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91. 发明授权

US08241426B2 CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device 有权
标题翻译： CMP抛光方法，CMP抛光装置以及半导体装置的制造方法
公开(公告)号：US08241426B2
公开(公告)日：2012-08-14
申请号：US11795697
申请日：2005-12-21
申请人： Syozo Takada , Hisanori Matsuo , Akira Ishikawa
发明人： Syozo Takada , Hisanori Matsuo , Akira Ishikawa
IPC分类号： B08B3/12 , B08B6/00 , B08B7/00 , B08B7/02
CPC分类号： H01L21/02074 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/76826 , H01L21/76828
摘要： When the remaining slurry and polishing residue are removed by cleaning with a cleaning liquid (preferably a cleaning liquid containing a surfactant), organic matter in the cleaning liquid containing a surfactant seeps into the interlayer insulating film 3. Therefore, the substrate is subsequently washed with an organic solvent or a solution containing an organic solvent, thus washing away the organic matter that has seeped into the interlayer insulating film 3. Although the interlayer insulating film 3 is subjected to a hydrophobic treatment, since the solvent used is an organic solvent, this solvent is able to seep into the interlayer insulating film 3, dissolve the organic matter, and wash the organic matter away without being affected by this hydrophobic treatment. Afterward, the substrate 1 is dried, and the organic solvent or solution containing an organic solvent that is adhering to the surface is removed.
摘要翻译：当通过用清洗液（优选含有表面活性剂的清洗液）清洗剩余的浆料和抛光残渣时，含有表面活性剂的清洗液中的有机物渗入层间绝缘膜3.因此，随后用有机溶剂或含有有机溶剂的溶液，从而洗去已经渗透到层间绝缘膜3中的有机物质。尽管对层间绝缘膜3进行疏水处理，但由于使用的溶剂是有机溶剂，因此溶剂能够渗透到层间绝缘膜3中，溶解有机物质，并且在不受这种疏水处理的影响的情况下洗涤有机物质。之后，干燥基板1，除去附着在表面上的有机溶剂的有机溶剂或溶液。

92. 发明申请

US20110239882A1 WEB PRINTING PRESS 有权
标题翻译： WEB打印机
公开(公告)号：US20110239882A1
公开(公告)日：2011-10-06
申请号：US13075048
申请日：2011-03-29
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： B41L41/00
CPC分类号： B41F23/0409 , B41F7/26 , B41F23/0443 , B41M7/0045 , B41M7/0081
摘要： A web printing apparatus includes a transfer device which transfers highly reactive ink/varnish onto a web, and a fixing device which fixes, on the web, the highly reactive ink/varnish transferred by the transfer device. The fixing device includes only a light irradiation device which irradiates the web with light in the wavelength range, in which no ozone is generated, to cure the highly reactive ink/varnish on the web without thermal drying of the web.
摘要翻译：纸幅印刷装置包括将高反应性油墨/清漆转印到纸幅上的转印装置和在纸幅上固定由转印装置转印的高反应性油墨/清漆的定影装置。定影装置仅包括光纤照射装置，其在没有产生臭氧的波长范围内照射纸幅，以在幅材上没有热干燥来固化幅材上的高反应性油墨/清漆。

93. 发明授权

US07981309B2 Method for detecting polishing end in CMP polishing device, CMP polishing device, and semiconductor device manufacturing method 有权
标题翻译：用于检测CMP抛光装置中的抛光端的方法，CMP抛光装置和半导体器件制造方法
公开(公告)号：US07981309B2
公开(公告)日：2011-07-19
申请号：US11921008
申请日：2006-05-16
申请人： Takehiko Ueda , Hosei Nakahira , Akira Ishikawa
发明人： Takehiko Ueda , Hosei Nakahira , Akira Ishikawa
IPC分类号： C03C25/68 , B24B49/00
CPC分类号： G01N21/55 , B24B37/013 , B24B49/12 , G01N21/9501 , H01L21/3212 , H01L22/26
摘要： The spectral reflectance spectrum of an object of polishing that has reached the polishing endpoint is found ahead of time, the spectral reflectance spectrum of the object of polishing is found during polishing, and the correlation coefficient of these is seen as parameter 1. Meanwhile, the sum of the absolute values of the difference between the first order differentials of these is seen as parameter 2. Then, when parameter 1 is in a range exceeding a specific value, and parameter 2 is at its minimum, it is concluded that the polishing endpoint has been reached. Thus, it is possible to provide a method for detecting the polishing endpoint in a highly reliable CMP polishing apparatus.
摘要翻译：达到抛光终点的抛光对象的光谱反射光谱提前发现，抛光时发现抛光对象的光谱反射光谱，其相关系数被视为参数1。将这些的一阶微分之差的绝对值之和视为参数2.然后，当参数1在超过特定值的范围内且参数2处于最小值时，得出结论：抛光端点已经到达因此，可以提供一种用于在高可靠性CMP抛光装置中检测抛光终点的方法。

