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101. 发明专利

JP2014177682A Manufacturing method of vapor deposition mask 有权
标题翻译：蒸汽沉积掩模的制造方法
公开(公告)号：JP2014177682A
公开(公告)日：2014-09-25
申请号：JP2013053207
申请日：2013-03-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SAITO YUJI , KUDO SHUJI , KOSUGE TAKAYUKI , MIZUMURA MICHINOBU
IPC分类号： C23C14/24
CPC分类号： B32B38/10 , B32B15/00 , B32B2310/0843 , C23C14/042
摘要： PROBLEM TO BE SOLVED: To apply equal tension over the entire surface of a mask sheet and fix the sheet to a frame.SOLUTION: There is provided a manufacturing method of a vapor deposition mask having a structure that a metal mask sheet 4 on which a plurality of opening patterns are formed is stretched and fixed to a frame-shaped metal frame 7, in which a first step of adhering a peripheral part of the metal mask sheet 4 to a synthetic fiber mesh 1 to which fixed tension is applied; a second step of cutting off a portion of the mesh 1 corresponding to a vapor deposition effective region having an enough size that includes the plurality of opening patterns of the metal mask sheet 4; a third step of bonding and fixing the frame 7 to the peripheral part of the metal mask sheet 4 from the opposite side of the mesh 1; and a fourth step of removing the mesh 1 from the metal mask sheet 4 are performed.
摘要翻译：要解决的问题：在掩模片的整个表面上施加相等的张力并将片材固定到框架上。解决方案：提供一种蒸镀掩模的制造方法，其具有金属掩模片4，其上形成有形成有多个开口图案被拉伸并固定在框状的金属框架7上，其中将金属掩模片4的周边部分粘附到固定张力的合成纤维网1上的第一步骤; 第二步骤，切除与具有包括金属掩模片4的多个开口图案的足够尺寸的蒸镀有效区域对应的网孔1的一部分; 将框架7从网1的相对侧接合并固定到金属掩模片4的周边部分的第三步骤; 并且执行从金属掩模片4去除网格1的第四步骤。

102. 发明专利

JP5586060B2 Chemical liquid filling method to the micro dispenser and micro dispenser 有权
公开(公告)号：JP5586060B2
公开(公告)日：2014-09-10
申请号：JP2010238129
申请日：2010-10-25
申请人：株式会社ブイ・テクノロジー
发明人：貴文平野
IPC分类号： B05C5/00 , B05D3/00

103. 发明专利

JP5565659B2 Laser processing equipment 有权
公开(公告)号：JP5565659B2
公开(公告)日：2014-08-06
申请号：JP2009242926
申请日：2009-10-22
申请人：株式会社ブイ・テクノロジー
发明人：祐二棚田
IPC分类号： B23K26/10 , B23K26/16
摘要： PROBLEM TO BE SOLVED: To provide a laser beam machining apparatus that can easily make compatible, with a simple structure, the prevention of sticking of a substrate and the collection performance of dust generated in laser beam machining. SOLUTION: The laser beam machining apparatus forms a separating groove (scribing groove) by irradiating a thin film 21 of the lower face of a glass substrate 20 with a laser beam while conveying the glass substrate 20 in a state wherein the glass substrate is floated on a floating stage 31b. In the laser beam machining apparatus, on the surface 34 of the floating stage 31b, a suction hole 33 for dust collection is formed in a recessed shape, while grooves 35a, 35b for communicating the inside of the suction hole 33 with the outer periphery of the floating stage 31b are formed in a recessed shape on the surface of the floating stage 31b. COPYRIGHT: (C)2011,JPO&INPIT

104. 发明专利

JP5564639B2 Compound semiconductors deposition method and apparatus 有权
公开(公告)号：JP5564639B2
公开(公告)日：2014-07-30
申请号：JP2011511322
申请日：2010-04-28
申请人：国立大学法人東京大学 , 株式会社ブイ・テクノロジー
发明人：元一大津 , 崇八井 , 忠川添 , 俊輔山崎 , 康一梶山 , 通伸水村 , 圭一伊藤
IPC分类号： H01L21/205 , C23C16/34
CPC分类号： C23C16/481 , C23C14/548 , C23C16/303 , C23C16/52 , C30B25/00 , C30B29/403 , H01L21/0237 , H01L21/0242 , H01L21/0254 , H01L21/0262 , H01L33/0062

