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11. 发明授权

US5380723A Indole derivatives 失效
标题翻译：吲哚衍生物
公开(公告)号：US5380723A
公开(公告)日：1995-01-10
申请号：US228505
申请日：1994-04-15
申请人： Toshihiro Takahashi , Hitoshi Inoue , Masato Horigome , Kenichi Momose , Masanori Sugita , Kouichi Katsuyama , Chikako Suzuki , Shinji Nagai , Masao Nagase , Koichi Nakamaru
发明人： Toshihiro Takahashi , Hitoshi Inoue , Masato Horigome , Kenichi Momose , Masanori Sugita , Kouichi Katsuyama , Chikako Suzuki , Shinji Nagai , Masao Nagase , Koichi Nakamaru
IPC分类号： A61K31/40 , A61K31/403 , A61K31/404 , A61K31/4045 , A61K31/44 , A61K31/4427 , A61K31/4439 , A61K31/445 , A61K31/454 , A61K31/47 , A61K31/4725 , A61K31/5377 , A61P1/04 , C07D209/14 , C07D209/16 , C07D401/04 , C07D401/14 , C07D413/04 , C07D403/14 , C07D413/14
CPC分类号： C07D401/14 , C07D209/16
摘要： Disclosed are indole derivatives of formula (I) ##STR1## wherein X and Y each independently represent H or --CH.sub.2 CH.sub.2 R; R represents pyridyl or substituted amino of NR.sub.1 R.sub.2 ;R.sub.1 represents H or C.sub.1 -C.sub.6 alkyl;R.sub.2 represents 2-(3-indolyl)ethyl or aralkyl; orR.sub.1 and R.sub.2 together with the nitrogen atom to which they are attached may form an N-containing 5 to 6 membered hetero ring, an N, O-containing hetero ring, which hetero ring may be fused with benzene;n is an integer of 4 to 8;with the proviso that X and Y both do not represent H or piperizinoethyl when n is 4, or pharmaceuticaly acceptable acid addition salts thereof. They are useful as an antiulcer agent.
摘要翻译：公开了式（I）的吲哚衍生物其中X和Y各自独立地表示H或-CH 2 CH 2 R; R代表NR1R2的吡啶基或取代氨基; R1代表H或C1-C6烷基; R2代表2-（3-吲哚基）乙基或芳烷基; 或R 1和R 2与它们所连接的氮原子一起可以形成含N的5至6元杂环，含N，O的杂环，该杂环可以与苯稠合; n为4〜8的整数，条件是当n为4时X和Y都不表示H或哌嗪子基，或其药学上可接受的酸加成盐。它们作为抗溃疡剂是有用的。

12. 发明授权

US5326879A Indole derivatives 失效
标题翻译：吲哚衍生物
公开(公告)号：US5326879A
公开(公告)日：1994-07-05
申请号：US949028
申请日：1992-09-22
申请人： Toshihiro Takahashi , Hitoshi Inoue , Masato Horigome , Kenichi Momose , Masanori Sugita , Kouichi Katsuyama , Chikako Suzuki , Shinji Nagai , Masao Nagase , Koichi Nakamaru
发明人： Toshihiro Takahashi , Hitoshi Inoue , Masato Horigome , Kenichi Momose , Masanori Sugita , Kouichi Katsuyama , Chikako Suzuki , Shinji Nagai , Masao Nagase , Koichi Nakamaru
IPC分类号： A61K31/40 , A61K31/403 , A61K31/404 , A61K31/4045 , A61K31/44 , A61K31/4427 , A61K31/4439 , A61K31/445 , A61K31/454 , A61K31/47 , A61K31/4725 , A61K31/5377 , A61P1/04 , C07D209/14 , C07D209/16 , C07D401/04 , C07D401/14 , C07D413/04 , C07D403/06
CPC分类号： C07D401/14 , C07D209/16
摘要： Disclosed are indole derivatives of formula (I) ##STR1## wherein X and Y each independently represent H or --CH.sub.2 CH.sub.2 R;R represents pyridyl or substituted amino of NR.sub.1 R.sub.2 ;R.sub.1 represents H or C.sub.1 -C.sub.6 alkyl;R.sub.2 represents 2-(3-indolyl)ethyl or aralkyl; orR.sub.1 and R.sub.2 together with the nitrogen atom to which they are attached may form an N-containing 5 to 6 membered hetero ring, an N, O-containing hetero ring, which hetero ring may be fused with benzene;n is an integer of 4 to 8;with the proviso that X and Y both do not represent H or piperizinoethyl when n is 4, or pharmaceuticaly acceptable acid addition salts thereof. They are useful as an antiulcer agent.
摘要翻译：公开了式（I）的吲哚衍生物代表H或-CH 2 CH 2 R; R代表NR1R2的吡啶基或取代氨基; R1代表H或C1-C6烷基; R2代表2-（3-吲哚基）乙基或芳烷基; 或R 1和R 2与它们所连接的氮原子一起可以形成含N的5至6元杂环，含N，O的杂环，该杂环可以与苯稠合; n为4〜8的整数，条件是当n为4时X和Y都不表示H或哌嗪子基，或其药学上可接受的酸加成盐。它们作为抗溃疡剂是有用的。

