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    • 12. 发明授权
    • Multi-level type nonvolatile semiconductor memory device
    • 多级型非易失性半导体存储器件
    • US06469343B1
    • 2002-10-22
    • US09679650
    • 2000-10-05
    • Hirotomo MiuraYasuo Sato
    • Hirotomo MiuraYasuo Sato
    • H01L29792
    • H01L27/11568G11C11/5621G11C11/5628G11C11/5642G11C11/5657G11C11/5671G11C16/0466H01L27/115H01L29/7923
    • A nonvolatile semiconductor memory device having nonvolatile memory cells, each of said memory cells including a semiconductor substrate of one type of electric conduction, a pair of source and drain regions of the opposite type of electric conduction formed in the semiconductor substrate, an electric charge-capturing film formed on a channel region between the pair of source and drain regions, and a gate electrode formed on the charge-capturing film and working as a control electrode. The electric charge-capturing film has a multi-layer structure in which at least four insulating films and at least three dielectric films each working as an electric charge accumulation layer are alternatingly laminated one upon the other, the lowermost insulating film among the at least four insulating films is formed as a gate-insulating film, a plurality of different threshold voltages are set to the at least three dielectric films to correspond to their electric charge-capturing states, and at least four kinds of memory states are specified depending upon the plurality of threshold voltages. This constitution makes it possible to easily and reliably adjust the amount of electric charge to be captured and, hence, to store desired multi-value data while preventing the occurrence of an inconvenience such as data corruption.
    • 一种具有非易失性存储单元的非易失性半导体存储器件,每个所述存储单元包括一种类型的导电的半导体衬底,形成在所述半导体衬底中的相对电导体的一对源区和漏区, 在一对源区和漏区之间的沟道区上形成的捕获膜,以及形成在电荷捕获膜上并用作控制电极的栅电极。 电荷捕获膜具有多层结构,其中至少四个绝缘膜和每个用作电荷蓄积层的至少三个电介质膜彼此交替层叠,所述至少四个绝缘膜 形成绝缘膜作为栅极绝缘膜,对至少三个电介质膜设置多个不同的阈值电压以对应于其电荷捕获状态,并且根据多个不同的阈值电压指定至少四种存储状态 的阈值电压。 这种结构使得可以容易且可靠地调整要捕获的电荷量,并因此存储期望的多值数据,同时防止诸如数据损坏的不便的发生。
    • 15. 发明授权
    • Document creating apparatus creates free format document from handwritten data converting into normalized size
    • 文档创建设备从手写数据创建自由格式文档转换为归一化大小
    • US06317762B1
    • 2001-11-13
    • US08744993
    • 1996-11-07
    • Toru OkawaRyuichi MatsukuraYasuo Sato
    • Toru OkawaRyuichi MatsukuraYasuo Sato
    • G06F1730
    • G06T11/60G06K9/00402
    • A document creating apparatus creates a document in response to handwritten data generated from a handwritten data input device and displays the created document on a display screen. The document creating apparatus includes a setting mechanism for setting on the display screen one or a plurality of normalized regions having a normalized size as an attribute and one or a plurality of non-normalized regions having no normalized size as the attribute, a judging mechanism for judging whether input data are input to the normalized region or the non-normalized region, a first storing mechanism for converting a size of the input data into a normalized size of the normalized region and storing the normalized input data in a memory when the judging mechanism judges that the input data are input to the normalized region, and a second storing mechanism for storing the input data in the memory as they are when the judging mechanism judges that the input data are input to the non-normalized region.
    • 文档创建装置响应于从手写数据输入装置生成的手写数据创建文档,并将显示画面上显示所生成的文档。 该文件制作装置包括一个设置机构,用于在显示屏幕上设置一个或多个归一化尺寸的归一化区域作为属性,一个或多个非标准化区域没有归一化尺寸作为属性, 判断输入数据是否被输入到归一化区域或非归一化区域;第一存储机构,用于将所述输入数据的大小转换成归一化区域的归一化大小,并且当所述判断机构 判断输入数据被输入到归一化区域;以及第二存储机构,用于当判断机构判断输入数据被输入到非归一化区域时,将它们存储在存储器中。
    • 16. 发明授权
    • Semiconductor memory using different concentration impurity diffused
layers
    • 半导体存储器采用不同浓度的杂质扩散层
    • US5796149A
    • 1998-08-18
    • US524672
    • 1995-09-08
    • Fumitaka SugayaYasuo Sato
    • Fumitaka SugayaYasuo Sato
    • H01L21/8246H01L29/78H01L29/76H01L29/94
    • H01L27/11266H01L29/7835
    • A semiconductor memory which includes first and second memory cells, wherein the first memory cells include first MOS transistors each having impurity diffused layers provided inside of both of a source and a drain to expanding source and drain regions, the second memory cells include second or third MOS transistors each having an impurity diffused layer provided inside of one of a source and a drain or include fourth MOS transistors each having no impurity diffused layer provided inside of either thereof, as well as a method for fabricating the semiconductor memory. Differences in threshold voltage between the first and second to fourth MOS transistors are utilized as differences in storage status between the first and second memory cells so that data "0" or "1" is stored in each memory cell. There are also provided a semiconductor memory wherein differences between the first to fourth MOS transistors in the drain-source current flowing through the transistors when subjected to application of an identical gate voltage thereto are utilized to store four sorts of data in one memory cell, and provided a method for fabricating the semiconductor memory.
