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11. 发明专利

JP2006100829A Lithography apparatus and device-manufacturing method 有权
标题翻译： LITHOGRAPHY装置和装置制造方法
公开(公告)号：JP2006100829A
公开(公告)日：2006-04-13
申请号：JP2005279999
申请日：2005-09-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOOGKAMP JAN FREDERIK , KUIT JAN JAAP , VISSER RAIMOND
IPC分类号： H01L21/027 , B65G49/07 , G03F7/20 , H01L21/677
CPC分类号： G03F7/70741 , H01L21/68707
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of arranging and removing objects, such as a quickly and effectively patterning device and substrate. SOLUTION: The lithography apparatus is provided with a lighting system that adjusts radiation beams, support that gives patterns to the cross-section of radiation beams and supports patterning devices to form patterning radiation beams, substrate table that holds a substrate, projection system that projects patterning radiation beams on the targeted part of the substrate, and robot that is configured to transmit replaceable objects, to and from a support region. The robot is provided with an arm and end-effecter equipped with first and second carriers that are configured to transmit each replaceable object. The end-effecter is connected with the arm of the robot so that it can be rotated about the axis of rotation that extends substantially in parallel with the support region. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够布置和移除诸如快速有效地构图装置和基板的物体的光刻设备。解决方案：光刻设备设置有调节辐射束的照明系统，支撑件，其形成辐射束横截面的图案并且支撑图案形成装置以形成图案化辐射束，保持衬底的衬底台，投影系统这些工程将衬底的目标部分上的辐射束图案化，以及被配置为向支撑区域传送可替换物体的机器人。机器人设置有臂和端部执行器，其配备有被配置为传送每个可替换对象的第一和第二托架。端部执行器与机器人的臂连接，使得其可以围绕基本上平行于支撑区域延伸的旋转轴线旋转。版权所有（C）2006，JPO＆NCIPI

12. 发明专利

JP2004343063A Lithographic projection assembly, handling apparatus for handling substrate, and method of handling substrate 有权
公开(公告)号：JP2004343063A
公开(公告)日：2004-12-02
申请号：JP2004066539
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN GROOS PIETER JOHANNES MARI , MARIA HENNUS PIETER RENAAT , HOOGKAMP JAN FREDERIK , HENDRIK KLOMP ALBERT JAN , ONVLEE JOHANNES , VISSER RAIMOND
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67225 , G03F7/70733 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F7/70875 , G03F7/70991 , H01L21/67201
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projection assembly comprising: a substrate handler provided with a handler chamber in which at least two load locks for transferring a substrate between a first environment and a second environment are provided, the second environment has a lower pressure than the first environment, and further the second environment is superior; and a lithographic projection apparatus comprising a projection chamber. SOLUTION: The handler chamber and the projection chamber connect with each other through, on one hand, a loading position so that the substrate enters from the handler chamber the projection chamber, and on the other hand, an unloading position for taking out the substrate from the projection chamber to the handler chamber. The handler chamber is provided with a pretreatment means for pretreating the substrate, and a transporting means having a constitution in which the substrate is transferred from the load lock to the pretreatment means, and transferred from the pretreatment means to the loading position, and further transferred from the unloading position to the load lock. COPYRIGHT: (C)2005,JPO&NCIPI

13. 发明专利

SG115631A1 LITHOGRAPHIC PROJECTION ASSEMBLY, LOAD LOCK AND METHOD FOR TRANSFERRING OBJECTS 未知
公开(公告)号：SG115631A1
公开(公告)日：2005-10-28
申请号：SG200401159
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VUGTS JOSEPHUS CORNELIUS JOHAN , LIVESEY ROBERT GORDON , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/677 , G03F7/20 , H01L21/027
摘要： A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.

