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11. 发明申请

US20080142919A1 CMOS image sensors with light shielding patterns and methods of forming the same 有权
标题翻译：具有遮光图案的CMOS图像传感器及其形成方法
公开(公告)号：US20080142919A1
公开(公告)日：2008-06-19
申请号：US11974981
申请日：2007-10-17
申请人： Jong-Cheol Shin
发明人： Jong-Cheol Shin
IPC分类号： H01L31/0216 , H01L31/18
CPC分类号： H01L27/14623
摘要： An image sensor includes a semiconductor substrate including an active pixel region and an optical black region, a wiring pattern on the active pixel region and on the optical black region, and a light shielding pattern on the wiring pattern in the optical black region, the light shielding pattern including an opening therein. A dummy pattern is in the optical black region and is spaced apart from the light shielding pattern. The dummy pattern blocks light incident through the openings of the light shielding patter. An inter-metal dielectric layer fills spaces between the patterns, and a passivation layer is on the inter-metal dielectric layer. The dummy pattern includes an opening therein, and a hydrogen diffusion path is provided from the passivation layer, through the opening in the light shielding pattern and the opening in the dummy pattern, to the semiconductor substrate. The dummy pattern may be on the same level as the wiring pattern.
摘要翻译：图像传感器包括：半导体衬底，包括有源像素区域和光学黑色区域，有源像素区域和光学黑色区域上的布线图案，以及光学黑色区域中的布线图案上的遮光图案，屏蔽图案包括其中的开口。虚拟图案在光学黑色区域中并且与遮光图案间隔开。虚拟图案阻挡通过遮光图案的开口入射的光。金属间介电层填充图案之间的空间，钝化层位于金属间介电层上。虚拟图案包括开口，并且从钝化层通过遮光图案中的开口和虚设图案中的开口向半导体衬底提供氢扩散路径。虚设图案可以与布线图案处于同一水平。

12. 发明授权

US07205623B2 Image sensor and method of manufacturing same 失效
标题翻译：图像传感器及其制造方法
公开(公告)号：US07205623B2
公开(公告)日：2007-04-17
申请号：US11229764
申请日：2005-09-20
申请人： Jong-Wook Hong , Jong-Cheol Shin
发明人： Jong-Wook Hong , Jong-Cheol Shin
IPC分类号： H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14623 , H01L27/1463
摘要： An image sensor includes a photodiode formed in substrate, an insulating interlayer structure formed on the substrate, a metal structure formed in the insulating interlayer structure, a dummy pattern formed on the insulating interlayer structure, and a light-shielding layer pattern enclosing the dummy pattern. The dummy pattern is at least partially overlapped by the metal structure and the light-shielding layer pattern is at least partially overlapped by the photodiode.
摘要翻译：图像传感器包括形成在基板中的光电二极管，形成在基板上的绝缘层间结构，形成在绝缘层间结构中的金属结构，形成在绝缘层间结构上的虚设图案，以及包围虚设图案的遮光层图案。虚设图案至少部分地被金属结构重叠，并且遮光层图案至少部分地被光电二极管重叠。

13. 发明申请

US20060060899A1 Image sensor and method of manufacturing same 失效
标题翻译：图像传感器及其制造方法
公开(公告)号：US20060060899A1
公开(公告)日：2006-03-23
申请号：US11229764
申请日：2005-09-20
申请人： Jong-Wook Hong , Jong-Cheol Shin
发明人： Jong-Wook Hong , Jong-Cheol Shin
IPC分类号： H01L21/00 , H01L31/062
CPC分类号： H01L27/14685 , H01L27/14623 , H01L27/1463
摘要： An image sensor includes a photodiode formed in substrate, an insulating interlayer structure formed on the substrate, a metal structure formed in the insulating interlayer structure, a dummy pattern formed on the insulating interlayer structure, and a light-shielding layer pattern enclosing the dummy pattern. The dummy pattern is at least partially overlapped by the metal structure and the light-shielding layer pattern is at least partially overlapped by the photodiode.
摘要翻译：图像传感器包括形成在基板中的光电二极管，形成在基板上的绝缘层间结构，形成在绝缘层间结构中的金属结构，形成在绝缘层间结构上的虚设图案，以及包围虚设图案的遮光层图案。虚设图案至少部分地被金属结构重叠，并且遮光层图案至少部分地被光电二极管重叠。

14. 发明授权

US06926386B2 Inkjet printer head and method of fabricating the same 有权
标题翻译：喷墨打印头及其制造方法
公开(公告)号：US06926386B2
公开(公告)日：2005-08-09
申请号：US10603828
申请日：2003-06-26
申请人： Jong-Cheol Shin , Kwang-Joon Yoon , Sung-Joon Park
发明人： Jong-Cheol Shin , Kwang-Joon Yoon , Sung-Joon Park
IPC分类号： B41J2/01 , B41J2/045 , B41J2/05 , B41J2/055 , B41J2/14 , B41J2/16 , B41J2/34 , B41J2/195
CPC分类号： B41J2/1631 , B41J2/14137 , B41J2/1601 , B41J2/1628 , B41J2/1632
摘要： An inkjet printer head includes a semiconductor wafer having a nozzle portion for ejecting ink, an ink cartridge for supplying ink to the nozzle portion, and an ink ejection unit interposed between the ink cartridge and the semiconductor wafer. A method of forming the printer head includes forming an ink ejection unit having an opening on a semiconductor wafer to expose an upper surface of the wafer, etching the wafer through the opening in the ink ejection unit to form a nozzle in the semiconductor wafer, and attaching an ink cartridge to the upper surface of the semiconductor wafer.
摘要翻译：喷墨打印头包括具有用于喷射墨水的喷嘴部分的半导体晶片，用于向喷嘴部分供墨的墨盒以及介于墨盒和半导体晶片之间的墨水喷射单元。一种形成打印头的方法包括：在半导体晶片上形成具有开口的喷墨单元以暴露晶片的上表面，通过喷墨单元中的开口蚀刻晶片，以在半导体晶片中形成喷嘴;以及将墨盒附接到半导体晶片的上表面。

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