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11. 发明授权

US5576247A Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture 失效
标题翻译：疏水分子层防止BPSG层吸收水分的薄层形成方法
公开(公告)号：US5576247A
公开(公告)日：1996-11-19
申请号：US97231
申请日：1993-07-27
申请人： Kousaku Yano , Masayuki Endo , Yuka Terai , Noboru Nomura , Tomoyasu Murakami , Tetsuya Ueda , Satoshi Ueda
发明人： Kousaku Yano , Masayuki Endo , Yuka Terai , Noboru Nomura , Tomoyasu Murakami , Tetsuya Ueda , Satoshi Ueda
IPC分类号： H01L21/3105 , H01L21/316
CPC分类号： H01L21/3105 , Y10S438/974
摘要： A BPSG layer serving as a silicon oxide layer is formed on a semiconductor substrate 1. Formed on the surface of the BPSG layer is a hydrophobic molecular layer comprising hydrophobic groups such as methyl, ethyl and the like, by a silylation reaction (in which silyl having hydrophobic groups such as methyl groups, ethyl groups and the like, is reacted with OH groups, and in which the hydrophobic groups are substituted with H of the OH groups to generate --O--Si(CH.sub.3).sub.3 or the like). The molecular layer prevents the BPSG layer from absorbing moisture.
摘要翻译：在半导体衬底1上形成用作氧化硅层的BPSG层。在BPSG层的表面上形成疏水性分子层，其通过甲硅烷基化反应（甲基，具有疏水基团如甲基，乙基等与OH基团反应，并且其中疏水基团被H的OH基团取代以产生-O-Si（CH 3）3等）。分子层防止BPSG层吸湿。

12. 发明授权

US5312776A Method of preventing the corrosion of metallic wirings 失效
标题翻译：防止金属布线腐蚀的方法
公开(公告)号：US5312776A
公开(公告)日：1994-05-17
申请号：US977022
申请日：1992-11-16
申请人： Tomoyasu Murakami , Michinari Yamanaka , Kousaku Yano , Masayuki Endo , Noboru Nomura , Staoshi Ueda , Naoto Matsuo , Hiroshi Imai , Masafumi Kubota
发明人： Tomoyasu Murakami , Michinari Yamanaka , Kousaku Yano , Masayuki Endo , Noboru Nomura , Staoshi Ueda , Naoto Matsuo , Hiroshi Imai , Masafumi Kubota
IPC分类号： H01L21/02 , H01L21/3213 , H01L23/532 , H01L71/44
CPC分类号： H01L21/02071 , H01L23/5329 , H01L2924/0002 , Y10S148/131
摘要： According to the method of preventing the corrosion of metallic wirings of the present invention, aluminium alloy wirings are formed on the surface of a substrate with the use of photoresists, and the photoresists are then removed. Thereafter, HMDS (hexamethyl disilazine) serving as a surface-active agent or its derivative is supplied to the aluminium alloy wirings to form hydrophobic molecular layers on the lateral walls of the aluminium alloy wirings.
摘要翻译：根据本发明的防止金属配线的腐蚀的方法，使用光致抗蚀剂在基板的表面上形成铝合金布线，然后除去光致抗蚀剂。此后，将作为表面活性剂或其衍生物的HMDS（六甲基二硅嗪）供给到铝合金布线，以在铝合金布线的侧壁上形成疏水性分子层。

