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171. 发明授权

US07247870B2 Systems for protecting internal components of an EUV light source from plasma-generated debris 失效
公开(公告)号：US07247870B2
公开(公告)日：2007-07-24
申请号：US11512822
申请日：2006-08-30
申请人： Alexander I. Ershov , William N. Partlo
发明人： Alexander I. Ershov , William N. Partlo
IPC分类号： G01J3/10
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

172. 发明授权

US07217940B2 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US07217940B2
公开(公告)日：2007-05-15
申请号：US10798740
申请日：2004-03-10
申请人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
发明人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
IPC分类号： H01J35/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

173. 发明授权

US07164144B2 EUV light source 有权
标题翻译： EUV光源
公开(公告)号：US07164144B2
公开(公告)日：2007-01-16
申请号：US10900839
申请日：2004-07-27
申请人： William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
发明人： William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
IPC分类号： H01J35/20
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
摘要翻译：激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件，靶跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出;以及流轨道误差检测器，其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差来自与期望的等离子体起始位点相交的所需流道的流轨道。

174. 发明授权

US06765946B2 Fan for gas discharge laser 有权
标题翻译：风机用于气体放电激光
公开(公告)号：US06765946B2
公开(公告)日：2004-07-20
申请号：US10029319
申请日：2001-10-17
申请人： William N. Partlo , Curtis L. Rettig
发明人： William N. Partlo , Curtis L. Rettig
IPC分类号： H01S322
CPC分类号： G03F7/70025 , F04D29/283 , F04D29/666 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An electric discharge laser apparatus having a laser chamber containing a laser gas and two longitudinal electrodes defining a discharge region for producing electrical discharges and a tangential fan for circulating the laser gas and having blade members configured to minimize adverse effects of reflections of electric discharge generated shock waves back to the discharge region simultaneously with a subsequent discharge.
摘要翻译：一种放电激光装置，其具有包含激光气体的激光室和限定用于产生放电的放电区域的两个纵向电极和用于使激光气体循环的切向风扇，并具有构造成使得放电产生的冲击的反射的不利影响最小化的叶片构件与随后的放电同时回放到放电区域。

175. 发明授权

US06425559B1 Gas laser chamber with vertical vibration isolator 有权
标题翻译：带垂直隔振器的气体激光室
公开(公告)号：US06425559B1
公开(公告)日：2002-07-30
申请号：US09675492
申请日：2000-09-29
申请人： I. Roger Oliver , Alex P. Ivaschenko , William N. Partlo , Palash P. Das
发明人： I. Roger Oliver , Alex P. Ivaschenko , William N. Partlo , Palash P. Das
IPC分类号： F16M1100
CPC分类号： H01S3/03 , H01S3/02
摘要： A chamber/optics support structure for a laser having a laser chamber with a vibration source. The chamber and the laser resonance cavity optical elements are supported on a platform. The chamber is supported by a plurality of wheels which in turn rests on two tracks on track supports mounted on the platform. A vertical vibration isolator isolates vertical vibrations originating in the chamber from the laser optics. A flexible clamp flexibly clamps the chamber in a horizontal position to align it with the resonance cavity optical elements and to substantially decouple vibration between the chamber vibration source to the optical elements in a frequency range of concern. The invention is especially useful for positioning the heavy laser chamber of a narrow band excimer laser and for decoupling vibrations resulting from its blower from the lasers line narrowing module and output coupler. In a preferred embodiment the plurality of wheels is three wheels, two of which rest in a V-groove track and one of which rests on a flat track. This preferred embodiment uses two flexible clamps each having an adjustment bolt and four symmetrically spaced silicon rubber vibration isolators. Precise horizontal alignment of the chamber is accomplished using the adjustment bolt which is then held in position with a lock nut and a clamping bolt. Silicon rubber dampers in the isolators decouple horizontal chamber vibrations from the optical elements. In specific embodiments, the vertical vibration isolator may be a flexible liner in the wheels or in the rails or alternatively a pad on which the chamber rests.
摘要翻译：一种用于具有具有振动源的激光室的激光器的腔室/光学器件支撑结构。腔室和激光共振腔光学元件支撑在平台上。该室由多个轮支撑，多个轮依次放置在安装在平台上的轨道支架上的两个轨道上。垂直隔振器将起始于室内的垂直振动与激光光学器件隔离。柔性夹具可灵活地将腔室夹紧在水平位置，以将其与共振腔光学元件对准，并使其在腔室振动源与光学元件之间的振动基本上在关注的频率范围内分离。本发明特别适用于定位重物激光腔的窄带准分子激光器，并将其鼓风机的振动与激光线变窄模块和输出耦合器分离。在优选实施例中，多个车轮是三个车轮，其中两个车轮搁置在V形槽轨道中，其中一个车轮搁置在平坦轨道上。该优选实施例使用两个柔性夹具，每个柔性夹具具有调节螺栓和四个对称间隔的硅橡胶隔振器。使用调节螺栓实现腔室的精确水平对准，调节螺栓然后通过锁紧螺母和夹紧螺栓保持在适当的位置。隔离器中的硅橡胶阻尼器将水平室振动与光学元件分离。在具体实施例中，垂直隔振器可以是轮子中或轨道中的柔性衬垫，或者替代地，腔室搁置在其上。

