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11. 发明公开

KR1020120068462A 포지티브 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 无效
标题翻译：使用它的光电子体的正电子成像组合物和图案方法
公开(公告)号：KR1020120068462A
公开(公告)日：2012-06-27
申请号：KR1020100130096
申请日：2010-12-17
申请人： 동우 화인켐 주식회사
发明人： 이은상 , 임민주 , 신혜라 , 김성현
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0223 , G03F7/0226 , G03F7/0395 , G03F7/0397 , H01L21/0274
摘要： PURPOSE: A positive photo-resist composition and a method for forming photo-resist patterns using the same are provided to prevent the reduction of yield due to coating stains and pattern exfoliation. CONSTITUTION: A positive photo-resist composition includes 10 to 25 weight% of an alkali soluble resin, 1 to 10 weight% of a photo-sensitive compound, 1 to 10 weight% of a cyclic terpene compound, and remaining amount of solvents based on the total weight of the composition. The cyclic terpene compound is limonene or terpinene. The alkali soluble resin is a novolac resin. The photo-sensitive compound is a diazide-based compound. The solvents is one or more selected from a group including 3-methoxylbuthyl acetate, methyl methoxy propionate, butyl acetate, ethyl lactate, gamma butyrolactone, propylene glycol monomethyl ether acetate.
摘要翻译：目的：提供正型光致抗蚀剂组合物和使用其形成光刻胶图案的方法，以防止由于涂层污渍和图案剥离而导致的收率降低。构成：正型光致抗蚀剂组合物包含10-25重量％的碱溶性树脂，1至10重量％的光敏化合物，1至10重量％的环萜烯化合物，以及基于组合物的总重量。环萜烯化合物是柠檬烯或萜品烯。碱溶性树脂是酚醛清漆树脂。光敏化合物是二叠氮基化合物。溶剂是选自乙酸3-甲氧基丁酸乙酯，甲氧基丙酸甲酯，乙酸丁酯，乳酸乙酯，γ-丁内酯，丙二醇单甲醚乙酸酯的一种或多种。

12. 发明公开

KR1020110051837A 포지티브 포토레지스트 조성물 无效
标题翻译：积极的光电组成
公开(公告)号：KR1020110051837A
公开(公告)日：2011-05-18
申请号：KR1020090108620
申请日：2009-11-11
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 장원영 , 윤종흠
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , G03F7/0048 , G03F7/022 , G03F7/0226 , G03F7/0236 , G03F7/075 , G03F7/0757 , G03F7/0758 , G03F7/425
摘要： PURPOSE: A positive type photo-resist composition is provided to improve the dispersibility of the composition on a large-sized substrate by preventing a pattern delamination phenomenon and a pattern collapse phenomenon in a developing process or an etching process. CONSTITUTION: A positive type photo-resist composition includes 10 to 30 weight% of an alkaline soluble resin, 1 to 15 weight% of a photosensitive compound, 0.01 to 0.1 weight% of a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, R1, R2, and R3 are respectively hydrogen or halogen element. R4 and R5 are respectively hydrogen or C1 to C4 alkoxy group. The alkaline soluble resin is novolak resin.
摘要翻译：目的：提供一种正型光致抗蚀剂组合物，以通过在显影过程或蚀刻工艺中防止图案分层现象和图案塌陷现象来改善组合物在大尺寸基材上的分散性。构成：正型光致抗蚀剂组合物包含10〜30重量％的碱溶性树脂，1〜15重量％的感光性化合物，0.01〜0.1重量％的化学式1表示的化合物和溶剂。在化学式1中，R1，R2和R3分别是氢或卤素元素。 R4和R5分别是氢或C1-C4烷氧基。碱溶性树脂是酚醛清漆树脂。

13. 发明授权

KR102157641B1 화학증폭형 감광성 수지 조성물 및 이로부터 제조된 절연막 有权
公开(公告)号：KR102157641B1
公开(公告)日：2020-09-18
申请号：KR1020150031581
申请日：2015-03-06
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 최석균 , 양돈식
IPC分类号： G03F7/038 , G03F7/039

