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1. 发明授权

US06425559B1 Gas laser chamber with vertical vibration isolator 有权
标题翻译：带垂直隔振器的气体激光室
公开(公告)号：US06425559B1
公开(公告)日：2002-07-30
申请号：US09675492
申请日：2000-09-29
申请人： I. Roger Oliver , Alex P. Ivaschenko , William N. Partlo , Palash P. Das
发明人： I. Roger Oliver , Alex P. Ivaschenko , William N. Partlo , Palash P. Das
IPC分类号： F16M1100
CPC分类号： H01S3/03 , H01S3/02
摘要： A chamber/optics support structure for a laser having a laser chamber with a vibration source. The chamber and the laser resonance cavity optical elements are supported on a platform. The chamber is supported by a plurality of wheels which in turn rests on two tracks on track supports mounted on the platform. A vertical vibration isolator isolates vertical vibrations originating in the chamber from the laser optics. A flexible clamp flexibly clamps the chamber in a horizontal position to align it with the resonance cavity optical elements and to substantially decouple vibration between the chamber vibration source to the optical elements in a frequency range of concern. The invention is especially useful for positioning the heavy laser chamber of a narrow band excimer laser and for decoupling vibrations resulting from its blower from the lasers line narrowing module and output coupler. In a preferred embodiment the plurality of wheels is three wheels, two of which rest in a V-groove track and one of which rests on a flat track. This preferred embodiment uses two flexible clamps each having an adjustment bolt and four symmetrically spaced silicon rubber vibration isolators. Precise horizontal alignment of the chamber is accomplished using the adjustment bolt which is then held in position with a lock nut and a clamping bolt. Silicon rubber dampers in the isolators decouple horizontal chamber vibrations from the optical elements. In specific embodiments, the vertical vibration isolator may be a flexible liner in the wheels or in the rails or alternatively a pad on which the chamber rests.
摘要翻译：一种用于具有具有振动源的激光室的激光器的腔室/光学器件支撑结构。腔室和激光共振腔光学元件支撑在平台上。该室由多个轮支撑，多个轮依次放置在安装在平台上的轨道支架上的两个轨道上。垂直隔振器将起始于室内的垂直振动与激光光学器件隔离。柔性夹具可灵活地将腔室夹紧在水平位置，以将其与共振腔光学元件对准，并使其在腔室振动源与光学元件之间的振动基本上在关注的频率范围内分离。本发明特别适用于定位重物激光腔的窄带准分子激光器，并将其鼓风机的振动与激光线变窄模块和输出耦合器分离。在优选实施例中，多个车轮是三个车轮，其中两个车轮搁置在V形槽轨道中，其中一个车轮搁置在平坦轨道上。该优选实施例使用两个柔性夹具，每个柔性夹具具有调节螺栓和四个对称间隔的硅橡胶隔振器。使用调节螺栓实现腔室的精确水平对准，调节螺栓然后通过锁紧螺母和夹紧螺栓保持在适当的位置。隔离器中的硅橡胶阻尼器将水平室振动与光学元件分离。在具体实施例中，垂直隔振器可以是轮子中或轨道中的柔性衬垫，或者替代地，腔室搁置在其上。

2. 发明授权

US06442181B1 Extreme repetition rate gas discharge laser 有权
标题翻译：极端重复率气体放电激光
公开(公告)号：US06442181B1
公开(公告)日：2002-08-27
申请号：US09684629
申请日：2000-10-06
申请人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
发明人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a laser chamber having a gas flow path with a gradually increasing cross section downstream of the discharge electrodes to permit recovery a large percentage of the pressure drop in the discharge region, (2) a squirrel cage type fan for producing gas velocities through the discharge region of more than 76 m/s and capable of continuous trouble-free operation for several months, (3) a heat exchanger system capable of removing in excess of 16 kw of heat energy from the laser gas (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes needed to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz or greater and (5) a laser beam measurement and control system capable of measuring pulse energy wavelength and bandwidth on a pulse-to-pulse laser with feedback pulse-to-pulse control of pulse energy and wavelength.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）具有在放电电极下游具有逐渐增加的横截面的气体流动路径的激光室，以允许在放电区域中恢复大部分的压降，（2）松鼠通过排气区域超过76m / s产生气体速度的笼式风扇，能够连续无故障运行数月，（3）能够从其中除去超过16kw的热能的热交换器系统激光气体（4）脉冲电力系统，能够在脉冲重复频率为4,000Hz时以5mJ至10mJ或更大的范围内以期望的脉冲能量产生激光脉冲所需的电极提供精确控制的电脉冲至6,000Hz以上，（5）激光束测量和控制系统，其能够测量脉冲到脉冲激光器上的脉冲能量波长和带宽，其中反馈脉冲至脉冲控制脉冲能量和波长。

3. 发明授权

US07884303B2 Laser thin film poly-silicon annealing optical system 有权
标题翻译：激光薄膜多晶硅退火光学系统
公开(公告)号：US07884303B2
公开(公告)日：2011-02-08
申请号：US11201877
申请日：2005-08-11
申请人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
发明人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译：公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

