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91. 发明申请

US20070015082A1 Process of making a lithographic structure using antireflective materials 审中-公开
标题翻译：使用抗反射材料制作平版印刷结构的工艺
公开(公告)号：US20070015082A1
公开(公告)日：2007-01-18
申请号：US11180787
申请日：2005-07-14
申请人： Marie Angelopoulos , Katherina Babich , Sean Burns , Allen Gabor , Scott Halle , Arpan Mahorowala , Dirk Pfeiffer
发明人： Marie Angelopoulos , Katherina Babich , Sean Burns , Allen Gabor , Scott Halle , Arpan Mahorowala , Dirk Pfeiffer
IPC分类号： G03F7/26 , G03C5/00
CPC分类号： G03F7/091 , G03F7/0757 , Y10T428/24942 , Y10T428/31663
摘要： A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.
摘要翻译：一种光刻结构，包括：设置在基板上的有机抗反射材料; 以及设置在有机抗反射材料上的硅抗反射材料。硅抗反射材料包括具有SiO 2主链的交联聚合物，发色团和对193nm或157nm辐射基本透明的透明有机基团。组合地，有机抗反射材料和硅抗反射材料提供适用于深紫外光刻的抗反射材料。本发明还涉及制备光刻结构的方法。

92. 发明授权

US06752935B2 Deaggregated electrically conductive polymers and precursors thereof 失效
标题翻译：解聚集的导电聚合物及其前体
公开(公告)号：US06752935B2
公开(公告)日：2004-06-22
申请号：US09945898
申请日：2001-09-04
申请人： Marie Angelopoulos , Bruce K. Furman
发明人： Marie Angelopoulos , Bruce K. Furman
IPC分类号： H01B112
CPC分类号： H01B1/124 , C08G2261/312 , H01B1/125 , H01B1/127 , H01B1/128 , Y10S524/91 , Y10T428/26
摘要： Deaggregated substituted and unsubstitued polyparaphenylenes, polyparaphenylevevinyles, polyanilines, polyazines, polythiophenes, poly-p-phenylene sulfides, polyfuranes, polypyrroles, polyselenophene, polyacetylenes formed from soluble precursors and combinations thereof and copolymers thereof and methods of fabrication are described. The deaggregated polymer molecules when subsequently doped show higher electrical conductivity. Agents such as lithium chloride, m-cresol and nonylphenol are used to deaggregate the polymer molecules. The deaggregating agents can be added prior to or during doping the molecules.
摘要翻译：描述了聚集的取代和未取代的聚对苯二酚，聚对苯乙烯基乙烯基，聚苯胺，聚嗪，聚噻吩，聚对苯硫醚，聚呋喃，聚吡咯，聚硒吩，由可溶性前体及其组合形成的聚乙炔及其共聚物及其制备方法。随后掺杂时的解聚聚合物分子显示更高的导电性。诸如氯化锂，间甲酚和壬基苯酚的试剂用于解聚聚合物分子。解聚剂可以在掺杂分子之前或期间加入。

93. 发明授权

US06685853B1 Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith 有权
标题翻译：能量敏感的导电掺合物，其用途，制造方法和用其制造的结构
公开(公告)号：US06685853B1
公开(公告)日：2004-02-03
申请号：US09614230
申请日：2000-07-12
申请人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
发明人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
IPC分类号： H01B112
CPC分类号： H01B1/12 , H01L23/5328 , H01L2924/0002 , H01L2924/00
摘要： The present invention is an admixture of an electrically conductive material and an energy sensitive material resulting in a conductive energy sensitive composition. The structures are useful for lithography in microelectronic fabrication to avoid the effects of charging on resists from electron beams. The compositions are also useful in applications of scanning electron metrology and static dissipation.
摘要翻译：本发明是导电材料和能量敏感材料的混合物，导致导电能量敏感组合物。该结构可用于微电子制造中的光刻，以避免对来自电子束的抗蚀剂充电的影响。该组合物也可用于扫描电子测量和静电消散的应用中。

94. 发明授权

US06682860B2 Attenuated embedded phase shift photomask blanks 有权
公开(公告)号：US06682860B2
公开(公告)日：2004-01-27
申请号：US10122876
申请日：2002-04-12
申请人： Marie Angelopoulos , Katherina Babich , S. Jay Chey , Michael Straight Hibbs , Robert N. Lang , Arpan Pravin Mahorowala , Kenneth Christopher Racette
发明人： Marie Angelopoulos , Katherina Babich , S. Jay Chey , Michael Straight Hibbs , Robert N. Lang , Arpan Pravin Mahorowala , Kenneth Christopher Racette
IPC分类号： G03F900
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08
摘要： An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001% up to 15% at 157 nm) is obtained by this process.