13. 发明授权

US5259922A Drying etching method 失效
标题翻译：干燥蚀刻法
公开(公告)号：US5259922A
公开(公告)日：1993-11-09
申请号：US744583
申请日：1991-08-14
申请人： Atsuhiro Yamano , Tokuhiko Tamaki , Masafumi Kubota , Kenji Harafuji , Noboru Nomura
发明人： Atsuhiro Yamano , Tokuhiko Tamaki , Masafumi Kubota , Kenji Harafuji , Noboru Nomura
IPC分类号： H01L21/311 , H01L21/3213 , H01L21/00
CPC分类号： H01J37/32082 , H01L21/31116 , H01L21/32137
摘要： A dry etching method of a substrate or layer of a semiconductor or other material which includes the steps of providing a metallic chamber having an anode and a cathode which are spaced from each other and mounting the substrate or layer to be etched on the cathode, and applying a potential from a RF power supply to the cathode so that a plasma is generated between the anode and the cathode to produce a bulk region and sheath regions between the cathode and the anode. The frequency of the RF power supply is set at a level higher than 13.56 MHz under which the substrate or layer is subjected to etching with the ions. A polysilicon, SiN or Al alloy layer can be efficiently etched with a Cl-based etching gas.
摘要翻译：一种半导体或其他材料的衬底或层的干蚀刻方法，其包括提供具有阳极和阴极的金属室，所述金属室彼此间隔开并将待蚀刻的衬底或层安装在阴极上，以及将来自RF电源的电势施加到阴极，使得在阳极和阴极之间产生等离子体，以在阴极和阳极之间产生体积区域和鞘区域。 RF电源的频率设定在高于13.56MHz的水平，在该水平下，用离子对衬底或层进行蚀刻。可以用Cl基蚀刻气体有效地蚀刻多晶硅，SiN或Al合金层。

14. 发明授权

US5252430A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5252430A
公开(公告)日：1993-10-12
申请号：US812839
申请日：1991-12-20
申请人： Kazuhiko Hashimoto , Noboru Nomura
发明人： Kazuhiko Hashimoto , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/20 , G03F7/38 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/2059 , G03F7/38 , Y10S430/143
摘要： The fine pattern forming method includes the steps of applying an organic polymer film on a semiconductor substrate and heat treating the same; applying a resin solution (including an acid degradation polymer or an acid reactive monomer, an acid generator capable of generating an acid by irradiation with an electric charged beam, and a silicone resin) on the organic polymer layer and heat treating the same; carrying out a heat treatment after a pattern is written, causing the generated acid to react with the acid degradation polymer or the acid reactive monomer and carrying out a development in an alkaline solution to form a resist pattern; and etching the organic polymer layer using the resist pattern as a mask. The use of the resist layer including the silicone resin, the acid generator, and the acid degradation polymer or the acid reactive monomer enables an accurate fine resist pattern to be formed which has a high sensitivity and dry etching resistance, and in which charging is prevented when a pattern is written by a charged beam.
摘要翻译：精细图案形成方法包括以下步骤：在半导体衬底上施加有机聚合物膜并对其进行热处理; 在有机聚合物层上涂布树脂溶液（包括酸降解聚合物或酸反应性单体，能够通过带电束照射产生酸的酸产生剂和有机硅树脂）并对其进行热处理; 在图案写入之后进行热处理，使所产生的酸与酸降解聚合物或酸反应性单体反应，并在碱性溶液中进行显影以形成抗蚀剂图案; 并使用抗蚀图案作为掩模蚀刻有机聚合物层。使用包含硅树脂，酸产生剂，酸降解聚合物或酸反应性单体的抗蚀剂层，能够形成具有高灵敏度和耐干蚀刻性的精确的抗蚀剂图案，并且防止充电当图案由带电束写入时。

15. 发明授权

US5169494A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5169494A
公开(公告)日：1992-12-08
申请号：US742550
申请日：1991-08-08
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/039 , G03F7/09
CPC分类号： G03F7/094 , G03F7/039
摘要： The present invention provides a method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one substance selected from the group consisting of a polyphenylene sulfide, a derivative thereof, and a polymer represented by the formula (I): ##STR1## where n is a positive integer, for forming at least one of the organic polymer film and the electron beam resist film. According to the present invention, it is possible to prevent charging by incident electrons, thereby keeping free of field butting and reduction of overlay accuracy, and to form an accurate and vertical fine resist pattern.
摘要翻译：本发明提供一种形成精细图案的方法，包括以下步骤：在半导体衬底上形成有机聚合物膜并进行热处理，在有机聚合物膜上形成无机膜并进行热处理，在无机膜上形成电子抗蚀剂膜并对其进行热处理，在抗蚀剂膜上绘制图案，将其显影以形成抗蚀剂图案，并使用抗蚀剂图案作为掩模蚀刻无机膜和有机聚合物膜，其中改进包括使用选择的一种物质由聚苯硫醚，其衍生物和由式（I）表示的聚合物组成：其中n为正整数，用于形成至少一个有机聚合物膜和电子光束抗蚀膜。根据本发明，可以防止入射电子的充电，从而保持无间隙对接和降低覆盖精度，并形成精确和垂直的精细抗蚀剂图案。