94. 发明授权

US07973313B2 Thin film integrated circuit device, IC label, container comprising the thin film integrated circuit, manufacturing method of the thin film integrated circuit device, manufacturing method of the container, and management method of product having the container 有权
标题翻译：薄膜集成电路器件，IC标签，包含薄膜集成电路的容器，薄膜集成电路器件的制造方法，容器的制造方法以及具有容器的产品的管理方法
公开(公告)号：US07973313B2
公开(公告)日：2011-07-05
申请号：US10781795
申请日：2004-02-20
申请人： Yasuyuki Arai , Akira Ishikawa , Toru Takayama , Junya Maruyama , Yuugo Goto , Yumiko Ohno , Yuko Tachimura
发明人： Yasuyuki Arai , Akira Ishikawa , Toru Takayama , Junya Maruyama , Yuugo Goto , Yumiko Ohno , Yuko Tachimura
IPC分类号： H01L27/12 , H01L29/66
CPC分类号： H01L27/1266 , G06K19/07749 , H01L27/12 , H01L27/1214 , H01L27/1218 , H01L29/78603
摘要： The present invention provides an ultrathin thin film integrated circuit and a thin film integrated circuit device including the thin film integrated circuit device. Accordingly, the design of a product is not spoilt while an integrated circuit formed from a silicon wafer, which is thick and produces irregularities on the surface of the product container. The thin film integrated circuit according to the present invention includes a semiconductor film as an active region (for example a channel region in a thin film transistor), unlike an integrated circuit formed from a conventional silicon wafer. The thin film integrated circuit according to the present invention is thin enough that the design is not spoilt even when a product such as a card or a container is equipped with the thin film integrated circuit.
摘要翻译：本发明提供了一种超薄薄膜集成电路和包括薄膜集成电路器件的薄膜集成电路器件。因此，产品的设计不会被破坏，而由硅晶片形成的集成电路是厚的，并且在产品容器的表面上产生不规则性。根据本发明的薄膜集成电路不同于由常规硅晶片形成的集成电路，包括半导体膜作为有源区（例如，薄膜晶体管中的沟道区）。根据本发明的薄膜集成电路足够薄，即使当诸如卡或容器的产品配备有薄膜集成电路时，该设计也不会被破坏。

95. 发明授权

US07824023B2 Ink furnishing unit in an ink jet recorder 有权
标题翻译：喷墨记录器中的墨水装置单元
公开(公告)号：US07824023B2
公开(公告)日：2010-11-02
申请号：US11921819
申请日：2006-06-12
申请人： Hideo Izawa , Takao Namiki , Akira Ishikawa , Junichi Setoyama
发明人： Hideo Izawa , Takao Namiki , Akira Ishikawa , Junichi Setoyama
IPC分类号： B41J2/175
CPC分类号： B41J2/19 , B41J2/16523 , B41J2/1707 , B41J2/175 , B41J2/185
摘要： It is desirable that the entire ink to be furnished to the nozzle head be deaerated efficiently, the entire ink including a portion of ink recovered from the purge section.Accordingly, an ink furnishing unit in an ink jet recorder is provided, which comprises a back pressure tank 15 connected to a nozzle head 2 via an ink supply passage, a main tank 9 connected to the back pressure tank via a main supply passage 16 provided with a main ink pump 18 therein, a recovery tank 7 connected to the main tank via a return passage provided with an ink pump 22 therein, and a purge cap 5 connected to the recovery tank via a recovery passage 8 provided with a purge pump 6 therein, the purge cap being opposed to the nozzle head when purging, wherein a deaerator 17 is disposed in the main supply passage connecting the main tank and the back pressure tank and the back pressure tank is connected to an upstream of the purge pump in the recovery passage via a three way directional control valve 30.
摘要翻译：希望将要提供给喷嘴头的整个油墨有效地脱气，整个油墨包括从吹扫部分回收的一部分油墨。因此，提供了一种喷墨记录器中的墨水装置，其包括经由供墨通道连接到喷嘴头2的背压罐15，经由主供应通道16连接到背压罐的主罐9，其中具有主墨水泵18，通过其中设置有墨泵22的返回通道连接到主容器的回收罐7和经由回收通道8连接到回收罐的清洗帽5，该回收通道8设置有清洗泵6 其中，清洗盖在吹扫时与喷嘴头相对，其中，在连接主罐和背压罐的主供应通道中设置除气器17，并且背压罐连接到净化泵的上游通过三通方向控制阀30的回收通道。

