明授权

US08079005B2 Method and system for performing pattern classification of patterns in integrated circuit designs 有权
标题翻译：用于在集成电路设计中执行图案模式分类的方法和系统
公开(公告)号：US08079005B2
公开(公告)日：2011-12-13
申请号：US12241409
申请日：2008-09-30
申请人： Ya-Chieh Lai , Frank E. Gennari , Matthew W Moskewicz , Junjiang Lei , Weinong Lai
发明人： Ya-Chieh Lai , Frank E. Gennari , Matthew W Moskewicz , Junjiang Lei , Weinong Lai
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Disclosed is an approach for performing pattern classification for electronic designs. One advantage of this approach is that it can use fast pattern matching techniques to classify both patterns and markers based on geometric similarity. In this way, the large number of markers and hotspots that typically are identified within an electronic design can be subsumed and compressed into a much smaller set of pattern families. This significantly reduced the number of patterns that must be individually analyzed, which considerably reduces the quantity of system resources and time needed to analyze and verify a circuit design.
摘要翻译：公开了一种用于执行电子设计的模式分类的方法。这种方法的一个优点是它可以使用快速模式匹配技术来基于几何相似性对图案和标记进行分类。以这种方式，通常在电子设计中识别的大量标记和热点可被归纳并压缩成更小的一组模式族。这大大减少了必须单独分析的模式数量，大大减少了系统资源的数量和分析和验证电路设计所需的时间。

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