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11. 发明申请

WO2006003867A3 MICROSCOPE OBSERVATION METHOD, MICROSCOPE, DIFFERENTIATION INTERFERENCE MICROSCOPE, PHASE DIFFERENCE MICROSCOPE, INTERFERENCE MICROSCOPE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING DEVICE 审中-公开
标题翻译：显微镜观察法，显微镜，分化干涉显微镜，相差显微镜，干涉显微镜，图像处理方法和图像处理装置
公开(公告)号：WO2006003867A3
公开(公告)日：2006-02-16
申请号：PCT/JP2005011772
申请日：2005-06-27
申请人： NIPPON KOGAKU KK , OOKI HIROSHI
发明人： OOKI HIROSHI
IPC分类号： G01N21/27 , G01N21/17 , G01N21/35 , G06T3/00
CPC分类号： G02B21/365 , G02B27/58
摘要： It is possible to obtain a special image such as a super-resolution image without specializing the configuration of a microscope. A microscope observation method includes: a measurement step for changing the illumination angle of an object (1) and measuring the complex amplitude distribution of each light wave generated separately on the image formation plane (15) by each light flux emitted from the object (1) at the respective illumination angle values; a calculation step for calculating the complex amplitude distribution of the virtual light wave generated on the image formation plane when the image formation optical system (14) is replaced by a virtual image formation optical system (L') having a greater numerical aperture according to the data on the complex amplitude distribution of each light wave; and an image creation step for creating image data on the virtual image formed on the image formation plane by the virtual image formation optical system (L') according to the complex amplitude distribution of the virtual light wave.
摘要翻译：没有专门的显微镜配置，可以获得特殊图像，如超分辨率图像。显微镜观察方法包括：测量步骤，用于改变物体（1）的照射角度并测量由从物体（1）发射的每个光束在图像形成平面（15）上分开产生的每个光波的复振幅分布）在相应的照明角度值处; 计算步骤，用于当图像形成光学系统（14）被具有更大数值孔径的虚拟图像形成光学系统（L'）代替时，计算在图像形成平面上产生的虚拟光波的复振幅分布，关于每个光波的复振幅分布的数据; 以及图像创建步骤，用于根据虚拟光波的复振幅分布在虚拟图像形成光学系统（L'）上在图像形成平面上形成的虚拟图像上创建图像数据。

12. 发明申请

WO2004093159A2 IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM 审中-公开
标题翻译：静态液相流体控制系统
公开(公告)号：WO2004093159A2
公开(公告)日：2004-10-28
申请号：PCT/US2004009911
申请日：2004-03-29
申请人： NIPPON KOGAKU KK , COON DEREK , HAZELTON ANDREW J
发明人： COON DEREK , HAZELTON ANDREW J
IPC分类号： G03F7/20 , H01L
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： A fluid control system for immersion lithography is formed with an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.
摘要翻译：用于浸没光刻的流体控制系统由诸如透镜的光学构件，诸如半导体晶片的工件形成，其中具有与光学构件相对的表面设置在其间的间隙，用于提供浸没流体的流体供应装置例如水到间隙中的指定曝光区域;以及流体控制装置，其至少在进行浸没光刻操作时，激活流体上的力，使得浸没流体保持在曝光区域及其附近。可能导致加压气体对流体施加流体动力以将其保持在其位置。