176. 发明授权

US6064072A Plasma focus high energy photon source 有权
标题翻译：等离子体聚焦高能光子源
公开(公告)号：US6064072A
公开(公告)日：2000-05-16
申请号：US268243
申请日：1999-03-15
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G03F7/20 , H05G2/00 , H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltage high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。脉冲电源提供足够高电压的电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。在一个优选的实施方案中，活性气体是锂，缓冲气体是氦气，辐射收集器涂覆有用于电极的材料。材料的一个不错的选择是钨。在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极构造的中心电极的轴的孔中的固体锂的汽化来产生锂气体。

177. 发明授权

US5844727A Illumination design for scanning microlithography systems 失效
标题翻译：扫描微光刻系统的照明设计
公开(公告)号：US5844727A
公开(公告)日：1998-12-01
申请号：US921494
申请日：1997-09-02
申请人： William N. Partlo
发明人： William N. Partlo
IPC分类号： G02B27/00 , G02B27/09 , G03F7/20 , H01L21/027 , G02B3/06 , G02B27/10 , G03B27/54
CPC分类号： G02B27/0927 , G02B27/0961 , G02B27/0966 , G03F7/70058 , G03F7/70358
摘要： In one embodiment, the illumination system for a scanner incorporates an excimer laser whose square beam is incident upon a two-dimensional array of lenses. The light exiting the array is made incident on a long focal length lens for creating nearly parallel rays. The combination of the array and the long focal length lens causes the resulting square beam at the focal plane of the long focal length lens to have a substantially uniform intensity across its area. An array of cylindrical lenses receives these nearly parallel rays. The light output of the cylindrical lens array is then made incident on a first positive lens whose focal length is longer than the distance between the cylindrical lens array and the first positive lens. A second positive lens is located of the focal plane of the first positive lens. This results in all light rays from the cylindrical lenses which have the same angle to be focused at the same point on the second positive lens. The light incident upon the second positive lens has a long vertical dimension and a short horizontal width dimension. The oblong beam is further adjusted and redirected as necessary to illuminate a reticle.
摘要翻译：在一个实施例中，用于扫描器的照明系统包括准矩形激光器，其方波入射到二维阵列阵列上。离开阵列的光入射到长焦距透镜上，用于产生几乎平行的光线。阵列和长焦距透镜的组合使得在长焦距透镜的焦平面处的所得到的方束在其区域上具有基本均匀的强度。圆柱形透镜阵列接收这些几乎平行的光线。然后将柱面透镜阵列的光输出入射在焦距长于柱面透镜阵列和第一正透镜之间的距离的第一正透镜上。第二正透镜位于第一正透镜的焦平面上。这导致来自柱面透镜的所有光线具有在第二正透镜上的相同点处具有相同角度的聚焦。入射在第二正透镜上的光具有长的垂直尺寸和短的水平宽度尺寸。根据需要进一步调整长方体梁并重新定向以照亮掩模版。

178. 发明授权

US5729562A Pulse power generating circuit with energy recovery 失效
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：US5729562A
公开(公告)日：1998-03-17
申请号：US739873
申请日：1996-10-31
申请人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
发明人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
IPC分类号： H01S3/00 , H01S3/097 , H01S3/225 , H02M9/04 , H03K3/57 , H03K17/00 , H03K17/80 , H05H1/06
CPC分类号： H05H1/06 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225 , H03K2217/0036
摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路。能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

179. 发明授权

US5452054A Variable annular illuminator for photolithographic projection imager 失效
标题翻译：用于光刻投影成像器的可变环形照明器
公开(公告)号：US5452054A
公开(公告)日：1995-09-19
申请号：US342787
申请日：1994-11-21
申请人： Paul G. Dewa , Paul F. Michaloski , Paul J. Tompkins , William N. Partlo
发明人： Paul G. Dewa , Paul F. Michaloski , Paul J. Tompkins , William N. Partlo
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70141 , G03F7/702
摘要： The illumination of a photolithographic projection imager is given a variable annular intensity profile by using diverging and counter diverging elements that are movable relative to each other in the illumination path. An upstream element diverges the illumination into an annular configuration, the radius of which is set by the distance downstream to the counter diverging element. Convex and concave conical surfaces on the movable elements can accomplish this.
摘要翻译：通过使用在照明路径中可相对于彼此移动的发散和反向发散元件，给予光刻投影成像器的照明可变的环形强度分布。上游元件将照明分散成环形构型，其半径设置在反扩散元件下游的距离。可移动元件上的凸形和凹形圆锥形表面可以实现这一点。

180. 发明授权

US09091944B2 Source collector, lithographic apparatus and device manufacturing method 有权
标题翻译：源极收集器，光刻设备和器件制造方法
公开(公告)号：US09091944B2
公开(公告)日：2015-07-28
申请号：US13497741
申请日：2010-09-24
申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
发明人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
IPC分类号： G03B27/54 , G03F7/20 , H05G2/00
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。源极收集器装置包括与腔室外部的引导方式流体连通的腔室。用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

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