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1. 发明申请

WO2004093159A2 IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM 审中-公开
标题翻译：静态液相流体控制系统
公开(公告)号：WO2004093159A2
公开(公告)日：2004-10-28
申请号：PCT/US2004009911
申请日：2004-03-29
申请人： NIPPON KOGAKU KK , COON DEREK , HAZELTON ANDREW J
发明人： COON DEREK , HAZELTON ANDREW J
IPC分类号： G03F7/20 , H01L
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： A fluid control system for immersion lithography is formed with an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.
摘要翻译：用于浸没光刻的流体控制系统由诸如透镜的光学构件，诸如半导体晶片的工件形成，其中具有与光学构件相对的表面设置在其间的间隙，用于提供浸没流体的流体供应装置例如水到间隙中的指定曝光区域;以及流体控制装置，其至少在进行浸没光刻操作时，激活流体上的力，使得浸没流体保持在曝光区域及其附近。可能导致加压气体对流体施加流体动力以将其保持在其位置。

2. 发明申请

WO2006052855A2 FINE STAGE Z SUPPORT APPARATUS 审中-公开
标题翻译：精美舞台Z支持装置
公开(公告)号：WO2006052855A2
公开(公告)日：2006-05-18
申请号：PCT/US2005040229
申请日：2005-11-04
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
发明人： BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
IPC分类号： A47J43/08
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682 , Y10T29/41
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

3. 发明申请

WO0003301A2 EXPOSURE DEVICE HAVING A PLANAR MOTOR 审中-公开
标题翻译：具有平面电机的曝光装置
公开(公告)号：WO0003301A2
公开(公告)日：2000-01-20
申请号：PCT/US9915278
申请日：1999-07-07
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
发明人： HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
IPC分类号： H01J37/20 , G03F7/20 , H01L21/027 , H01L21/68 , H02K41/02 , H02K41/03 , G03F
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70858 , H02K41/031 , H02K2201/18
摘要： Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.
摘要翻译：公开了能够有效地抑制对环境的热影响的平面电动机装置。当向与可移动部件（51）的磁体相对的电枢线圈（38）供给电流时，通过电磁力沿着移动面（21a）驱动可动部件51。当可动构件（51）沿一定的方向继续被驱动时，向可动构件（51）的每个移动位置的电磁线圈（38）供给与磁体相对的电枢线圈（38），由此电枢线圈）提供电流产生热量。电枢线圈（38）被容纳在基座（21）中的真空室（41）中，并且被布置成与定子轭（43）接触，在它们之间形成预定的间隙，并且陶瓷形成真空室（41）的板（36）。因此，从电枢线圈（38）到移动面（21a）侧的热传递基本上仅通过放射线实现，从而可以有效地抑制对环境的热影响。

4. 发明申请

WO2004092833A3 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，其中包括一个静态地图设备的运输区域
公开(公告)号：WO2004092833A3
公开(公告)日：2005-12-01
申请号：PCT/US2004009994
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03B27/42 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254），浸没流体系统（252）和输送区域 256）。流体屏障（254）位于装置（30）附近，并将输送区域（256）保持在间隙（246）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。输送区域（256）将流体屏障（254）和装置（30）附近的浸没流体（248）的至少一部分输送离开装置（30）。浸没流体系统（252）可以包括与输送区域（256）流体连通的流体移除系统（282）。运输区域（256）可由多孔材料制成。

5. 发明申请

WO2005010611A3 WAFER TABLE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：抛光平台的波形表
公开(公告)号：WO2005010611A3
公开(公告)日：2005-09-15
申请号：PCT/US2004017452
申请日：2004-06-02
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , TAKAIWA HIROAKI
发明人： HAZELTON ANDREW J , TAKAIWA HIROAKI
IPC分类号： G03B27/58 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70975 , G03F7/70341 , G03F7/707 , G03F7/70716 , Y10T29/49826
摘要： Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly. The wafer table (51) assembly has a top surface, and is arranged to support a wafer (64) to be moved with respect to the lens (46) as well as at least one component (350). The top surface of the wafer (64) and the top surface of the component (350) are each at substantially a same height as the top of the wafer table (51) assembly. An overall top surface of the wafer table (51) assembly which includes the top surface of the wafer (64), the top surface of the wafer table (51) assembly, and the top surface of the at least one component (350) is substantially planar.
摘要翻译：公开了用于允许液体基本上包含在浸没式光刻系统的透镜（46）和晶片台（51）组件之间的方法和装置。根据本发明的一个方面，曝光装置包括透镜（46）和晶片台（51）组件。晶片台（51）组件具有顶表面，并且被布置成支撑相对于透镜（46）移动的晶片（64）以及至少一个部件（350）。晶片（64）的顶表面和部件（350）的顶表面各自处于与晶片台（51）组件的顶部基本相同的高度。晶片台（51）组件的整个顶表面包括晶片（64）的顶表面，晶片台（51）组件的顶表面和至少一个部件（350）的顶表面是基本上平面。