13. 发明申请

WO0221583A9 ALIGNER AND METHOD OF MANUFACTURING A DEVICE 审中-公开
标题翻译：对准器和制造器件的方法
公开(公告)号：WO0221583A9
公开(公告)日：2003-01-23
申请号：PCT/JP0107740
申请日：2001-09-06
申请人： NIPPON KOGAKU KK , NAKAHARA KANEFUMI
发明人： NAKAHARA KANEFUMI
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F1/66 , G03F7/70741 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： An aligner, wherein a buffer (116) allowing a plurality sheets of masks to stock therein and allowed to be loaded and unloaded is disposed in a mask carrying route ranging from the carrying in/out ports (22A, 22B) of an SMIF pod (28) to a mask stage (RST), and a mask carrying system (32) transfers the masks between the carrying in/out ports (22A, 22B), buffer (116), and mask stage (RST), whereby, because the carrying system (32) carries in order the masks carried into a device in the state of being stored in the SMIF pod (28), the masks can be maximally stored therein to allow sufficient sheets of masks necessary for exposure to be always held in the device and, because the carrying system transfers the masks between the carrying in/out ports, buffer, and mask stage, the mask container replacement operation by an operator's manual operation can be eliminated.
摘要翻译：对准器，其中允许多张掩模在其中储存并被允许装载和卸载的缓冲器（116）设置在从SMIF盒的输入/输出端口（22A，22B） 28）传送到掩模级（RST），并且掩模传送系统（32）在输入/输出端口（22A，22B），缓冲器（116）和掩模级（RST）之间传送掩模，由此携带系统（32）将掩模携带在被存储在SMIF盒（28）中的状态下的设备中，可以将掩模最大程度地存储在其中，以使曝光所需的足够的面罩始终保持在并且由于承载系统在进/出端口，缓冲器和掩模级之间传送掩模，所以可以消除操作人员手动操作的掩模容器更换操作。

14. 发明申请

WO0003301A2 EXPOSURE DEVICE HAVING A PLANAR MOTOR 审中-公开
标题翻译：具有平面电机的曝光装置
公开(公告)号：WO0003301A2
公开(公告)日：2000-01-20
申请号：PCT/US9915278
申请日：1999-07-07
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
发明人： HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
IPC分类号： H01J37/20 , G03F7/20 , H01L21/027 , H01L21/68 , H02K41/02 , H02K41/03 , G03F
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70858 , H02K41/031 , H02K2201/18
摘要： Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.
摘要翻译：公开了能够有效地抑制对环境的热影响的平面电动机装置。当向与可移动部件（51）的磁体相对的电枢线圈（38）供给电流时，通过电磁力沿着移动面（21a）驱动可动部件51。当可动构件（51）沿一定的方向继续被驱动时，向可动构件（51）的每个移动位置的电磁线圈（38）供给与磁体相对的电枢线圈（38），由此电枢线圈）提供电流产生热量。电枢线圈（38）被容纳在基座（21）中的真空室（41）中，并且被布置成与定子轭（43）接触，在它们之间形成预定的间隙，并且陶瓷形成真空室（41）的板（36）。因此，从电枢线圈（38）到移动面（21a）侧的热传递基本上仅通过放射线实现，从而可以有效地抑制对环境的热影响。

15. 发明申请

WO2013100203A3 APPARATUS FOR LOADING A FLEXIBLE SUBSTRATE AND A LITHOGRAPHY APPARATUS 审中-公开
标题翻译：用于装载柔性基板和平面设备的装置
公开(公告)号：WO2013100203A3
公开(公告)日：2014-04-17
申请号：PCT/JP2012084311
申请日：2012-12-28
申请人： NIPPON KOGAKU KK
发明人： SHIBAZAKI YUICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70133 , G03F7/707 , G03F7/7075
摘要： A carrier system is equipped with a fine movement stage (WFS) which holds a wafer (W) that is mounted and can move along a predetermined plane, a chuck main section (130) which holds the wafer from above in a non-contact manner and can move vertically, and vertical movement pins (140) which can support the wafer held by the chuck main section on the fine movement stage from below and are vertically movable. And, a controller drives the chuck main section and the vertical movement pins downward until a lower surface of the wafer comes into contact with the fine movement stage while maintaining a hold state by the chuck main section to the wafer and a support state by the vertical movement pins to the wafer, and releases the hold state and the support state.
摘要翻译：载体系统配备有保持安装并可沿着预定平面移动的晶片（W）的精细移动台（WFS），以非接触方式从上方保持晶片的卡盘主体部分（130）并且能够垂直移动的垂直移动销（140），其可以从下方支撑由微动载置台上的卡盘主体部分保持的晶片，并且可垂直移动。并且，控制器将卡盘主体部分和垂直移动销向下驱动，直到晶片的下表面与微动载台接触，同时保持夹头主体对晶片的保持状态，并且通过垂直方向保持支撑状态移动销到晶片，并释放保持状态和支撑状态。

