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1. 发明授权

US08365103B1 System and method for implementing image-based design rules 有权
标题翻译：用于实现基于图像的设计规则的系统和方法
公开(公告)号：US08365103B1
公开(公告)日：2013-01-29
申请号：US12644647
申请日：2009-12-22
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D MDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.
摘要翻译：公开了用于创建和实现二维（2D），基于图像的设计规则（IBDR）的系统和方法。用于创建2D IBDR的技术可以包括识别代表设计感兴趣的2D图案的搜索图案，基于搜索图案创建图案表示，为图案表示定义锚定点，以及将权重分配给模式表示。 2D MDR可用于通过将2D IBDR与设计进行比较来搜索设计的系统和方法。通过表征所需的规则几何形状，可以将许多2D IBDR合并到类似的2D IBDR的子集中，根据期望的规则几何将2D IBDR分组成组，将2D IBDR组合并成单个代表搜索模式。另外，可以从公开的二维IBDR创建标准设计规则。标准设计规则可以通过在感兴趣的2D图案内定义形状的原点，识别所关注的2D图案内的特征，导出相对于所识别的每个特征的原点的参数，从感兴趣的2D图案创建，以及使用派生参数编写标准设计规则脚本。

2. 发明授权

US07818707B1 Fast pattern matching 有权
标题翻译：快速模式匹配
公开(公告)号：US07818707B1
公开(公告)日：2010-10-19
申请号：US11609901
申请日：2006-12-12
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image. Extracted situations can further be used to improve density analysis of the IC layout. This improved density analysis includes extracting the situations for a window of the IC layout, removing overlap from the window based on the extracted situations, calculating a density for each of the situations, and calculating a density for the window based on the density for each of the situations.
摘要翻译：公开了使用情况分析和转换集成电路布局的系统，方法和技术。用于变换集成电路（IC）布局的方法包括识别IC布局内的形状，识别每个形状的特征并提取各个特征的情况。提取的情况可用于改善IC布局的光学邻近校正（OPC）。这种改进的OPC包括提取情况，模拟情况以基于未能满足期望的OPC容限级别来确定被识别用于修改的情况的一组情况，修改一组情况以提高期望的OPC容忍度的满足度，以及重新整合修改了一组情况进入IC布局。提取的情况也可以用来改善IC布局的空中图像模拟。这种改进的航空图像模拟包括提取情况，模拟情况的子集以确定子集的空中图像，并且平铺该情况子集以形成较大的空间图像。提取的情况可以进一步用于改进IC布局的密度分析。这种改进的密度分析包括提取IC布局的窗口的情况，基于提取的情况从窗口去除重叠，为每种情况计算密度，并且基于每个的密度来计算窗口的密度情况。

3. 发明授权

US08327299B1 System and method for implementing image-based design rules 有权
公开(公告)号：US08327299B1
公开(公告)日：2012-12-04
申请号：US12644789
申请日：2009-12-22
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D MDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.

4. 发明授权

US07707542B1 Creating a situation repository 有权
标题翻译：创建一个情境存储库
公开(公告)号：US07707542B1
公开(公告)日：2010-04-27
申请号：US11609904
申请日：2006-12-12
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50 , G03F9/00 , G03F1/00
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image. Extracted situations can further be used to improve density analysis of the IC layout. This improved density analysis includes extracting the situations for a window of the IC layout, removing overlap from the window based on the extracted situations, calculating a density for each of the situations, and calculating a density for the window based on the density for each of the situations.
摘要翻译：公开了使用情况分析和转换集成电路布局的系统，方法和技术。用于变换集成电路（IC）布局的方法包括识别IC布局内的形状，识别每个形状的特征并提取各个特征的情况。提取的情况可用于改善IC布局的光学邻近校正（OPC）。这种改进的OPC包括提取情况，模拟情况以基于未能满足期望的OPC容限级别来确定被识别用于修改的情况的一组情况，修改一组情况以提高期望的OPC容忍度的满足度，以及重新整合修改了一组情况进入IC布局。提取的情况也可以用来改善IC布局的空中图像模拟。这种改进的航空图像模拟包括提取情况，模拟情况的子集以确定子集的空中图像，并且平铺该情况子集以形成较大的空间图像。提取的情况可以进一步用于改进IC布局的密度分析。这种改进的密度分析包括提取IC布局的窗口的情况，基于提取的情况从窗口去除重叠，为每种情况计算密度，并且基于每个的密度来计算窗口的密度情况。