14. 发明公开

KR1020170033022A 포지티브형 감광성 수지 조성물 및 이로부터 제조된 절연막 审中-实审
标题翻译：从正型感光性树脂组合物，并且其由绝缘膜
公开(公告)号：KR1020170033022A
公开(公告)日：2017-03-24
申请号：KR1020150130807
申请日：2015-09-16
申请人： 동우 화인켐 주식회사
发明人： 최석균 , 임민주 , 박한우
IPC分类号： G03F7/039 , G03F7/004 , H01B3/30
摘要： 본발명은감광성수지조성물에관한것으로, 보다상세하게는수산기의적어도일부가산분해성기로보호된제1 수지; 에폭시기를포함하는아크릴제2 수지; 및특정구조의반복단위를포함하는제3 수지;를포함하는바인더수지(A); 광산발생제(B); 및용매(C)를포함함으로써, 감도및 경시안정성이우수하고밀착성이뛰어난절연막을형성할수 있는포지티브형감광성수지조성물및 이로부터제조된절연막에관한것이다.
摘要翻译：本发明涉及一种光敏树脂组合物，更具体地说，涉及一种光敏树脂组合物，其包含由至少部分羟基的酸分解性基团保护的第一树脂; 含有环氧基的丙烯酸第二树脂; 并且包含具有特定结构的重复单元的第三树脂; 光酸产生剂（B）; 由此形成溶剂（C），从而形成灵敏度和经时稳定性优异且粘合性优异的绝缘膜及由其制成的绝缘膜。

15. 发明公开

KR1020160011032A 화학증폭형 감광성 수지 조성물 및 이를 이용한 황변 저감 방법 审中-实审
标题翻译：化学放大光敏抗蚀剂组合物及其使用方法减少黄色
公开(公告)号：KR1020160011032A
公开(公告)日：2016-01-29
申请号：KR1020140091989
申请日：2014-07-21
申请人： 동우 화인켐 주식회사
发明人： 최한영 , 임민주 , 박한우
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/031 , G03F7/033 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/11
摘要： 본발명은화학증폭형감광성수지조성물및 이를이용한황변저감방법에관한것으로서, 보다상세하게는화학식 1로표시되는반복단위를포함하는바인더수지, 광산발생제및 용매를포함함으로써황변현상을방지할수 있는화학증폭형감광성수지조성물및 이를이용한황변저감방법에관한것이다.
摘要翻译：本发明涉及一种化学放大型感光性树脂组合物及使用其的减少黄变的方法，更具体地说，涉及能够防止黄化现象的化学增幅感光性树脂组合物，其包含：含有重复单元的粘合剂树脂由化学式1表示; 光致酸发生器; 和溶剂。本发明还涉及使用该组合物减少黄化的方法。

16. 发明公开

KR1020150105121A 감광성 수지 조성물 审中-实审
标题翻译：感光性组合物
公开(公告)号：KR1020150105121A
公开(公告)日：2015-09-16
申请号：KR1020140027374
申请日：2014-03-07
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 박한우 , 이은상 , 최한영
IPC分类号： G03F7/004 , G03F7/11 , G02F1/13
CPC分类号： G03F7/0045 , G03F7/004 , G03F7/0233 , G03F7/027 , G03F7/033 , G03F7/0392 , G03F7/0758
摘要： The present invention relates to a photosensitive resin composition and, more specifically, to a photosensitive resin composition including: a binder resin; a photoacid generator; a sensitizer; a thermal base generator represented by chemical formula 1 or 2; and a solvent, so the photosensitive resin composition is capable of obtaining fast sensitivity and markedly improved transmittance as well as obtaining an insulating film with a pattern adhesion property and excellent uniformity.
摘要翻译：本发明涉及感光性树脂组合物，更具体地说，涉及包含粘合剂树脂的感光性树脂组合物，光致酸发生器; 敏化剂由化学式1或2表示的热碱发生器; 和溶剂，因此感光性树脂组合物能够获得快速的敏感性和显着改善的透射率，以及获得具有图案粘附性和优异的均匀性的绝缘膜。

17. 发明公开

KR1020140087814A 감광성 수지 조성물 및 이로부터 제조되는 절연막 审中-实审
标题翻译：感光树脂组合物及其制备的绝缘层
公开(公告)号：KR1020140087814A
公开(公告)日：2014-07-09
申请号：KR1020120158494
申请日：2012-12-31
申请人： 동우 화인켐 주식회사
发明人： 박한우 , 임민주 , 성시진
IPC分类号： G03F7/028 , G03F7/11 , G02F1/13
CPC分类号： Y02P20/582
摘要： The present invention relates to a photosensitive resin composition and an insulation film manufactured from the same and, more specifically, to a photosensitive resin composition which comprises a non-sulfonamide-based photoacid generator and a sensitizer, to have a fast sensitivity and a high transmittance; and to an insulation film manufactured by the same.
摘要翻译：本发明涉及一种感光性树脂组合物和由其制造的绝缘膜，更具体地说，涉及一种包含非磺酰胺类光酸产生剂和敏化剂的感光性树脂组合物，其具有快速灵敏度和高透射率 ; 以及由其制造的绝缘膜。