95. 发明授权

US06514667B2 Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof 有权
公开(公告)号：US06514667B2
公开(公告)日：2003-02-04
申请号：US09932002
申请日：2001-08-17
申请人： Marie Angelopoulos , Katherina Babich , Alfred Grill , Scott David Halle , Arpan Pravin Mahorowala , Vishnubhai Vitthalbhai Patel
发明人： Marie Angelopoulos , Katherina Babich , Alfred Grill , Scott David Halle , Arpan Pravin Mahorowala , Vishnubhai Vitthalbhai Patel
IPC分类号： G03F7075
CPC分类号： H01L21/3122 , C23C16/30 , C23C16/32 , C23C16/325 , G03F7/091 , H01L21/02112 , H01L21/02126 , H01L21/02167 , H01L21/02211 , H01L21/02216 , H01L21/02274 , H01L21/0276 , H01L21/31144 , H01L21/31633 , H01L21/76832 , H01L23/53295 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

96. 发明授权

US06331356B1 Patterns of electrically conducting polymers and their application as electrodes or electrical contacts 失效
标题翻译：导电聚合物的图案及其作为电极或电触头的应用
公开(公告)号：US06331356B1
公开(公告)日：2001-12-18
申请号：US09113807
申请日：1998-07-09
申请人： Marie Angelopoulos , Christos Dimitrios Dimitrakopoulos , Bruce Kenneth Furman , Teresita Ordonez Graham , Shui-Chih Alan Lien
发明人： Marie Angelopoulos , Christos Dimitrios Dimitrakopoulos , Bruce Kenneth Furman , Teresita Ordonez Graham , Shui-Chih Alan Lien
IPC分类号： B32B904
CPC分类号： H01L51/5203 , C08G61/12 , G02F1/13439 , H01B1/125 , H01B1/127 , H01B1/128 , H01J29/868 , H01L21/0332 , H01L21/31138 , H01L23/49894 , H01L23/60 , H01L29/456 , H01L29/458 , H01L29/4908 , H01L33/38 , H01L33/42 , H01L51/0018 , H01L51/0021 , H01L51/0023 , H01L51/0504 , H01L51/0508 , H01L51/0512 , H01L51/0545 , H01L51/102 , H01L51/5206 , H01L51/5234 , H01L2251/5323 , H01L2924/0002 , H01L2924/09701 , H01L2924/12044 , Y10T428/10 , Y10T428/1055 , Y10T428/12528 , Y10T428/24331 , Y10T428/31504 , Y10T428/31533 , Y10T428/31678 , Y10T428/31692 , H01L2924/00
摘要： Electronic devices having patterned electrically conductive polymers providing electrical connection thereto and methods of fabrication thereof are described. Liquid crystal display cells are described having at least one of the electrodes providing a bias across the liquid crystal material formed from a patterned electrically conductive polymer. Thin film transistors having patterned electrically conductive polymers as source drain and gate electrodes are described. Light emitting diodes having anode and coated regions formed from patterned electrically conductive polymers are described. Methods of patterning using a resist mask; patterning using a patterned metal layer; patterning the metal layer using a resist; and patterning the electrically conductive polymer directly to form electrodes and anode and cathode regions are described.
摘要翻译：描述了具有提供电连接的图案化导电聚合物的电子器件及其制造方法。描述了液晶显示单元，其中至少一个电极提供跨越由图案化的导电聚合物形成的液晶材料的偏压。描述了具有图案化导电聚合物作为源极漏极和栅电极的薄膜晶体管。描述了由图案化的导电聚合物形成的具有阳极和涂覆区域的发光二极管。使用抗蚀剂掩模的图案化方法; 使用图案化金属层进行图案化; 使用抗蚀剂图案化金属层; 并且直接对导电聚合物进行图案化以形成电极，并描述阳极和阴极区域。

97. 发明授权

US06255450B1 Methods of fabrication of deaggregated electrically conductive polymers and precursors therefor 有权
标题翻译：解聚集导电聚合物及其前体的制备方法
公开(公告)号：US06255450B1
公开(公告)日：2001-07-03
申请号：US09228735
申请日：1999-01-12
申请人： Marie Angelopoulos , Bruce K. Furman
发明人： Marie Angelopoulos , Bruce K. Furman
IPC分类号： C08G7300
CPC分类号： C08F283/00 , C08G61/12
摘要： Deaggregated substituted and unsubstituted polyparaphenylenes, polyparaphenylevevinyles, polyanilines, polyazines, polythiophenes, poly-p-phenylene sulfides, polyfuranes, polypyrroles, polyselenophene, polyaccetylenes formed from soluble precursors and combinations thereof and copolymers thereof and methods of fabrication are described. The deaggregated polymer molecules when subsequently doped show higher electrical conductivity. Agents such as lithium chloride, m-cresol and nonylphenol are used to deaggregate the polymer molecules. The deaggregating agents can be added prior to or during doping the molecules.
摘要翻译：描述了聚集的取代和未取代的聚对苯二酚，聚对苯乙烯基乙烯基，聚苯胺，聚嗪，聚噻吩，聚对亚苯基硫醚，聚呋喃，聚吡咯，聚硒酚，由可溶性前体形成的聚四氯乙烯及其组合及其共聚物及其制备方法。随后掺杂时的解聚聚合物分子显示更高的导电性。诸如氯化锂，间甲酚和壬基苯酚的试剂用于解聚聚合物分子。解聚剂可以在掺杂分子之前或期间加入。

