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11. 发明授权

US07915600B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07915600B2
公开(公告)日：2011-03-29
申请号：US11870020
申请日：2007-10-10
申请人： Yoshifumi Ueno , Georg Soumagne , Akira Sumitani , Osamu Wakabayashi
发明人： Yoshifumi Ueno , Georg Soumagne , Akira Sumitani , Osamu Wakabayashi
IPC分类号： G01J1/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033
摘要： An extreme ultra violet light source apparatus has a relatively high output for exposure and suppresses the production of debris as much as possible instead of disposing of debris that has been produced. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply unit for supplying solid tin or lithium as a target to a predetermined position within the chamber; a CO2 laser for applying a laser beam based on pulse operation to the target supplied by the target supply unit so as to generate plasma; and a collector mirror having a multilayer film on a reflecting surface thereof, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.
摘要翻译：极紫外光源装置具有相对较高的曝光输出，尽可能地抑制碎片的产生，而不是处理已经产生的碎片。极紫外光源装置包括：产生极紫外光的室; 用于将固体锡或锂作为目标供应到所述室内的预定位置的目标供应单元; 用于将基于脉冲操作的激光束施加到由目标供给单元提供的目标以产生等离子体的CO 2激光器; 以及在其反射表面上具有多层膜的收集器反射镜，用于收集从等离子体辐射的极紫外光以输出极紫外光。

12. 发明申请

US20100078579A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100078579A1
公开(公告)日：2010-04-01
申请号：US12566170
申请日：2009-09-24
申请人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
发明人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/001 , H05G2/008
摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.
摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

13. 发明授权

US09647415B2 Laser apparatus and method of controlling laser apparatus 有权
公开(公告)号：US09647415B2
公开(公告)日：2017-05-09
申请号：US14602208
申请日：2015-01-21
申请人： Hiroaki Tsushima , Osamu Wakabayashi , Takashi Matsunaga
发明人： Hiroaki Tsushima , Osamu Wakabayashi , Takashi Matsunaga
IPC分类号： H01S3/10 , H01S3/00 , H01S3/097 , H01S3/08 , H01S3/0971 , H01S3/23
CPC分类号： H01S3/09702 , H01S3/0014 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/2366
摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

14. 发明授权

US09257809B2 Laser device for exposure apparatus 有权
标题翻译：用于曝光设备的激光装置
公开(公告)号：US09257809B2
公开(公告)日：2016-02-09
申请号：US13401734
申请日：2012-02-21
申请人： Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
发明人： Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
IPC分类号： H01S3/223 , H01S3/03 , H01S3/134 , H01S3/23 , H01S3/036 , G03F7/20
CPC分类号： H01S3/03 , G03F7/70025 , H01S3/036 , H01S3/134 , H01S3/2316 , H01S3/2366
摘要： A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.
摘要翻译：用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光，并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

15. 发明授权

US09046651B2 Mirror device 有权
标题翻译：镜像设备
公开(公告)号：US09046651B2
公开(公告)日：2015-06-02
申请号：US13696528
申请日：2011-12-29
申请人： Hiroshi Someya , Yukio Watanabe , Katsuhiko Wakana , Osamu Wakabayashi
发明人： Hiroshi Someya , Yukio Watanabe , Katsuhiko Wakana , Osamu Wakabayashi
IPC分类号： G02B7/182 , G02B7/18 , G03F7/20
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
摘要翻译：反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。

16. 发明授权

US08811436B2 Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus 有权
标题翻译：激光装置，包括激光装置的极紫外光发生系统和用于控制激光装置的方法
公开(公告)号：US08811436B2
公开(公告)日：2014-08-19
申请号：US13696497
申请日：2012-02-08
申请人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
发明人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
IPC分类号： H01S3/13
CPC分类号： H01S3/10046 , G03F7/70025 , G03F7/70033 , H01S3/0085 , H01S3/09702 , H01S3/10007 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4025 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
摘要翻译：激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

17. 发明授权

US08804780B2 Method for adjusting spectral line width of narrow-band laser 有权
标题翻译：调整窄带激光光谱线宽度的方法
公开(公告)号：US08804780B2
公开(公告)日：2014-08-12
申请号：US11822126
申请日：2007-07-02
申请人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
发明人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
IPC分类号： H01S3/13 , H01S3/137
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译：对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量曝光工具可以稳定。

18. 发明授权

US08587863B2 Wavelength conversion device, solid-state laser apparatus, and laser system 有权
标题翻译：波长转换装置，固体激光装置和激光系统
公开(公告)号：US08587863B2
公开(公告)日：2013-11-19
申请号：US13568232
申请日：2012-08-07
申请人： Osamu Wakabayashi , Takashi Onose
发明人： Osamu Wakabayashi , Takashi Onose
IPC分类号： G02F1/35 , G02F2/02 , H01S3/04
CPC分类号： H01S3/2251 , G02F1/353 , G02F2001/3505 , G02F2001/3546 , G02F2203/60 , H01S3/0092 , H01S3/0401 , H01S3/1625 , H01S3/1636 , H01S3/2316 , H01S3/2325 , H01S3/2375
摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.
摘要翻译：波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

19. 发明授权

US08536551B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08536551B2
公开(公告)日：2013-09-17
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

20. 发明申请

US20130208742A1 OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：光学装置，激光装置和超极紫外光发生系统
公开(公告)号：US20130208742A1
公开(公告)日：2013-08-15
申请号：US13817818
申请日：2012-02-17
申请人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
发明人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
IPC分类号： H01S3/10
CPC分类号： H01S3/0071 , H01S3/0014 , H01S3/10061 , H01S3/1305 , H05G2/008
摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
摘要翻译：光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

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