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1. 发明公开

KR1020110121301A 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 박막 트랜지스터 기판의 제조 방법 无效
标题翻译：光刻胶组合物，形成图案的方法和使用其制造薄膜晶体管基板的方法
公开(公告)号：KR1020110121301A
公开(公告)日：2011-11-07
申请号：KR1020100040837
申请日：2010-04-30
申请人： 삼성디스플레이 주식회사 , 동우 화인켐 주식회사
发明人： 홍필순 , 박귀현 , 주진호 , 송진호 , 김상태 , 김성현 , 장원영 , 윤종흠 , 이은상 , 임민주
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/0236 , G03F7/085 , G03F7/40 , H01L21/32139 , H01L27/1214 , H01L21/0274
摘要： PURPOSE: A photo-resist composition, a method for forming patterns using the same, and a method for manufacturing a thin film transistor substrate using the same are provided to prevent the delamination of photo-resist patterns after an etching process. CONSTITUTION: A photo-resist composition includes an alkali soluble resin, a photo-sensitive compound, a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, the R is hydrogen C1-C1 alkyl group, C4-C8 cycloalkyl group, or benzene group. A method for forming patterns using the composition includes the following: A photo-resist film is formed on a film to be etched by applying the composition. The photo-resist film is exposed by the irradiation of light. The photo-resist film is developed to form photo-resist patterns. The photo-resist pattern is used as an etching mask to etch the film to be etched.
摘要翻译：目的：提供光致抗蚀剂组合物，使用其形成图案的方法以及使用其制造薄膜晶体管基板的方法，以防止在蚀刻工艺之后的光致抗蚀剂图案的分层。构成：光致抗蚀剂组合物包括碱溶性树脂，光敏化合物，化学式1表示的化合物和溶剂。在化学式1中，R是氢C1-C1烷基，C4-C8环烷基或苯基。使用该组合物形成图案的方法包括以下：通过施加该组合物在待蚀刻的膜上形成光致抗蚀剂膜。通过照射光使光致抗蚀剂膜曝光。显影光致抗蚀剂膜以形成光刻胶图案。光刻胶图案用作蚀刻掩模以蚀刻待蚀刻的膜。

2. 发明公开

KR1020110051837A 포지티브 포토레지스트 조성물 无效
标题翻译：积极的光电组成
公开(公告)号：KR1020110051837A
公开(公告)日：2011-05-18
申请号：KR1020090108620
申请日：2009-11-11
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 장원영 , 윤종흠
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , G03F7/0048 , G03F7/022 , G03F7/0226 , G03F7/0236 , G03F7/075 , G03F7/0757 , G03F7/0758 , G03F7/425
摘要： PURPOSE: A positive type photo-resist composition is provided to improve the dispersibility of the composition on a large-sized substrate by preventing a pattern delamination phenomenon and a pattern collapse phenomenon in a developing process or an etching process. CONSTITUTION: A positive type photo-resist composition includes 10 to 30 weight% of an alkaline soluble resin, 1 to 15 weight% of a photosensitive compound, 0.01 to 0.1 weight% of a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, R1, R2, and R3 are respectively hydrogen or halogen element. R4 and R5 are respectively hydrogen or C1 to C4 alkoxy group. The alkaline soluble resin is novolak resin.
摘要翻译：目的：提供一种正型光致抗蚀剂组合物，以通过在显影过程或蚀刻工艺中防止图案分层现象和图案塌陷现象来改善组合物在大尺寸基材上的分散性。构成：正型光致抗蚀剂组合物包含10〜30重量％的碱溶性树脂，1〜15重量％的感光性化合物，0.01〜0.1重量％的化学式1表示的化合物和溶剂。在化学式1中，R1，R2和R3分别是氢或卤素元素。 R4和R5分别是氢或C1-C4烷氧基。碱溶性树脂是酚醛清漆树脂。

