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151. 发明申请

US20060194155A1 Resist pattern forming method and semiconductor device manufacturing method 审中-公开
标题翻译：抗蚀剂图案形成方法和半导体器件制造方法
公开(公告)号：US20060194155A1
公开(公告)日：2006-08-31
申请号：US11360502
申请日：2006-02-24
申请人： Daisuke Kawamura , Tsuyoshi Shibata , Shinichi Ito
发明人： Daisuke Kawamura , Tsuyoshi Shibata , Shinichi Ito
IPC分类号： G03F7/00
CPC分类号： G03F7/2022 , G03F7/2028 , G03F7/70341 , G03F7/7045
摘要： A resist pattern forming method includes forming a resist film above a substrate. A first exposure is performed in which a specific region of an edge of the resist film is irradiated with light much enough to allow subsequent development to dissolve the resist film, thereby forming a latent image in the resist film at the edge. The resist film whose edge has been irradiated is rinsed. A second exposure is performed in which a desired pattern of light is projected onto an exposure region of the rinsed resist film via a projection optical system of an immersion exposure tool with liquid whose refractive index is larger than that of air existing between the exposure region and the substrate-side face of a component element closest to the substrate in the projection optical system. Development on the exposure region of the resist film is performed.
摘要翻译：抗蚀剂图案形成方法包括在基板上形成抗蚀剂膜。进行第一曝光，其中抗蚀剂膜的边缘的特定区域被足够多的光照射以允许随后的显影以溶解抗蚀剂膜，从而在边缘处在抗蚀剂膜中形成潜像。冲洗其边缘的抗蚀剂膜。进行第二次曝光，其中期望的图案通过浸没曝光工具的投影光学系统投射到冲洗的抗蚀剂膜的曝光区域上，其中折射率大于曝光区域和在投影光学系统中最靠近基板的元件元件的基板侧面。进行抗蚀剂膜的曝光区域的显影。

152. 发明申请

US20060177776A1 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device 有权
标题翻译：浸渍曝光方法和装置以及半导体装置的制造方法
公开(公告)号：US20060177776A1
公开(公告)日：2006-08-10
申请号：US11315000
申请日：2005-12-23
申请人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
发明人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making large a contact angle to the liquid with at least outer peripheral portion of a main surface of the substrate compared with a contact angle to the liquid with an area adjacent to the outer peripheral portion of the substrate, which area is a part of a surface of a substrate supporting side of a substrate support member supporting the substrate included in the exposure apparatus, and carrying out the exposure process.
摘要翻译：公开了一种在液体至少部分地填充在待曝光的基板和进行曝光处理的曝光装置的投影光学系统之间进行曝光处理的浸渍曝光方法，包括进行以下处理：与具有与基板的外周部分相邻的区域的液体的接触角相比，与基板的主表面的至少外周部分形成与液体大的接触角，该区域是表面的一部分支撑包含在曝光装置中的基板的基板支撑部件的基板支撑侧，进行曝光处理。

153. 发明授权

US07007713B2 Pressure control apparatus 有权
标题翻译：压力控制装置
公开(公告)号：US07007713B2
公开(公告)日：2006-03-07
申请号：US10465709
申请日：2003-06-19
申请人： Toshiharu Wada , Mitsutoshi Araki , Shinichi Ito
发明人： Toshiharu Wada , Mitsutoshi Araki , Shinichi Ito
IPC分类号： G05D16/16
CPC分类号： G05D16/0663 , Y10T137/5283 , Y10T137/7782 , Y10T137/7797 , Y10T137/7812 , Y10T137/8326
摘要： The present invention provides a pressure control apparatus for controlling the pressure at an output port without reducing the effective sectional area by controlling a main valve through the switching operation of a small-sized directional control valve, wherein the main valve has any of the following functions, i.e. a function of-providing a valve full-open position, a function of reducing pressure, and a function of providing a valve full-closed position. When a diaphragm chamber is placed at the secondary pressure by switching the directional control valve, the primary pressure is reduced by the main valve, and a predetermined reduced pressure is outputted. When the diaphragm chamber is at the primary pressure, the main valve is fully closed. When the diaphragm chamber is at the atmospheric pressure, the main valve fully opens, and hence the primary-side fluid flows to the output port as it is.
摘要翻译：本发明提供一种用于通过小型方向控制阀的切换操作控制主阀而不降低有效截面面积来控制输出口处的压力的压力控制装置，其中主阀具有以下任何功能，即提供阀门全开位置的功能，降低压力的功能以及提供阀门全闭合位置的功能。当通过切换方向控制阀将隔膜室置于二次压力时，通过主阀减小一次压力，并输出预定的减压。当隔膜室处于初级压力时，主阀完全关闭。当隔膜室处于大气压力时，主阀完全打开，因此初级侧流体原样流入输出口。

