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11. 发明授权

US4975223A Optical material 失效
标题翻译：光学材料
公开(公告)号：US4975223A
公开(公告)日：1990-12-04
申请号：US305647
申请日：1989-02-03
申请人： Hideaki Doi , Teruo Sakagami
发明人： Hideaki Doi , Teruo Sakagami
IPC分类号： C08F212/08 , C08F12/00 , C08F16/14 , C08F16/16 , C08F20/26 , C08F212/00 , C08F212/14 , C08F212/32 , C08F216/14 , C08F216/16 , C08F220/30 , C08F290/00 , C08F299/02 , G02B1/04
CPC分类号： C08F212/32 , G02B1/04
摘要： An optical material of a high refractive index is formed of a copolymer obtained by copolymerizing 3-40 wt. % of 4-isopropenylbiphenyl, 30-97 wt. % of a monofunctional aromatic monomer represented by the following formula (I) or (II) and 0-67 wt. % of another monomer copolymerizable with 4-isopropenylbiphenyl and the monofunctional aromatic monomer. ##STR1## wherein R means a hydrogen atom or methyl group, X denotes ##STR2## in which n stands for an integer of 0-3, Y is a halogen atom other than a fluorine atom, or a methyl, hydroxyl or methoxy group, and m stands for an integer of 0-3, with the proviso that Y may be different from each other when m is 2 or 3.
摘要翻译：高折射率的光学材料由通过共聚3-40重量％％的4-异丙烯基联苯，30-97wt。％的由下式（I）或（II）表示的单官能芳族单体和0-67重量％％的可与4-异丙烯基联苯和单官能芳族单体共聚的另一种单体。式（I）其中R表示氢原子或甲基，X表示其中n表示0-3的整数，Y表示卤素，除了氟原子以外的原子，或甲基，羟基或甲氧基，m表示0-3的整数，条件是当m为2或3时，Y可以彼此不同。

12. 发明授权

US4962541A Pattern test apparatus 失效
标题翻译：图案测试仪
公开(公告)号：US4962541A
公开(公告)日：1990-10-09
申请号：US154239
申请日：1988-02-10
申请人： Hideaki Doi , Yasuhiko Hara , Akira Sase , Satoshi Shinada
发明人： Hideaki Doi , Yasuhiko Hara , Akira Sase , Satoshi Shinada
IPC分类号： H01L21/66 , G01N21/88 , G01N21/93 , G01N21/956 , G06T1/00 , G06T7/00
CPC分类号： G06T7/001 , G01N21/95607 , G03F1/84 , G06T2207/30148
摘要： Disclosed is a pattern test apparatus for detecting a fault on the basis of comparison/collation between a test reference pattern and a test target pattern, the apparatus being arranged such that a picture element area is defined by a circle with a predetermined radius on a reference matter having at test reference pattern, and when the number of the picture elements located on the reference pattern is larger than the number of the picture elements located outside the reference pattern, a part of the reference pattern corresponding to a picture element located in the center of the circle is deleted. By such an arrangement, the test reference pattern can be made analogous to the real test target pattern regardless of the shape thereof, so that misjudgment of a normal test target pattern for a fault pattern can be prevented.
摘要翻译：公开了一种用于基于测试参考图案和测试对象图案之间的比较/对照来检测故障的图案测试设备，该设备被布置为使得图像元素区域由参考上的预定半径的圆圈定义具有测试参考图案的物体，并且当位于参考图案上的像素的数量大于位于参考图案外部的图像元素的数量时，与位于中心的图像元素相对应的参考图案的一部分的圈子被删除。通过这样的布置，可以使测试参考图案与实际测试对象图案类似，而不管其形状如何，从而可以防止对故障图案的正常测试对象图案的误判。