3. 发明公开

KR1020110046757A 포지티브 고감도 포토레지스트 조성물 无效
标题翻译：具有高灵敏度的正极光电组合物
公开(公告)号：KR1020110046757A
公开(公告)日：2011-05-06
申请号：KR1020090103400
申请日：2009-10-29
申请人： 동우 화인켐 주식회사
发明人： 윤종흠 , 유인호 , 김성현
IPC分类号： G03F7/039
CPC分类号： G03F7/0392 , C07D405/14 , C07D409/12 , C07D471/08 , C07D498/04 , G03F7/023 , G03F7/039 , G03F7/0397
摘要： PURPOSE: A positive photo-resist composition is provided to overcome reflow related problems and increase the sensitivity of the photo-resist in case of a 4 mask process. CONSTITUTION: A positive photo-resist composition includes an alkaline soluble resin, a dissolution inhibitor, an additive, and a solvent. The additive includes a compound represented by chemical formula 1. In the chemical formula 1, R1, R2, and R3 are respectively hydrogen, halogen, substituted or non-substituted C1 to C18 linear, branched, or cyclic alkyl group, substituted or non-substituted C1 to C18 linear, branched, or cyclic alkoxy group, carboxylic group, C1 to C18 alkoxy carbonyl group, mercapto group, cyano group, hydroxyl group, nitro group, substituted or non-substituted phenyl group, and substituted or non-substituted benzyl group.
摘要翻译：目的：提供正光致抗蚀剂组合物以克服回流相关问题，并且在4掩模处理的情况下增加光致抗蚀剂的灵敏度。构成：正型光致抗蚀剂组合物包括碱溶性树脂，溶解抑制剂，添加剂和溶剂。在化学式1中，R1，R2和R3分别为氢，卤素，取代或未取代的C1至C18直链，支链或环状烷基，取代或未取代的，取代的C1至C18直链，支链或环状烷氧基，羧基，C1至C18烷氧基羰基，巯基，氰基，羟基，硝基，取代或未取代的苯基，以及取代或未取代的苄基组。

4. 发明公开

KR1020110040085A 포지티브 포토레지스트 조성물 无效
标题翻译：积极的光电组成
公开(公告)号：KR1020110040085A
公开(公告)日：2011-04-20
申请号：KR1020090097219
申请日：2009-10-13
申请人： 동우 화인켐 주식회사
发明人： 장원영 , 윤종흠 , 진성열 , 성시진
IPC分类号： G03F7/039
CPC分类号： G03F7/0392 , G03F7/022 , G03F7/0226 , G03F7/023 , G03F7/0233 , G03F7/0236 , G03F7/039 , G03F7/0397
摘要： PURPOSE: A positive photo-resist composition is provided to obtain the superior pattern profiles by preventing the generation of cracks while a wet type etching process is implemented. CONSTITUTION: A positive photo-resist composition includes a novolak resin, a photosensitive compound, and ester-based polyol, and a solvent. The ester-based polyol is represented by chemical formula 1. In the chemical formula 1, R1 and R2 are respectively selected from a group including phenyl group, benzyl group, C1 to C10 of linear or branched alkyl group, and C1 to C10 of linear or branched hydroxyalkyl group. The R1 and/or the R2 includes hydroxyl group. n is the integer of 1 to 20.
摘要翻译：目的：提供正光致抗蚀剂组合物以通过在实施湿式蚀刻工艺时防止产生裂缝来获得优异的图案轮廓。构成：正型光致抗蚀剂组合物包括酚醛清漆树脂，光敏化合物和酯基多元醇以及溶剂。酯基多元醇由化学式1表示。在化学式1中，R 1和R 2分别选自直链或支链烷基的苯基，苄基，C1〜C10，以及直链或支链烷基的C1〜C10 或支链羟烷基。 R1和/或R2包括羟基。 n为1〜20的整数。

5. 发明公开

KR1020090085852A 투명 보호막 형성용 광경화성 수지 조성물 无效
标题翻译：用于形成透明超薄层的光固化树脂组合物
公开(公告)号：KR1020090085852A
公开(公告)日：2009-08-10
申请号：KR1020080011731
申请日：2008-02-05
申请人： 동우 화인켐 주식회사
发明人： 윤종흠 , 문성배
IPC分类号： G03F7/028 , G03F7/004
CPC分类号： G03F7/028 , G03F7/004 , G03F7/0045 , G03F7/0047
摘要： A photo-curable resin composition is provided to ensure excellent transparency, heat resistance, chemical resistance, adhesion, surface hardness, high planarization performance and resolution. A photo-curable resin composition comprises [A] (a) a monomer having an acryl group, a monomer having C3~C12 aliphatic cyclic group, and a copolymer having a carboxyl group at a main chain, and (b) a monomer having a carboxyl group, a monomer having substituted or unsubstituted maleimide group, and a monomer having an oxetane group at a main chain; [B] a component including at least one monomer having a resorcin type oxetan monomer and at least one monomer having at least two acryl functional groups; [C] a radical generating photopolymerization initiator; and [D] solvent.
摘要翻译：提供光固化树脂组合物以确保优异的透明性，耐热性，耐化学性，粘附性，表面硬度，高平坦化性能和分辨率。光固化树脂组合物包含[A]（a）具有丙烯酰基的单体，具有C 3〜C 12脂肪族环状基团的单体和在主链具有羧基的共聚物，和（b）具有羧基，具有取代或未取代的马来酰亚胺基的单体和在主链具有氧杂环丁烷基的单体; [B]包含至少一种具有间苯二酚型氧杂an族单体的单体和至少一种具有至少两个丙烯酰基官能团的单体的组分; [C]自由基产生光聚合引发剂; 和[D]溶剂。

