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11. 发明授权

US09004984B1 Cleaning material and abrasive material made from bamboo fiber 有权
标题翻译：由竹纤维制成的清洁材料和研磨材料
公开(公告)号：US09004984B1
公开(公告)日：2015-04-14
申请号：US09519618
申请日：2000-03-06
申请人： Tomoko Suzuki , Yoko Miyaoka
发明人： Tomoko Suzuki , Yoko Miyaoka
IPC分类号： B24D15/00 , B24D3/00
CPC分类号： B24D3/002
摘要： The present invention discloses a cleaning cloth, an abrasive cloth, a cleaning buff and an abrasive buff which are each formed by knitting/weaving bamboo fibers having excellent cleaning, abrasive capacity and excellent ignition resistance.
摘要翻译：本发明公开了通过编织/编织竹纤维形成的清洁布，研磨布，清洁抛光机和研磨抛光机，其具有优异的清洁，研磨能力和优异的耐点火性。

12. 发明申请

US20110053044A1 PROTON-CONDUCTING STRUCTURE AND METHOD FOR MANUFACTURING THE SAME 有权
公开(公告)号：US20110053044A1
公开(公告)日：2011-03-03
申请号：US12871266
申请日：2010-08-30
申请人： Yuji Zenitani , Takashi Otsuka , Tomoko Suzuki , Tomoyuki Komori
发明人： Yuji Zenitani , Takashi Otsuka , Tomoko Suzuki , Tomoyuki Komori
IPC分类号： H01M8/10 , H01M8/02
CPC分类号： H01M8/04701 , G01N27/4074 , H01B1/122 , H01M8/04089 , H01M8/1016 , H01M8/12 , H01M2300/0068 , H01M2300/0094 , Y02P70/56
摘要： A proton-conducting structure that exhibits favorable proton conductivity in the temperature range of not lower than 100° C., and a method for manufacturing the same are provided. After a pyrophosphate salt containing Sn, Zr, Ti or Si is mixed with phosphoric acid, the mixture is maintained at a temperature of not less than 80° C. and not more than 150° C., and thereafter maintained at a temperature of not less than 200° C. and not more than 400° C. to manufacture a proton-conducting structure. The proton-conducting structure of the present invention has a core made of tin pyrophosphate, and a coating layer formed on the surface of the core, the coating layer containing Sn and O, and having a coordination number of O with respect to Sn of grater than 6.

13. 发明授权

US07399365B2 Aqueous fluoride compositions for cleaning semiconductor devices 失效
标题翻译：氟化物组合物，用于清洁半导体器件
公开(公告)号：US07399365B2
公开(公告)日：2008-07-15
申请号：US10826319
申请日：2004-04-19
申请人： Tetsuo Aoyama , Toshitaka Hiraga , Tomoko Suzuki
发明人： Tetsuo Aoyama , Toshitaka Hiraga , Tomoko Suzuki
IPC分类号： B08B3/04 , C11D7/50
CPC分类号： H01L21/02063 , C11D7/08 , C11D7/10 , C11D7/263 , C11D7/28 , C11D7/3218 , C11D7/3263 , C11D7/5013 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/31116 , H01L21/31133 , H01L21/76802 , H01L21/76814
摘要： The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.
摘要翻译：本发明涉及稀释氟化物溶液以及用于从包括这种稀溶液的半导体衬底清洗等离子体蚀刻残留物的方法。根据本发明的组合物和方法可以有利地提供清洁效率和材料相容性。

14. 发明授权

US07067446B2 Material demonstrating negative or low thermal expansion coefficient and method for manufacture thereof 有权
标题翻译：显示负热或低热膨胀系数的材料及其制造方法
公开(公告)号：US07067446B2
公开(公告)日：2006-06-27
申请号：US11197304
申请日：2005-08-05
申请人： Tomoko Suzuki , Atsushi Omote , Masa-aki Suzuki
发明人： Tomoko Suzuki , Atsushi Omote , Masa-aki Suzuki
IPC分类号： C04B35/495 , C04B35/486
CPC分类号： C04B35/495 , C01G39/006 , C01G41/006 , C01P2002/72 , C04B35/6261 , C04B35/62625 , C04B2235/3206 , C04B2235/3208 , C04B2235/3213 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3241 , C04B2235/3244 , C04B2235/3256 , C04B2235/3258 , C04B2235/326 , C04B2235/3286 , C04B2235/76 , C04B2235/77 , C04B2235/786 , C04B2235/9607
摘要： A material having a negative or low thermal expansion coefficient and composed substantially of a single crystal system is provided.The material is an oxide represented by the chemical formula ((R4+M2+)1-xA3+2x)(QO4)3 (where R stands for at least one tetravalent metal element selected from Zr and Hf; M stands for at least one divalent metal element selected from Mg, Ca, Sr, Ba, and Ra; Q stands for at least one hexavalent metal element selected from W and Mo; and A stands for at least one trivalent metal element selected from Al, Sc, Y, Lu, Ga, and In; 0
摘要翻译：提供具有负或低热膨胀系数并且基本上由单晶系统组成的材料。该材料是由化学式（（R 4 + 2 + 2 +）1-x 3 A 3+）表示的氧化物，（其中R表示选自Zr和Hf中的至少一种四价金属元素; M表示（Q 3）3 对于选自Mg，Ca，Sr，Ba和Ra中的至少一种二价金属元素; Q表示选自W和Mo中的至少一种六价金属元素; A表示选自Al，Sc中的至少一种三价金属元素，Y，Lu，Ga和In; 0