96. 发明授权

US07810921B2 Printing apparatus 有权
标题翻译：印刷装置
公开(公告)号：US07810921B2
公开(公告)日：2010-10-12
申请号：US11656066
申请日：2007-01-23
申请人： Hideo Izawa , Akira Ishikawa
发明人： Hideo Izawa , Akira Ishikawa
IPC分类号： B41J2/01
CPC分类号： B41J3/543 , B41J3/60 , B41J11/0015 , B41J11/002 , B41J15/04 , B41J15/165
摘要： To allow continuous paper to be printed a plurality of times with a time difference by ink jet printer equipment and dried each time of printing while preventing condensation from occurring on an ink discharge surface of print head at and after the second time of printing, there is provided a printing apparatus comprising: a plurality of trains of printing units each of which has print heads arranged along a direction in which a continuous sheet of paper travels and which are arranged parallel to one another as shifted mutually in position in a direction of width of the continuous sheet of paper; a dryer section in which a plurality of continuous sheets of paper from the plural printing unit trains can travel as mutually shifted in position in a direction of width of the continuous sheet of paper; a cooling roller unit disposed downstream of the dryer section and having a cooling roller on which the plurality of continuous sheets of paper from the dryer section can be wound as mutually shifted in position in a direction of width of the continuous sheet of paper; and a turnover unit disposed between the cooling roller unit and a train of printing units for shifting the continuous sheet of paper in position into a direction of its width while reversing the direction in which it travels.
摘要翻译：为了允许连续纸通过喷墨打印机设备以时间差打印多次，并且每次打印时干燥，同时防止在第二次打印时和之后在打印头的喷墨表面上发生冷凝，存在提供了一种打印设备，包括：多个打印单元列，每个打印单元具有沿着连续纸张行进的方向布置的打印头，并且彼此平行地布置，沿宽度方向相互位移连续纸张; 干燥部，其中来自多个印刷单元列的多个连续纸可以在连续纸张的宽度方向上相互移位; 冷却辊单元，设置在所述干燥部的下游，并具有冷却辊，所述多个连续的来自所述干燥部的纸张可以从所述冷却辊沿所述连续纸的宽度方向相互移位; 以及设置在冷却辊单元和一系列印刷单元之间的翻转单元，用于将位置上的连续纸移动到其宽度方向上，同时反转其行进方向。

97. 发明授权

US07650342B2 User profile management system 有权
标题翻译：用户个人资料管理系统
公开(公告)号：US07650342B2
公开(公告)日：2010-01-19
申请号：US11628952
申请日：2005-06-10
申请人： Keiji Sugiyama , Junichi Hirai , Akira Ishikawa
发明人： Keiji Sugiyama , Junichi Hirai , Akira Ishikawa
IPC分类号： G06F7/00
CPC分类号： G06Q30/02 , G06Q30/0201 , G06Q30/04 , G06Q30/0601 , G06Q40/04
摘要： A management device that provides user profile taking the user's situation into consideration. The management device creates, in response to a request from applications, a new user profile (hereinafter referred to as “comprehensive user profile”) based on a plurality of user profiles, and provides it to the applications. The management device always monitors a user's situation, directly or indirectly correlates the user's situation at the time that the user profile is registered with the user profile, and stores the same. Because the management device creates the comprehensive user profile based on the user profile corresponding to the current user situation, the comprehensive user profile reflects the user's situation which changes from time to time.
摘要翻译：提供考虑用户情况的用户简档的管理设备。管理设备响应于应用的请求，创建基于多个用户简档的新用户简档（以下称为“综合用户简档”），并将其提供给应用。管理设备始终监视用户的情况，直接或间接地将用户简档登记的用户情况与用户简档相关联，并将其存储。由于管理设备基于与当前用户情况相对应的用户简档创建综合用户简档，所以综合用户简档反映了用户不时变化的情况。

