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11. 发明授权

US08445876B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08445876B2
公开(公告)日：2013-05-21
申请号：US12603872
申请日：2009-10-22
申请人： Takashi Suganuma , Masato Moriya , Tamotsu Abe , Kouji Kakizaki , Osamu Wakabayashi
发明人： Takashi Suganuma , Masato Moriya , Tamotsu Abe , Kouji Kakizaki , Osamu Wakabayashi
IPC分类号： H01J35/00 , G03B27/54
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译：可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

12. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

13. 发明授权

US08288743B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08288743B2
公开(公告)日：2012-10-16
申请号：US12406388
申请日：2009-03-18
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： B01D59/44
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

14. 发明授权

US08173984B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08173984B2
公开(公告)日：2012-05-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

15. 发明授权

US08536551B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08536551B2
公开(公告)日：2013-09-17
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

16. 发明申请

US20110309260A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：室外设备和极光紫外线发光系统
公开(公告)号：US20110309260A1
公开(公告)日：2011-12-22
申请号：US13122354
申请日：2011-03-11
申请人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
发明人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： G21K5/00 , G01J1/42
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译：与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

17. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

18. 发明申请

US20090232171A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20090232171A1
公开(公告)日：2009-09-17
申请号：US12382109
申请日：2009-03-09
申请人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译：在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

19. 发明授权

US08698112B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08698112B2
公开(公告)日：2014-04-15
申请号：US13396289
申请日：2012-02-14
申请人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： H01J35/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译：一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为位于等离子体产生区域和至少电绝缘体之间。目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

20. 发明授权

US08492738B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08492738B2
公开(公告)日：2013-07-23
申请号：US13465108
申请日：2012-05-07
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： H01J1/50
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

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