18. 发明公开

KR1020130063715A 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서 无效
标题翻译：用于制造间隔物和间隔物的感光性树脂组合物
公开(公告)号：KR1020130063715A
公开(公告)日：2013-06-17
申请号：KR1020110130231
申请日：2011-12-07
申请人： 동우 화인켐 주식회사
发明人： 최화섭 , 임민주 , 정보람
IPC分类号： G03F7/004 , G03F7/027 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/004 , G03F7/0047 , G03F7/20 , G03F7/2002
摘要： PURPOSE: A photosensitive resin composition for forming a spacer and a spacer manufactured by the same are provided to improve solvent resistance properties and heat resistance properties. CONSTITUTION: A photosensitive resin composition for forming a spacer includes an oxime ester-based photo-initiator which is represented by chemical formula 1. The composition further includes one or more photo-initiators selected from a group including a triazine-based compound, an acetophenone-based compound, a biimidazol-based compound, an oxime-based compound, a benzoin-based compound, a benzophenone-based compound, a thioxanthone-based compound, and an anthracene-based compound. The composition further includes an alkali soluble resin, a photo-curable monomer, and a solvent. The spacer is made of the composition.
摘要翻译：目的：提供用于形成间隔物的感光性树脂组合物和由其制造的间隔物，以提高耐溶剂性和耐热性。构成：用于形成间隔物的感光性树脂组合物包括由化学式1表示的肟酯类光引发剂。该组合物还包含一种或多种选自三嗪类化合物，苯乙酮类的光引发剂基于二咪唑的化合物，基于二咪唑的化合物，肟基化合物，苯偶姻系化合物，二苯甲酮系化合物，噻吨酮系化合物和蒽类化合物。该组合物还包含碱溶性树脂，光固化性单体和溶剂。间隔物由组合物制成。

19. 发明公开

KR1020110121301A 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 박막 트랜지스터 기판의 제조 방법 无效
标题翻译：光刻胶组合物，形成图案的方法和使用其制造薄膜晶体管基板的方法
公开(公告)号：KR1020110121301A
公开(公告)日：2011-11-07
申请号：KR1020100040837
申请日：2010-04-30
申请人： 삼성디스플레이 주식회사 , 동우 화인켐 주식회사
发明人： 홍필순 , 박귀현 , 주진호 , 송진호 , 김상태 , 김성현 , 장원영 , 윤종흠 , 이은상 , 임민주
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/0236 , G03F7/085 , G03F7/40 , H01L21/32139 , H01L27/1214 , H01L21/0274
摘要： PURPOSE: A photo-resist composition, a method for forming patterns using the same, and a method for manufacturing a thin film transistor substrate using the same are provided to prevent the delamination of photo-resist patterns after an etching process. CONSTITUTION: A photo-resist composition includes an alkali soluble resin, a photo-sensitive compound, a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, the R is hydrogen C1-C1 alkyl group, C4-C8 cycloalkyl group, or benzene group. A method for forming patterns using the composition includes the following: A photo-resist film is formed on a film to be etched by applying the composition. The photo-resist film is exposed by the irradiation of light. The photo-resist film is developed to form photo-resist patterns. The photo-resist pattern is used as an etching mask to etch the film to be etched.
摘要翻译：目的：提供光致抗蚀剂组合物，使用其形成图案的方法以及使用其制造薄膜晶体管基板的方法，以防止在蚀刻工艺之后的光致抗蚀剂图案的分层。构成：光致抗蚀剂组合物包括碱溶性树脂，光敏化合物，化学式1表示的化合物和溶剂。在化学式1中，R是氢C1-C1烷基，C4-C8环烷基或苯基。使用该组合物形成图案的方法包括以下：通过施加该组合物在待蚀刻的膜上形成光致抗蚀剂膜。通过照射光使光致抗蚀剂膜曝光。显影光致抗蚀剂膜以形成光刻胶图案。光刻胶图案用作蚀刻掩模以蚀刻待蚀刻的膜。

20. 发明授权

KR102122075B1 감광성 수지 조성물 및 이를 이용하여 제조된 유기막을 포함하는 표시장치 有权
公开(公告)号：KR102122075B1
公开(公告)日：2020-06-12
申请号：KR1020140111494
申请日：2014-08-26
申请人： 삼성디스플레이 주식회사 , 동우 화인켐 주식회사
发明人： 강훈 , 박철원 , 정양호 , 김재성 , 주진호 , 김종백 , 박한우 , 백기범 , 양돈식 , 임민주
IPC分类号： G03F7/033 , C07D498/04 , G03F7/004 , G03F7/023 , C08F2/50 , C08L79/08 , C07D409/12 , G03F7/027

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