6. 发明申请

WO2004092830A3 LIQUID JET AND RECOVERY SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：液体喷射和恢复系统
公开(公告)号：WO2004092830A3
公开(公告)日：2005-06-16
申请号：PCT/US2004010071
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle (21) for supplying a fluid (7) into the exposure region or as a recovery nozzle (23) for recovering the fluid from the exposure region. A fluid controlling device (14) functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and those on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译：用于浸没式光刻设备（100）的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，图像图案通过该曝光区域投射在诸如晶片的工件（W）上。这些喷嘴各自适于选择性地用作用于将流体（7）供应到曝光区域中的源喷嘴（21），或用作从曝光区域回收流体的回收喷嘴（23）。流体控制装置（14）用于使曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴，并且在所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得期望的流动模式可以建立了为了方便浸没光刻。

7. 发明申请

WO2004109757A2 HEAT PIPE WITH TEMPERATURE CONTROL 审中-公开
标题翻译：热管温控
公开(公告)号：WO2004109757A2
公开(公告)日：2004-12-16
申请号：PCT/US2004016495
申请日：2004-05-26
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J
发明人： HAZELTON ANDREW J
IPC分类号： F28D15/06 , G03F7/20 , H01L
CPC分类号： G03F7/70758 , F28D15/06 , G03F7/70858
摘要： Methods and apparatus for controlling the boiling temperature of a fluid within a heat pipe are disclosed. According to one aspect of the present invention, a method for controlling a temperature associated with a heat pipe that contains a fluid and has an evaporator end includes measuring the temperature associated with the heat pipe and determining when the temperature associated with the heat pipe is at a desired level. The method also includes changing a pressure within the heat pipe when it is determined that the temperature associated with the heat pipe is not at a desired level. Changing the pressure within the heat pipe causes the temperature associated with the heat pipe to change.
摘要翻译：公开了用于控制热管内的流体的沸腾温度的方法和装置。根据本发明的一个方面，一种用于控制与包含流体并具有蒸发器端的热管相关联的温度的方法包括测量与热管相关联的温度，并确定与热管相关的温度何时处于一个期望的水平。当确定与热管相关联的温度不在期望水平时，该方法还包括改变热管内的压力。改变热管内的压力导致与热管相关的温度改变。

8. 发明申请

WO0003301A9 EXPOSURE DEVICE HAVING A PLANAR MOTOR 审中-公开
标题翻译：具有平面电机的暴露装置
公开(公告)号：WO0003301A9
公开(公告)日：2000-05-25
申请号：PCT/US9915278
申请日：1999-07-07
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
发明人： HAZELTON ANDREW J , TANAKA KEIICHI , EATON JOHN K
IPC分类号： H01J37/20 , G03F7/20 , H01L21/027 , H01L21/68 , H02K41/02 , H02K41/03 , H02K41/00 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70858 , H02K41/031 , H02K2201/18
摘要： Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.
摘要翻译：公开了一种能够有效抑制热对环境的影响的平面电动机装置。当电流供应到与可移动部件（51）的磁体相对的电枢线圈（38）时，可移动部件（51）通过电磁力沿着移动表面（21a）被驱动。当可动部件（51）继续沿一定方向被驱动时，对于可动部件（51）的每个移动位置，电流被提供给与磁体相对的电枢线圈（38），由此电枢线圈）提供电流产生热量。电枢线圈38容纳在基座21内的真空室41内，与定子磁轭43接触配置，在它们之间形成规定的间隙，板（36）形成真空室（41）。因此，从电枢线圈（38）到移动表面（21a）侧的热传递基本上仅通过辐射来实现，从而可以有效地抑制热对环境的影响。

9. 发明申请

WO2004090634A3 ENVIRONMENTAL SYSTEM INCLUDING VACCUM SCAVANGE FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，包括用于浸没式光刻设备的真空SCAVANGE
公开(公告)号：WO2004090634A3
公开(公告)日：2007-03-01
申请号：PCT/IB2004002704
申请日：2004-03-29
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , SOGARD MICHAEL
发明人： HAZELTON ANDREW J , SOGARD MICHAEL
IPC分类号： G03B27/32 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254）和浸没流体系统（252）。流体屏障（254）位于装置（30）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。浸没流体系统（252）收集直接在流体屏障（254）和装置（30）之间的浸没流体（248）。流体屏障（254）可以包括位于装置（30）附近的扫气入口（286），并且浸没流体系统（252）可包括低压源（392A），该低压源与清流入口（286）。流体屏障（254）限制浸没流体（248）的任何蒸气（249）并防止其扰动测量系统（22）。另外，环境系统（26）可以包括轴承流体源（290B），该轴承流体源引导在流体屏障（254）和装置（30）之间的轴承流体（290C）相对于装置支撑流体屏障（254）（30）。

10. 发明申请

WO2004093130A3 CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY 审中-公开
标题翻译： CLEANUP方法在透视图中的光学
公开(公告)号：WO2004093130A3
公开(公告)日：2005-11-03
申请号：PCT/US2004010309
申请日：2004-04-02
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , KAWAI HIDEMI , WATSON DOUGLAS C , NOVAK W THOMAS
发明人： HAZELTON ANDREW J , KAWAI HIDEMI , WATSON DOUGLAS C , NOVAK W THOMAS
IPC分类号： B08B3/04 , B08B3/12 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid supplying device serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.
摘要翻译：浸没式光刻设备具有布置成保持标线片（R）的掩模版台（RST），布置成保持工件（W）的工作台（9）和包括照明源（1）和光学元件（PL），用于具有由来自照明源的辐射投影的标线片的图像图案。在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置用于将浸液（7）供应到该间隙中，使得所提供的浸没液体接触光学元件（4）和在浸没光刻过程中的工件（W）。一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。

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