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11. 发明授权

US4669867A Alignment and exposure apparatus 失效
标题翻译：对准和曝光设备
公开(公告)号：US4669867A
公开(公告)日：1987-06-02
申请号：US701623
申请日：1985-02-14
申请人： Koji Uda , Kazuyuki Oda , Naoki Ayata
发明人： Koji Uda , Kazuyuki Oda , Naoki Ayata
IPC分类号： G03F9/00 , G03B27/42
CPC分类号： G03F9/70
摘要： An alignment and exposure apparatus in which sequential operations of pattern projection for projecting a pattern of a first object, at a reduced ratio, onto a second object through an optical system, stepwise movement for moving the second object stepwise relative to the first object, detection for detecting any positional deviation between the first and second objects at a position at which the stepwise movement of the second object is terminated, and correction for correcting the positional relation between the first and second objects on the basis of the detected positional deviation, are repeated relative to the second object to thereby print the patterns onto the second object in a reduced scale. Upon correction of the positional relation between the first and second objects, at least one of the first and second objects is displaced in accordance with the magnitude of the detected positional deviation and/or, upon stepwise movement of the second object, the amount of stepwise movement to be made is corrected in accordance with the detected positional deviation with respect to the position at which the preceding stepwise movement of the second object is terminated. By this, the time required for repetitions of exposures is reduced.
摘要翻译：一种对准和曝光装置，其中用于通过光学系统将第一物体的图案以减小的比例投影到第二物体上的图案投影的顺序操作，用于相对于第一物体逐步移动第二物体的逐步移动，检测用于检测在第二物体的逐步移动终止的位置处的第一和第二物体之间的任何位置偏差，并且基于检测到的位置偏差校正第一和第二物体之间的位置关系的校正被重复从而以更小的比例将图案印刷到第二物体上。在校正第一和第二物体之间的位置关系时，第一和第二物体中的至少一个根据检测到的位置偏差的大小而移位和/或在第二物体的逐步移动时，根据检测到的相对于第二物体的先前逐步移动终止的位置的位置偏差来校正要进行的移动。因此，减少重复曝光所需的时间。

12. 发明授权

US5641264A Substrate conveying device and method of controlling the same 失效
标题翻译：基板输送装置及其控制方法
公开(公告)号：US5641264A
公开(公告)日：1997-06-24
申请号：US996870
申请日：1992-12-21
申请人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
发明人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
IPC分类号： G03F7/20 , H01L21/687 , B65G65/00
CPC分类号： G03F7/70741 , H01L21/68707 , Y10S294/907
摘要： A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.
摘要翻译：一种控制输送装置的方法，所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构，其中检测到通过被输送物品施加到抓握手的按压力，并且输送操作当按压力超过预定力时，输送机构停止。

13. 发明授权

US5459573A Light quantity controlling apparatus 失效
标题翻译：光量控制装置
公开(公告)号：US5459573A
公开(公告)日：1995-10-17
申请号：US291747
申请日：1994-08-17
申请人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
发明人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G01B11/00 , G01D5/26 , G03F9/00 , H01L21/68 , H01L31/12 , H01L33/00 , H01S5/06 , H01S5/062 , H01S5/0683 , G01N21/86
CPC分类号： G03F9/7088 , G03F9/7049 , H01L21/68 , H01L21/682 , H01S5/06835 , H01S5/06216
摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.
摘要翻译：一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。为了获得适当的标记信号，控制入射在累积传感器上的光量。在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。由积累传感器产生的标记检测信号是精确的。

14. 发明授权

US5182615A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5182615A
公开(公告)日：1993-01-26
申请号：US563420
申请日：1990-08-07
申请人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
发明人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F9/7049
摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

15. 发明授权

US5172402A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5172402A
公开(公告)日：1992-12-15
申请号：US666649
申请日：1991-03-08
申请人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
发明人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70008 , G03F7/702
摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

16. 发明授权

US5138643A Exposure apparatus 失效
公开(公告)号：US5138643A
公开(公告)日：1992-08-11
申请号：US591252
申请日：1990-10-01
申请人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
发明人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866
摘要： An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.

17. 发明授权

US5008703A Exposure apparatus and control of the same 失效
标题翻译：曝光装置和控制相同
公开(公告)号：US5008703A
公开(公告)日：1991-04-16
申请号：US407434
申请日：1989-09-06
申请人： Eigo Kawakami , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa
发明人： Eigo Kawakami , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/7075 , G03F7/709
摘要： Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation in the aligning operation or the exposure operation, is prohibited. This ensures high-precision pattern printing.

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