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11. 发明授权

US06982784B2 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method 失效
公开(公告)号：US06982784B2
公开(公告)日：2006-01-03
申请号：US10931984
申请日：2004-09-02
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： H01L21/6875 , G03F7/707 , G03F7/70708 , G03F7/7075 , G03F7/70925 , H01L21/67265 , H01L21/67294 , H01L21/6831 , H01L21/6838 , H01L21/68714 , H01L21/68785 , H01L2223/54493
摘要： A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

12. 发明授权

US06930756B2 Electron beam exposure apparatus and semiconductor device manufacturing method 失效
标题翻译：电子束曝光装置及半导体装置的制造方法
公开(公告)号：US06930756B2
公开(公告)日：2005-08-16
申请号：US10617682
申请日：2003-07-14
申请人： Kotaro Akutsu , Shin Matsui
发明人： Kotaro Akutsu , Shin Matsui
IPC分类号： G03F7/20 , H01J37/20 , H01J37/317 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/20214 , H01J2237/20228 , H01J2237/20235 , H01J2237/31774
摘要： An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or a plurality of electron beams. The apparatus includes a substrate stage on which a substrate is mounted, a transfer stage which drives the substrate stage on an X-Y plane, an electromagnetic actuator which drives the substrate stage in a rotation direction about a Z-axis with respect to the transfer stage, and a measuring system which measures a position of the substrate stage in the rotation direction about the Z-axis using a measuring beam along a direction perpendicular to the plurality of electron beams.
摘要翻译：一种电子束曝光装置，其使用一个或多个电子束以预定图案曝光基板。该装置包括其上安装有基板的基板台，在XY平面上驱动基板台的转印台，相对于转印台围绕Z轴的旋转方向驱动基板台的电磁致动器，以及测量系统，其使用测量光束沿着垂直于多个电子束的方向测量围绕Z轴的旋转方向的基板台的位置。

13. 发明授权

US06984362B2 Processing apparatus, measuring apparatus, and device manufacturing method 失效
标题翻译：处理装置，测量装置和装置制造方法
公开(公告)号：US06984362B2
公开(公告)日：2006-01-10
申请号：US10619506
申请日：2003-07-16
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05B1/00 , G05B23/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

14. 发明申请

US20050271558A1 Processing apparatus, measuring apparatus, and device manufacturing method 失效
标题翻译：处理装置，测量装置和装置制造方法
公开(公告)号：US20050271558A1
公开(公告)日：2005-12-08
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： H01L21/027 , G03F7/20 , G05D16/00 , G05D16/20
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

15. 发明授权

US06616898B2 Processing apparatus with pressure control and gas recirculation system 失效
标题翻译：具有压力控制和气体再循环系统的加工设备
公开(公告)号：US06616898B2
公开(公告)日：2003-09-09
申请号：US09257258
申请日：1999-02-25
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D1600
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境气体被吹送到密封真空室中，使得沿着处理部分沿预定方向产生气流。

16. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

17. 发明授权

US07102735B2 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method 失效
标题翻译：基板保持装置，半导体制造装置及装置的制造方法
公开(公告)号：US07102735B2
公开(公告)日：2006-09-05
申请号：US11220677
申请日：2005-09-08
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： H01L21/6875 , G03F7/707 , G03F7/70708 , G03F7/7075 , G03F7/70925 , H01L21/67265 , H01L21/67294 , H01L21/6831 , H01L21/6838 , H01L21/68714 , H01L21/68785 , H01L2223/54493
摘要： A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.
摘要翻译：基板保持装置包括能够可移除地保持具有接触构件的板以与基板接触的基座构件，以及识别设置在板上的识别符号的传感器。

18. 发明申请

US20060033904A1 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method 失效
公开(公告)号：US20060033904A1
公开(公告)日：2006-02-16
申请号：US11220677
申请日：2005-09-08
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58
CPC分类号： H01L21/6875 , G03F7/707 , G03F7/70708 , G03F7/7075 , G03F7/70925 , H01L21/67265 , H01L21/67294 , H01L21/6831 , H01L21/6838 , H01L21/68714 , H01L21/68785 , H01L2223/54493
摘要： A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

19. 发明授权

US6054713A Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US6054713A
公开(公告)日：2000-04-25
申请号：US13304
申请日：1998-01-26
申请人： Akira Miyake , Masato Muraki , Masahiko Okunuki , Shigeru Terashima , Shin Matsui
发明人： Akira Miyake , Masato Muraki , Masahiko Okunuki , Shigeru Terashima , Shin Matsui
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70375 , H01J37/3175 , H01J2237/31779
摘要： An electron beam exposure apparatus, which illuminates a mask with light emitted by a light source, photoelectrically converts the light patterned by the mask using a photoelectric converter, and exposes an object to be exposed with a patterned electron beam emitted by the photoelectric converter. The apparatus includes an electron optical system for imaging the electron beam emitted by the photoelectric converter onto the object, an axial shifter for shifting an optical center of the electron optical system in a direction perpendicular to an optical axis, an axial deflector for deflecting the electron beam that propagates in the electron optical system, a region limiter for limiting a region of the mask to be projected onto the object via the photoelectric converter and the electron optical system to a partial region of the mask, and a scan controller for scanning the object with the region-limited electron beam by changing the partial region to be limited while controlling the axial shifter and axial deflector.
摘要翻译：用光源发出的光照射掩模的电子束曝光装置使用光电转换器对由掩模图案化的光进行光电转换，并用由光电转换器发射的图案化电子束曝光待曝光的物体。该装置包括用于将由光电转换器发射的电子束成像到物体上的电子光学系统，用于沿垂直于光轴移动电子光学系统的光学中心的轴向移动器，用于偏转电子的轴向偏转器在电子光学系统中传播的光束，用于将要经由光电转换器和电子光学系统投射到物体上的掩模的区域限制到掩模的部分区域的区域限制器，以及用于扫描物体的扫描控制器通过在控制轴向移位器和轴向偏转器的同时改变局部区域来限制电子束区域。

20. 发明授权

US5930324A Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5930324A
公开(公告)日：1999-07-27
申请号：US831867
申请日：1997-04-02
申请人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
发明人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30
CPC分类号： G03F7/702 , G03F7/70691 , G03F7/70841 , G03F9/7015
摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.
摘要翻译：一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件，由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态测量部分相对于辐射光的光轴。

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