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11. 发明授权

US5032531A Method of manufacturing active matrix panel 失效
标题翻译：有源矩阵面板的制造方法
公开(公告)号：US5032531A
公开(公告)日：1991-07-16
申请号：US376866
申请日：1989-07-07
申请人： Ken Tsutsui , Toshihisa Tsukada , Hideaki Yamamoto , Yasuo Tanaka , Haruo Matsumaru
发明人： Ken Tsutsui , Toshihisa Tsukada , Hideaki Yamamoto , Yasuo Tanaka , Haruo Matsumaru
IPC分类号： G02F1/136 , G02F1/1343 , G02F1/1362 , G02F1/1368 , G09F9/30 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/78 , H01L29/786
CPC分类号： G02F1/1368 , H01L27/1214 , H01L29/66765 , G02F1/136213
摘要： In a first manufacturing step of an active matrix liquid-crystal panel, a transparent conductor film and a metal film are sequentially accumulated on a substrate in this order so as to form a two-layer film. The two-layer film including the transparent conductor film and the metal film is subjected to photoetching to simultaneously form at least a pixel electrode (transparent conductor film) and a gate electrode (metal film) of a thin-film transistor according to a predetermined pattern. In a fabrication process near the end of the fabrication, when the source and drain electrodes of the thin-film transistors are formed, the metal film on the pixel electrode is simultaneously removed. Since the removal of the metal film protecting the pixel electrode is simultaneously achieved at a point near the final process, protection of the pixel electrode is guaranteed, thereby realizing improvement of the yielding and reduction of the production process.
摘要翻译：在有源矩阵液晶面板的第一制造工序中，依次将透明导体膜和金属膜累积在基板上，形成双层膜。对包含透明导体膜和金属膜的两层膜进行光刻，以至少形成根据预定图案的薄膜晶体管的像素电极（透明导体膜）和栅电极（金属膜）。在接近制造结束的制造工艺中，当形成薄膜晶体管的源极和漏极时，同时去除像素电极上的金属膜。由于保护像素电极的金属膜的去除同时在最终工艺附近实现，因此保护像素电极的保护，从而实现生产过程的屈服和减少的改善。

12. 发明授权

US4429325A Photosensor 失效
标题翻译：光电传感器
公开(公告)号：US4429325A
公开(公告)日：1984-01-31
申请号：US206780
申请日：1980-11-14
申请人： Yukio Takasaki , Tadaaki Hirai , Hideaki Yamamoto , Toshihisa Tsukada , Yoshiaki Mori
发明人： Yukio Takasaki , Tadaaki Hirai , Hideaki Yamamoto , Toshihisa Tsukada , Yoshiaki Mori
IPC分类号： H01L27/146 , H01L31/0264 , H04N5/335 , H04N5/359 , H04N5/361 , H04N5/369 , H04N5/374 , H01L27/14
CPC分类号： H01L27/14603 , H01L27/14609 , H01L27/14623 , H01L27/14665
摘要： In a photosensor having a metal electrode, at least one photoelectric conversion layer which overlies the metal electrode, and a transparent or partly transparent conductive layer which overlies the photoelectric conversion layer, a recombination layer for recombining electrons and holes is disposed between the metal electrode and the photoelectric conversion layer. By disposing the recombination layer, the metal electrode having an insulating oxide film on its surface can be handled as if the insulating oxide film were not existent. The dark current is suppressed, and the photo-response is made good. As the materials of the recombination layer, Sb.sub.2 S.sub.3, As.sub.2 Se.sub.3, As.sub.2 S.sub.3, Sb.sub.2 Se.sub.3 etc. are typical.
摘要翻译：在具有金属电极的光电传感器中，覆盖在金属电极上的至少一个光电转换层和覆盖在光电转换层上的透明或部分透明导电层，在金属电极与金属电极之间配置复合层，光电转换层。通过配置复合层，其表面上具有绝缘氧化膜的金属电极可以像不存在绝缘氧化膜那样被处理。暗电流被抑制，光响应良好。作为复合层的材料，通常是Sb2S3，As2Se3，As2S3，Sb2Se3等。