15. 发明申请

US20060009345A1 Material demonstrating negative or low thermal expansion coefficient and method for manufacture thereof 有权
公开(公告)号：US20060009345A1
公开(公告)日：2006-01-12
申请号：US11197304
申请日：2005-08-05
申请人： Tomoko Suzuki , Atsushi Omote , Masa-aki Suzuki
发明人： Tomoko Suzuki , Atsushi Omote , Masa-aki Suzuki
IPC分类号： C04B35/48
CPC分类号： C04B35/495 , C01G39/006 , C01G41/006 , C01P2002/72 , C04B35/6261 , C04B35/62625 , C04B2235/3206 , C04B2235/3208 , C04B2235/3213 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3241 , C04B2235/3244 , C04B2235/3256 , C04B2235/3258 , C04B2235/326 , C04B2235/3286 , C04B2235/76 , C04B2235/77 , C04B2235/786 , C04B2235/9607
摘要： A material having a negative or low thermal expansion coefficient and composed substantially of a single crystal system is provided. The material is an oxide represented by the chemical formula ((R4+M2+)1-xA3+2x)(QO4)3 (where R stands for at least one tetravalent metal element selected from Zr and Hf; M stands for at least one divalent metal element selected from Mg, Ca, Sr, Ba, and Ra; Q stands for at least one hexavalent metal element selected from W and Mo; and A stands for at least one trivalent metal element selected from Al, Sc, Y, Lu, Ga, and In; 0

16. 发明授权

US06812178B2 Zero thermal expansion material 有权
标题翻译：零热膨胀材料
公开(公告)号：US06812178B2
公开(公告)日：2004-11-02
申请号：US10189773
申请日：2002-07-08
申请人： Tomoko Suzuki , Atsushi Omote , Jun Kuwata
发明人： Tomoko Suzuki , Atsushi Omote , Jun Kuwata
IPC分类号： C04B35495
CPC分类号： C04B35/053 , C01G39/00 , C01G39/006 , C01G41/006 , C01G49/00 , C01P2002/72 , C01P2006/10 , C01P2006/32 , C04B35/488 , C04B35/495 , H01L23/15 , H01L2924/0002 , H05K1/0306 , H01L2924/00
摘要： Using as a negative thermal expansion material a double oxide containing at least partly a compound represented by the chemical formula: RQ2O8 (wherein R is Zr, Hf or a tetravalent metallic element represented by a mixture system of these, and Q is a hexavalent metallic element selected from W and Mo), and using as a positive thermal expansion material a material containing at least partly a compound represented by the chemical formula: MQX4 (wherein M is Mg, Ca, Sr, Ba, Ra or a divalent metallic element represented by a mixture system of any of these, Q is a hexavalent metallic element selected from W and Mo, and X is an element selected from O and S), these are mixed preferably in a weight ratio of 1:1 and are synthesized to obtain a material whose coefficient of thermal expansion is substantially zero over a wide temperature range, i.e., a zero thermal expansion material. Using this zero thermal expansion material, high-precision and high-performance practical component parts can be obtained.
摘要翻译：使用至少部分由化学式RQ2O8表示的化合物（其中R是Zr，Hf或由它们的混合体系表示的四价金属元素）的双氧化物作为负热膨胀材料，Q是六价金属元素选自W和Mo），并且使用至少部分由化学式MQX4表示的化合物（其中M为Mg，Ca，Sr，Ba，Ra或由下式表示的二价金属元素作为正热膨胀材料）任何这些的混合体系，Q是选自W和Mo的六价金属元素，X是选自O和S的元素），优选以1:1的重量比混合，得到热膨胀系数在宽温度范围内基本为零的材料，即零热膨胀材料。使用这种零热膨胀材料，可以获得高精度和高性能的实用部件。

17. 发明授权

US6083101A Device for controlling diffused air 失效
标题翻译：用于控制扩散空气的装置
公开(公告)号：US6083101A
公开(公告)日：2000-07-04
申请号：US028291
申请日：1998-02-24
申请人： Kunihiko Kaga , Tomoko Suzuki , Satoru Kotoh , Katsuhisa Ootsuta , Takayuki Yoshida , Eriko Kumekawa , Sakuo Sugawara , Tatsuo Seki
发明人： Kunihiko Kaga , Tomoko Suzuki , Satoru Kotoh , Katsuhisa Ootsuta , Takayuki Yoshida , Eriko Kumekawa , Sakuo Sugawara , Tatsuo Seki
IPC分类号： F24F1/00 , F24F7/00
CPC分类号： F24F1/0011 , F24F2001/0048 , F24F2221/46
摘要： An air outlet has a plurality of vertical vortex generating structures 21 in a triangular shape arranged so as to be oriented at an angle .theta. with respect to diffused air.
摘要翻译：空气出口具有三角形形状的多个垂直涡流产生结构21，其布置成相对于扩散空气以角度θ取向。

