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11. 发明授权

US08477412B2 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US08477412B2
公开(公告)日：2013-07-02
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： G02B15/14
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：集光镜交换装置能够安全且容易地交换收集器反射镜，用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

12. 发明授权

US07880153B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07880153B2
公开(公告)日：2011-02-01
申请号：US12073001
申请日：2008-02-28
申请人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
发明人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
IPC分类号： H05G2/00 , G01J1/42
CPC分类号： G03F7/70916 , G03F7/70033
摘要： An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.
摘要翻译： EUV光源装置，能够防止过滤EUV光的过滤器的劣化和/或破损。 EUV光源装置包括产生EUV光的EUV产生室; 目标材料供应单元，用于将目标材料供应到EUV光产生室中; 激光源，用于将激光束施加到提供到EUV光产生室中的目标材料以产生等离子体; 用于收集从等离子体辐射的EUV光的收集光学器件; 用于过滤由收集光学器件收集的EUV光的滤光器; 以及设置在等离子体和过滤器之间的过滤器保护构件，用于通过阻挡从等离子体飞向过滤器的飞散物质来保护过滤器。

13. 发明申请

US20080104828A1 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US20080104828A1
公开(公告)日：2008-05-08
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： B23P21/00
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：一种集电镜交换装置，能够安全且容易地交换用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光的集光镜。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

14. 发明授权

US08536551B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08536551B2
公开(公告)日：2013-09-17
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

15. 发明授权

US08445876B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08445876B2
公开(公告)日：2013-05-21
申请号：US12603872
申请日：2009-10-22
申请人： Takashi Suganuma , Masato Moriya , Tamotsu Abe , Kouji Kakizaki , Osamu Wakabayashi
发明人： Takashi Suganuma , Masato Moriya , Tamotsu Abe , Kouji Kakizaki , Osamu Wakabayashi
IPC分类号： H01J35/00 , G03B27/54
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译：可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

16. 发明授权

US08481984B2 Extreme ultra violet light source apparatus 有权
公开(公告)号：US08481984B2
公开(公告)日：2013-07-09
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

17. 发明申请

US20090314967A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20090314967A1
公开(公告)日：2009-12-24
申请号：US12482796
申请日：2009-06-11
申请人： Masato MORIYA , Osamu Wakabayshi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato MORIYA , Osamu Wakabayshi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

18. 发明申请

US20130208742A1 OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：光学装置，激光装置和超极紫外光发生系统
公开(公告)号：US20130208742A1
公开(公告)日：2013-08-15
申请号：US13817818
申请日：2012-02-17
申请人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
发明人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
IPC分类号： H01S3/10
CPC分类号： H01S3/0071 , H01S3/0014 , H01S3/10061 , H01S3/1305 , H05G2/008
摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
摘要翻译：光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

19. 发明授权

US08804778B2 Laser apparatus and extreme ultraviolet light source apparatus 有权
标题翻译：激光设备和极紫外光源设备
公开(公告)号：US08804778B2
公开(公告)日：2014-08-12
申请号：US12580523
申请日：2009-10-16
申请人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
发明人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , B82Y20/00 , G03F7/70033 , H01S3/0007 , H01S3/107 , H01S3/2232 , H01S3/235 , H01S5/02284 , H01S5/0654 , H01S5/06837 , H01S5/0687 , H01S5/141 , H01S5/3402 , H01S5/4012 , H01S5/4062 , H01S5/4087
摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
摘要翻译：一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包含波长的纵模式激光，以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

20. 发明申请

US20130034116A1 SLAB AMPLIFICATION DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译： SLAB放大装置，激光装置和超极紫外线发光系统
公开(公告)号：US20130034116A1
公开(公告)日：2013-02-07
申请号：US13642464
申请日：2011-11-10
申请人： Krzysztof Nowak , Takashi Suganuma , Osamu Wakabayashi
发明人： Krzysztof Nowak , Takashi Suganuma , Osamu Wakabayashi
IPC分类号： H01S3/10 , H01S3/13
CPC分类号： H01S3/2366 , H01S3/005 , H01S3/0315 , H01S3/2375 , H05G2/008
摘要： An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes.
摘要翻译： EUV光发生系统包括：激光器，其包括诸如半导体激光器的主振荡器，空间滤波器，气体平板放大器件，中继光学系统和高速轴流放大器。平板放大装置包括光束调节光学单元，分别设置在平板放大器SA的输入和输出侧，以将平板放大器的光束轮廓和/或偏振方向和/或光束轮廓的细长方向平行于平板波导的自由空间轴AF，即平行于放电电极。

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