16. 发明申请

WO2013093633A3 ENHANCEMENTS TO INTEGRATED OPTICAL ASSEMBLY 审中-公开
标题翻译：增强集成光学组件
公开(公告)号：WO2013093633A3
公开(公告)日：2013-11-07
申请号：PCT/IB2012003023
申请日：2012-12-23
申请人： NIPPON KOGAKU KK
发明人： SMITH DANIEL GENE
IPC分类号： G02B26/10 , G02B26/12
CPC分类号： G01B11/24 , G01S7/481 , G01S7/4972 , G02B5/122 , G02B26/10
摘要： An integrated optical assembly is provided, with enhancements that are particularly useful when the integrated optical assembly forms part of a laser radar system. The integrated optical assembly produces a reference beam that is related to the optical characteristics of a scanning reflector, or to changes in position or orientation of the scanning reflector relative to a source. Thus, if the scanning reflector orientation were to shift from its intended orientation (due e.g. to thermal expansion) or if characteristics of the scanning reflector (e.g. the index of refraction of the scanning reflector) were to change on account of temperature changes, the reference beam can be used to provide data that can be used to account for such changes. In addition, if the scanning reflector were to be positioned in an orientation other than the orientation desired, the reference beam can be used in identifying and correcting that positioning.
摘要翻译：提供集成光学组件，其增强特性在集成光学组件形成激光雷达系统的一部分时特别有用。集成光学组件产生参考光束，该参考光束与扫描反射器的光学特性相关或者改变扫描反射器相对于源的位置或方向。因此，如果扫描反射器取向从其预期取向（例如由于热膨胀引起）偏移或者如果扫描反射器的特性（例如，扫描反射器的折射率）由于温度变化而改变，则参考光束可用于提供可用于说明这些变化的数据。另外，如果扫描反射器的定位方向不同于所需的定向，则参考光束可用于识别和校正该定位。

17. 发明申请

WO2012176929A3 MULTIPLE-BLADE HOLDING DEVICES 审中-公开
标题翻译：多片式保持装置
公开(公告)号：WO2012176929A3
公开(公告)日：2013-02-28
申请号：PCT/JP2012066311
申请日：2012-06-20
申请人： NIPPON KOGAKU KK , WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
发明人： WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
IPC分类号： F16F7/08
CPC分类号： F16F7/082
摘要： An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region (20). When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y- directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator (38), wherein operation of the actuator and compression of the overlap region are automated.
摘要翻译：示例性装置包括分别由重叠区域（20）彼此交错的多个叶片的第一和第二组可移动地连接在一起的第一和第二部分。当重叠区域被压缩时，防止第一和第二部分相对于彼此的位移，以便在第一和第二正交方向（例如，z方向和y方向）上提供相对高的刚度，并且在第三正交方向（例如，x方向）。该装置可以与致动器（38）配合使用，其中致动器的操作和重叠区域的压缩是自动化的。

18. 发明申请

WO2012177663A2 AUTOFOCUS SYSTEM WITH REFERENCE CONFIGURATION 审中-公开
标题翻译：具有参考配置的自动对焦系统
公开(公告)号：WO2012177663A2
公开(公告)日：2012-12-27
申请号：PCT/US2012043186
申请日：2012-06-19
申请人： NIPPON KOGAKU KK , SOGARD MICHAEL R , SMITH DANIEL GENE , GOODWIN ERIC PETER
发明人： SOGARD MICHAEL R , SMITH DANIEL GENE , GOODWIN ERIC PETER
IPC分类号： G06T7/20
CPC分类号： G01B11/026 , G01B11/00 , G03F9/7026 , G06T7/70 , G06T2207/30148 , H04N5/23212
摘要： A system (222) for measuring the position of a work piece (200) includes a redirector assembly (244), a light source assembly (240), a detector assembly (242), and a control system (224). The redirector assembly (244) is positioned near and spaced apart from the working surface (200A). The light source assembly (240) directs a measurement beam (246A) and a reference beam (246B) at the redirector assembly (244). The detector assembly (242) detects the measurement beam (246A) reflected off of the work piece (200) and generates a measurement signal, and detects the reference beam (246B) reflected off of the redirector assembly (244) and generates a reference signal. The control system (24) uses the measurement signal and the reference signal to determine the position of the work piece (200).
摘要翻译：用于测量工件（200）的位置的系统（222）包括重定向器组件（244），光源组件（240），检测器组件（242）和控制系统（224）。重定向器组件（244）位于工作表面（200A）附近和间隔开的位置。光源组件（240）在重定向器组件（244）处引导测量光束（246A）和参考光束（246B）。检测器组件（242）检测从工件（200）反射的测量光束（246A），并产生测量信号，并检测从转向器组件（244）反射的参考光束（246B），并产生参考信号。控制系统（24）使用测量信号和参考信号来确定工件（200）的位置。

