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11. 发明授权

US07034298B2 Inspection method and apparatus using an electron beam 失效
公开(公告)号：US07034298B2
公开(公告)日：2006-04-25
申请号：US10669253
申请日：2003-09-25
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
IPC分类号： G01N13/16 , G06K9/00
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.

12. 发明授权

US06771419B1 Rear projection type image display unit 失效
标题翻译：背投式图像显示单元
公开(公告)号：US06771419B1
公开(公告)日：2004-08-03
申请号：US09869498
申请日：2001-06-28
申请人： Shigekazu Yamagishi , Hiroshi Miyai , Hiroshi Yamaguchi , Kenichi Ikeda
发明人： Shigekazu Yamagishi , Hiroshi Miyai , Hiroshi Yamaguchi , Kenichi Ikeda
IPC分类号： G03B2160
CPC分类号： G03B21/625 , G03B21/62 , H04N9/31
摘要： Color lights from image projecting sections (207) that enlarge and project images of red, green and blue, respectively, are made incident on a transparent screen at different angles of incidence, so that image synthesis is carried out. The color lights projected are converted into telecentric light by a Fresnel lens (211), and after principal rays of the respective color lights are converted into substantially parallel rays by a color shading eliminating means (219) provided with lenticular lenses on both sides thereof, the rays are incident on a light diffusing means (224). The light diffusing means (224) is formed with a transparent substrate sheet and a plurality of transparent micro beads made to adhere onto a light-incident surface of the substrate sheet with an opaque adhesive. Image light passes through light transmitting portions between the substrate sheet and the micro beads to be diffused. This configuration enables to provide a rear-projection image display whose display images are hardly affected by external light, which has an increased angle of visibility, and which undergoes less color shading, without a decrease in light utilization efficiency.
摘要翻译：来自图像投影部分（207）的颜色光分别以不同的入射角入射到透明屏幕上，从而进行图像合成。通过菲涅尔透镜（211）将所投射的彩色光转换成远心光，并且通过在其两侧上设置有双凸透镜的着色消除装置（219）将各色光的主光线转换成基本平行的光线后，光线入射到光漫射装置（224）上。光扩散装置（224）形成有透明基板和多个透明微珠，其通过不透明粘合剂粘附在基片的光入射表面上。图像光通过基片和微珠之间的透光部分进行扩散。该配置能够提供一种背投影图像显示器，其显示图像几乎不受外部光的影响，外部光线具有增加的可见度角度，并且在不降低光利用效率的情况下经受较少的色彩遮蔽。

13. 发明授权

US06583634B1 Method of inspecting circuit pattern and inspecting instrument 有权
标题翻译：电路图案检查方法
公开(公告)号：US06583634B1
公开(公告)日：2003-06-24
申请号：US09559563
申请日：2000-04-27
申请人： Mari Nozoe , Hiroyuki Shinada , Kenji Watanabe , Keiichi Saiki , Aritoshi Sugimoto , Hiroshi Morioka , Maki Tanaka , Hiroshi Miyai
发明人： Mari Nozoe , Hiroyuki Shinada , Kenji Watanabe , Keiichi Saiki , Aritoshi Sugimoto , Hiroshi Morioka , Maki Tanaka , Hiroshi Miyai
IPC分类号： G01R31305
CPC分类号： H01J37/28 , G01R31/307 , G09G3/006 , H01J37/265 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.
摘要翻译：为了根据要检查的电路图案的材料和结构获得电子束的最佳照射条件以及在最佳条件下无故障检测的种类和检查时间的延迟，检查装置将电子束19照射到作为样本的样品板9，由检测器7检测产生的二次电子，将获得的信号顺序地存储在存储器中，比较由比较计算单元存储在存储器中的相同模式，并提取故障提供了通过故障判定单元将预定阈值与比较信号进行比较，其中根据样本的结构和照射的推荐值，将照射能量的最佳值预先存储在设备内部的数据库中可以通过使用照射能量的输入或选择来搜索适合于检查的能量或输入关于被检查物品的结构的信息。

14. 发明授权

US5640462A Imaging method of X-ray computerized tomography and apparatus for X-ray computerized tomography 失效
标题翻译： X线计算机断层扫描成像方法及X线计算机断层扫描仪器
公开(公告)号：US5640462A
公开(公告)日：1997-06-17
申请号：US945903
申请日：1992-09-17
申请人： Katsutoshi Sato , Shigeru Izumi , Shoji Kamata , Hiroshi Miyai , Hiroshi Kitaguchi , Masahiro Kondo , Seishi Watahiki
发明人： Katsutoshi Sato , Shigeru Izumi , Shoji Kamata , Hiroshi Miyai , Hiroshi Kitaguchi , Masahiro Kondo , Seishi Watahiki
IPC分类号： A61B6/03 , G01N23/04 , G06Q50/22 , G06Q50/24 , G06T1/00 , G06T11/00 , G06K9/00
CPC分类号： G01N23/046 , G06T11/001 , G01N2223/419
摘要： An imaging method of an X-ray computerized tomography (X-ray CT) comprising the steps of reconstructing a partial region including a region of interest from penetrating data of an object, extracting only shape information from the reconstructed image, setting a threshold function determined by resolution to the reconstructed image information which is equivalent to linear absorption coefficient distribution (density), extracting the reconstructed image information by making the information into bi-values or tri-values based on the threshold function or by differentiating the information, and extracting and imaging only a portion where the linear absorption coefficient distribution (density) changes stepwise.
摘要翻译：一种X射线计算机断层摄影（X射线CT）的成像方法，包括以下步骤：从穿透对象的数据重建包含感兴趣区域的部分区域，仅从重构图像中提取形状信息，设定阈值函数通过分辨率等于线性吸收系数分布（密度）的重建图像信息，通过基于阈值函数将信息形成为双值或三值来提取重建图像信息，或者通过对信息进行微分，并提取和仅成像线性吸收系数分布（密度）逐步变化的部分。

