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    • 11. 发明授权
    • Simultaneous flooding and inspection for charge control in an electron beam inspection machine
    • 电子束检查机中充电控制的同时淹没和检查
    • US06627884B2
    • 2003-09-30
    • US09912732
    • 2001-07-23
    • Mark A. McCordDavid WalkerJun PeiNeil Richardson
    • Mark A. McCordDavid WalkerJun PeiNeil Richardson
    • G21K700
    • H01J37/28G01N23/225H01J2237/004H01J2237/2817
    • Disclosed are methods and apparatus for simultaneously flooding a sample (e.g., a semiconductor wafer) to control charge and inspecting the sample. The apparatus includes a charged particle beam generator arranged to generate a charged particle beam substantially towards a first portion of the sample and a flood gun for generating a second beam towards a second portion of the sample. The second beam is generated substantially simultaneously with the inspection beam. The apparatus further includes a detector arranged to detect charged particles originating from the sample portion. In a further implementation, the apparatus further includes an image generator for generating an image of the first portion of the sample from the detected particles. In one embodiment, the sample is a semiconductor wafer. In a method aspect, a first area of a sample is flooded with a flood beam to control charge on a surface of the sample. A second area of the sample is inspected with an inspection beam. The second area comprises at least a portion of the first area flooded by the flood beam. The inspection beam moves in tandem with the flood beam. In another aspect of the present invention, methods and apparatus are provided for controlling the charge buildup of an area of the sample by an electrode having a voltage applied to it and through which the flood beam and charged particles emitted from the area of the sample can pass.
    • 公开了用于同时淹没样品(例如,半导体晶片)以控制电荷并检查样品的方法和装置。 该装置包括带电粒子束发生器,其布置成基本上朝向样品的第一部分产生带电粒子束,以及用于产生朝向样品的第二部分的第二束的泛喷枪。 第二光束基本上与检查光束同时产生。 该装置还包括检测器,其被布置成检测源自样品部分的带电粒子。 在另一实施方式中,该装置还包括图像发生器,用于从检测到的粒子生成样品的第一部分的图像。 在一个实施例中,样品是半导体晶片。 在方法方面,样品的第一区域用泛光束淹没以控制样品表面上的电荷。 用检查梁检查样品的第二个区域。 第二区域包括由洪水束淹没的第一区域的至少一部分。 检查光束与泛光束一起移动。在本发明的另一方面,提供了一种方法和装置,用于通过具有施加到其上的电压的电极来控制样品区域的电荷积累,通过该方法和装置, 并且从样品的区域发射的带电粒子可以通过。
    • 15. 发明授权
    • Automated inspection using cell-cell subtraction perpendicular to stage motion direction
    • 使用垂直于舞台运动方向的细胞细胞减法进行自动检查
    • US08106355B1
    • 2012-01-31
    • US12163708
    • 2008-06-27
    • Jan LauberMark A. McCord
    • Jan LauberMark A. McCord
    • G21K7/00
    • H01J37/28H01J2237/20285H01J2237/221H01J2237/2817
    • One embodiment relates to an apparatus for automated inspection of a semiconductor substrate. Processor-executable code is configured to control the stage electronics to move the substrate using a continuous motion in a substrate-translation direction and is configured to control the beam to scan it across the surface of the substrate and collect corresponding image data, scan lines of the scan being along a scan-line direction perpendicular to the substrate-translation direction. Processor-executable code is also configured to select from the image data two cells of the repeating pattern on the surface of the substrate, the two cells being displaced from each other by one or multiple cell heights in the scan-line direction. Finally, processor-executable code is configured to generate a difference image by subtracting image data from said two cells on a pixel-by-pixel basis. Other embodiments, aspects and features are also disclosed.
    • 一个实施例涉及用于半导体衬底的自动检查的设备。 处理器可执行代码被配置为控制平台电子设备以使其在基板平移方向上使用连续运动来移动基板,并且被配置成控制该波束跨越基板的表面进行扫描,并收集相应的图像数据,扫描线 扫描沿着垂直于衬底平移方向的扫描线方向。 处理器可执行代码还被配置为从图像数据中选择基板表面上的重复图案的两个单元,两个单元在扫描线方向上彼此移位一个或多个单元格高度。 最后,处理器可执行代码被配置为通过以逐个像素为基础从所述两个单元中减去图像数据来生成差分图像。 还公开了其它实施例,方面和特征。