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    • 11. 发明申请
    • Plasma processing apparatus
    • 等离子体处理装置
    • US20050045104A1
    • 2005-03-03
    • US10795350
    • 2004-03-09
    • Masatsugu AraiRyujiro UdoSeiichiro KannoTsuyoshi Yoshida
    • Masatsugu AraiRyujiro UdoSeiichiro KannoTsuyoshi Yoshida
    • F25B1/00H01L21/00H01L21/3065C23C16/00
    • H01L21/67248H01J37/32082H01J2237/2001H01L21/67109
    • A plasma processing apparatus having an electrostatic chucking electrode that allows temperature control of a semiconductor wafer during etching process with high efficiency comprises: a holder stage comprising an electrode block S having a dielectric film 4 on the surface thereof and a coolant flow passage 6 therein, in which temperature control is performed while holding a semiconductor wafer W on the dielectric film on the surface of the electrode block; and a cooling cycle 50 including a compressor 52, a condenser 55, an expansion valve 53, a heat exchanger 54 having a heater built therein, and an evaporator, wherein the temperature control of the electrode block S is performed by using a direct-expansion-type temperature controller in which the electrode block S is used as the evaporator of the cooling cycle, and the coolant is directly circulated and expanded inside the electrode block.
    • 一种具有静电夹持电极的等离子体处理装置,其能够高效率地进行蚀刻处理时的半导体晶片的温度控制,包括:保持台,其具有在其表面具有电介质膜4的电极块S和冷却剂流路6, 在将半导体晶片W保持在电极块的表面上的电介质膜上的同时进行温度控制; 以及包括压缩机52,冷凝器55,膨胀阀53,内置加热器的热交换器54和蒸发器的冷却循环50,其中,电极块S的温度控制通过使用直接膨胀 型温度控制器,其中电极块S用作冷却循环的蒸发器,并且冷却剂在电极块内直接循环和膨胀。
    • 12. 发明申请
    • Plasma processing apparatus
    • 等离子体处理装置
    • US20080017107A1
    • 2008-01-24
    • US11798646
    • 2007-05-15
    • Masatsugu AraiRyujiro UdoSeiichiro KannoTsuyoshi Yoshida
    • Masatsugu AraiRyujiro UdoSeiichiro KannoTsuyoshi Yoshida
    • C23C16/00
    • H01L21/67248H01J37/32082H01J2237/2001H01L21/67109
    • A plasma processing apparatus having an electrostatic chucking electrode that allows temperature control of a semiconductor wafer during etching process with high efficiency comprises: a holder stage comprising an electrode block S having a dielectric film 4 on the surface thereof and a coolant flow passage 6 therein, in which temperature control is performed while holding a semiconductor wafer W on the dielectric film on the surface of the electrode block; and a cooling cycle 50 including a compressor 52, a condenser 55, an expansion valve 53, a heat exchanger 54 having a heater built therein, and an evaporator, wherein the temperature control of the electrode block S is performed by using a direct-expansion-type temperature controller in which the electrode block S is used as the evaporator of the cooling cycle, and the coolant is directly circulated and expanded inside the electrode block.
    • 一种具有静电夹持电极的等离子体处理装置,其能够高效率地进行蚀刻处理时的半导体晶片的温度控制,包括:保持台,其具有在其表面具有电介质膜4的电极块S和冷却剂流路6, 在将半导体晶片W保持在电极块的表面上的电介质膜上的同时进行温度控制; 以及包括压缩机52,冷凝器55,膨胀阀53,内置加热器的热交换器54和蒸发器的冷却循环50,其中,电极块S的温度控制通过使用直接膨胀 型温度控制器,其中电极块S用作冷却循环的蒸发器,并且冷却剂在电极块内直接循环和膨胀。
    • 19. 发明申请
    • LITHIUM ION SECONDARY BATTERY
    • 锂离子二次电池
    • US20090136835A1
    • 2009-05-28
    • US12269081
    • 2008-11-12
    • Kenji NakaiAkinori TadaMasatsugu AraiKinya Aota
    • Kenji NakaiAkinori TadaMasatsugu AraiKinya Aota
    • H01M2/18B23K26/20
    • H01M10/0525H01M2/263H01M10/0431H01M10/0587Y02T10/7011Y10T29/49108
    • A lithium ion secondary battery comprises a case; a positive electrode foil having a current collector foil on which a positive electrode material is coated; an negative electrode film having a current collector film on which an negative electrode material is coated; a separator sandwiched between the positive electrode film and the negative electrode film, the films and the separator being arranged in multiple layers to form a group of electrodes enclosed in the case, a positive collector disc plate connected to the positive electrode side of the group of the electrodes, and an negative collector disc plate connected to the negative electrode side of the group of the electrodes. Each of the current collector foils has a non-coated portion extended along one side of the foils, a part or the entire of the non-coated portion being exposed from a side of the separator. At least one of the collector disc plate is welded to the side of the exposed non-coated portion of the group of the electrodes. The periphery of the collector disc plate has an annular portion, which is bent towards the group of electrodes.
    • 锂离子二次电池包括壳体; 具有集电箔的正极箔,其上涂覆有正极材料; 具有集电体膜的负极膜,其上涂覆有负极材料; 夹在正极膜和负极膜之间的隔膜,膜和隔膜被布置成多层以形成封闭在壳体中的一组电极,正极集电板盘连接到正极集电体的正极侧 所述电极和与所述电极组的负极侧连接的负极集电板。 每个集电箔具有沿箔的一侧延伸的未涂覆部分,未涂覆部分的一部分或全部从分离器的侧面露出。 集电盘片中的至少一个焊接到该组电极的暴露未涂覆部分的一侧。 集电盘片的周边具有朝向该组电极弯曲的环形部分。