6. 发明公开

KR1020080033766A 투명 보호막 형성용 경화성 수지 조성물 有权
标题翻译：用于形成透明保护层的固化LESIN组合物
公开(公告)号：KR1020080033766A
公开(公告)日：2008-04-17
申请号：KR1020060099906
申请日：2006-10-13
申请人： 동우 화인켐 주식회사
发明人： 문성배 , 이경호 , 윤종흠
IPC分类号： C08L25/08 , C08G61/02
摘要： A curable resin composition for forming a transparent protective layer is provided to ensure high planarization performance capable of hiding unevenness formed on the surface of a color filter or black matrix, and obtain good film hardness even in a severe etching process. A curable resin composition for forming a transparent protective layer includes [A] 100 parts by weight of a curable resin having a molecular weight of 800-20,000, which is obtained by addition-polymerizing monomers comprising (a) a monomer having an anhydride structure on a main chain and (b) a styrenic monomer, [B] 5-70 parts by weight of at least one monomer or resin having an epoxy group and at least one monomer or resin having an oxetane group as a hardener capable of reacting with an anhydride, [C] 5-70 parts by weight of at least one monomer having a carboxylic acid anhydride group, [D] 5-70 parts by weight of at least one monomer having an acrylic group, and [E] 0.1-10 parts by weight of a monofunctional amine as a reaction initiator.
摘要翻译：提供一种用于形成透明保护层的固化树脂组合物，以确保能够掩盖形成在滤色器或黑色矩阵的表面上的不均匀性的高平坦化性能，并且即使在严重的蚀刻工艺中也能获得良好的膜硬度。用于形成透明保护层的固化性树脂组合物包括[A] 100重量份的分子量为800〜20,000的固化性树脂，其通过将单体加成聚合得到，所述单体包含（a）具有酸酐结构的单体主链和（b）苯乙烯类单体，[B] 5-70重量份的至少一种具有环氧基的单体或树脂和至少一种具有氧杂环丁烷基的单体或树脂作为能够与酸酐，[C] 5-70重量份的至少一种具有羧酸酐基团的单体，[D] 5-70重量份至少一种具有丙烯酸基团的单体，和[E] 0.1-10份的单官能胺作为反应引发剂。

7. 发明授权

KR101350050B1 투명 보호막 형성용 경화성 수지 조성물 有权
标题翻译：用于形成透明保护层的固化LESIN组合物
公开(公告)号：KR101350050B1
公开(公告)日：2014-01-14
申请号：KR1020060099906
申请日：2006-10-13
申请人： 동우 화인켐 주식회사
发明人： 문성배 , 이경호 , 윤종흠
IPC分类号： C08L25/08 , C08G61/02
摘要： 본 발명은,
[A] (a)주쇄에 무수물 구조를 갖게하는 단량체 및 (b)스티렌계 단량체를 포함하는 단량체들을 부가중합시켜서 수득되는 800~20,000의 분자량을 갖는 경화성 수지 100중량에 대하여;
[B] 무수물과 반응할 수 있는 경화제로서 에폭시 관능기를 갖는 1종 이상의 단량체 또는 수지, 및 옥세탄 관능기를 갖는 1종 이상의 단량체 또는 수지 5~70중량부;
[C] 카르복실산 무수물기를 갖는 1종 이상의 단량체 5~70 중량부;
[D] 아크릴기를 갖는 1종 이상의 단량체 5~70 중량부
[E] 반응개시제로서 1가 아민 0.1 내지 10 중량부를 포함하는 투명 보호막 형성용 경화성 수지 조성물에 관한 것이다.
경화성 수지, 투명 보호막, 칼라필터, 디스플레이

