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    • 17. 发明授权
    • Semiconductor device
    • 半导体器件
    • US5831296A
    • 1998-11-03
    • US235155
    • 1994-04-28
    • Takao KurodaYasuhiro Shiraki
    • Takao KurodaYasuhiro Shiraki
    • H01L29/812H01L21/20H01L21/338H01L29/201H01L29/205H01L29/778H01L29/80
    • H01L29/205H01L29/7783Y10S438/938
    • Disclosed is a semiconductor device comprising an undoped GaAs layer, an intermediate undoped layer and an undoped Ga.sub.1-x Al.sub.x As layer which are successively provided on a substrate made of a semiinsulating GaAs crystal; the intermediate undoped layer being an undoped In.sub.y Ga.sub.1-y As layer, an undoped GaAs.sub.1-z Sb.sub.z layer, a superlattice layer which includes an undoped In.sub.y Ga.sub.1-y As layer and an undoped GaAs.sub.1-z Sb.sub.z layer, a superlattice layer which includes an undoped In.sub.y Ga.sub.1-y As layer and an undoped GaAs layer, or a superlattice layer which includes an undoped GaAs.sub.1-z Sb layer and an undoped GaAs layer. When applied to a high electron mobility transistor, this semiconductor device affords a high current and a high speed and has the merit of a small dispersion in the threshold voltage thereof.
    • 公开了一种半导体器件,其包括未掺杂的GaAs层,中间未掺杂层和未掺杂的Ga1-xAlxAs层,其连续地设置在由半绝缘GaAs晶体制成的衬底上; 中间未掺杂层是未掺杂的In y Ga 1-y As层,未掺杂的GaAs1-zSbz层,包含未掺杂的In y Ga 1-y As层的超晶格层和未掺杂的GaAs1-zSbz层,包含未掺杂的In y Ga 1-y As层的超晶格层和 未掺杂的GaAs层或包含未掺杂的GaAs1-zSb层和未掺杂的GaAs层的超晶格层。 当施加到高电子迁移率晶体管时,该半导体器件提供高电流和高速度,并且其阈值电压具有小的色散。
    • 18. 发明授权
    • Method of forming a metal silicide film
    • 形成金属硅化物膜的方法
    • US5047111A
    • 1991-09-10
    • US110580
    • 1987-10-16
    • Akitoshi IshizakaYasuhiro ShirakiTakashi Ohshima
    • Akitoshi IshizakaYasuhiro ShirakiTakashi Ohshima
    • C30B1/02H01L21/285
    • H01L21/28518C30B1/023C30B29/10
    • Films of desired metal, e.g., Ni or Co, and of Si are laminated alternatelyn a single crystal silicon substrate to form a multi-layered structure, and thereafter the substrate is heated to grow an epitaxial NiSi.sub.2 or CoSi.sub.2 film in solid phase with less diffusion of Ni or Co atoms into the silicon substrate. Each layer in the multi-layered structure has a thickness selected in the range of 30-300 A with the overall composition ratio Si/Ni (or Si/Co) in the range of 1.8-2.0. The lamination process is done at a substrate temperature which does not cause the laminated films to react with the substrate and does not cause the multi-layered structure to become polycrystalline, e.g. below 350.degree. C. for the formation of an NiSi.sub.2 film or below 450.degree. C. for the formation of a CoSi.sub.2 film. The solid phase epitaxy is achieved at a substrate heating temperature in a range of 350.degree.-750.degree. C. for the formation of an epitaxial NiSi.sub.2 film or 450.degree.-1000.degree. C. for the formation of a CoSi.sub.2 film.
    • 将期望的金属(例如Ni或Co)和Si的膜交替层叠在单晶硅衬底上以形成多层结构,然后将衬底加热以生长外延NiSi 2或CoSi 2膜,固相少 Ni或Co原子扩散到硅衬底中。 多层结构中的每个层具有在30-300A范围内选择的厚度,Si / Ni(或Si / Co)的总组成比在1.8-2.0的范围内。 层压方法是在不使层压膜与基板反应而不会使多层结构变得多晶的基板温度下进行的。 低于350℃以形成NiSi2膜或低于450℃以形成CoSi 2膜。 在350〜-750℃的衬底加热温度下实现固相外延,用于形成外延NiSi2膜或450-1000℃以形成CoSi 2膜。
    • 20. 发明授权
    • Electronic control unit
    • 电子控制单元
    • US07187225B2
    • 2007-03-06
    • US11201382
    • 2005-08-11
    • Masaharu YuharaYasuhiro ShirakiKazuhito OkishioHiroshi NakamuraHisato UmemaruYoshimitsu TakahataYasuaki Gotoh
    • Masaharu YuharaYasuhiro ShirakiKazuhito OkishioHiroshi NakamuraHisato UmemaruYoshimitsu TakahataYasuaki Gotoh
    • H03K5/08
    • H02H9/005H02H9/046
    • This invention provides an electronic control unit is capable of suppressing electromagnetic noise having a frequency band used in a portable wireless apparatus, and capable of exhibiting a noise resistance property against electromagnetic noise. The electronic control unit including a constant voltage power supply circuit portion, an analog signal inputting circuit portion, and a conversion processing circuit portion, an analog sensor and a driving power supply being connected to the outside, and the unit being connected to the analog sensor through a power supply line and a signal line, in which the analog signal inputting circuit portion includes a current limiting circuit portion, an integrating circuit portion, a current limiting resistor, a signal noise absorbing circuit, and a first bypass capacitor, and capacitance (C1) and parasitic inductance (L1) of the first bypass capacitor are set in a range of 7×106
    • 本发明提供一种电子控制单元,其能够抑制具有在便携式无线装置中使用的频带的电磁噪声,并且能够表现出抗电磁噪声的抗噪声特性。 电子控制单元包括恒压电源电路部分,模拟信号输入电路部分和转换处理电路部分,模拟传感器和驱动电源连接到外部,并且该单元连接到模拟传感器 通过电源线和信号线,其中模拟信号输入电路部分包括限流电路部分,积分电路部分,限流电阻器,信号噪声吸收电路和第一旁路电容器以及电容( C 1)和第一旁路电容器的寄生电感(L 1)设定在7×10 6 <1 / [2pi√(L 1x C 1)] <35×10 6的范围内, / SUP>。