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11. 发明申请

US20040239911A1 MAGNETICALLY LEVITATED AND DRIVEN RETICLE-MASKING BLADE STAGE MECHANISM HAVING SIX DEGREES OF FREEDOM OF MOTION 有权
标题翻译：具有运动自由度的六个方面的磁力检测和驱动的防伪叶片机械
公开(公告)号：US20040239911A1
公开(公告)日：2004-12-02
申请号：US10449663
申请日：2003-06-02
申请人： ASML Holding N.V.
发明人： Frederick M. Carter , Daniel N. Galburt , Stephen Roux
IPC分类号： G03B027/62
CPC分类号： G03F7/70066 , G03F7/70758 , G03F7/70816 , G03F7/70825 , H02K41/03 , H02K2201/18
摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
摘要翻译：一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。掩模版掩模刀片由掩模版掩模刀片托架组件支撑。掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。优选地，掩模掩模刮板滑架组件是电磁悬浮的。测量掩模版掩模片滑架组件的位置和取向中的至少一个。掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。尺寸可以是两个维度。可以控制掩模掩模刮板托架组件的运动。

12. 发明申请

US20040141163A1 Device for holding a template for use in imprint lithography 有权
标题翻译：用于保存用于压印光刻的模板的装置
公开(公告)号：US20040141163A1
公开(公告)日：2004-07-22
申请号：US10747737
申请日：2003-12-29
申请人： The University of Texas System, Board of Regents, UT System
发明人： Todd Bailey , Byung J. Choi , Matthew E. Colburn , S. V. Sreenivasan , C. Grant Willson , John Ekerdt
IPC分类号： G03B027/00 , G03B027/62
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use.
摘要翻译：描述了压印光刻模板，形成和使用模板的方法以及模板保持装置。压印光刻模板可以包括在主体的表面上具有多个凹部的主体。身体可以是对于激活光是基本上透明的材料。多个凹部的至少一部分可以限定具有小于约250nm的特征尺寸的特征。可以通过获得对于激活光而基本上透明并在模板的表面上形成多个或多个凹陷的材料来形成模板。在一些实施例中，模板还可以包括至少一个对准标记。在一些实施例中，模板还可以包括间隙感测区域。可以使用压印光刻模板来在设置在基板上的可光固化液体中形成印刷层。在使用期间，模板可以设置在模板保持器内。模板保持器可以包括具有构造成接收模板的开口的主体，支撑板和耦合到主体的至少一个压电致动器。压电致动器可以被配置为在使用期间改变模板的物理尺寸。

13. 发明申请

US20040114124A1 Chuck, lithographic apparatus and device manufacturing method 有权
标题翻译：卡盘，光刻设备和器件制造方法
公开(公告)号：US20040114124A1
公开(公告)日：2004-06-17
申请号：US10643167
申请日：2003-08-19
申请人： ASML Netherlands B.V.
发明人： Martinus Hendricus Hendricus Hoeks , Joost Jeroen Ottens
IPC分类号： G03B027/62
CPC分类号： G03F7/70708 , G03F7/707 , H01L21/6833
摘要： A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.
摘要翻译：光刻投影装置设置有静电卡盘。静电卡盘包括形成在第一表面上的多个销的电介质元件。通过施加位于与夹紧表面相对的电介质构件的表面上的电极与位于待夹紧物品的夹紧表面上的电极之间的电位差，待夹紧的物品夹在卡盘上的适当位置。引脚设置有至少一个上导电层，其用于减少约翰森 - 拉贝克效应，允许基板更快地释放。

14. 发明申请

US20040043309A1 Apparatus and method for mounting a hard pellicle 失效
标题翻译：用于安装硬膜的装置和方法
公开(公告)号：US20040043309A1
公开(公告)日：2004-03-04
申请号：US10233916
申请日：2002-09-03
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Burn Jeng Lin
IPC分类号： G03F009/00 , G03B027/54 , G03B027/62 , G03F007/20 , G03B027/32 , G03F001/14
CPC分类号： G03F1/62 , G03F7/70866 , G03F7/70975 , G03F7/70983 , G03F7/70991
摘要： An apparatus for mounting at least one hard pellicle to a mask which includes an enclosure having an interior cavity, demounting means for removing a protective cover from a mask, mounting means for mounting at least one hard pellicle to the mask and conduit means for pumping a light-transmitting gas into the interior cavity between the hard pellicle and the mask.
摘要翻译：一种用于将至少一个硬膜安装到掩模上的装置，其包括具有内腔的外壳，用于从掩模移除保护盖的拆卸装置，用于将至少一个硬膜安装到所述掩模的安装装置和用于泵送透光气体进入硬膜和面罩之间的内腔。