105. 发明专利

JP2014138107A Method for manufacturing electronic device 有权
标题翻译：制造电子器件的方法
公开(公告)号：JP2014138107A
公开(公告)日：2014-07-28
申请号：JP2013006358
申请日：2013-01-17
申请人： Yamagata Univ , 国立大学法人山形大学 , V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUKAMI MAKOTO , OKU SHINYA , TOKITO SHIZUO , SHU MINTETSU , SUZUKI YOSHIKAZU
IPC分类号： H01L21/28 , C23C16/48 , H01L21/285 , H01L21/288
CPC分类号： C23C16/483 , C23C16/047 , H01L51/0022
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing an electronic device capable of corresponding to on-demand, and having an electrode pattern that can be easily formed with a high accuracy.SOLUTION: A first layer 2 consisting of a material that is different from a material of a substrate, having a surface energy being higher than that of the substrate 1, and an electrode pattern shape, is formed on the substrate 1 by a gas curtain type laser CVD method, and a second layer 3 is formed on an upper surface of the first layer 2 with a conductive nano ink to form an electrode pattern of the electronic device.
摘要翻译：要解决的问题：提供一种能够根据需要制造的电子设备的制造方法，具有可以容易地高精度地形成的电极图案。解决方案：由不同的材料构成的第一层2 通过气帘式激光CVD法在基板1上形成表面能高于基板1的基板的材料和电极图案形状，第二层3形成在第一层2的上表面与导电纳米油墨形成电子器件的电极图案。

106. 发明专利

JP2014135571A Imaging apparatus 审中-公开
标题翻译：成像设备
公开(公告)号：JP2014135571A
公开(公告)日：2014-07-24
申请号：JP2013001399
申请日：2013-01-08
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , MIZUMURA MICHINOBU , KANAO MASAYASU , ISHIKAWA SUSUMU
IPC分类号： H04N5/33 , H01L27/146 , H01L31/10 , H04N5/372 , H04N5/374
CPC分类号： H01L27/14607 , H01L27/14621 , H01L27/14623 , H01L27/1463 , H01L27/14643 , H01L27/14645 , H01L27/14649 , H01L27/14698
摘要： PROBLEM TO BE SOLVED: To obtain a clear long-wavelength band image with longer wavelengths than those of near-infrared rays when obtaining a visible image and the long-wavelength band image with longer wavelengths than those of near-infrared rays using one imaging sensor.SOLUTION: In an imaging sensor 1 for an imaging apparatus, plural photoelectric conversion units 2(2A, 2B) are formed on one semiconductor substrate 10. Each photoelectric conversion unit 2A included in the plural photoelectric conversion units 2(2A, 2B) represents spectral response characteristics which peak in the band of longer wavelengths than those of near-infrared rays. The plural photoelectric conversion units 2(2A, 2B) include photoelectric conversion units 2B representing spectral response characteristics which peak in a visible light band.
摘要翻译：要解决的问题为了获得具有比近红外线更长的波长的清晰的长波长带图像，并且使用一个成像传感器获得具有比使用一个成像传感器的近红外线更长的波长的长波长带图像解决方案：在用于成像装置的成像传感器1中，在一个半导体衬底10上形成多个光电转换单元2（2A，2B）。包括在多个光电转换单元2（2A，2B）中的每个光电转换单元2A表示在比较近的红外线的波长较长的波段中峰值的光谱响应特性。多个光电转换单元2（2A，2B）包括表示在可见光区域中峰值的光谱响应特性的光电转换单元2B。

107. 发明专利

JP2014098196A Method for manufacturing vapor deposition mask 有权
标题翻译：制造蒸气沉积掩模的方法
公开(公告)号：JP2014098196A
公开(公告)日：2014-05-29
申请号：JP2012250974
申请日：2012-11-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU
IPC分类号： C23C14/04
CPC分类号： C23C14/042 , B23K26/066 , C23C14/048 , C23C16/042
摘要： PROBLEM TO BE SOLVED: To improve the accuracy of positions where a plurality of opening patterns are formed.SOLUTION: A method for manufacturing a composite type vapor deposition mask where a resin film 17 formed with opening patterns 16, having the same geometry as that of thin film patterns, corresponding to the thin film patterns deposited on a substrate and a thin plate-shaped magnetic metal member 15 formed with through holes 14 having a size involving the opening pattern 16 are brought into close contact with each other, comprises steps of: forming a member 7 for a mask having a structure where the magnetic metal member 15 formed with the through holes 14 and the resin film 17 before being formed with the opening patterns 16 are brought into close contact with each other; forming marks 23 having a constant shape and depth by irradiating laser light L to the film 17 in the through holes 14 of the member 7 for a mask; and forming the opening patterns 16 penetrating the film 17 by irradiating the laser light L to predetermined positions on the basis of the marks 23.
摘要翻译：要解决的问题：提高形成多个开口图案的位置的精度。解决方案：一种复合型蒸镀掩模的制造方法，其中形成有开口图案16的树脂膜17具有与对应于沉积在基板上的薄膜图案的薄膜图案和形成有具有涉及开口图案16的尺寸的通孔14的薄板状磁性金属构件15彼此紧密接触，包括以下步骤：在形成具有开口图案16的形成有通孔14的磁性金属构件15和树脂膜17之间形成具有结构的掩模构件7彼此紧密接触; 通过在掩模用构件7的通孔14中的膜17上照射激光L来形成具有恒定形状和深度的标记23; 并且通过基于标记23将激光L照射到预定位置来形成穿透膜17的开口图案16。