98. 发明授权

US06241913B1 Branched electrically conductive polymers and precursors and applications thereof 失效
标题翻译：支链导电聚合物及其前体及其应用
公开(公告)号：US06241913B1
公开(公告)日：2001-06-05
申请号：US08722283
申请日：1996-09-27
申请人： Marie Angelopoulos , Yun-Hsin Liao
发明人： Marie Angelopoulos , Yun-Hsin Liao
IPC分类号： H01B112
CPC分类号： C08G73/1071 , C08G2261/312 , C08L101/12 , H01B1/128
摘要： The present invention is directed to a polymer selected from a precursor to an electrically conductive polymer and an electrically conductive polymer. The polymer has a branched structure. The polymer is formed from polymerization of momomers of which at least one monomer has more than one polymerizable site. One of the polymerizable monomers or units can have structural formula X—(M)n where X is a base element of the unit, M is the polymerization functional site, n is the number of M sites; and n>1. The polymer can be formed from more than one polymerization unit having different base elements, polymerization functional units and different values of n.
摘要翻译：本发明涉及一种选自导电聚合物的前体和导电聚合物的聚合物。聚合物具有支链结构。聚合物由其中至少一个单体具有多于一个可聚合位点的单体的聚合形成。可聚合单体或单元之一可以具有结构式X-（M）n，其中X是单元的基础元素，M是聚合官能位点，n是M位点的数目; 而n> 1。聚合物可由多于一个具有不同碱基元素，聚合官能单元和不同n值的聚合单元形成。

99. 发明授权

US06221568B1 Developers for polychloroacrylate and polychloromethacrylate based resists 失效
标题翻译：聚氯丙烯酸酯和聚氯甲基丙烯酸酯基抗蚀剂的开发商
公开(公告)号：US06221568B1
公开(公告)日：2001-04-24
申请号：US09421591
申请日：1999-10-20
申请人： Marie Angelopoulos , Wayne Martin Moreau , Karen Elizabeth Petrillo
发明人： Marie Angelopoulos , Wayne Martin Moreau , Karen Elizabeth Petrillo
IPC分类号： G03F732
CPC分类号： G03F7/325
摘要： The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.
摘要翻译：本发明涉及具有高对比度且其组分在沸点上紧密匹配的聚α-丙烯酸酯或甲基丙烯酸酯基抗蚀剂的显影剂组合物。使用本发明人改善了在正电子束抗蚀剂中显影的图像的临界尺寸均匀性。更具体地说，本发明涉及其组合物指向增强的印刷线性，更好地跨平板均匀性以及改进的成像正性抗蚀剂的对比度的显影剂制剂。这种改进的显影剂可用于由光子，电子，离子或X射线暴露的正性抗蚀剂。

100. 发明授权

US06153725A Control of polymerization kinetics and rate of polymer precipitation as a means of controlling the aggregation and morphology in conductive polymers and precursors thereof 失效
标题翻译：控制聚合动力学和聚合物沉淀速率作为控制导电聚合物及其前体中的聚集和形态的手段
公开(公告)号：US06153725A
公开(公告)日：2000-11-28
申请号：US43630
申请日：1998-07-17
申请人： Marie Angelopoulos , Richard Anthony DiPietro
发明人： Marie Angelopoulos , Richard Anthony DiPietro
IPC分类号： C08G61/12 , H01B1/12 , C08G73/00
CPC分类号： H01B1/128 , C08G61/122
摘要： The present invention is directed to methods of fabricating electrically conducting polymers and precursors thereof in which the polymer has a controlled level of aggregation and morphology. This is done by controlling the rate of polymerization and the rate at which the polymer precipitates from solution during the polymerization reaction. An additive is added to the polymerization medium, said additive increasing or decreasing the rate at which the polymer precipitates from the reaction medium. When said additive is a second organic solvent, the polymerization reaction proceeds homogeneously for a longer period of time than does the corresponding polymerization reaction which does not include said additive. Control of the polymerization kinetics allows control of the morphology for the isolated polymer and in turn control of the properties of these polymers.
摘要翻译： PCT No.PCT / US97 / 13273 Sec。 371日期：1998年7月17日 102（e）日期1998年7月17日PCT 1997年7月24日PCT公布。出版物WO98 / 04611 日期1998年2月5日本发明涉及制造导电聚合物及其前体的方法，其中聚合物具有受控的聚集和形态水平。这是通过控制聚合速率和在聚合反应期间聚合物从溶液中沉淀的速率来完成的。将添加剂加入到聚合介质中，所述添加剂增加或降低聚合物从反应介质中沉淀出的速率。当所述添加剂是第二有机溶剂时，与不含所述添加剂的相应聚合反应相比，聚合反应进行的时间比较长。聚合动力学的控制允许控制分离的聚合物的形态，从而控制这些聚合物的性质。

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