15. 发明申请

US20040023137A1 Apparatus and methods for photolithographic processing 失效
标题翻译：用于光刻处理的装置和方法
公开(公告)号：US20040023137A1
公开(公告)日：2004-02-05
申请号：US10213034
申请日：2002-08-05
发明人： Kevin Duesman , Randal Chance
IPC分类号： G03F009/00 , G03B027/32 , G03B027/52 , G03B027/42 , G03B027/54 , G03B027/62 , G03F007/213 , G03F007/22
CPC分类号： G03F7/70466
摘要： Photolithographic processing apparatus and methods are disclosed. In one embodiment, a method of photolithographically patterning a surface of a substrate includes forming a photoreactive layer on the surface of the substrate, transmitting light through a first patterning portion of a first photolithographic mask to expose a first patterned portion of the photoreactive layer, transmitting light through a second patterning portion of a second photolithographic mask to expose a second patterned portion of the photoreactive layer. In an alternate embodiment, transmitting light through the first patterning portion of the first photolithographic mask is performed simultaneously with transmitting light through the second patterning portion of the second photolithographic mask. In a further embodiment, the light being transmitted through the second patterning portion of a second photolithographic mask has already been transmitted through a first transparent portion of the first photolithographic mask.
摘要翻译：公开了光刻处理装置和方法。在一个实施例中，光刻地图案化衬底的表面的方法包括在衬底的表面上形成光反应层，透过第一光刻掩模的第一图案化部分透射光以暴露光反应层的第一图案化部分，透射光通过第二光刻掩模的第二图案化部分以暴露光致反应层的第二图案化部分。在替代实施例中，透射第一光刻掩模的第一图案化部分的光透过第二光刻掩模的第二图案形成部分同时进行。在另一个实施例中，透射通过第二光刻掩模的第二图案化部分的光已经透射通过第一光刻掩模的第一透明部分。

16. 发明申请

US20030232257A1 Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device 失效
标题翻译：近场光曝光掩模，避免近场光的重叠，其制造方法，曝光装置和使用近场曝光掩模的方法，以及制造装置的方法
公开(公告)号：US20030232257A1
公开(公告)日：2003-12-18
申请号：US10449505
申请日：2003-06-02
申请人： Canon Kabushiki Kaisha
发明人： Yasuhisa Inao , Ryo Kuroda
IPC分类号： G03F001/08 , G03F007/20 , G03F007/26 , G03B027/00 , G03B027/62
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/70325
摘要： A near-field light exposure mask provided with a plurality of apertures each having a width small than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.
摘要翻译：一种近场曝光掩模，其具有多个孔，每个孔的宽度小于用于曝光的光的波长。在上述掩模中，在多个孔之间，彼此相邻的孔设置在必要的距离处，使得从彼此相邻的一个孔中流出的近场光不与另一个孔产生的重叠。

17. 发明申请

US20030224264A1 Projection exposure device and position alignment device and position alignment method 有权
标题翻译：投影曝光装置和位置对位装置及位置对准方法
公开(公告)号：US20030224264A1
公开(公告)日：2003-12-04
申请号：US10414966
申请日：2003-04-16
发明人： Youichi Hirabayashi , Noriyoshi Matsumoto
IPC分类号： G03F009/00 , G03B027/34 , G03B027/40 , G03B027/62
CPC分类号： G03F9/7088 , G03F9/7011 , G03F9/7019 , G03F9/7065
摘要： The invention provides a projection exposure device that makes precise positional alignment possible. With a printed circuit board 76 placed on a mobile stage 70, a mask mark 90 is irradiated by an ultra-violet light source 60 of an ultra-violet illumination device 6, thereby the image of the mask mark 90 is passed through a projection exposure lens 71 and a half-mirror 11, then reflected by an ultra-violet reflection surface mirror 10, thereafter further passed through a beam splitter 34 and an image formation lens 32, forming an image on a CCD 30. The center coordinate of the image is measured by an image recognition device 2. Next, a board mark 91 on the printed circuit board 76 is illuminated by an infrared light source 50 of an infrared illumination device 5, and its image is passed through the ultra-violet reflection surface mirror 10, the half-mirror 11, the beam splitter 34, a reflector 43, an image formation lens 42, and a beam splitter 52, forming an image on a CCD 40. The positional alignment is implemented by moving the mobile stage 70 in the XY directions or rotating it in null degree angle by controlling a moving mechanism 81 in the way the center coordinate of the board mark 91 on the infrared CCD 40 is aligned with the center coordinate of the mask mark 90 on the ultra-violet CCD 30.
摘要翻译：本发明提供了使得精确位置对准成为可能的投影曝光装置。利用放置在移动台70上的印刷电路板76，由紫外线照明装置6的紫外光源60照射掩模标记90，掩模标记90的图像通过投影曝光透镜71和半透镜11，然后被紫外反射面镜10反射，然后进一步通过在CCD 30上形成图像的分束器34和图像形成透镜32.图像的中心坐标通过图像识别装置2测量。接下来，印刷电路板76上的板标记91被红外照明装置5的红外光源50照射，并且其图像通过紫外反射表面反射镜10 ，半反射镜11，分束器34，反射器43，图像形成透镜42和分束器52，在CCD 40上形成图像。通过在XY中移动移动台70来实现位置对准方向或旋转它通过以红外CCD 40上的板标记91的中心坐标与紫外CCD 30上的掩模标记90的中心坐标对齐的方式控制移动机构81来控制角度角。

