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    • 18. 发明授权
    • Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
    • 透明弹性体,接触模式光刻掩模,传感器和波前工程元件
    • US06753131B1
    • 2004-06-22
    • US09422611
    • 1999-10-21
    • John A. RogersRebecca J. JackmanKateri E. PaulOlivier J. A. SchuellerTricia Lynn BreenGeorge M. Whitesides
    • John A. RogersRebecca J. JackmanKateri E. PaulOlivier J. A. SchuellerTricia Lynn BreenGeorge M. Whitesides
    • G03C500
    • B82Y40/00B82Y10/00G03F1/34G03F1/50G03F1/60G03F7/0002
    • A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift due to radiation passing through the indentations as opposed to the protrusions is essentially complete. Minima in intensity of electromagnetic radiation are thereby produced at boundaries between the indentations and protrusions. The elastomeric mask conforms well to the surface of photoresist and, following development, features smaller than 100 nm can be obtained. Patterns including curved portions are obtained, as well as curved and/or linear patterns on non-planar surfaces. An elastomeric transparent diffraction grating serves also as a spatial light modulator photothermal detector, strain gauge, and display device. A technique for simplified photolithography is also described. A photoreactive, contoured surface is exposed to electricmagnetic radiation and contours in the surface alters the electromagnetic radiation to promote selective surface photoreaction. The contours can act as lenses, gratings, or the like, such that the photoreactive surface itself can selectively direct uniform radiation to promote selective photoreaction within itself. A photoresist layer having a contoured surface thus can be exposed to uniform radiation, without a mask, followed by development and lift-off to create a photoresist pattern that can be used in any of a variety of ways. The invention provides methods of making contoured, photoreactive surfaces, and contoured photoreactive surfaces themselves.
    • 接触模式光刻相位掩模包括具有多个凹陷和突起的衍射表面。 突起与正性光致抗蚀剂的表面接触,并且表面暴露于通过相位掩模的电磁辐射。 与突起相反的通过压痕的辐射的相移基本上完成。 因此,在凹陷和突起之间的边界处产生电磁辐射强度的微小。 弹性体掩模与光致抗蚀剂的表面相适应,并且在显影之后,可以获得小于100nm的特征。 获得包括弯曲部分的图案,以及在非平面表面上的曲线和/或线性图案。 弹性透明衍射光栅还用作空间光调制器光热检测器,应变计和显示装置。 还描述了用于简化光刻的技术。 光反应的轮廓表面暴露于电磁辐射,并且表面中的轮廓改变电磁辐射以促进选择性表面光反应。 轮廓可以用作透镜,光栅等,使得光反应表面本身可以选择性地引导均匀的辐射以促进其本身内的选择性光反应。 因此,具有轮廓表面的光致抗蚀剂层可以暴露于均匀的辐射,而不需要掩模,然后显影和剥离以产生可以以各种方式中的任何一种使用的光致抗蚀剂图案。 本发明提供了制造轮廓,光反应表面和轮廓光反应表面本身的方法。
    • 19. 发明授权
    • Fabrication of small-scale cylindrical articles
    • 小型圆柱形制品的制造
    • US5951881A
    • 1999-09-14
    • US681235
    • 1996-07-22
    • John A. RogersRebecca J. JackmanGeorge M. Whitesides
    • John A. RogersRebecca J. JackmanGeorge M. Whitesides
    • B05D1/28G03F7/00G03F7/16G03F7/18G03F7/24H01F41/04H01L22/027
    • G02B6/02142B05D1/283B82Y30/00B82Y40/00G02B6/02138G03F7/00G03F7/161G03F7/18G03F7/24H01F41/042G02B6/02152
    • Techniques for fabrication of small-scale metallic structures such as microinductors, microtransformers and stents are described. A chemically active agent such as a catalyst is applied from an applicator in a pattern to an exterior surface of an article, metal is deposited according to the pattern and optionally, removed from the substrate. Where the substrate is cylindrical, the pattern can serve as a stent. Alternatively, a pattern of a self-assembled monolayer can be printed on a surface, which pattern can dictate metal plating or etching resulting in a patterned metal structure that can be cylindrical. In another embodiment, a structure is patterned on a surface that serves as a phase-modulating pattern or amplitude-modulating pattern. The article subsequently is exposed to radiation that can induce a change in refractive index within the article, and the phase-modulating or amplitude-modulating pattern results in different indices of refraction being created in different portions of the article. By this technique, a grating can be written into a core of an optical fiber.
    • 描述了微型电感器,微型变压器和支架等小型金属结构的制造技术。 将化学活性剂如催化剂从涂布器以图案施加到制品的外表面,根据图案沉积金属,并任选地从基材上除去金属。 在基底为圆柱形的情况下,图案可用作支架。 或者,自组装单层的图案可以印刷在表面上,该图案可以规定金属电镀或蚀刻,导致可以是圆柱形的图案化金属结构。 在另一个实施例中,在用作相位调制图案或幅度调制图案的表面上图案化结构。 该物品随后暴露于可引起制品内的折射率变化的辐射,并且相位调制或幅度调制图案导致在制品的不同部分产生不同的折射率。 通过这种技术,可以将光栅写入光纤的核心。
    • 20. 发明授权
    • Elastomeric light valves
    • 弹性光阀
    • US06304364B1
    • 2001-10-16
    • US08873191
    • 1997-06-11
    • Dong QinYounan XiaGeorge M. Whitesides
    • Dong QinYounan XiaGeorge M. Whitesides
    • G02B2600
    • B82Y30/00B82Y10/00G02B5/122G02B5/201G02B5/206G02B5/24
    • Electromagnetic radiation valves are provided. In one system, a transparent, elastomeric article is provided having a contoured surface including protrusions and intervening indentations. The contoured surface is placed adjacent a transparent plate and a void pattern defined by indentations of the contoured surface is filled with an opaque fluid. The protrusions decrease in cross-sectional area in the direction in which they extend away from the bulk of the elastomeric article, thus compression of the elastomeric protrusions against the transparent plate results in an increase in surface area in elastomeric protrusions against the transparent plate due to deformation of the protrusions, and the opaque fluid is displaced from the voids. Increased transmission of the electromagnetic radiation results. In another system, a similar elastomeric article includes an array of corner cubes that are totally internally reflective of the electromagnetic radiation. Increased deformation of the protrusions of the transparent plate results in decreased total internal reflection of light, due to the progressive destruction of the corner-cube geometry, and the passage of light is increased with compression.
    • 提供电磁辐射阀。 在一个系统中,提供透明的弹性制品,其具有包括突起和中间凹口的轮廓表面。 轮廓表面放置在透明板附近,并且由不规则表面的凹痕限定的空隙图案填充有不透明流体。 突出部分在其远离弹性体制品的本体延伸的方向上的横截面积减小,因此弹性体突起抵靠透明板的压缩导致弹性体突出物相对于透明板的表面积增加,由于 突起的变形,不透明的液体从空隙中移位。 增加电磁辐射的传播结果。 在另一系统中,类似的弹性体制品包括完全内反射电磁辐射的角立方体阵列。 由于角立方几何形状的逐渐破坏,透明板的突起的增加变形导致光的全内反射减少,并且光的通过随着压缩而增加。