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1. 发明申请

WO2011111643A1 PIEZOELECTRIC MATERIAL AND DEVICES USING THE SAME 审中-公开
标题翻译：压电材料和使用其的装置
公开(公告)号：WO2011111643A1
公开(公告)日：2011-09-15
申请号：PCT/JP2011/055154
申请日：2011-02-28
申请人： CANON KABUSHIKI KAISHA , TOKYO INSTITUTE OF TECHNOLOGY , SOPHIA UNIVERSITY , KUBOTA, Makoto , MIURA, Kaoru , YABUTA, Hisato , WATANABE, Takayuki , HAYASHI, Jumpei , FUNAKUBO, Hiroshi , YAMADA, Tomoaki , YASUI, Shintaro , YAZAWA, Keisuke , UCHIDA, Hiroshi , NAGATA, Jyunichi
发明人： KUBOTA, Makoto , MIURA, Kaoru , YABUTA, Hisato , WATANABE, Takayuki , HAYASHI, Jumpei , FUNAKUBO, Hiroshi , YAMADA, Tomoaki , YASUI, Shintaro , YAZAWA, Keisuke , UCHIDA, Hiroshi , NAGATA, Jyunichi
IPC分类号： H01L41/18 , C04B35/01
CPC分类号： H01L41/18 , C04B35/01 , C04B35/016 , C04B35/2625 , C04B35/44 , C04B35/453 , C04B35/475 , C04B35/6325 , C04B2235/3206 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3232 , C04B2235/3267 , C04B2235/3272 , C04B2235/3284 , C04B2235/3286 , C04B2235/3298 , C04B2235/449 , C04B2235/76 , C04B2235/765 , C04B2235/768 , C04B2235/787 , H01L41/0805 , H01L41/0973 , H01L41/1878 , H01L41/316 , H01L41/318 , H02N2/106 , H02N2/163
摘要： Provided is a Bi-based piezoelectric material having good piezoelectric properties. The piezoelectric material includes a perovskite-type metal oxide represented by the general formula A x (Zn j Ti (1-j) ) 1 (Mg k Ti (1-k) ) m M n O 3 , where A represents Bi, optionally containing one or more elements selected from the group consisting of trivalent metal elements; M represents at least one kind of an element selected from the group consisting of Fe, Al, Sc, Mn, Y, Ga, and Yb; and 0.9 ≤x≤1.25, 0.4≤j≤0.6, 0.4≤k≤0.6, 0.09≤1≤0.49, 0.19≤m≤0.64, 0.13≤n≤0.48, and 1+m+n=1 are satisfied.
摘要翻译：提供具有良好的压电性能的Bi基压电材料。压电材料包括由通式Ax（ZnjTi（1-j））1（MgkTi（1-k））mMnO 3表示的钙钛矿型金属氧化物，其中A表示Bi，任选地含有一种或多种选自由三价金属元素组成; M表示选自Fe，Al，Sc，Mn，Y，Ga和Yb中的至少一种元素; 并且0.9 = x = 1.25,0.4 = j = 0.6,0.4 = k = 0.6,0.09 = 1 = 0.49,0.19 = m = 0.64,0.13 = n = 0.48，并且1 + m + n = 1。

2. 发明申请

WO2012133926A3 OPTICAL PROFILE MEASURING APPARATUS, METHOD FOR MEASURING PROFILE, AND METHOD FOR MANUFACTURING A STRUCTURE WITH A PROFILE 审中-公开
标题翻译：光学轮廓测量装置，测量轮廓的方法和用于制造具有轮廓的结构的方法
公开(公告)号：WO2012133926A3
公开(公告)日：2012-11-29
申请号：PCT/JP2012059284
申请日：2012-03-29
申请人： NIPPON KOGAKU KK , YAMADA TOMOAKI , TANEMURA TAKASHI
发明人： YAMADA TOMOAKI , TANEMURA TAKASHI
IPC分类号： G01B11/25
CPC分类号： G01B11/24 , G01B11/2518 , Y10T29/49769
摘要： A profile measuring apparatus is provided for accurately measuring a profile of a measuring object. A profile measuring apparatus includes: an irradiating unit (20) which is configured to irradiate the measuring object (3) with light from the light source to form a spotted pattern; a scanner (23) which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver (25) which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit (70) which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller (43) which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.
摘要翻译：提供了用于精确测量测量对象的轮廓的轮廓测量装置。轮廓测量装置包括：照射单元，被配置为用来自光源的光照射测量对象以形成点状图案; 扫描器（23），被配置为以点样图案相对地扫描测量对象的表面; 光接收器（25），其包括多个受光像素，所述光接收像素被排列成从与照射所述测量对象的光的照射方向不同的不同方向检测由照射所述测量对象的光产生的所述点样图案的图像; 改变单元，被配置为根据所述光的照射方向改变用于检测所述点样图案的图像的位置的信号的位置; 以及控制器（43），其被配置为基于来自所述受光像素的信号来计算所述测量对象的位置信息。

3. 发明申请

WO2012133926A2 PROFILE MEASURING APPARATUS, METHOD FOR MEASURING PROFILE, AND METHOD FOR MANUFACTURING STRUCTURE 审中-公开
标题翻译：轮廓测量装置，测量轮廓的方法和制造结构的方法
公开(公告)号：WO2012133926A2
公开(公告)日：2012-10-04
申请号：PCT/JP2012/059284
申请日：2012-03-29
申请人： NIKON CORPORATION , YAMADA, Tomoaki , TANEMURA, Takashi
发明人： YAMADA, Tomoaki , TANEMURA, Takashi
IPC分类号： G01B11/25
CPC分类号： G01B11/24 , G01B11/2518 , Y10T29/49769
摘要： A profile measuring apparatus is provided for accurately measuring a profile of a measuring object. A profile measuring apparatus includes: an irradiating unit which is configured to irradiate the measuring object with light from the light source to form a spotted pattern; a scanner which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.
摘要翻译：提供了用于精确测量测量对象的轮廓的轮廓测量装置。轮廓测量装置包括：照射单元，被配置成用来自光源的光照射测量对象以形成点状图案; 扫描器，其被配置为以所述点样图案相对地扫描所述测量对象的表面; 光接收器，其包括多个受光像素，所述光接收像素被排列成从不同于照射所述测量对象的光的照射方向的不同方向检测由照射所述测量对象的光产生的所述点样图案的图像; 改变单元，被配置为根据所述光的照射方向改变用于检测所述点样图案的图像的位置的信号的位置; 以及控制器，被配置为基于来自光接收像素的信号来计算测量对象的位置信息。

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