16. 发明授权

US5057689A Scanning electron microscope and a method of displaying cross sectional profiles using the same 失效
标题翻译：扫描电子显微镜和使用其显示跨部分轮廓的方法
公开(公告)号：US5057689A
公开(公告)日：1991-10-15
申请号：US583541
申请日：1990-09-17
申请人： Noboru Nomura , Hideo Nakagawa , Taichi Koizumi , Kenji Harafuji , Mitsuhiro Okuni , Norimichi Anazawa
发明人： Noboru Nomura , Hideo Nakagawa , Taichi Koizumi , Kenji Harafuji , Mitsuhiro Okuni , Norimichi Anazawa
IPC分类号： H01J37/141 , H01J37/153
CPC分类号： H01J37/141 , H01J37/153
摘要： A scanning electron microscope is disclosed in which an objective lens includes a first pole piece and a second pole piece. The first pole piece is provided with a hole through which an electron beam passes, and is disposed between an electron gun for emitting the electron beam and the second pole piece. The second pole piece has a planar portion on which a specimen is placed, and the second pole piece being mounted on a supporting block movable in a plane substantially perpendicular to the projecting direction of the electron beam.

17. 发明授权

US4745042A Water-soluble photopolymer and method of forming pattern by use of the same 失效
标题翻译：水溶性光聚合物及其形成方法
公开(公告)号：US4745042A
公开(公告)日：1988-05-17
申请号：US724304
申请日：1985-04-17
申请人： Masaru Sasago , Masayuki Endo , Kenichi Takeyama , Noboru Nomura
发明人： Masaru Sasago , Masayuki Endo , Kenichi Takeyama , Noboru Nomura
IPC分类号： G03F7/021 , G03F7/022 , G03F7/09 , G03F7/095 , G03C1/495 , G03C1/52 , G03C1/71 , G03C5/16
CPC分类号： G03F7/022 , G03F7/0215 , G03F7/091 , G03F7/095
摘要： This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography. Besides, when it is applied in said pattern forming method, much finer patterns may be formed.
摘要翻译：本发明涉及一种由水溶性有机物合成的水溶性光聚合物组合物，其特征在于生物技术生产和精制而成的基质聚合物，并含有多糖，蛋白质，明胶，酪蛋白中的至少一种，聚乙烯吡咯烷酮和聚乙烯醇，特别是作为天然多糖的支链淀粉，以及赋予基础聚合物水溶液功能的化学品，例如水溶性辐射敏感化学品，交联剂，催化剂，环氧化合物和化合物拥有相对于辐射的漂白或褪色作用。水溶性光聚合物可以在水中显影，安全性高，老化程度低，有望用作高分辨率，高电阻的单层抗蚀剂或多层抗蚀剂的材料，或作为材料对比增强了诉讼。此外，当以所述图案形成方法应用时，可以形成更精细的图案。

18. 发明授权

US4672496A Magnetic head having electromechanical transducer disposed at one end thereof 失效
标题翻译：具有设置在其一端的机电换能器的磁头
公开(公告)号：US4672496A
公开(公告)日：1987-06-09
申请号：US400596
申请日：1982-07-22
申请人： Kenji Kanai , Nobuyuki Kaminaka , Noboru Nomura , Yuuji Omata
发明人： Kenji Kanai , Nobuyuki Kaminaka , Noboru Nomura , Yuuji Omata
IPC分类号： G11B5/127 , G11B5/49 , G11B5/147
CPC分类号： G11B5/4907 , G11B5/1278
摘要： A thin magnetic film is deposited over a nonmagnetic or piezoelectric substrate. When a shock wave is propagated through this substrate from its one end to the other end, the permeability of the thin magnetic film is locally increased and a portion or region having a high permeability also travels from one end to the other end of the thin magnetic film in unison with the shock wave. A magnetic core with a signal winding is disposed and magnetically coupled with the thin magnetic film. The signal can be recorded or reproduced while the recording medium is scanned.
摘要翻译：薄磁膜沉积在非磁性或压电衬底上。当冲击波从其一端传播到另一端时，薄磁性膜的磁导率局部增加，并且具有高磁导率的部分或区域也从薄磁体的一端到另一端传播电影与冲击波一致。具有信号绕组的磁芯被设置并与薄磁膜磁耦合。可以在扫描记录介质时记录或再现信号。