8. 发明公开

KR1020120068461A 포지티브 포토레지스트 조성물 无效
标题翻译：积极的光电组成
公开(公告)号：KR1020120068461A
公开(公告)日：2012-06-27
申请号：KR1020100130095
申请日：2010-12-17
申请人： 동우 화인켐 주식회사
发明人： 윤종흠 , 김성현 , 성시진 , 송인각
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/004 , G03F7/0045 , G03F7/022 , G03F7/039
摘要： PURPOSE: A positive photo-resist composition is provided to improve sensitivity and to reduce failure rate by stably securing thermal distribution. CONSTITUTION: A positive photo-resist composition includes a first alkali soluble resin represented by chemical formula 1, a second alkali soluble resin, a dissolution inhibitor, and a solvent. The polystyrene-reduced weight average molecular weight of the first alkali soluble resin is between 1,000 and 5,000. In chemical formula 1, R9 to R14 are respectively hydrogen atoms, C1 to C6 linear or branched alkyl groups, C1 to C6 linear or branched alkoxy groups, or C3 to C6 cycloalkyl groups; R16 to R18 are respectively selected from a group including hydrogen atoms, C1 to C6 linear or branched alkyl groups, and C6 to C18 aryl groups; N is 10 to 200.
摘要翻译：目的：提供正光致抗蚀剂组合物，以通过稳定地确保热分布来提高灵敏度和降低故障率。构成：正型光致抗蚀剂组合物包括由化学式1表示的第一碱溶性树脂，第二碱溶性树脂，溶解抑制剂和溶剂。第一碱溶性树脂的聚苯乙烯换算的重均分子量为1,000-5,000。在化学式1中，R 9至R 14分别为氢原子，C 1至C 6直链或支链烷基，C 1至C 6直链或支链烷氧基或C 3至C 6环烷基; R16〜R18分别选自氢原子，C1〜C6直链或支链烷基和C6〜C18芳基; N为10〜200。

9. 发明公开

KR1020120007341A 구리계 금속막용 포지티브형 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 无效
标题翻译：用于基于铜箔的金属膜组合物的正电子照相机和使用其的光电子发送器的方法
公开(公告)号：KR1020120007341A
公开(公告)日：2012-01-20
申请号：KR1020100068056
申请日：2010-07-14
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 장원영 , 윤종흠
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0044 , G03F7/0223 , H01L21/0273 , H01L21/0274
摘要： PURPOSE: A positive photo-resist composition for a copper-based metal film and a method for forming a photo-resist pattern using the same are provided to prevent the collapse and the delamination of patterns in a developing process or an etching process. CONSTITUTION: A positive photo-resist composition includes 10-25 weight% of an alkali-soluble resin, 1-10 weight% of a photo-sensitive compound, 0.01-0.1 weight% of a compound represented by chemical formula 1, and remaining amount of a solvent based on the total weight of the composition. In the chemical formula 1, the R1 is hydrogen or hydroxyl group. The R2 and the R3 are respectively hydrogen, C1 to C5 alkyl group, or C6 to C15 aryl group. The alkali-soluble resin is a novolak resin.
摘要翻译：目的：提供一种用于铜基金属膜的正型光致抗蚀剂组合物和使用其的形成光致抗蚀剂图案的方法，以防止在显影过程或蚀刻工艺中图案的塌陷和分层。构成：正光致抗蚀剂组合物包含10-25重量％的碱溶性树脂，1-10重量％的光敏化合物，0.01-0.1重量％的化学式1表示的化合物和剩余量基于组合物的总重量的溶剂。在化学式1中，R1是氢或羟基。 R2和R3分别为氢，C1至C5烷基或C6至C15芳基。碱溶性树脂是酚醛清漆树脂。

10. 发明授权

KR101292385B1 경화성 수지 조성물 失效
标题翻译：固化树脂组合物
公开(公告)号：KR101292385B1
公开(公告)日：2013-08-01
申请号：KR1020060084412
申请日：2006-09-01
申请人： 동우 화인켐 주식회사
发明人： 이경호 , 문성배 , 윤종흠
IPC分类号： C08L25/08 , C08J5/22 , C08L25/06
摘要： 본 발명은 기존의 에폭시기를 함유한 불포화 화합물, 올레핀계 불포화 화합물, 불포화 카르복실산 무수물 등을 포함하고 라디칼 개시제를 이용한 경화 시스템을 채택하는 것 대신에 주쇄에 무수물을 도입하여 내열성, 내알칼리성 및 내산성을 개선하고 가교제로서 에폭시기 또는 옥세탄기를 도입하여 내열성, 내알칼리성 및 내산성 등의 내화학성을 개선하고 극한 에칭 조건에서도 우수한 도막 경도를 얻을 수 있는 디스플레이 칼라필터 보호막용 경화성 수지 조성물 제공한다
경화성수지, 디스플레이 칼라필터, 경화성

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