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1. 发明申请

US20080302652A1 Particle Reduction Through Gas and Plasma Source Control 审中-公开
标题翻译：通过气体和等离子体源控制减少粒子
公开(公告)号：US20080302652A1
公开(公告)日：2008-12-11
申请号：US12132294
申请日：2008-06-03
申请人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
发明人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
IPC分类号： H05H1/24
CPC分类号： H01J37/3299 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.
摘要翻译：一种用于产生用于引入半导体处理室的激发气体的系统。该系统包括用于产生等离子体的等离子体源。等离子体源包括等离子体室和用于从气体源接收工艺气体的气体入口。气体流量控制器耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。该系统包括用于检测从第一处理气体到第二处理气体的转变的控制回路，并且用于在大于约300毫秒的时间段内将第二处理气体的入口流量从约0sccm至约10,000sccm调节以将等离子体施加的瞬态热通量负载保持在等离子体室的内表面低于等离子体室的汽化温度。

2. 发明申请

US20090320677A1 PARTICLE TRAP FOR A PLASMA SOURCE 失效
标题翻译：用于等离子体源的颗粒捕获
公开(公告)号：US20090320677A1
公开(公告)日：2009-12-31
申请号：US12147078
申请日：2008-06-26
申请人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
发明人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
IPC分类号： B01D53/22 , B01J19/08 , B01D46/46 , B01D45/08 , B01D50/00
CPC分类号： H01J37/32357 , H01J37/32871 , Y10S55/15 , Y10T29/4935
摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
摘要翻译：用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。冷却剂构件可以与气体通道热连通。

3. 发明授权

US07914603B2 Particle trap for a plasma source 失效
标题翻译：用于等离子体源的粒子阱
公开(公告)号：US07914603B2
公开(公告)日：2011-03-29
申请号：US12147078
申请日：2008-06-26
申请人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
发明人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
IPC分类号： B01D46/46
CPC分类号： H01J37/32357 , H01J37/32871 , Y10S55/15 , Y10T29/4935
摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
摘要翻译：用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。冷却剂构件可以与气体通道热连通。

4. 发明授权

US08692466B2 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator 有权
标题翻译：提供功率以在反应性气体发生器中点燃和维持等离子体的方法和装置
公开(公告)号：US08692466B2
公开(公告)日：2014-04-08
申请号：US12394904
申请日：2009-02-27
申请人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
发明人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
IPC分类号： H01J7/24
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译：描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。从点火电源向等离子体点火电路供电。测量等离子体点火电路的预点火信号。基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。经过一段时间后，调节可调节点火控制信号。

5. 发明申请

US20100219757A1 Method and Apparatus of Providing Power to Ignite and Sustain a Plasma in a Reactive Gas Generator 有权
标题翻译：提供功率以激发和维持反应性气体发生器中的等离子体的方法和装置
公开(公告)号：US20100219757A1
公开(公告)日：2010-09-02
申请号：US12394904
申请日：2009-02-27
申请人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
发明人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
IPC分类号： H05H1/24
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译：描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。从点火电源向等离子体点火电路供电。测量等离子体点火电路的预点火信号。基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。经过一段时间后，调节可调节点火控制信号。

6. 发明申请

US20110005922A1 Methods and Apparatus for Protecting Plasma Chamber Surfaces 审中-公开
标题翻译：用于保护等离子体腔体表面的方法和装置
公开(公告)号：US20110005922A1
公开(公告)日：2011-01-13
申请号：US12499453
申请日：2009-07-08
申请人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
发明人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
IPC分类号： C23C14/34
CPC分类号： C25D11/04 , C25D11/026 , C25D11/18 , C25D11/30 , H01J37/32477
摘要： A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas.
摘要翻译：一种用于在半导体处理系统中使用的用于在包括铝和镁的物体的表面上形成保护层的方法，其包括使用等离子体电解氧化工艺氧化物体的表面。该方法还包括通过激发包含卤素的气体产生含卤素的等离子体。该方法还包括将氧化的表面暴露于含卤素等离子体或激发气体。

7. 发明申请

US20140096908A1 DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS 审中-公开
标题翻译：分布式多区域等离子体源系统，方法和装置
公开(公告)号：US20140096908A1
公开(公告)日：2014-04-10
申请号：US13649103
申请日：2012-10-10
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01J37/32
CPC分类号： H01J37/32431 , H01J37/321 , H01J37/32669
摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
摘要翻译：处理室包括处理室顶部中的多个等离子体源。每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。还描述了等离子体处理系统。还描述了等离子体处理的方法。

8. 发明授权

US09155181B2 Distributed multi-zone plasma source systems, methods and apparatus 有权
标题翻译：分布式多区域等离子体源系统，方法和装置
公开(公告)号：US09155181B2
公开(公告)日：2015-10-06
申请号：US12852352
申请日：2010-08-06
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01L21/306 , C23C16/00 , H05H1/46 , H01J37/32
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H2001/4652 , H05H2001/4682
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
摘要翻译：等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。还描述了用于产生等离子体的系统和方法。

9. 发明授权

US08999104B2 Systems, methods and apparatus for separate plasma source control 有权
标题翻译：用于单独等离子体源控制的系统，方法和装置
公开(公告)号：US08999104B2
公开(公告)日：2015-04-07
申请号：US12852364
申请日：2010-08-06
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： C23F1/00 , H01J37/32
CPC分类号： H01J37/32449 , H01J37/32422 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334
摘要： A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
摘要翻译：等离子体源包括多个环等离子体室，多个初级绕组，多个铁氧体和一个控制系统。每个初级绕组缠绕在环形等离子体室的外部一个周围。多个环形等离子体室中的每一个穿过多个铁氧体的相应部分。控制系统耦合到每个环形等离子体室。还描述了用于产生和使用等离子体的系统和方法。

10. 发明授权

US10283325B2 Distributed multi-zone plasma source systems, methods and apparatus 有权
公开(公告)号：US10283325B2
公开(公告)日：2019-05-07
申请号：US13649103
申请日：2012-10-10
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01J37/32
摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

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