5. 发明授权

US08091047B1 System and method for implementing image-based design rules 有权
标题翻译：用于实现基于图像的设计规则的系统和方法
公开(公告)号：US08091047B1
公开(公告)日：2012-01-03
申请号：US12644742
申请日：2009-12-22
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D MDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.
摘要翻译：公开了用于创建和实现二维（2D），基于图像的设计规则（IBDR）的系统和方法。用于创建2D IBDR的技术可以包括识别代表设计感兴趣的2D图案的搜索图案，基于搜索图案创建图案表示，为图案表示定义锚定点，以及将权重分配给模式表示。 2D MDR可用于通过将2D IBDR与设计进行比较来搜索设计的系统和方法。通过表征所需的规则几何形状，可以将许多2D IBDR合并到类似的2D IBDR的子集中，根据期望的规则几何将2D IBDR分组成组，将2D IBDR组合并成单个代表搜索模式。另外，可以从公开的二维IBDR创建标准设计规则。标准设计规则可以通过在感兴趣的2D图案内定义形状的原点，识别所关注的2D图案内的特征，导出相对于所识别的每个特征的原点的参数，从感兴趣的2D图案创建，以及使用派生参数编写标准设计规则脚本。

6. 发明授权

US08769474B1 Fast pattern matching 有权
标题翻译：快速模式匹配
公开(公告)号：US08769474B1
公开(公告)日：2014-07-01
申请号：US12907003
申请日：2010-10-18
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Disclosed are methods, systems, and articles of manufacture for using pattern matching with an integrated circuit layout including recognizing shapes within the IC layout, identifying features for the shapes, and extracting situations for the respective features. The method may further include simulating the situations to determine a set of situations for modification based on an OPC requirement, modifying the set of situations to improve satisfaction of the OPC requirement, and reintegrating the modified set of situations into the IC layout. The method may also include simulating a subset of the extracted situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image. The method may also include removing overlap from a window based on the situations extracted for the window, calculating a density for each of the situations, and calculating a density for the window based on the density.
摘要翻译：公开了使用与集成电路布局进行图案匹配的方法，系统和制品，包括识别IC布局内的形状，识别形状的特征以及为各个特征提取情况。该方法还可以包括模拟情况以基于OPC要求来确定用于修改的一组情况，修改一组情况以提高OPC要求的满足度，以及将修改后的情况集合到IC布局中。该方法还可以包括模拟所提取情况的子集以确定该子集的空中图像，并且平铺该情况子集以形成较大的空间图像。该方法还可以包括基于为窗口提取的情况从窗口中移除重叠，计算每种情况的密度，以及基于密度来计算窗口的密度。

7. 发明授权

US07661087B1 Yield analysis with situations 有权
标题翻译：产量分析与情况
公开(公告)号：US07661087B1
公开(公告)日：2010-02-09
申请号：US11609903
申请日：2006-12-12
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image. Extracted situations can further be used to improve density analysis of the IC layout. This improved density analysis includes extracting the situations for a window of the IC layout, removing overlap from the window based on the extracted situations, calculating a density for each of the situations, and calculating a density for the window based on the density for each of the situations.
摘要翻译：公开了使用情况分析和转换集成电路布局的系统，方法和技术。用于变换集成电路（IC）布局的方法包括识别IC布局内的形状，识别每个形状的特征并提取各个特征的情况。提取的情况可用于改善IC布局的光学邻近校正（OPC）。这种改进的OPC包括提取情况，模拟情况以基于未能满足期望的OPC容限级别来确定被识别用于修改的情况的一组情况，修改一组情况以提高期望的OPC容忍度的满足度，以及重新整合修改了一组情况进入IC布局。提取的情况也可以用来改善IC布局的空中图像模拟。这种改进的航空图像模拟包括提取情况，模拟情况的子集以确定子集的空中图像，并且平铺该情况子集以形成较大的空间图像。提取的情况可以进一步用于改进IC布局的密度分析。这种改进的密度分析包括提取IC布局的窗口的情况，基于提取的情况从窗口去除重叠，为每种情况计算密度，并且基于每个的密度来计算窗口的密度情况。