154. 发明申请

US20060001208A1 Sheet material feeding apparatus 失效
标题翻译：片材送料装置
公开(公告)号：US20060001208A1
公开(公告)日：2006-01-05
申请号：US11170800
申请日：2005-06-30
申请人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
发明人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
IPC分类号： B65H5/22
CPC分类号： B65H1/025 , B65H3/0653 , B65H2511/214 , B65H2701/1916 , B65H2220/02 , B65H2220/08
摘要： A sheet material feeding apparatus includes a feed-out device that brings the stacked sheet materials conveyed on a floor belt into contact with a pickup roller and feeds the sheet materials out in a direction crossing the conveying direction of the stacked sheet materials by rotation of the pickup roller, and an inclination correcting device provided in an upstream of the feed-out device in its sheet material feeding direction and including an upper roller located at a position higher than that of the pickup roller, that brings an upper side of the stacked sheet materials conveyed towards the feed-out device into contact with the upper roller to correct the inclination of the stacked sheet materials.
摘要翻译：片材供给装置包括：送出装置，其将输送在地板带上的层叠片材与拾取辊接触，并将片材沿与叠层片材的输送方向交叉的方向通过拾取辊和倾斜校正装置，其设置在所述送出装置的片材供给方向的上游，并且包括位于比拾取辊的位置高的位置的上辊，其将堆叠片材的上侧向送出装置输送的材料与上辊接触以校正堆叠的片材的倾斜度。

155. 发明申请

US20050270794A1 Illumination device 有权
标题翻译：照明装置
公开(公告)号：US20050270794A1
公开(公告)日：2005-12-08
申请号：US11108872
申请日：2005-04-19
申请人： Hidefumi Okamoto , Toshiyuki Kondo , Shinichi Ito
发明人： Hidefumi Okamoto , Toshiyuki Kondo , Shinichi Ito
IPC分类号： G02B6/00 , F21S8/10 , F21V7/04 , F21V8/00 , F21V9/00 , F21V19/00 , F21Y101/02 , G02B6/42
CPC分类号： G02B6/0091 , F21S43/14 , F21S43/19 , F21S43/237 , F21S43/247 , F21V5/008 , F21V19/001 , F21V19/045 , F21Y2115/10 , G02B6/0038 , Y10S362/80
摘要： A light access can be integrally formed with a light guide on at least one end of the light guide. A printed circuit board with an LED lamp mounted thereon can be press-fitted in the light access for transient arrangement, and can be fixed by a cover. The position of the printed circuit board can be determined in relation to the light guide. For example, engagement hooks of the light access can be fitted with recesses in the printed circuit board for positioning the circuit board in a plane normal to the longitudinal direction of the light guide. Similarly, positioning ribs of the light guide can be employed for positioning in the longitudinal direction of the light guide. The light guide can be formed in an almost rod shape having four sides in section normal to the longitudinal direction of the light guide. A light guide lens can be formed in one surface and a diffuser cut can be formed in the opposite surface of the light guide.
摘要翻译：可以在光导的至少一端与导光体一体地形成光访问。具有安装在其上的LED灯的印刷电路板可以压配合在光接入中用于瞬时布置，并且可以通过盖固定。印刷电路板的位置可以相对于光导确定。例如，光接入的接合钩可以在印刷电路板中装配有凹槽，用于将电路板定位在垂直于光导的纵向方向的平面中。类似地，可以使用光导的定位肋沿光导的纵向定位。导光体可以形成为具有垂直于光导的纵向方向的四边的几乎棒状。可以在一个表面上形成导光透镜，并且可以在光导的相对表面中形成扩散器切割。

156. 发明申请

US20050248741A1 Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device 失效
标题翻译：产生书写图案的方法，形成抗蚀剂图案的方法，控制曝光工具的方法以及制造半导体器件的方法
公开(公告)号：US20050248741A1
公开(公告)日：2005-11-10
申请号：US11108751
申请日：2005-04-19
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03B27/42 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70616 , G03F7/70341 , G03F7/70433 , G03F7/70441
摘要： A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.
摘要翻译：公开了一种生成写入图案的方法，其从图案数据生成写入图案数据以将掩模图案写入用于包括投影光学系统的曝光工具中的光掩模中，以将掩模图案转印到形成在基板，在局部区域形成液膜的浸渍机构，以及相对于投影光学系统和浸渍机构移动基板的移动机构，所述方法包括获得抗蚀剂膜之间的接触历史值的典型分布和单位曝光区域中的液膜，根据接触历史值的典型分布将与图案数据对应的图案分割成多个区域，并对包含在每个分割区域内的图案进行校正根据联系历史值的规则。