    • 一种半导体存储器,包括第一和第二存储单元,其中第一存储单元包括第一MOS晶体管,每个第一MOS晶体管具有设置在源极和漏极两者内部的扩散源极和漏极区的杂质扩散层,第二存储单元包括第二或第三 每个具有设置在源极和漏极之一内部的杂质扩散层的MOS晶体管或包括设置在其任一内侧的不具有杂质扩散层的第四MOS晶体管以及半导体存储器的制造方法。 利用第一和第二至第四MOS晶体管之间的阈值电压的差异作为第一和第二存储单元之间的存储状态的差异,从而在每个存储单元中存储数据“0”或“1”。 还提供了一种半导体存储器,其中利用在施加相同的栅极电压时流过晶体管的漏 - 源电流中的第一至第四MOS晶体管之间的差异来将四种数据存储在一个存储单元中,以及 提供了一种用于制造半导体存储器的方法。
    • 17. 发明授权
    • Nonvolatile semiconductor memory device and method of producing the same
    • 非易失性半导体存储器件及其制造方法
    • US5686333A
    • 1997-11-11
    • US736059
    • 1996-10-22
    • Yasuo Sato
    • Yasuo Sato
    • H01L21/8247H01L27/115H01L29/423H01L29/788H01L29/792H61L21/8247
    • H01L27/11521H01L27/115H01L29/42324
    • In a nonvolatile semiconductor memory device and a method of producing the same, the nonvolatile semiconductor memory device includes a semiconductor substrate of a first conductivity type, a pair of spaced source/drain diffusion layers of a second conductivity type different from the first conductivity type, a floating gate electrode formed on a channel region disposed between the pair of source/drain diffusion layers in the surface of the semiconductor substrate in an insulated relationship with the channel region, and a control gate electrode formed on the floating gate electrode in on insulated relationship with the floating gate electrode wherein a part of the control gate electrode to extend beyond a side of the floating gate electrode to an underside thereof.
    • 在非易失性半导体存储器件及其制造方法中,非易失性半导体存储器件包括第一导电类型的半导体衬底,与第一导电类型不同的第二导电类型的一对间隔的源极/漏极扩散层, 形成在沟道区域上的浮栅,该沟道区设置在半导体衬底的与沟道区绝缘的表面中的一对源极/漏极扩散层之间,并且以绝缘关系形成在浮置栅电极上的控制栅电极 其中所述浮栅电极,其中所述控制栅电极的一部分延伸超过所述浮栅电极的一侧到其下侧。
    • 19. 发明授权
    • Process for supplying gas to a utilization station at a utilization site
    • 在利用场地向利用站供气的处理
    • US5433921A
    • 1995-07-18
    • US202497
    • 1994-02-28
    • Yasuo Sato
    • Yasuo Sato
    • F17C13/12F17D1/02B01J19/14
    • F17D1/02F17C13/12F17C2221/014F17C2221/05F17C2223/0123F17C2223/0161F17C2223/036F17C2260/038F17C2265/01F17C2265/025F17C2270/0518
    • Process and installation for supplying at least one pure active gas to at least one utilization station (P.sub.i) in a first building (A) at a utilization site. It comprises the steps of providing, at the utilization site, a second safety building (B) at a distance from the first building (A), providing at least one source (2; 7; 10) of said gas in the second building (B), and transferring, by at least one safety conduit (C) of high cleanliness, the gas, at a low pressure, to the utilization station (P.sub.i). There is also taught the step of purifying (4; 11) the gas in the second building (B) before transfer to the conduit (C). The pure gas is prepared in situ (2, 4; 10, 11) in the second building (B). There can alternatively be provided, adjacent to the second building (B), at least one source of vector gas (1), with mixing in controlled fashion (6; 9), in the second building (B), the pure active gas with the vector gas before transfer of the mixture to the conduit (C). Apparatus is provided for analyzing (3; 5, 5' ; 8, 8'; 12), in the second building (B), the purity and/or the mixing rate of the active gas and/or of a mixture of gas containing the active gas, before transfer to the conduit (C).
    • 用于将至少一种纯活性气体供应到在利用场所的第一建筑物(A)中的至少一个利用站(Pi)的过程和安装。 其包括以下步骤:在使用场所提供距离第一建筑物(A)一定距离的第二安全建筑物(B),在第二建筑物中提供至少一个所述气体源(2; 7; 10) B),并且通过至少一个高清洁度的安全导管(C)将气体以低压传送到使用站(Pi)。 还教导了在转移到导管(C)之前,将第二建筑物(B)中的气体净化(4; 11)的步骤。 在第二建筑物(B)中原位制备纯气体(2,4,10,11)。 或者可以在第二建筑物(B)中邻近第二建筑物(B)提供至少一个向量气体源(1),在第二建筑物(B)中以受控的方式(6; 9)混合,所述纯活性气体具有 将混合物转移到导管(C)之前的载体气体。 提供了用于在第二建筑物(B)中分析(3; 5,5'; 8,8'; 12)的装置,其中活性气体和/或包含气体的气体混合物的纯度和/或混合速率 活性气体,然后转移到导管(C)。