15. 发明授权

US08542246B2 Color conversion device, color conversion table and color conversion method 有权
标题翻译：颜色转换装置，颜色转换表和颜色转换方法
公开(公告)号：US08542246B2
公开(公告)日：2013-09-24
申请号：US12921867
申请日：2009-03-11
申请人： Katsuo Saigo , Hiroshi Miyai , Hisakazu Hitomi , Masanobu Inoe , Masahiro Kawashima , Akihiro Takeuchi
发明人： Katsuo Saigo , Hiroshi Miyai , Hisakazu Hitomi , Masanobu Inoe , Masahiro Kawashima , Akihiro Takeuchi
IPC分类号： G09G5/00 , G09G5/02 , G06K9/00 , G06K9/40 , G03F3/08 , H04N1/46 , H04N1/60 , H04N1/62 , G06T11/00
CPC分类号： H04N1/6058 , G06T11/001 , H04N1/62 , H04N1/628
摘要： A color conversion device generates color data in a second color gamut based on first converted color data and input color data, which are obtained from input color data in a first color gamut, and outputs the color data in the second color gamut. The color conversion device includes a first color mapping unit which generates the first converted color data by mapping the input color data into the second color gamut; a color mixing unit which generates color data by mixing the first converted color data and second converted color data at a ratio corresponding to the first color gamut and the second color gamut; and a color data output unit which outputs the color data.
摘要翻译：颜色转换装置基于从第一色域中的输入颜色数据获得的第一转换颜色数据和输入颜色数据，在第二色域中生成颜色数据，并输出第二色域中的颜色数据。颜色转换装置包括：第一颜色映射单元，其通过将输入的颜色数据映射到第二色域来生成第一转换的颜色数据; 混色单元，其以与第一色域和第二色域对应的比率混合第一转换色数据和第二转换色数据，生成彩色数据; 以及输出颜色数据的颜色数据输出单元。

16. 发明授权

US08086021B2 Appearance inspection apparatus with scanning electron microscope and image data processing method using scanning electron microscope 有权
标题翻译：具有扫描电子显微镜的外观检查装置和使用扫描电子显微镜的图像数据处理方法
公开(公告)号：US08086021B2
公开(公告)日：2011-12-27
申请号：US12367695
申请日：2009-02-09
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J2237/221 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
摘要翻译：本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。此外，允许用户选择吞吐量提高或S / N改善以优先化。

17. 发明申请

US20110278452A1 PATTERN CHECK DEVICE AND PATTERN CHECK METHOD 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US20110278452A1
公开(公告)日：2011-11-17
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/285
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

18. 发明申请

US20100008564A1 INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE 失效
标题翻译：检查基板图案的检查装置
公开(公告)号：US20100008564A1
公开(公告)日：2010-01-14
申请号：US12564567
申请日：2009-09-22
申请人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

19. 发明申请

US20080063257A1 Pattern Inspection Method And Apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US20080063257A1
公开(公告)日：2008-03-13
申请号：US11931693
申请日：2007-10-31
申请人： Takashi HIROI , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi HIROI , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.
摘要翻译：一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在存储器中的缺陷类别数据一起显示缺陷候选的图像，并且显示的缺陷类别数据可在显示屏幕上变化，并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

20. 发明授权

US07294833B2 Method of alignment for efficient defect review 失效
标题翻译：高效缺陷检查对齐方法
公开(公告)号：US07294833B2
公开(公告)日：2007-11-13
申请号：US10847885
申请日：2004-05-19
申请人： Takehiko Konno , Hiroshi Miyai
发明人： Takehiko Konno , Hiroshi Miyai
IPC分类号： H01J37/28
CPC分类号： H01J37/3045 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
摘要翻译：一种检查系统包括用于在制造半导体器件的步骤中检测半导体样品中的缺陷的SEM目视检查装置和用于以高分辨率观察由SEM目视检查装置检测的半导体样品中的缺陷的检查装置。该系统具有将对准字典图像作为将由SEM目视检查装置使用检查配方设置的对准参数之一传送给检查装置的功能。

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