19. 发明授权

US4477794A Magnetoresistive element 失效
标题翻译：磁阻元件
公开(公告)号：US4477794A
公开(公告)日：1984-10-16
申请号：US406894
申请日：1982-08-10
申请人： Noboru Nomura , Kenji Kanai , Nobuyuki Kaminaka , Yuji Omata
发明人： Noboru Nomura , Kenji Kanai , Nobuyuki Kaminaka , Yuji Omata
IPC分类号： G11B5/39 , H01L43/08 , G11B5/30
CPC分类号： G11B5/3903 , H01L43/08
摘要： The invention provides a magnetoresistive element which magnetostatically has magnetic anisotropy to control a domain structure and which eliminates Barkhousen noise that will cause abrupt movement of domain walls and irregular magnetization due to a change in the signal magnetic field, wherein a grating pattern is formed on at least one surface of a magnetoresistive film by a process in which a grating pattern is unidirectionally formed on the surface of a substrate and the magnetoresistive film of a ferromagnetic body is deposited thereon. Further, various magnetoresistive elements to which a novel bias method is applied are provided.
摘要翻译：本发明提供一种磁阻元件，其磁静态地具有磁各向异性以控制畴结构，并且消除了由于信号磁场的变化引起的畴壁突然移动和不规则磁化的巴克霍森噪声，其中光栅图案形成在通过在基板的表面上单向形成光栅图案并且在其上沉积铁磁体的磁阻膜的工艺，形成磁阻膜的至少一个表面。此外，提供了应用了新的偏置方法的各种磁阻元件。

20. 发明授权

US4068272A High sensitivity magnetic head using magneto-resistive effect element 失效
标题翻译：高灵敏度磁头使用磁阻效应元件
公开(公告)号：US4068272A
公开(公告)日：1978-01-10
申请号：US632761
申请日：1975-11-17
申请人： Kenji Kanai , Nobuyuki Kaminaka , Norimoto Nouchi , Noboru Nomura
发明人： Kenji Kanai , Nobuyuki Kaminaka , Norimoto Nouchi , Noboru Nomura
IPC分类号： G11B5/39 , G11B5/12 , G11B5/30
CPC分类号： G11B5/3925 , G11B5/3903 , G11B5/3977 , G11B5/398
摘要： This invention provides a high sensitivity magnetic head using magneto-resistive effect elements consisting of ferromagnetic thin plates and allows construction of a high precision multi-track head by using thin film and photo-etching techniques. The magnetic head comprises a base, two flux converging cores forming a magnetic gap, a detecting portion provided between the two flux converging cores and extending at right angles to the end of the base, one end of the detecting portion being located in the neighborhood of the gap and having a smaller sectional area than the other portions, and detecting electrodes provided at the opposite ends of the detecting portion. At least one of the two cores is of a ferromagnetic material and integrally formed on the base.
摘要翻译：本发明提供了使用由铁磁薄板构成的磁阻效应元件的高灵敏度磁头，并且通过使用薄膜和光蚀刻技术来构造高精度多轨头。磁头包括基座，形成磁隙的两个磁通会聚磁芯，设置在两个磁通会聚磁芯之间并与基座的端部成直角延伸的检测部分，检测部分的一端位于所述间隙具有比其他部分更小的截面面积，以及设置在所述检测部分的相对端的检测电极。两个芯中的至少一个是铁磁材料并且一体地形成在基部上。

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