18. 发明授权

US5849444A Electrophotographic photoreceptor with aliphatic amine containing electron transporting layer 失效
标题翻译：含有电子传输层的脂族胺的电子照相感光体
公开(公告)号：US5849444A
公开(公告)日：1998-12-15
申请号：US895211
申请日：1997-07-16
申请人： Akira Kinoshita , Hirofumi Hayata , Toyoko Shibata , Tomoko Suzuki
发明人： Akira Kinoshita , Hirofumi Hayata , Toyoko Shibata , Tomoko Suzuki
IPC分类号： G03G5/047 , G03G5/06 , G03G5/04
CPC分类号： G03G5/062 , G03G5/047 , G03G5/0609 , G03G5/0614 , G03G5/0629 , G03G5/0637
摘要： An electrophotographic photoreceptor is disclosed, comprising a conductive support and having thereon a photoreceptor layer comprising an electron-transporting charge transport layer containing an organic electron-transporting material in a binder, the electron transporting charge transport layer further containing an aliphatic amine compound having an oxidation potential of 0.5 to 0.9 V versus a silver/silver chloride electrode, in an amount of 0.01 to 20 parts by weight based on 100 parts of the electron-transporting material.
摘要翻译：公开了一种电子照相感光体，其包含导电性支持体，并且在其上具有包含在粘合剂中含有有机电子传输材料的电子传输电荷输送层的感光体层，所述电子传输电荷传输层还含有具有氧化性的脂族胺化合物相对于银/氯化银电极为0.5〜0.9V的电位为0.01〜20重量份，相对于100重量份的电子传输材料。

19. 发明授权

US5827698A Lysine decarboxylase gene and method of producing l-lysine 失效
标题翻译：赖氨酸脱羧酶基因及其生产方法
公开(公告)号：US5827698A
公开(公告)日：1998-10-27
申请号：US849212
申请日：1997-06-09
申请人： Yoshimi Kikuchi , Tomoko Suzuki , Hiroyuki Kojima
发明人： Yoshimi Kikuchi , Tomoko Suzuki , Hiroyuki Kojima
IPC分类号： C12N15/00 , C12N9/88 , C12P13/08 , C07H21/00 , C07H21/02 , C07H21/04
CPC分类号： C12P13/08 , C12N9/88
摘要： L-lysine is produced efficiently by cultivating, in a liquid medium, a microorganism belonging to the genus Escherichia with decreased or disappeared lysine decarboxylase activity relevant to decomposition of L-lysine, for example, a bacterium belonging to the genus Escherichia with restrained expression of a novel gene coding for lysine decarboxylase and/or a known gene cadA to allow L-lysine to be produced and accumulated in a culture liquid, and collecting it.
摘要翻译： PCT No.PCT / JP95 / 02481 Sec。 371日期：1997年6月9日 102（e）日期1997年6月9日PCT提交1995年12月5日PCT公布。出版物WO96 / 17930 PCT 日期：1996年6月13日L-赖氨酸通过在液体培养基中培养属于埃希氏杆菌属的微生物，与赖氨酸分解相关的赖氨酸脱羧酶活性降低或消失，例如属于该属的细菌大肠杆菌具有限制性表达编码赖氨酸脱羧酶的新基因和/或已知基因cadA以允许L-赖氨酸在培养液中产生和积累并收集。

20. 发明授权

US5222074A Thermal decomposition cell 失效
标题翻译：热分解细胞
公开(公告)号：US5222074A
公开(公告)日：1993-06-22
申请号：US709280
申请日：1991-06-03
申请人： Kiyoshi Uchiyama , Tomoko Suzuki , Tatsuo Yokotsuka , Akira Takamori , Masato Nakajima
发明人： Kiyoshi Uchiyama , Tomoko Suzuki , Tatsuo Yokotsuka , Akira Takamori , Masato Nakajima
IPC分类号： C30B23/08 , C23C14/24 , C23C16/452 , C30B23/06 , H01L21/203
CPC分类号： C30B23/066 , C23C14/24 , C23C16/452
摘要： A thermal decomposition cell for producing a molecular beam from a material gas, includes: a crucible maintained at a given temperature necessary for thermal decomposition of the material gas which is effused in the crucible in a given direction; and a thermal decomposition baffle provided in the crucible and heated to a given temperature necessary for thermal decomposition of the material gas for producing the molecular beam by thermal-decomposing of the material gas such that the material gas is baffled in substantially all directions, the thermal decomposition baffle being made of a given metal to cause the thermal decomposition of the material gas. The thermal decomposition baffle may comprise a fiber or a cloth made of the metal loaded in the crucible. The thermal decomposition baffle may comprise a plurality of different sized rooms made of the given metal, each of said rooms having fine holes to allow the material gas to pass therethrough, and successively arranged in such a manner that said material gas moves from one room toward the other adjacent thereto.

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