13. 发明授权

US06622054B1 Method monitoring a quality of electronic circuits and its manufacturing condition and system for it 失效
标题翻译：监控电子电路质量的方法及其制造条件和系统
公开(公告)号：US06622054B1
公开(公告)日：2003-09-16
申请号：US09413468
申请日：1999-10-06
申请人： Hirohito Okuda , Toshifumi Honda , Hisae Yamamura , Yuji Takagi , Hideaki Doi , Shigeshi Yoshinaga
发明人： Hirohito Okuda , Toshifumi Honda , Hisae Yamamura , Yuji Takagi , Hideaki Doi , Shigeshi Yoshinaga
IPC分类号： G05B1302
CPC分类号： G05B19/41875 , G05B23/0216 , G05B23/024 , G05B2219/37572 , G05B2219/45029 , H05K1/0269 , H05K3/0005 , H05K3/3484 , Y02P90/04 , Y02P90/22
摘要： With a view to providing a monitoring system for the quality and manufacturing conditions of electronic circuits capable of facilitating the grasping of correlation's between diverse manufacturing conditions and manufacturing states, statistically characteristic images are selected out of a group of images retrieved from a detection information database by specifying at least one out of the values of feature quantities, design information and manufacturing conditions, and are displayed.
摘要翻译：为了提供电子电路的质量和制造条件的监测系统，能够便于掌握不同的制造条件和制造状态之间的相关性，从通过检测信息数据库检索的一组图像中选出统计特征图像指定特征量，设计信息和制造条件的值中的至少一个，并且被显示。

14. 发明授权

US06614923B1 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof 失效
标题翻译：图案检查方法和装置，以及基于电子束图像的图案检查方法及其装置
公开(公告)号：US06614923B1
公开(公告)日：2003-09-02
申请号：US09225512
申请日：1999-01-06
申请人： Chie Shishido , Yuji Takagi , Shuji Maeda , Takanori Ninomiya , Takashi Hiroi , Masahiro Watanabe , Hideaki Doi
发明人： Chie Shishido , Yuji Takagi , Shuji Maeda , Takanori Ninomiya , Takashi Hiroi , Masahiro Watanabe , Hideaki Doi
IPC分类号： G06K932
CPC分类号： G06T7/001 , G06T5/006 , G06T2207/10061 , G06T2207/30148 , H01J37/226 , H01J37/28 , H01J2237/2448 , H01J2237/24592 , H01J2237/2482 , H01J2237/2806 , H01J2237/2817
摘要： For purpose of providing a defect inspecting method and an apparatus thereof and a defect inspecting method on basis of electron beam image and an apparatus thereof, reducing possibility of bringing erroneous or false reports due to the test objection side and the inspecting apparatus side, being caused by discrepancies, such as the minute difference in pattern shapes, the difference in gradation values, the distortion or deformation of the patterns, the position shift, thereby enabling the detection of the defects or the defective candidates in more details, wherein an image which is small in distortion by controlling the electron beam scanning is detected and divided into a size so as to be able to neglect therefrom, and then position shift detection and defect decision are carried out in an accuracy less or finer than pixel for each division unit. In the defect decision, a desired tolerance can be set up depending upon changes in gradation values and the position shift.
摘要翻译：为了提供基于电子束图像的缺陷检查方法及其装置和缺陷检查方法及其装置，减少由于检测对象侧和检查装置侧引起错误或错误的报告的可能性通过差异，例如图案形状的微小差异，灰度值的差异，图案的变形或变形，位置偏移，从而能够更详细地检测缺陷或缺陷候选物，其中，图像是检测出通过控制电子束扫描而具有较小的失真，并将其分割成能够忽略的尺寸，然后针对每个分割单元以比像素少的精度执行位移检测和缺陷判定。在缺陷判定中，可以根据灰度值和位置偏移的变化来建立期望的公差。

15. 发明授权

US06546308B2 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices 失效
公开(公告)号：US06546308B2
公开(公告)日：2003-04-08
申请号：US09812822
申请日：2001-03-21
申请人： Yuji Takagi , Hideaki Doi , Makoto Ono
发明人： Yuji Takagi , Hideaki Doi , Makoto Ono
IPC分类号： G06F1900
CPC分类号： G01N21/94
摘要： The present invention relates to a method and system of inspecting a product, including extracting defects from the product, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects for inspection. The method and system is characterized in that the extracted feature data of the defects is fed back for inspecting the product. The present invention also relates to a method of manufacturing a semiconductor electric or electronic device, including extracting defects from the semiconductor electric or electronic device, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data on the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects to an apparatus for manufacturing the semiconductor electric or electronic device.