13. 发明授权

US5889573A Thin film transistor substrate, manufacturing method thereof, liquid crystal display panel and liquid crystal display equipment 失效
标题翻译：薄膜晶体管基板，其制造方法，液晶显示面板和液晶显示设备
公开(公告)号：US5889573A
公开(公告)日：1999-03-30
申请号：US928719
申请日：1997-09-12
申请人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
发明人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
IPC分类号： G02F1/1343 , G02F1/1345 , G02F1/136 , G02F1/1362 , G02F1/1368 , G09F9/30 , G09G3/36 , H01L21/3205 , H01L21/336 , H01L27/12 , H01L29/49 , H01L29/78 , H01L29/786 , H01L29/04
CPC分类号： G02F1/136286 , G02F1/1345 , G02F1/136213 , H01L29/4908 , H01L2924/0002
摘要： The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel and, more in particular, it relates to a structure and a manufacturing method which enables to improve the characteristics thereof.In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines. In a more preferred structure, the anodic oxidized film is used for all of the gate insulators, the dielectric films for the thin film capacitances and the interlayer insulation films for the intersections between the bus-lines.The present invention also relates to a method of selectively forming an anodic oxidized film on an aluminum pattern. That is, in a case of forming a selective oxidation mask to a desired region on the aluminum pattern with a positive type photoresist, in the present invention, an angle (.theta.) formed between the selective oxidation mask and the aluminum pattern is made as: .theta..gtoreq.110-20T (T: film thickness of the positive type photoresist).
摘要翻译：本发明涉及使用薄膜晶体管的有源矩阵寻址TFT基板，其制造方法和阳极氧化方法，使用TFT基板的液晶显示面板和使用该液晶显示面板的液晶显示设备，更具体地，涉及能够改善其特性的结构和制造方法。在本发明中，Cr或Ta用于栅极端子，铝或主要由铝组成的金属用于从其延伸的栅极总线，栅电极和薄膜电容（附加电容，存储电容）和阳极氧化膜由金属构成并且没有缺陷用于栅极绝缘体，薄膜电容的介电膜和用于总线之间的交叉点的层间绝缘膜中的至少一个。在更优选的结构中，阳极氧化膜用于所有栅极绝缘体，用于薄膜电容的介电膜和用于总线之间的交叉点的层间绝缘膜。本发明还涉及在铝图案上选择性地形成阳极氧化膜的方法。也就是说，在使用正型光致抗蚀剂在铝图案上的期望区域上形成选择性氧化掩模的情况下，在本发明中，在选择性氧化掩模和铝图案之间形成的角度（θ）为： θ= 110-20T（T：正型光致抗蚀剂的膜厚度）。

14. 发明授权

US5359206A Thin film transistor substrate, liquid crystal display panel and liquid crystal display equipment 失效
标题翻译：薄膜晶体管基板，液晶显示面板和液晶显示设备
公开(公告)号：US5359206A
公开(公告)日：1994-10-25
申请号：US674328
申请日：1991-04-15
申请人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
发明人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
IPC分类号： G02F1/1343 , G02F1/1345 , G02F1/136 , G02F1/1362 , G02F1/1368 , G09F9/30 , G09G3/36 , H01L21/3205 , H01L21/336 , H01L27/12 , H01L29/49 , H01L29/78 , H01L29/786 , H01L29/04 , H01L23/48 , H01L27/01 , H01L31/036
CPC分类号： G02F1/136286 , G02F1/1345 , G02F1/136213 , H01L29/4908 , H01L2924/0002
摘要： Disclosed is an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel. In the TFT substrate, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extending therefrom, for gate electrodes, and for electrodes of thin film capacitors (additional capacitance, storage capacitance), and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulating films for the intersections between the bus-lines. Also disclosed is a method of selectively forming an anodic oxidized film on an aluminum pattern. That is, in a case of forming a selective oxidation mask to a desired region on the aluminum pattern with a positive type photoresist, in the present invention, an angle (.theta.) formed between the selective oxidation mask and the aluminum pattern is made as: .theta..gtoreq.110-20T (T: film thickness of the positive type photoresist).
摘要翻译： PCT No.PCT / JP90 / 01039 Sec。 371日期：1991年4月15日 102（e）日期1991年4月15日PCT提交1990年8月13日PCT公布。 WO91 / 02999 PCT出版物 1991年3月7日公开。公开是使用薄膜晶体管的有源矩阵寻址TFT基板，其制造方法和阳极氧化方法，使用TFT基板的液晶显示面板和使用液体的液晶显示设备水晶显示面板。在TFT基板中，使用Cr或Ta作为栅极端子，铝或主要由铝构成的金属用于从栅极电极延伸的栅极总线，以及用于薄膜电容器的电极（附加电容，存储电容）并且由金属构成并且没有缺陷的阳极氧化膜用于栅极绝缘体，薄膜电容的介电膜和用于总线之间的交叉点的层间绝缘膜中的至少一种。还公开了在铝图案上选择性地形成阳极氧化膜的方法。也就是说，在使用正型光致抗蚀剂在铝图案上的期望区域上形成选择性氧化掩模的情况下，在本发明中，在选择性氧化掩模和铝图案之间形成的角度（θ）为： θ= 110-20T（T：正型光致抗蚀剂的膜厚度）。