98. 发明申请

US20090047785A1 CMP Polishing Method, CMP Polishing Apparatus, and Process for Producing Semiconductor Device 有权
标题翻译： CMP抛光方法，CMP抛光装置和用于制造半导体器件的方法
公开(公告)号：US20090047785A1
公开(公告)日：2009-02-19
申请号：US11795697
申请日：2005-12-21
申请人： Syozo Takada , Hisanori Matsuo , Akira Ishikawa
发明人： Syozo Takada , Hisanori Matsuo , Akira Ishikawa
IPC分类号： H01L21/306 , B24B7/00
CPC分类号： H01L21/02074 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/76826 , H01L21/76828
摘要： When the remaining slurry and polishing residue are removed by cleaning with a cleaning liquid (preferably a cleaning liquid containing a surfactant), organic matter in the cleaning liquid containing a surfactant seeps into the interlayer insulating film 3. Therefore, the substrate is subsequently washed with an organic solvent or a solution containing an organic solvent, thus washing away the organic matter that has seeped into the interlayer insulating film 3. Although the interlayer insulating film 3 is subjected to a hydrophobic treatment, since the solvent used is an organic solvent, this solvent is able to seep into the interlayer insulating film 3, dissolve the organic matter, and wash the organic matter away without being affected by this hydrophobic treatment. Afterward, the substrate 1 is dried, and the organic solvent or solution containing an organic solvent that is adhering to the surface is removed.
摘要翻译：当通过用清洗液（优选含有表面活性剂的清洗液）清洗剩余的浆料和抛光残渣时，含有表面活性剂的清洗液中的有机物渗入层间绝缘膜3.因此，随后用有机溶剂或含有有机溶剂的溶液，从而洗去已经渗透到层间绝缘膜3中的有机物质。尽管对层间绝缘膜3进行疏水处理，但由于使用的溶剂是有机溶剂，因此溶剂能够渗透到层间绝缘膜3中，溶解有机物质，并且在不受这种疏水处理的影响的情况下洗涤有机物质。之后，干燥基板1，除去附着在表面上的有机溶剂的有机溶剂或溶液。

99. 发明申请

US20080301166A1 User Profile Management System 有权
标题翻译：用户资料管理系统
公开(公告)号：US20080301166A1
公开(公告)日：2008-12-04
申请号：US11628952
申请日：2005-06-10
申请人： Keiji Sugiyama , Junichi Hirai , Akira Ishikawa
发明人： Keiji Sugiyama , Junichi Hirai , Akira Ishikawa
IPC分类号： G06F17/30 , G06F7/00
CPC分类号： G06Q30/02 , G06Q30/0201 , G06Q30/04 , G06Q30/0601 , G06Q40/04
摘要： The present invention provides a user profile which takes a user's situation into consideration. A management device 100 creates, in response to a request from applications 110, a new user profile (hereinafter referred to as “comprehensive user profile”) based on a plurality of user profiles, and provides it to the applications 110. The management device 100 always monitors a user's situation, directly or indirectly correlates the user's situation at the time that the user profile is registered with the user profile, and stores the same. Because the management device creates the comprehensive user profile based on the user profile corresponding to the current user situation, the comprehensive user profile reflects the user's situation which changes from time to time.
摘要翻译：本发明提供了考虑用户情况的用户简档。管理设备100响应于来自应用110的请求，创建基于多个用户简档的新用户简档（以下称为“综合用户简档”），并将其提供给应用110.管理设备100 始终监视用户的情况，直接或间接地将用户简档登记的用户情况与用户配置文件相关联，并将其存储。由于管理设备基于与当前用户情况相对应的用户简档创建综合用户简档，所以综合用户简档反映了用户不时变化的情况。

100. 发明授权

US07408193B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US07408193B2
公开(公告)日：2008-08-05
申请号：US11530353
申请日：2006-09-08
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： H01L29/10
CPC分类号： H01L27/1266 , G02F1/133305 , G02F1/1368 , G02F2001/13613 , H01L21/84 , H01L24/97 , H01L27/124 , H01L2221/68368 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01021 , H01L2924/01023 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01056 , H01L2924/0106 , H01L2924/01073 , H01L2924/01074 , H01L2924/01082 , H01L2924/09701 , H01L2924/12041 , H01L2924/12042 , H01L2924/14 , H01L2924/15788 , H01L2924/19043 , H01L2924/30105 , H01L2924/3025 , H01L2924/00
摘要： A semiconductor device packaged in three dimensions comprises a first thin film device, a second thin film device, and a third thin film device, each of the first, second, and third thin film devices comprising a first insulating film, a first electrode formed over the first insulating film, a second insulating film formed over the first electrode, first and second thin film transistors formed over the second insulating film, wherein the first thin film transistor is connected to the first electrode through a first contact hole, a third insulating film formed over the first and second thin film transistor, a second electrode formed over the third insulating film, wherein the second electrode is connected to the second thin film transistor through a second contact hole, and a fourth insulating film formed over the third insulating film and the second electrode.
摘要翻译：封装在三维中的半导体器件包括第一薄膜器件，第二薄膜器件和第三薄膜器件，第一，第二和第三薄膜器件中的每一个包括第一绝缘膜，形成在第一薄膜器件上的第一电极第一绝缘膜，形成在第一电极上的第二绝缘膜，形成在第二绝缘膜上的第一和第二薄膜晶体管，其中第一薄膜晶体管通过第一接触孔连接到第一电极，第三绝缘膜形成在第一和第二薄膜晶体管上的第二电极，形成在第三绝缘膜上的第二电极，其中第二电极通过第二接触孔连接到第二薄膜晶体管，第四绝缘膜形成在第三绝缘膜上，第二电极。

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