8. 发明授权

US07653892B1 System and method for implementing image-based design rules 有权
标题翻译：用于实现基于图像的设计规则的系统和方法
公开(公告)号：US07653892B1
公开(公告)日：2010-01-26
申请号：US11207266
申请日：2005-08-18
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D IBDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.
摘要翻译：公开了用于创建和实现二维（2D），基于图像的设计规则（IBDR）的系统和方法。用于创建2D IBDR的技术可以包括识别代表设计感兴趣的2D图案的搜索图案，基于搜索图案创建图案表示，为图案表示定义锚定点，以及将权重分配给模式表示。 2D IBDR可用于通过将2D IBDR与设计进行比较来搜索设计的系统和方法。通过表征所需的规则几何形状，可以将许多2D IBDR合并到类似的2D IBDR的子集中，根据期望的规则几何将2D IBDR分组成组，将2D IBDR组合并成单个代表搜索模式。另外，可以从公开的二维IBDR创建标准设计规则。标准设计规则可以通过在感兴趣的2D图案内定义形状的原点，识别所关注的2D图案内的特征，导出相对于所识别的每个特征的原点的参数，从感兴趣的2D图案创建，以及使用派生参数编写标准设计规则脚本。

9. 发明授权

US08631373B1 Yield analysis with situations 有权
标题翻译：产量分析与情况
公开(公告)号：US08631373B1
公开(公告)日：2014-01-14
申请号：US12645173
申请日：2009-12-22
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image. Extracted situations can further be used to improve density analysis of the IC layout. This improved density analysis includes extracting the situations for a window of the IC layout, removing overlap from the window based on the extracted situations, calculating a density for each of the situations, and calculating a density for the window based on the density for each of the situations.
摘要翻译：公开了使用情况分析和转换集成电路布局的系统，方法和技术。用于变换集成电路（IC）布局的方法包括识别IC布局内的形状，识别每个形状的特征并提取相应特征的情况。提取的情况可用于改善IC布局的光学邻近校正（OPC）。这种改进的OPC包括提取情况，模拟情况以基于未能满足期望的OPC容限级别来确定被识别用于修改的情况的一组情况，修改一组情况以提高期望的OPC容忍度的满足度，以及重新整合修改了一组情况进入IC布局。提取的情况也可以用来改善IC布局的空中图像模拟。这种改进的航空图像模拟包括提取情况，模拟情况的子集以确定子集的空中图像，并且平铺该情况子集以形成较大的空间图像。提取的情况可以进一步用于改进IC布局的密度分析。这种改进的密度分析包括提取IC布局的窗口的情况，基于提取的情况从窗口去除重叠，为每种情况计算密度，并且基于每个的密度来计算窗口的密度情况。

10. 发明授权

US07831942B1 Design check database 有权
标题翻译：设计检查数据库
公开(公告)号：US07831942B1
公开(公告)日：2010-11-09
申请号：US11609892
申请日：2006-12-12
申请人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
发明人： Frank E. Gennari , Ya-Chieh Lai , Matthew W. Moskewicz , Michael C. Lam , Gregory R. McIntyre
IPC分类号： G06F17/50 , G06F9/45 , G03C5/00
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D IBDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.
摘要翻译：公开了用于创建和实现二维（2D），基于图像的设计规则（IBDR）的系统和方法。用于创建2D IBDR的技术可以包括识别代表设计感兴趣的2D图案的搜索图案，基于搜索图案创建图案表示，为图案表示定义锚定点，以及将权重分配给模式表示。 2D IBDR可用于通过将2D IBDR与设计进行比较来搜索设计的系统和方法。通过表征所需的规则几何形状，可以将许多2D IBDR合并到类似的2D IBDR的子集中，根据期望的规则几何将2D IBDR分组成组，将2D IBDR组合并成单个代表搜索模式。另外，可以从公开的二维IBDR创建标准设计规则。标准设计规则可以通过在感兴趣的2D图案内定义形状的原点，识别所关注的2D图案内的特征，导出相对于所识别的每个特征的原点的参数，从感兴趣的2D图案创建，以及使用派生参数编写标准设计规则脚本。

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