15. 发明授权

US4430185A Method of producing photoelectric transducers 失效
标题翻译：光电传感器的制造方法
公开(公告)号：US4430185A
公开(公告)日：1984-02-07
申请号：US245749
申请日：1981-03-20
申请人： Yasuharu Shimomoto , Toshihisa Tsukada , Akira Sasano , Yasuo Tanaka , Hideaki Yamamoto , Yukio Takasaki
发明人： Yasuharu Shimomoto , Toshihisa Tsukada , Akira Sasano , Yasuo Tanaka , Hideaki Yamamoto , Yukio Takasaki
IPC分类号： C23C14/00 , C23C16/509 , H01L27/146 , H01L31/20 , H04N5/335 , H04N5/357 , H04N5/369 , H04N5/372 , H04N5/374 , C23C15/00
CPC分类号： C23C14/0036 , C23C16/5096 , H01L27/14665 , H01L31/202 , Y02E10/50 , Y02P70/521
摘要： In the method of producing photoelectric transducers having processes for forming a photoconductive layer on a predetermined substrate with an irregular surface by a method of depositing the photoconductive layer in the atmosphere including at least plasma, the predetermined substrate with irregular surface is disposed above a first electrode to which an electrode is opposed, and said photoconductive layer is formed while a negative potential is being applied to the first electrode. This enables the photoconductive layer to be formed without breaks at steps, pinholes and so on due to the irregular surface, and therefore, it is possible to provide good photoelectric transducers with small dark current.
摘要翻译：在具有通过在包括至少等离子体的气氛中沉积光电导层的方法的具有不规则表面的预定基板上形成光电导层的工艺的方法中，具有不规则表面的预定基板设置在第一电极电极相对，并且所述光导电层形成，同时向第一电极施加负电位。这使得光电导层由于不规则的表面而在步骤，针孔等形成而不会发生断裂，因此，可以提供具有小暗电流的良好光电传感器。

16. 发明授权

US4227078A Photo-sensor 失效
标题翻译：光传感器
公开(公告)号：US4227078A
公开(公告)日：1980-10-07
申请号：US918273
申请日：1978-06-22
申请人： Hideaki Yamamoto , Haruo Matsumaru , Makoto Matsui , Toshihisa Tsukada , Tadaaki Hirai , Eiichi Maruyama
发明人： Hideaki Yamamoto , Haruo Matsumaru , Makoto Matsui , Toshihisa Tsukada , Tadaaki Hirai , Eiichi Maruyama
IPC分类号： H04N1/028 , G02B6/42 , G06K9/20 , H01L27/144 , H01L27/146 , H01L31/02 , H01L31/0232 , H04N1/031 , G02B5/14
CPC分类号： H04N1/0312 , G02B6/421 , G02B6/4249 , G06K9/2009 , H01L27/1446 , H04N1/0311 , H04N1/0315
摘要： A photo-sensor wherein a bundle of optical fibers in the form of a sheet is disposed within a predetermined substrate, the optical fiber bundle extending from a first surface to a second surface of the substrate, an array of photosensitive elements is disposed integrally with the substrate in such a manner that at least one transparent insulating layer intervenes between the photoelectric elements and the optical fiber bundle on, at least, an end face of the optical fiber bundle on the first surface side of the substrate, and an end face of the optical fiber bundle open to the second surface of the substrate serves as an information reading face.
摘要翻译：一种光传感器，其中将片状形式的一束光纤设置在预定的基板内，光纤束从基板的第一表面延伸到第二表面，光敏元件阵列与基板，使得至少一个透明绝缘层介于光电元件和光纤束之间，至少在基板的第一表面侧上的光纤束的端面和向基板的第二表面开放的光纤束用作信息读取面。

17. 发明授权

US5585290A Method of manufacturing a thin film transistor substrate 失效
标题翻译：制造薄膜晶体管基板的方法
公开(公告)号：US5585290A
公开(公告)日：1996-12-17
申请号：US158219
申请日：1993-11-29
申请人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
发明人： Hideaki Yamamoto , Haruo Matsumaru , Yasuo Tanaka , Ken Tsutsui , Toshihisa Tsukada , Kazuo Shirahashi , Akira Sasano , Yuka Matsukawa
IPC分类号： G02F1/1343 , G02F1/1345 , G02F1/136 , G02F1/1362 , G02F1/1368 , G09F9/30 , G09G3/36 , H01L21/3205 , H01L21/336 , H01L27/12 , H01L29/49 , H01L29/78 , H01L29/786 , H01L21/84
CPC分类号： G02F1/136286 , G02F1/1345 , G02F1/136213 , H01L29/4908 , H01L2924/0002
摘要： The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel and, more in particular, it relates to a structure and a manufacturing method which enables to improve the characteristics thereof. In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines. In a more preferred structure, the anodic oxidized film is used for all of the gate insulators, the dielectric films for the thin film capacitances and the interlayer insulation films for the intersections between the bus-lines.
摘要翻译：本发明涉及使用薄膜晶体管的有源矩阵寻址TFT基板，其制造方法和阳极氧化方法，使用TFT基板的液晶显示面板和使用该液晶显示面板的液晶显示设备，更具体地，涉及能够改善其特性的结构和制造方法。在本发明中，Cr或Ta用于栅极端子，铝或主要由铝组成的金属用于从其延伸的栅极总线，栅电极和薄膜电容（附加电容，存储电容）和阳极氧化膜由金属构成并且没有缺陷用于栅极绝缘体，薄膜电容的介电膜和用于总线之间的交叉点的层间绝缘膜中的至少一个。在更优选的结构中，阳极氧化膜用于所有栅极绝缘体，用于薄膜电容的介电膜和用于总线之间的交叉点的层间绝缘膜。

