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11. 发明授权

US5729562A Pulse power generating circuit with energy recovery 失效
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：US5729562A
公开(公告)日：1998-03-17
申请号：US739873
申请日：1996-10-31
申请人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
发明人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
IPC分类号： H01S3/00 , H01S3/097 , H01S3/225 , H02M9/04 , H03K3/57 , H03K17/00 , H03K17/80 , H05H1/06
CPC分类号： H05H1/06 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225 , H03K2217/0036
摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路。能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

12. 发明授权

US6151346A High pulse rate pulse power system with fast rise time and low current 有权
标题翻译：高脉冲脉冲电源系统具有快速上升时间和低漏电流
公开(公告)号：US6151346A
公开(公告)日：2000-11-21
申请号：US370739
申请日：1999-08-09
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： G03F7/20 , H01S3/097 , H01S3/225 , H02M3/00 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源，用于在小于400微秒内对充电电容器充电，并且包括编程的处理器的脉冲控制系统以至少2000的速率控制充电电容器的充电至小于约百分之一的精度每秒收费

13. 发明授权

US06541786B1 Plasma pinch high energy with debris collector 失效
标题翻译：等离子体夹杂高能量与碎片收集器
公开(公告)号：US06541786B1
公开(公告)日：2003-04-01
申请号：US09324526
申请日：1999-06-02
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation collector-director is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid or liquid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration. Other preferred embodiments utilize a conical nested debris collector upstream of the radiation collector-director.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。脉冲电源提供电压足够高的电脉冲以在电极之间产生电放电，以在工作气体中产生非常高温，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。在一个优选的实施方式中，活性气体是锂，缓冲气体是氦气，并且辐射收集器导向器涂覆有用于电极的材料。材料的一个不错的选择是钨。在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极配置的中心电极的轴的孔中的固体或液体锂的汽化来产生锂气体。其他优选实施例利用在辐射收集器 - 导向器上游的锥形嵌套碎片收集器。

14. 发明授权

US5936988A High pulse rate pulse power system 失效
标题翻译：高脉冲脉冲电源系统
公开(公告)号：US5936988A
公开(公告)日：1999-08-10
申请号：US118773
申请日：1998-07-18
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： H01F30/00 , G03F7/20 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源，用于在小于400微秒内对充电电容器充电，并且包括编程的处理器的脉冲控制系统以至少2000的速率控制充电电容器的充电至小于约百分之一的精度每秒收费

15. 发明授权

US08462425B2 Oscillator-amplifier drive laser with seed protection for an EUV light source 有权
标题翻译：振荡器放大器驱动激光器，具有EUV光源的种子保护功能
公开(公告)号：US08462425B2
公开(公告)日：2013-06-11
申请号：US13077757
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/00 , G02F1/33 , G02B5/22 , H05G2/00 , G06K7/10
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1
摘要翻译：如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1

16. 发明授权

US08379687B2 Gas discharge laser line narrowing module 有权
标题翻译：气体放电激光线变窄模块
公开(公告)号：US08379687B2
公开(公告)日：2013-02-19
申请号：US11173955
申请日：2005-06-30
申请人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
发明人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
IPC分类号： H01S3/08
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

17. 发明授权

US08126027B2 Line narrowing module 有权
标题翻译：线窄模块
公开(公告)号：US08126027B2
公开(公告)日：2012-02-28
申请号：US13086858
申请日：2011-04-14
申请人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
发明人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.
摘要翻译：公开了一种可以包括接收光的光栅的装置，可以粗略地选择光栅入射角的第一棱镜和可精细选择光栅入射角的第二棱镜。在一个应用中，该装置可以用作激光源的线窄化模块。

18. 发明授权

US08075732B2 EUV collector debris management 失效
标题翻译： EUV收集器碎片管理
公开(公告)号：US08075732B2
公开(公告)日：2011-12-13
申请号：US10979945
申请日：2004-11-01
申请人： William N. Partlo , Richard L. Sandstrom , Igor V. Fomenkov , Alexander I. Ershov , William Oldham , William F. Marx , Oscar Hemberg
发明人： William N. Partlo , Richard L. Sandstrom , Igor V. Fomenkov , Alexander I. Ershov , William Oldham , William F. Marx , Oscar Hemberg
IPC分类号： C23F1/00
CPC分类号： B08B7/00
摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
摘要翻译：可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。蚀刻剂源材料可以包含卤素或卤素化合物。蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。还可以存在离子加速剂将离子朝向反射表面加速。离子可以包括蚀刻剂源材料。该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

19. 发明申请

US20110102759A1 Laser System 有权
标题翻译：激光系统
公开(公告)号：US20110102759A1
公开(公告)日：2011-05-05
申请号：US12987039
申请日：2011-01-07
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： G03B27/54
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

20. 发明授权

US07643528B2 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US07643528B2
公开(公告)日：2010-01-05
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

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