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11. 发明申请

US20080099697A1 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same 有权
标题翻译：带电粒子束装置，使用其散光的散光的方法和使用其的制造装置的方法
公开(公告)号：US20080099697A1
公开(公告)日：2008-05-01
申请号：US11898358
申请日：2007-09-11
申请人： Kenji Watanabe , Takeshi Murakami , Ryo Tajima , Masahiro Hatakeyama , Masatoshi Tsuneoka , Nobuharu Noji
发明人： Kenji Watanabe , Takeshi Murakami , Ryo Tajima , Masahiro Hatakeyama , Masatoshi Tsuneoka , Nobuharu Noji
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/026 , H01J37/153 , H01J37/29 , H01J2237/0047 , H01J2237/1532 , H01J2237/216
摘要： [Problem] To adjust astigmatism quickly with a simple algorithm by utilizing an autofocus estimation value of an image obtained from a pattern formed on a sample. [Means] A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focus estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.
摘要翻译： [问题]通过利用从样品上形成的图案获得的图像的自动聚焦估计值，通过简单的算法快速调节像散。用于通过对样品W施加带电粒子束以检测从样品发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样品W的带电粒子束装置300包括散光调节装置17，用于调整带电粒子束的散光。散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的聚焦估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴带电粒子束在中心。还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

12. 发明授权

US07241993B2 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07241993B2
公开(公告)日：2007-07-10
申请号：US09891511
申请日：2001-06-27
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： H01J37/28
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

13. 发明申请

US20070018101A1 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US20070018101A1
公开(公告)日：2007-01-25
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G21K7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

14. 发明申请

US20060237646A1 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample 有权
公开(公告)号：US20060237646A1
公开(公告)日：2006-10-26
申请号：US10543151
申请日：2004-01-27
申请人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuharu Noji , Yuichiro Yamazaki , Ichirota Nagahama
发明人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuharu Noji , Yuichiro Yamazaki , Ichirota Nagahama
IPC分类号： G21K7/00
CPC分类号： H01J37/32211 , G01N23/225 , H01J37/32357 , H01J2237/2441 , H01J2237/2446
摘要： An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface.

15. 发明申请

US20060118719A1 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
公开(公告)号：US20060118719A1
公开(公告)日：2006-06-08
申请号：US11290688
申请日：2005-12-01
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

16. 发明授权

US06468598B1 Magnetic disk and method of making thereof 失效
标题翻译：磁盘及其制造方法
公开(公告)号：US06468598B1
公开(公告)日：2002-10-22
申请号：US09598454
申请日：2000-06-22
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
IPC分类号： B05D500
CPC分类号： C23C14/048 , C23C16/047 , G11B5/82 , G11B5/84 , G11B5/8404 , G11B5/8408
摘要： It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk, having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam surface at an inclined angle to the substrate surface. The surface is irradiated through a shielding mask having a specific pattern, so as to produce a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.
摘要翻译：本发明的目的是提供一种制造具有均匀纹理结构的磁盘的方法，其制造深度小于20nm，优选小于10nm，局部深度偏差小于5 ％，其中纹理图案的特征在于结构的侧表面是倾斜的或弯曲的。该目的已经在制造磁盘的方法中实现，其通过用来自梁表面的高能量光束旋转和照射制造表面而在基板的制造表面上具有微波纹以减少动态摩擦和控制磁头浮动与基板表面成倾斜的角度。通过具有特定图案的屏蔽掩模照射该表面，以在基板表面上产生转印图案，以产生具有倾斜或弯曲侧表面的微波纹的纹理结构。

17. 发明授权

US5998097A Fabrication method employing energy beam source 失效
标题翻译：采用能量束源的制造方法
公开(公告)号：US5998097A
公开(公告)日：1999-12-07
申请号：US300844
申请日：1999-04-28
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务都可以在三维空间中的工件的任何表面和任何位置上进行。

18. 发明授权

US5883470A Fast atomic beam source with an inductively coupled plasma generator 失效
标题翻译：具有电感耦合等离子体发生器的快速原子束源
公开(公告)号：US5883470A
公开(公告)日：1999-03-16
申请号：US800278
申请日：1997-02-13
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yasushi Toma , Masao Saitoh
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yasushi Toma , Masao Saitoh
IPC分类号： G21K1/00 , B81B5/00 , G21K5/04 , H05H3/02
CPC分类号： H05H3/02
摘要： A fast atomic beam (FAB) source is capable of generating fast atomic beams having characteristics of a high beam density, precise directionality, and a wide range of controlled out put energy levels. The FAB source includes a discharge tube, an inductively coupled plasma generator for generating gas plasma in the discharge tube from gas introduced therein, positive and negative electrodes for accelerating ions to control the beam for a variety of energy levels. The negative electrode has a beam control opening for generating a FAB, wherein directionability, neutralization factor, and other FAB characteristics are controlled.
摘要翻译：快原子束（FAB）源能够产生具有高光束密度，精确方向性和宽范围的受控输出能级的特征的快速原子束。 FAB源包括放电管，电感耦合等离子体发生器，用于在其中引入的气体在放电管中产生气体等离子体，用于加速离子以控制光束以达到各种能级的正极和负极。负极具有用于产生FAB的光束控制开口，其中控制方向性，中和因子和其他FAB特性。

19. 发明授权

US5519213A Fast atom beam source 失效
标题翻译：快原子束源
公开(公告)号：US5519213A
公开(公告)日：1996-05-21
申请号：US289662
申请日：1994-08-12
申请人： Masahiro Hatakeyama
发明人： Masahiro Hatakeyama
IPC分类号： H05H3/02 , H01S1/00 , H01S3/00
CPC分类号： H05H3/02
摘要： A fast atom beam source is capable of efficiently emitting a fast atom beam with low energy and high particle flux. A plate-shaped electrode has a plurality of atom emitting holes. A pair of electrodes are disposed in series opposite the plate-shaped electrode so as to form an electric discharge part. An AC power supply impresses an AC voltage between the pair of electrodes. A DC power supply impresses a DC voltage between the plate-shaped electrode and one of the pair of electrodes that is closer to the plate-shaped electrode. A gas inlet introduces a gas to induce electric discharge in the space between the plate-shaped electrode and the pair of electrodes.
摘要翻译：快速原子束源能够有效地发射具有低能量和高粒子通量的快速原子束。板状电极具有多个原子发射孔。一对电极与板状电极串联设置，以形成放电部分。 AC电源在一对电极之间施加AC电压。直流电源在板状电极与更靠近板状电极的一对电极中的一个之间施加直流电压。气体入口引入气体以在板状电极和一对电极之间的空间中引起放电。

20. 发明授权

US09194826B2 Electron beam apparatus and sample observation method using the same 有权
标题翻译：电子束装置和使用其的样品观察方法
公开(公告)号：US09194826B2
公开(公告)日：2015-11-24
申请号：US12103354
申请日：2008-04-15
申请人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
发明人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
IPC分类号： G21K5/04 , G01N23/203 , G01N23/225 , H01J37/28
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/6116 , H01J37/28 , H01J2237/004 , H01J2237/022 , H01J2237/2446 , H01J2237/2817
摘要： The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.
摘要翻译：电子束装置设置有用于在其上安装样品的载物台，用于产生具有照射区域并将电子束照射到样品上的电子束的主光学系统，用于检测通过将电子束照射到样品上并获取样品的结构信息并获取关于观察区域的样品的图像和用于改变照射区域相对于观察区域的位置的照射区域改变部分。

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