18. 发明授权

US5340760A Method of manufacturing EEPROM memory device 失效
标题翻译：制造EEPROM存储器件的方法
公开(公告)号：US5340760A
公开(公告)日：1994-08-23
申请号：US992473
申请日：1992-12-15
申请人： Kazuhiro Komori , Satoshi Meguro , Takaaki Hagiwara , Hitoshi Kume , Toshihisa Tsukada , Hideaki Yamamoto
发明人： Kazuhiro Komori , Satoshi Meguro , Takaaki Hagiwara , Hitoshi Kume , Toshihisa Tsukada , Hideaki Yamamoto
IPC分类号： A01H5/02 , H01L27/06 , H01L27/105 , H01L29/788 , H01L21/335
CPC分类号： A01H5/02 , H01L27/105 , H01L29/7885 , H01L29/7886 , H01L27/0688
摘要： This invention discloses EEPROM which increases an erasing voltage V.sub.pp to be applied in a data write cycle by increasing an avalanche breakdown voltage between a source region and a semiconductor substrate in order to improve erasing efficiency, and employs a structure which strengthens the electric field at the edge of a drain region in order to let hot carrier be easily generated and to improve writing efficiency.
摘要翻译：本发明公开了一种EEPROM，其通过增加源极区域和半导体衬底之间的雪崩击穿电压来增加在数据写入周期中施加的擦除电压Vpp，以提高擦除效率，并采用这样的结构，边缘，以便容易地产生热载体并提高写入效率。

19. 发明授权

US5151385A Method of manufacturing a metallic silicide transparent electrode 失效
标题翻译：制造金属硅氧烷透明电极的方法
公开(公告)号：US5151385A
公开(公告)日：1992-09-29
申请号：US252144
申请日：1988-10-03
申请人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
发明人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
IPC分类号： H01L31/10 , H01L27/14 , H01L31/0216 , H01L31/0224 , H01L31/04 , H01L31/18 , H01L31/20
CPC分类号： H01L31/022466 , H01L24/24 , H01L31/02164 , H01L31/1884 , H01L31/202 , H01L2924/12032 , H01L2924/12043 , Y02E10/50 , Y02P70/521 , Y10S148/147
摘要： A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and light shielding film.

20. 发明授权

US5079603A Semiconductor memory device 失效
标题翻译：半导体存储器件
公开(公告)号：US5079603A
公开(公告)日：1992-01-07
申请号：US517386
申请日：1990-04-30
申请人： Kazuhiro Komori , Satoshi Meguro , Takaaki Hagiwara , Hitoshi Kume , Toshihisa Tsukada , Hideaki Yamamoto
发明人： Kazuhiro Komori , Satoshi Meguro , Takaaki Hagiwara , Hitoshi Kume , Toshihisa Tsukada , Hideaki Yamamoto
IPC分类号： H01L27/112 , H01L21/8246 , H01L21/8247 , H01L27/06 , H01L27/10 , H01L27/105 , H01L27/115 , H01L29/78 , H01L29/788 , H01L29/792
CPC分类号： H01L29/7886 , H01L27/105 , H01L27/0688
摘要： This invention discloses an EEPROM which increases an erasing voltage V.sub.pp to be applied during a data write cycle by increasing an avalanche breakdown voltage between a source region and a semiconductor substrate in the memory cell transistor in order to improve the erasing efficiency, and employs a structure which strengthens the electric field at the edge of a drain region in order to let hot carriers be easily generated and to thereby improve writing efficiency.
摘要翻译：本发明公开了一种EEPROM，其通过增加存储单元晶体管中的源极区域和半导体衬底之间的雪崩击穿电压来增加在数据写入周期期间施加的擦除电压Vpp，以提高擦除效率，并采用结构这加强了漏极区域的边缘处的电场，以便容易地产生热载流子，从而提高写入效率。

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