108. 发明专利

JP2014098195A Thin film pattern formation method, alignment device, and vapor deposition device 审中-公开
标题翻译：薄膜图案形成方法，对准装置和蒸发沉积装置
公开(公告)号：JP2014098195A
公开(公告)日：2014-05-29
申请号：JP2012250973
申请日：2012-11-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To improve thin film pattern forming position accuracy.SOLUTION: Both ends of a vapor deposition mask are supported, and the vapor deposition mask is arranged above and opposite to a substrate. One supported end of the vapor deposition mask is lowered, and made near one end side of the substrate. Thereafter, the other end of the vapor deposition mask is gradually lowered, so that the vapor deposition mask is sequentially brought into close contact with one end side to the other end side of the substrate. The vapor deposition mask is moved in a plane parallel to a surface of the substrate to align the vapor deposition mask with the substrate. By applying a static magnetic field to a magnetic metal member of the vapor deposition mask from a rear face side of the substrate, the vapor deposition mask is closely fixed to the surface of the substrate by a magnetic force, and vapor deposition is performed from the vapor deposition mask side to form a thin film pattern with the same shape dimension as that of an opening pattern.
摘要翻译：要解决的问题：提高薄膜图案形成位置精度。解决方案：支持蒸镀掩模的两端，并且气相沉积掩模布置在基板的上方和相对之上。气相沉积掩模的一个支撑端降低，并在基底的一端侧附近制成。此后，蒸镀掩模的另一端逐渐降低，使得蒸镀掩模顺序地与基板的另一端侧的一端侧紧密接触。气相沉积掩模在平行于衬底的表面的平面中移动，以将气相沉积掩模与衬底对准。通过从基板的背面向静电磁性金属构件施加静磁场，通过磁力将气相沉积掩模紧密地固定在基板的表面上，并从蒸镀掩模侧，形成与开口图案相同的形状尺寸的薄膜图案。

109. 发明专利

JPWO2012081098A1 配向処理装置及び配向処理方法有权
公开(公告)号：JPWO2012081098A1
公开(公告)日：2014-05-22
申请号：JP2012548577
申请日：2010-12-15
申请人：株式会社ブイ・テクノロジー
发明人：水村　通伸 , 通伸水村
IPC分类号： G02F1/1337
CPC分类号： G03F9/7069 , G02F1/1303 , G02F1/133788
摘要：本発明は、配向状態が異なる第1及び第2の配向領域の隣接端部領域がアライメント手段7の追従精度に略等しい寸法だけ重なるように、基板搬送方向と交差する方向の幅を設定して形成した第1及び第2の開口1A,1Bが基板9の搬送方向と交差する方向に一定の配列ピッチで並ぶように同方向に互い違いに並べて配置した複数のフォトマスク2を使用し、各フォトマスク2の第1及び第2の開口1A,1Bに夫々偏光方向及び基板に対する入射角のうち少なくとも一方が異なる二つの偏光を入射させ、第1及び第2の開口1A,1Bを通過した二つの偏光をフォトマスク2の下側を搬送される基板9上の配向膜に照射させて上記第1及び第2の配向領域を隣り合わせに形成するものである。これにより、複数のフォトマスクの繋ぎ目で発生する配向乱れを目立たなくする。

110. 发明专利

JP2014096684A Optical inter-connection device 审中-公开
标题翻译：光学互连装置
公开(公告)号：JP2014096684A
公开(公告)日：2014-05-22
申请号：JP2012246685
申请日：2012-11-08
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , NASUKAWA TOSHIMICHI , ISHIKAWA SUSUMU , KANAO MASAYASU
IPC分类号： H04B10/80 , H04B10/114 , H04J14/00 , H04J14/02
CPC分类号： H04B10/803 , H01L25/167 , H01L31/167 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To enhance the alignment accuracy of light-emitting elements or light-receiving elements on a substrate by a relatively simplified manufacturing process and to prevent crosstalk of signal transmission between substrates (chips).SOLUTION: An optical inter-connection device 1 performs transmission and reception of a light signal between a plurality of semiconductor substrates 10 that are stacked. A plurality of light-emitting elements 2 or a plurality of light-receiving elements 3 that are disposed on one semiconductor substrate 10 have pn junction portions 10pn using the semiconductor substrate 10 as a common semiconductor layer 10p. A pair of the light-emitting element 2(2-1) and the light-receiving element 3(3-1) performing transmission and reception of a light signal between the different semiconductor substrates 10 perform light emission and light reception at a common wavelength λ1, respectively.
摘要翻译：要解决的问题：通过相对简化的制造工艺来提高基板上的发光元件或光接收元件的对准精度，并防止基板（芯片）之间的信号传输串扰。解决方案：光学互连装置 1在堆叠的多个半导体衬底10之间执行光信号的发送和接收。设置在一个半导体衬底10上的多个发光元件2或多个光接收元件3具有使用半导体衬底10作为公共半导体层10p的pn结部分10pn。在不同的半导体基板10之间进行光信号的发送接收的一对发光元件2（2-1）和受光元件3（3-1）进行发光和共用波长的光的接收 λ1。

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