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    • 14. 发明授权
    • Method of and apparatus for detecting foreign substances
    • 异物检测方法及装置
    • US5225886A
    • 1993-07-06
    • US584120
    • 1990-09-18
    • Mitsuyoshi KoizumiYoshimasa Ohshima
    • Mitsuyoshi KoizumiYoshimasa Ohshima
    • G01N21/94
    • G01N21/94
    • Disclosed herein are method of and apparatus for detecting a foreign substance on an object by illuminating said object, detecting via an optical system light reflected from said object and detecting said foreign substance in distinction from a background. The object is exposed to first illumination such that light reflected from said background is suppressed but light reflected from said foreign substance is highlighted relative to the light reflected from said background. The light reflected from said object as a result of said first illumination is detected, thereby obtaining a first detection signal. The object is exposed to second illumination such that light reflected from said background is free from suppression relative to the light reflected from said substance as a result of said second illumination. The light reflected from said object as a result of said second illumination is detected, thereby obtaining a second detection signal. Foreign-substance-highlighting processing is performed on said first detection signal by using said second detection signal, whereby said substance is detected.
    • 本文公开了通过照射所述物体来检测物体上的异物的方法和装置,通过光学系统检测从所述物体反射的光并检测所述异物与背景的区别。 对象被暴露于第一照明,使得从所述背景反射的光被抑制,而从所述异物反射的光相对于从所述背景反射的光被突出显示。 检测由于所述第一照明而从所述物体反射的光,从而获得第一检测信号。 物体暴露于第二照明,使得从所述背景反射的光相对于作为所述第二照明的结果从所述物质反射的光没有抑制。 检测作为所述第二照明的结果从所述物体反射的光,从而获得第二检测信号。 通过使用所述第二检测信号对所述第一检测信号进行异物突出处理,从而检测所述物质。
    • 16. 发明授权
    • Method for detecting foreign matter and device for realizing same
    • 异物检测方法及其实现方法
    • US5046847A
    • 1991-09-10
    • US262573
    • 1988-10-25
    • Toshihiko NakataNobuyuki AkiyamaYoshihiko YamuchiMitsuyoshi KoizumiYoshimasa Oshima
    • Toshihiko NakataNobuyuki AkiyamaYoshihiko YamuchiMitsuyoshi KoizumiYoshimasa Oshima
    • G01N21/21G01N21/94G03F9/00
    • G03F9/70G01N21/94G01N21/95623G01N2021/473G01N21/21
    • A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.
    • 一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。 由样品反射的一些光被遮光阶段遮挡,并且通过遮光台的由样品反射的其余光指向检测光学系统,由光检测器检测 。 样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。 选择该角度使得由直线组反射的衍射光不进入检测光学系统。 使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。 由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束,该特征由多个一维固态成像元件检测。 信号由驱动器,加法器和量化器与一维固态成像元件同步处理。
    • 19. 发明授权
    • Exposure apparatus and method of aligning exposure mask with workpiece
    • 曝光装置和曝光掩模与工件对准的方法
    • US4668089A
    • 1987-05-26
    • US684292
    • 1984-12-20
    • Yoshitada OshidaMasataka ShibaToshihiko NakataMitsuyoshi KoizumiNaoto Nakashima
    • Yoshitada OshidaMasataka ShibaToshihiko NakataMitsuyoshi KoizumiNaoto Nakashima
    • H01L21/30G03F9/00G01B11/26G01J1/32
    • G03F9/7049
    • An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section is on that surface of the mask plate which does not face the light source and includes a reflection portion for conducting light from another light source to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion of providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.
    • 曝光装置包括光源,具有曝光图案区域部分和对准/反射区域部分的掩模板,投影透镜,用于保持具有工件对准标记的工件的可动台,对准控制和用于 活动舞台。 在通过投影透镜投射到工件上的光源照射曝光图案区域部分之前,工件与掩模正确对准。 掩模板与工件之间的对准通过有效地使用具体排列并具有特定结构的对准/反射区域部分进行。 对准/反射区域在掩模板的不面向光源的表面上,并且包括用于将来自另一光源的光传导到工件的反射部分,并且传导从工件散射的光并通过投影透镜到 对准控制和掩模对准标记部分,当照明时,将掩模对准标记部分的图像提供给对准控制,使得其检测掩模对准标记部分和工件对准标记之间的位置关系,并产生控制信号 以实现掩模板和工件之间的对准。