157. 发明授权

US06880131B1 Apparatus and method for selecting data sets 失效
标题翻译：用于选择数据集的装置和方法
公开(公告)号：US06880131B1
公开(公告)日：2005-04-12
申请号：US09515905
申请日：2000-02-29
申请人： Hiroki Nakazono , Shinichi Ito
发明人： Hiroki Nakazono , Shinichi Ito
IPC分类号： G06F3/048 , G06F3/00 , G06F3/033 , G06F12/00 , G09G5/00 , G10H1/18
CPC分类号： G06F3/0482 , Y10S707/99953 , Y10S707/99956
摘要： A storage medium stores a large number of data sets or files as grouped in a smaller number of data groups or directories, each data group containing a plurality of data sets. On a control panel is provided a display screen, and are also provided a plurality of group call buttons to be individually allocated for the respective data groups and a plurality of data set designating buttons to be individually allocated for the respective data sets. When the user actuates an intended one of the group call buttons, identifying names or marks of the data sets of the called group are listed in a display screen for a further selection of the intended data set from among the listed group by user's actuation of an intended one of the data set designating buttons. This enables an easy and speedy selection of a particular intended data set from among a large number of data sets.
摘要翻译：存储介质存储大量数据集或文件，分组在较少数量的数据组或目录中，每个数据组包含多个数据集。在控制面板上设置有显示画面，并且还设置有要分别分配给各个数据组的多个组呼叫按钮以及要分别分配给各个数据组的多个数据组指定按钮。当用户启动组呼叫按钮中的预定的一个时，识别被叫组的数据集的名称或标记被列在显示屏幕中，用于通过用户的启动来从列出的组中进一步选择所期望的数据集意图是数据集指定按钮之一。这使得能够从大量数据集中容易且快速地选择特定的预期数据集。

158. 发明授权

US06709531B2 Chemical liquid processing apparatus for processing a substrate and the method thereof 失效
标题翻译：用于处理基板的化学液处理装置及其方法
公开(公告)号：US06709531B2
公开(公告)日：2004-03-23
申请号：US10396407
申请日：2003-03-26
申请人： Shinichi Ito , Riichiro Takahashi , Tatsuhiko Ema , Katsuya Okamura
发明人： Shinichi Ito , Riichiro Takahashi , Tatsuhiko Ema , Katsuya Okamura
IPC分类号： B08B504
CPC分类号： H01L21/67034 , B05C11/06 , B05C11/08 , B05D1/005 , B05D3/0406 , H01L21/6708 , Y10S134/902 , Y10S438/906
摘要： In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.
摘要翻译：在本公开中，在化学液膜上方形成空气流，并且通过使空气流与化学液体的表面接触而产生化学液体的移动。此外，通过旋转板在处理对象基板和板之间的空间中产生负压。因此，提高了液体的处理均匀性，能够有效地进行液体除去工序。结果，可以提高化学液体处理的产率。

159. 发明授权

US06579382B2 Chemical liquid processing apparatus for processing a substrate and the method thereof 失效
标题翻译：用于处理基板的化学液处理装置及其方法
公开(公告)号：US06579382B2
公开(公告)日：2003-06-17
申请号：US09784200
申请日：2001-02-16
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： B08B700
CPC分类号： H01L21/67034 , B05C11/06 , B05C11/08 , B05D1/005 , B05D3/0406 , H01L21/6708 , Y10S134/902 , Y10S438/906
摘要： In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.
摘要翻译：在本公开中，在化学液膜上方形成空气流，并且通过使空气流与化学液体的表面接触而产生化学液体的移动。此外，通过旋转板在处理对象基板和板之间的空间中产生负压。因此，提高了液体的处理均匀性，能够有效地进行液体除去工序。结果，可以提高化学液体处理的产率。

160. 发明授权

US06550990B2 Substrate processing apparatus and processing method by use of the apparatus 有权
公开(公告)号：US06550990B2
公开(公告)日：2003-04-22
申请号：US10022637
申请日：2001-12-20
申请人： Hideaki Sakurai , Masamitsu Itoh , Shinichi Ito
发明人： Hideaki Sakurai , Masamitsu Itoh , Shinichi Ito
IPC分类号： G03D500
CPC分类号： G03D5/003
摘要： An apparatus for processing a substrate comprising a substrate holding mechanism for holding the substrate substantially horizontally, a chemical solution discharge/suction mechanism having a chemical solution discharge/suction portion which has a chemical solution outlet for discharging a chemical solution onto the substrate and chemical solution inlets for sucking up the chemical solution present on the substrate, and a chemical solution supply/suction system for supplying the chemical solution to the chemical solution discharge/suction mechanism simultaneously with sucking the chemical solution by the chemical solution supply/suction mechanism.

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