16. 发明授权

US06376854B2 Method of inspecting a pattern on a substrate 有权
标题翻译：检查基板上的图案的方法
公开(公告)号：US06376854B2
公开(公告)日：2002-04-23
申请号：US09848422
申请日：2001-05-04
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N2188
CPC分类号： G01N21/95607
摘要： A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.
摘要翻译：一种用于检查形成在基板上的图案的方法，包括以下步骤：沿着安装有待检查的基板的第一方向移动工作台，通过沿第二方向扫描会聚的电子束将会聚的电子束照射在基板上其垂直于第一方向; 通过会聚电子束的照射来检测从基板辐射的电子，其中台的移动和会聚电子束的扫描同步; 从检测到的电子形成衬底的数字图像; 通过过滤数字图像来提高数字图像的质量; 以及通过使用改进的质量数字图像来检测在基板上形成的图案的缺陷。

17. 发明授权

US06278418B1 Three-dimensional imaging system, game device, method for same and recording medium 失效
标题翻译：三维成像系统，游戏装置，方法与记录介质
公开(公告)号：US06278418B1
公开(公告)日：2001-08-21
申请号：US08775480
申请日：1996-12-30
申请人： Hideaki Doi
发明人： Hideaki Doi
IPC分类号： G09G500
CPC分类号： G09G3/003 , A63F2300/1012 , A63F2300/64 , A63F2300/8076 , A63F2300/8082 , G09G3/002
摘要： A three-dimensional imaging system provides an image display system, a method and a recording medium, whereby a three-dimensional display of virtual images causes an observer to perceive virtual images three-dimensionally at a part of the body, such as the hand, of the observer. The system includes, for example, a position detecting unit detecting unit detecting the position in real space of a prescribed part of the body of an observer viewing the virtual images, and outputs the spatial coordinates thereof. A display position determining unit determining unit determines the positions at which the observer is caused to perceive the virtual images, on the basis of ages, on the basis of the spatial coordinates output by the position detecting unit.
摘要翻译：三维成像系统提供图像显示系统，方法和记录介质，由此虚拟图像的三维显示使得观察者在诸如手的身体的一部分三维地感知虚拟图像，的观察者。该系统包括例如位置检测单元检测单元，其检测观察虚拟图像的观察者的身体的规定部分的实际空间中的位置，并输出其空间坐标。显示位置确定单元确定单元基于年龄，基于由位置检测单元输出的空间坐标来确定使观察者感知虚拟图像的位置。

18. 发明授权

US5308875A Therapeutic coolant for the local treatment of burn 失效
标题翻译：治疗冷却液用于局部治疗烧伤
公开(公告)号：US5308875A
公开(公告)日：1994-05-03
申请号：US52812
申请日：1993-04-28
申请人： Yutaka Ogawa , Hideaki Doi
发明人： Yutaka Ogawa , Hideaki Doi
IPC分类号： A61K31/01 , A61P17/00
CPC分类号： A61K31/01 , Y10S424/13
摘要： A therapeutic coolant for the local treatment of burn is provided wherein said coolant consisting of squalene, squalane, or mixtures thereof.A method of treating burn is provided wherein said method comprising :applying a therapeutic coolant cooled to a temperature range from -10 to -60.degree. C., said coolant selected from the group consisting essentially of squalene, squalane, or mixtures thereof.
摘要翻译：提供了用于局部治疗烧伤的治疗性冷却剂，其中所述冷却剂由角鲨烯，角鲨烷或其混合物组成。提供了一种治疗烧伤的方法，其中所述方法包括：施用冷却至-10至-60℃温度范围的治疗冷却剂，所述冷却剂选自基本上由角鲨烯，角鲨烷或其混合物组成的组。

