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11. 发明申请

US20100219757A1 Method and Apparatus of Providing Power to Ignite and Sustain a Plasma in a Reactive Gas Generator 有权
标题翻译：提供功率以激发和维持反应性气体发生器中的等离子体的方法和装置
公开(公告)号：US20100219757A1
公开(公告)日：2010-09-02
申请号：US12394904
申请日：2009-02-27
申请人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
发明人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
IPC分类号： H05H1/24
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译：描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。从点火电源向等离子体点火电路供电。测量等离子体点火电路的预点火信号。基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。经过一段时间后，调节可调节点火控制信号。

12. 发明申请

US20090320677A1 PARTICLE TRAP FOR A PLASMA SOURCE 失效
标题翻译：用于等离子体源的颗粒捕获
公开(公告)号：US20090320677A1
公开(公告)日：2009-12-31
申请号：US12147078
申请日：2008-06-26
申请人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
发明人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
IPC分类号： B01D53/22 , B01J19/08 , B01D46/46 , B01D45/08 , B01D50/00
CPC分类号： H01J37/32357 , H01J37/32871 , Y10S55/15 , Y10T29/4935
摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
摘要翻译：用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。冷却剂构件可以与气体通道热连通。

13. 发明授权

US07914603B2 Particle trap for a plasma source 失效
标题翻译：用于等离子体源的粒子阱
公开(公告)号：US07914603B2
公开(公告)日：2011-03-29
申请号：US12147078
申请日：2008-06-26
申请人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
发明人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
IPC分类号： B01D46/46
CPC分类号： H01J37/32357 , H01J37/32871 , Y10S55/15 , Y10T29/4935
摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
摘要翻译：用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。冷却剂构件可以与气体通道热连通。

14. 发明申请

US20110005922A1 Methods and Apparatus for Protecting Plasma Chamber Surfaces 审中-公开
标题翻译：用于保护等离子体腔体表面的方法和装置
公开(公告)号：US20110005922A1
公开(公告)日：2011-01-13
申请号：US12499453
申请日：2009-07-08
申请人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
发明人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
IPC分类号： C23C14/34
CPC分类号： C25D11/04 , C25D11/026 , C25D11/18 , C25D11/30 , H01J37/32477
摘要： A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas.
摘要翻译：一种用于在半导体处理系统中使用的用于在包括铝和镁的物体的表面上形成保护层的方法，其包括使用等离子体电解氧化工艺氧化物体的表面。该方法还包括通过激发包含卤素的气体产生含卤素的等离子体。该方法还包括将氧化的表面暴露于含卤素等离子体或激发气体。

15. 发明申请

US20080302652A1 Particle Reduction Through Gas and Plasma Source Control 审中-公开
标题翻译：通过气体和等离子体源控制减少粒子
公开(公告)号：US20080302652A1
公开(公告)日：2008-12-11
申请号：US12132294
申请日：2008-06-03
申请人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
发明人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
IPC分类号： H05H1/24
CPC分类号： H01J37/3299 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.
摘要翻译：一种用于产生用于引入半导体处理室的激发气体的系统。该系统包括用于产生等离子体的等离子体源。等离子体源包括等离子体室和用于从气体源接收工艺气体的气体入口。气体流量控制器耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。该系统包括用于检测从第一处理气体到第二处理气体的转变的控制回路，并且用于在大于约300毫秒的时间段内将第二处理气体的入口流量从约0sccm至约10,000sccm调节以将等离子体施加的瞬态热通量负载保持在等离子体室的内表面低于等离子体室的汽化温度。

16. 发明授权

US09275839B2 Toroidal plasma chamber for high gas flow rate process 有权
标题翻译：环形等离子体室用于高气体流量过程
公开(公告)号：US09275839B2
公开(公告)日：2016-03-01
申请号：US12738314
申请日：2007-10-19
申请人： Xing Chen , Andrew Cowe
发明人： Xing Chen , Andrew Cowe
IPC分类号： H01J37/32
CPC分类号： H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
摘要翻译：一种用于激活处理气体的等离子体室，包括形成环形等离子体通道的至少四条腿，每条腿具有横截面积，以及形成在一条腿上的出口，该出口具有比截面积更大的横截面面积，其他腿的截面积。等离子体室还包括用于接收处理气体的入口和用于将处理气体引导到与出口相对的腿的宽阔区域上以减少局部高等离子体阻抗和气流不稳定性的集气室，其中与出口相对的腿限定多个的孔用于在等离子体通道中提供螺旋形气体旋转。

17. 发明申请

US20100206847A1 Toroidal plasma chamber for high gas flow rate process 有权
标题翻译：环形等离子体室用于高气体流量过程
公开(公告)号：US20100206847A1
公开(公告)日：2010-08-19
申请号：US12738314
申请日：2007-10-19
申请人： Xing Chen , Andrew Cowe
发明人： Xing Chen , Andrew Cowe
IPC分类号： C23F1/00 , C23F1/08 , C23C16/00 , C23C16/455
CPC分类号： H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
摘要翻译：一种用于激活处理气体的等离子体室，包括形成环形等离子体通道的至少四条腿，每条腿具有横截面积，以及形成在一条腿上的出口，该出口具有比截面积更大的横截面面积，其他腿的截面积。等离子体室还包括用于接收处理气体的入口和用于将处理气体引导到与出口相对的腿的宽阔区域上以减少局部高等离子体阻抗和气流不稳定性的集气室，其中与出口相对的腿限定多个的孔用于在等离子体通道中提供螺旋形气体旋转。

18. 发明申请

US20070145023A1 Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel 有权
标题翻译：具有介质真空容器的环形低场反应气体和等离子体源
公开(公告)号：US20070145023A1
公开(公告)日：2007-06-28
申请号：US11684916
申请日：2007-03-12
申请人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
发明人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
IPC分类号： B23K9/00
CPC分类号： H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
摘要翻译：描述了等离子体点火和冷却装置和等离子体系统的方法。装置可以包括容器和与容器相邻的至少一个点火电极。所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。气体在通道中被点燃，而流量的剩余部分被引导离开通道。

19. 发明申请

US20050145173A1 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel 有权
公开(公告)号：US20050145173A1
公开(公告)日：2005-07-07
申请号：US11058620
申请日：2005-02-15
申请人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
发明人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
IPC分类号： H01J37/32 , C23C16/00
CPC分类号： H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

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