13. 发明授权

US08530870B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08530870B2
公开(公告)日：2013-09-10
申请号：US13293914
申请日：2011-11-10
申请人： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
发明人： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
IPC分类号： G01N21/33 , G21K5/02 , H05H1/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
摘要翻译：从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

14. 发明授权

US08513630B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08513630B2
公开(公告)日：2013-08-20
申请号：US13274991
申请日：2011-10-17
申请人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
发明人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/008
摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
摘要翻译：在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率相对于离子小于一个原子/离子。

15. 发明申请

US20130154681A1 SUBSTRATE INSPECTION JIG AND SUBSTRATE INSPECTION METHOD 审中-公开
标题翻译：基板检查和基板检查方法
公开(公告)号：US20130154681A1
公开(公告)日：2013-06-20
申请号：US13714869
申请日：2012-12-14
申请人： Keishi Miyanishi , Yuji Miura , Shinji Nagai , Tomohiko Shiki , Tadayoshi Shibasaki , Hideo Watanabe , Katsuhiro Tanabe , Hiroyuki Inakazu , Yasukazu Sadakane , Tomoko Kawakami
发明人： Keishi Miyanishi , Yuji Miura , Shinji Nagai , Tomohiko Shiki , Tadayoshi Shibasaki , Hideo Watanabe , Katsuhiro Tanabe , Hiroyuki Inakazu , Yasukazu Sadakane , Tomoko Kawakami
IPC分类号： G01R1/04
CPC分类号： G01R1/0408
摘要： A substrate inspection jig for use in inspection of an electrical property of a printed board to be inspected on which an electronic component is mounted includes a spacer which is mounted on the printed board to be inspected, a conductive plate which is connected to the spacer, and is disposed along an arrangement direction of electrode terminals of the electronic component to be inspected, and a fastener which fastens the spacer on the printed board to be inspected, wherein the plate is disposed above the printed board to be inspected so as to avoid contact with the printed board to be inspected, and a predetermined potential of the printed board to be inspected is set to the plate through the spacer or/and the fastener.
摘要翻译：用于检查其上安装有电子部件的被检查印刷电路板的电气性能的基板检查夹具包括安装在要检查的印刷电路板上的间隔件，连接到间隔件的导电板，并且沿着要检查的电子部件的电极端子的排列方向布置，以及将待检查的印刷电路板上的间隔件紧固的紧固件，其中，该板被布置在要检查的印刷电路板上方以避免接触印刷板被检查，并且要检查的印刷板的预定电位通过间隔件或/和紧固件设置在板上。

16. 发明申请

US20120176036A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20120176036A1
公开(公告)日：2012-07-12
申请号：US13419177
申请日：2012-03-13
申请人： Takeshi ASAYAMA , Kouji Kakizaki , Akira Endo , Shinji Nagai
发明人： Takeshi ASAYAMA , Kouji Kakizaki , Akira Endo , Shinji Nagai
IPC分类号： H05H1/46
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
摘要翻译：一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动，极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面与离子收集器装置中的离子相撞。

17. 发明授权

US08165181B2 Polarization purity control device and gas laser apparatus provided with the same 有权
标题翻译：极化纯度控制装置和具备该极化纯度的气体激光装置
公开(公告)号：US08165181B2
公开(公告)日：2012-04-24
申请号：US12545474
申请日：2009-08-21
申请人： Shinji Nagai , Fumika Yoshida , Osamu Wakabayashi , Kouji Kakizaki
发明人： Shinji Nagai , Fumika Yoshida , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10 , H01S3/22
CPC分类号： H01S3/10061 , H01S3/005 , H01S3/2251 , H01S3/2316
摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.
摘要翻译：一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

18. 发明申请

US20110226745A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20110226745A1
公开(公告)日：2011-09-22
申请号：US13048454
申请日：2011-03-15
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： B23K26/04
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个光学元件以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

19. 发明授权

US07999241B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US07999241B2
公开(公告)日：2011-08-16
申请号：US12605113
申请日：2009-10-23
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02 , H01J17/26
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译：极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部检索对等离子体的产生无贡献的残留目标。

20. 发明申请

US20100108918A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100108918A1
公开(公告)日：2010-05-06
申请号：US12605725
申请日：2009-10-26
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译：极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

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