18. 发明申请

US20030207182A1 Framed pellicle for protection of photolithographic photomask 有权
公开(公告)号：US20030207182A1
公开(公告)日：2003-11-06
申请号：US10419933
申请日：2003-04-22
发明人： Toru Shirasaki
IPC分类号： G03F001/14 , G03B027/62 , B44F001/00 , A47G001/12 , G03F007/20
CPC分类号： G03F1/64
摘要： An improvement is provided in the photolithographic patterning of a photoresist layer by pattern-wise exposure to short-wavelength ultraviolet light through a pattern-bearing photomask which is dustproof protected by mounting a framed pellicle thereon. With an object to overcome the troubles therein due to absorption of short-wavelength ultraviolet light by oxygen and the interaction of atmospheric oxygen in the space surrounded by the photomask and the framed pellicle with the energy of the short-wavelength ultraviolet, the framed pellicle is provided in the frame with at least two gas-passage openings through which the air inside is replaced with nitrogen in conducting the ultraviolet exposure. The openings are preferably covered with a filter member and covered further with a covering member having a gas nozzle which is connected to a feed source of an inert gas such as nitrogen.

19. 发明申请

US20030186131A1 Electrostatic pellicle system for a mask 失效
标题翻译：用于面罩的静电防护薄膜系统
公开(公告)号：US20030186131A1
公开(公告)日：2003-10-02
申请号：US10112454
申请日：2002-03-28
发明人： Dan Enloe
IPC分类号： G03F001/14 , G03B027/62 , H02H001/00 , H02B001/00 , H05F001/00 , H05B001/00 , H01H001/00 , H01G002/00 , B44F001/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62
摘要： The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
摘要翻译：本发明描述了一种包括掩模的装置; 防护膜隔离物，附着在掩模上的防护膜隔片; 和静电防护薄膜系统，静电防护薄膜系统附着在防护薄膜组件上。本发明还描述了一种在暴露期间将污染物远离掩模附近的污染物，污染物包括不带电荷或中性颗粒，带正电荷的颗粒或带负电荷的颗粒，包括：诱导正电荷或负电荷在不带电或中性粒子上; 用带负电荷的电场吸引带正电的粒子; 并用带正电荷的电场吸引带负电荷的粒子。

20. 发明申请

US20030020894A1 Removable Optical pellicle 有权
标题翻译：可拆卸光学防护薄膜
公开(公告)号：US20030020894A1
公开(公告)日：2003-01-30
申请号：US09916737
申请日：2001-07-26
申请人： Micro Lithography, Inc.
发明人： Ching-Bore Wang
IPC分类号： G03B027/62
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70983
摘要： Optical pellicles for photomasks are described, where the optical pellicle is configured to be reversibly affixed to the photomask with a non-adhesive mounting member, such as a vacuum system or an electrostatic film. The optical pellicles of the invention are readily removed from the photomask and reattached without the use of adhesives, and are well-suited for use by automated methods.
摘要翻译：描述了用于光掩模的光学薄膜，其中光学防护薄膜被配置为可逆地固定到光掩模上的非粘性安装构件，例如真空系统或静电膜。本发明的光学薄膜易于从光掩模中去除并重新附着而不使用粘合剂，并且非常适合于通过自动化方法使用。

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