19. 发明授权

US06831998B1 Inspection system for circuit patterns and a method thereof 失效
标题翻译：电路图案检查系统及其方法
公开(公告)号：US06831998B1
公开(公告)日：2004-12-14
申请号：US09598652
申请日：2000-06-22
申请人： Hiroya Koshishiba , Hideaki Doi , Mitsunobu Isobe , Kazushi Yoshimura , Haruomi Kobayashi , Chie Shishido
发明人： Hiroya Koshishiba , Hideaki Doi , Mitsunobu Isobe , Kazushi Yoshimura , Haruomi Kobayashi , Chie Shishido
IPC分类号： G06K900
CPC分类号： G06T7/0004 , G06K9/00973 , G06T2207/30141
摘要： In order to provide a high-speed, inexpensive inspection system that has a short development period, that is flexible, and that allow algorithms to be easily changed, a PC equipped with an image input feature is used to capture an image detected by a line image sensor, this detected image is transferred to a plurality of PCs connected by a LAN, and defects are detected using software processing on the plurality of PCs.
摘要翻译：为了提供具有较短开发周期，灵活性并且允许算法容易改变的高速，廉价的检查系统，配备有图像输入特征的PC用于捕获由线检测到的图像图像传感器将该检测图像传送到由LAN连接的多个PC，并且使用多个PC上的软件处理来检测缺陷。

20. 发明授权

US06650409B1 Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system 失效
标题翻译：半导体器件制造方法，用于实施相同的系统和包括在同一系统中的半导体工件处理设备
公开(公告)号：US06650409B1
公开(公告)日：2003-11-18
申请号：US08617270
申请日：1996-03-14
申请人： Minori Noguchi , Yukio Kembo , Hiroshi Morioka , Hidetoshi Nishiyama , Hideaki Doi , Masataka Shiba , Yoshiharu Shigyo , Kazuhiko Matsuoka , Kenji Watanabe , Yoshimasa Ohshima , Fumiaki Endo , Yuzo Taniguchi
发明人： Minori Noguchi , Yukio Kembo , Hiroshi Morioka , Hidetoshi Nishiyama , Hideaki Doi , Masataka Shiba , Yoshiharu Shigyo , Kazuhiko Matsuoka , Kenji Watanabe , Yoshimasa Ohshima , Fumiaki Endo , Yuzo Taniguchi
IPC分类号： G01N2189
CPC分类号： H01L21/67288 , G01N21/9501 , H01J2237/0225 , H01L21/67253 , H01L21/681
摘要： A semiconductor device producing method and a semiconductor device producing system employs a processing apparatus provided with a dust particle detecting apparatus. The dust particle detecting apparatus measures the condition of adhesion of dust particles adhering to a work at least before or after processing the work, manages the condition of incremental adhesion of dust particles to the work resulting from processing for each lot of works or for each work on the basis of the measured condition of adhesion of dust particles measured before or after processing the work, and determines the time when the processing apparatus is to be cleaned or the cycle of cleaning the processing apparatus on the basis of the managed condition of adhesion of dust particles.
摘要翻译：半导体器件制造方法和半导体器件制造系统采用具有灰尘粒子检测装置的处理装置。尘埃粒子检测装置至少在工件加工之前或之后测量附着在工件上的灰尘颗粒的附着状态，管理灰尘颗粒对于每批工件或每个工件的加工产生的增加粘附的条件基于在处理工件之前或之后测量的粉尘颗粒的粘附测量条件，并根据管理的粘附条件确定处理设备要清洁的时间或清洁处理设备的循环灰尘颗粒。

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