14. 发明专利

SG125948A1 Supporting structure for use in a lithographic apparatus 未知
公开(公告)号：SG125948A1
公开(公告)日：2006-10-30
申请号：SG200401666
申请日：2004-03-26
申请人： ASML NETHERLANDS BV
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , ELP VAN JAN , HOOGKAMP JAN FREDERIK , MEER VAN ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPNAJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , BERG VAN DEN JOHANNES CHARLES , SANDE VAN DE HENRICUS JOHANNES , VERVOORT THIJS
IPC分类号： B08B1/00 , B25J13/08 , B25J15/00 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/68 , H01L21/683 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.

15. 发明专利

DE60024211T2 未知
公开(公告)号：DE60024211T2
公开(公告)日：2006-07-20
申请号：DE60024211
申请日：2000-12-19
申请人： ASML NETHERLANDS BV
发明人： KWAN YIM BUN PATRICK DR , VAN DE PASCH ENGELBERTUS ANTON , ARIENS ANDREAS BERNARDUS GERAR , MUNNIG SCHMIDT ROBERT-HAN , HOOGKAMP JAN FREDERIK , BUIS EDWIN JOHAN
IPC分类号： G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027
摘要： In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.

16. 发明专利

SG133619A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG133619A1
公开(公告)日：2007-07-30
申请号：SG2007049117
申请日：2005-06-20
申请人： ASML NETHERLANDS BV
发明人： KUIT JAN JAAP , BARTRAY PETRUS RUTGERUS , BIJVOET DIRK-JAN , HOOGKAMP JAN FREDERIK
IPC分类号： G03B27/42 , G03F7/20
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit (5) that performs a lithographic process involving exchangeable objects (1,1a,1b) in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot (10). The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

17. 发明专利

DE60024211D1 未知
公开(公告)号：DE60024211D1
公开(公告)日：2005-12-29
申请号：DE60024211
申请日：2000-12-19
申请人： ASML NETHERLANDS BV
发明人： KWAN DR , VAN DE PASCH ENGELBERTUS ANTON , ARIENS ANDREAS BERNARDUS GERAR , MUNNIG SCHMIDT ROBERT-HAN , HOOGKAMP JAN FREDERIK , BUIS EDWIN JOHAN
IPC分类号： G03F7/22 , G03F7/20 , G03F9/00 , H01L21/027
摘要： In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.

18. 发明专利

SG115632A1 LITHOGRAPHIC PROJECTION ASSEMBLY, HANDLING APPARATUS FOR HANDLING SUBSTRATES AND METHOD OF HANDLING A SUBSTRATE 未知
公开(公告)号：SG115632A1
公开(公告)日：2005-10-28
申请号：SG200401160
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： VAN GROOS PIETER JOHANNES MARI , HENNUS PIETER RENAAT MARIA , HOOGKAMP JAN FREDERIK , KLOMP ALBERT JAN HENDRIK , ONVLEE JOHANNES , VISSER RAIMOND
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027 , H01L21/677
摘要： The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.

19. 发明专利

SG115630A1 TEMPERATURE CONDITIONED LOAD LOCK, LITHOGRAPHIC APPARATUS COMPRISING SUCH A LOAD LOCK AND METHOD OF MANUFACTURING A SUBSTRATE WITH SUCH A LOAD LOCK 未知
公开(公告)号：SG115630A1
公开(公告)日：2005-10-28
申请号：SG200401152
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS JOHANNES LOU , KUIPERS LEO WILHELMUS MARIA , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： G03F7/20 , H01L21/68 , H01L21/027
摘要： A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.

20. 发明专利

SG115629A1 METHOD AND APPARATUS FOR MAINTAINING A MACHINE PART 未知
公开(公告)号：SG115629A1
公开(公告)日：2005-10-28
申请号：SG200401151
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： VAN GROOS PIETER JOHANNES MARI , HOOGKAMP JAN FREDERIK , KLOMP ALBERT JAN HENDRIK , LOOPSTRA ERIK ROELOF , VERMEULEN JOHANNES PETRUS MART , VUGTS JOSEPHUS CORNELIUS JOHAN , LIVESEY ROBERT GORDON , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/677 , G03F7/20 , H01L21/027 , H01L21/683
摘要： A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

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