19. 发明申请

WO2012133926A3 OPTICAL PROFILE MEASURING APPARATUS, METHOD FOR MEASURING PROFILE, AND METHOD FOR MANUFACTURING A STRUCTURE WITH A PROFILE 审中-公开
标题翻译：光学轮廓测量装置，测量轮廓的方法和用于制造具有轮廓的结构的方法
公开(公告)号：WO2012133926A3
公开(公告)日：2012-11-29
申请号：PCT/JP2012059284
申请日：2012-03-29
申请人： NIPPON KOGAKU KK , YAMADA TOMOAKI , TANEMURA TAKASHI
发明人： YAMADA TOMOAKI , TANEMURA TAKASHI
IPC分类号： G01B11/25
CPC分类号： G01B11/24 , G01B11/2518 , Y10T29/49769
摘要： A profile measuring apparatus is provided for accurately measuring a profile of a measuring object. A profile measuring apparatus includes: an irradiating unit (20) which is configured to irradiate the measuring object (3) with light from the light source to form a spotted pattern; a scanner (23) which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver (25) which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit (70) which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller (43) which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.
摘要翻译：提供了用于精确测量测量对象的轮廓的轮廓测量装置。轮廓测量装置包括：照射单元，被配置为用来自光源的光照射测量对象以形成点状图案; 扫描器（23），被配置为以点样图案相对地扫描测量对象的表面; 光接收器（25），其包括多个受光像素，所述光接收像素被排列成从与照射所述测量对象的光的照射方向不同的不同方向检测由照射所述测量对象的光产生的所述点样图案的图像; 改变单元，被配置为根据所述光的照射方向改变用于检测所述点样图案的图像的位置的信号的位置; 以及控制器（43），其被配置为基于来自所述受光像素的信号来计算所述测量对象的位置信息。

20. 发明申请

WO2012011612A3 CLEANING METHOD, IMMERSION EXPOSURE APPARATUS AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：清洗方法，浸渍曝光装置和装置制造方法
公开(公告)号：WO2012011612A3
公开(公告)日：2012-03-15
申请号：PCT/JP2011067185
申请日：2011-07-21
申请人： NIPPON KOGAKU KK , TANAKA RYO , HOSHINO TADASHI
发明人： TANAKA RYO , HOSHINO TADASHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70975
摘要： An immersion exposure apparatus exposes a substrate with exposure light that transits an exposure liquid (LQ). A liquid immersion member (3) has a first recovery port (18), which is capable of recovering the exposure liquid, and is disposed at least partly around an optical member (8) and an optical path of the exposure light that passes through the exposure liquid between the optical member and the substrate. A cleaning method comprises: supplying a cleaning liquid (LC) to a recovery passageway (19), wherethrough the exposure liquid recovered via the first recovery port from a space (SP), which the first recovery port faces, flows; and recovering the cleaning liquid from the recovery passageway. The liquid immersion member has a first discharge port (21), which is for discharging the exposure liquid from the recovery passageway, and a second discharge port (22), which hinders the discharge of the exposure liquid more than the first discharge port does and is for discharging a gas from the recovery passageway; and the cleaning liquid is not supplied to the space, which the first recovery port faces, via the first recovery port.
摘要翻译：浸没曝光装置用暴露于曝光液体（LQ）的曝光光来曝光基板。液浸构件（3）具有能够回收曝光液体的第一回收口（18），并且至少部分地设置在光学构件（8）的周围，并且通过所述曝光光的光路在光学构件和基底之间的曝光液体。清洁方法包括：向回收通道（19）供应清洁液体（LC），通过第一回收口从第一回收口面对的空间（SP）经过第一回收口回收的暴露液体流过; 并从回收通道回收清洗液。液浸部件具有用于从回收通道排出曝光液体的第一排出口（21）和比第一排出口更多地阻止曝光液体排出的第二排出口（22）用于从回收通道排出气体; 并且清洁液体不经由第一回收口供给到第一回收口面对的空间。

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