4. 发明授权

US07061959B2 Laser thin film poly-silicon annealing system 有权
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：US07061959B2
公开(公告)日：2006-06-13
申请号：US10884547
申请日：2004-07-01
申请人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
发明人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
IPC分类号： H01S3/22
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。该系统可以包括振荡器激光单元中的发散控制。发散控制可以包括不稳定的谐振器装置。该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。

5. 发明授权

US6128323A Reliable modular production quality narrow-band high REP rate excimer laser 有权
标题翻译：可靠的模块化生产质量窄带高REP率准分子激光器
公开(公告)号：US6128323A
公开(公告)日：2000-10-03
申请号：US157067
申请日：1998-09-18
申请人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
发明人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/08009 , H01S3/0812 , H01S3/1392 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。该室设计用于在较低的氟浓度下运行。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

6. 再颁专利

USRE38054E1 Reliable, modular, production quality narrow-band high rep rate F2 laser 失效
标题翻译：可靠，模块化，生产质量窄带高倍率F2激光
公开(公告)号：USRE38054E1
公开(公告)日：2003-04-01
申请号：US09801383
申请日：2001-03-07
申请人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
发明人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
IPC分类号： H01S310
CPC分类号： C23C14/225 , C23C14/0694 , C23C14/16 , C23C14/24 , G01J9/00 , G02B1/105 , G02B5/1852 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H03K3/57 , H03K17/80
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved communication module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了可产生1000Hz至2000Hz或更大范围内的10mJ激光脉冲的可靠的模块化生产质量准分子激光器。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括具有用于精确调整电压的电压降低电路的增加容量的高压电源，改进的通信模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

7. 发明授权

US06370174B1 Injection seeded F2 lithography laser 失效
标题翻译：注入种子F2光刻激光
公开(公告)号：US06370174B1
公开(公告)日：2002-04-09
申请号：US09459165
申请日：1999-12-10
申请人： Eckehard D. Onkels , Palash P. Das , Thomas P. Duffey , Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo
发明人： Eckehard D. Onkels , Palash P. Das , Thomas P. Duffey , Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo
IPC分类号： H01S300
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/036 , H01S3/225 , H01S3/2308 , H01S3/2333 , H01S3/2366
摘要： A tunable injection seeded very narrow band F2 lithography laser. The laser combines modular design features of prior art long life releasable lithography lasers with special F2 line narrowing and tuning techniques applied to a seed beam operated in a first gain medium which beam is used to stimulate narrow band lasing in a second gain medium to produce a very narrow band laser beam useful for integrated circuit lithography.
摘要翻译：可调式注入种子非常窄的F2光刻激光。激光器结合了现有技术的长寿命可剥离光刻激光器的模块化设计特征，其具有应用于在第一增益介质中操作的种子光束的特殊F2线窄化和调谐技术，该光束用于在第二增益介质中刺激窄带激光以产生非常窄带激光束可用于集成电路光刻。

8. 发明授权

US5729562A Pulse power generating circuit with energy recovery 失效
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：US5729562A
公开(公告)日：1998-03-17
申请号：US739873
申请日：1996-10-31
申请人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
发明人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
IPC分类号： H01S3/00 , H01S3/097 , H01S3/225 , H02M9/04 , H03K3/57 , H03K17/00 , H03K17/80 , H05H1/06
CPC分类号： H05H1/06 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225 , H03K2217/0036
摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路。能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

9. 发明授权

US07149234B2 High repetition rate gas discharge laser with precise pulse timing control 有权
标题翻译：高重复率气体放电激光器，具有精确的脉冲定时控制
公开(公告)号：US07149234B2
公开(公告)日：2006-12-12
申请号：US10650578
申请日：2003-08-27
申请人： Palash P. Das , Jennan Yu , Stuart L. Anderson , Helmut Schillinger , Tobias Pflanz , Claus Strowitzki , Claudia A. Hartmann , Stephan Geiger , Brett D. Smith , William N. Partlo
发明人： Palash P. Das , Jennan Yu , Stuart L. Anderson , Helmut Schillinger , Tobias Pflanz , Claus Strowitzki , Claudia A. Hartmann , Stephan Geiger , Brett D. Smith , William N. Partlo
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.
摘要翻译：高重复率，紧凑型，模块化气体放电，紫外线激光。激光器可用作用于在集成电路制造工艺中非常快速地检查晶片的光源。它也以非常快的速度对掩模版书写有用。优选实施例以1000至4000Hz的脉冲重复率工作，并被设计用于全天候的生产线操作。该优选实施例包括脉冲控制单元，其将脉冲的定时控制到小于4纳秒的精度。该气体放电激光器的优选实施例可被配置为与KrF气体混合物，ArF气体混合物或F 2气体混合物一起操作，每个气体混合物具有近似的缓冲气体，产生248nm，197nm或 157 nm紫外光脉冲。

10. 发明授权

US06985508B2 Very narrow band, two chamber, high reprate gas discharge laser system 有权
标题翻译：非常窄带，二室，高重复气体放电激光系统
公开(公告)号：US06985508B2
公开(公告)日：2006-01-10
申请号：US10627215
申请日：2003-07-24
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

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