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1. 发明授权

US06599683B1 Photoresist developer with reduced resist toppling and method of using same 有权
标题翻译：具有降低抗蚀剂倾倒的光致抗蚀剂显影剂及其使用方法
公开(公告)号：US06599683B1
公开(公告)日：2003-07-29
申请号：US10074640
申请日：2002-02-13
申请人： Kevin J. Torek , Yoshiki Hishiro
发明人： Kevin J. Torek , Yoshiki Hishiro
IPC分类号： G03F732
CPC分类号： G03F7/327 , G03F7/322
摘要： A developer solution used in the development process of a photoresist is provided. The developer solution reduces or eliminates toppling that occurs during development of the photoresist. The solution contains a polyhydric alcohol, a base compound, and a surfactant. A method for developing a photoresist using the solution is provided.
摘要翻译：提供了用于光致抗蚀剂的显影过程中的显影剂溶液。显影剂溶液减少或消除在光致抗蚀剂显影过程中发生的倒角。该溶液含有多元醇，碱性化合物和表面活性剂。提供了使用该溶液显影光致抗蚀剂的方法。

2. 发明授权

US06255042B1 Developing system for alkaline-developable lithographic printing plates with different interlayers 失效
标题翻译：用于具有不同夹层的碱性显影平版印刷版的显影系统
公开(公告)号：US06255042B1
公开(公告)日：2001-07-03
申请号：US09449074
申请日：1999-11-24
申请人： Ulrich Fiebag , Tondock Uwe
发明人： Ulrich Fiebag , Tondock Uwe
IPC分类号： G03F732
CPC分类号： G03F7/322 , C11D7/14 , C11D7/16 , C11D7/5022 , C11D11/0047
摘要： The invention is aqueous alkaline composition comprising at least one alkali metal silicate, glycerol, at least one glycol and phosphoric acid and/or phosphates. The composition can be used as a developer and replenisher for developing either positive-working or negative-working alkaline developable lithographic printing plates (including thermal plates) independently of the interlayer present in the printing plate.
摘要翻译：本发明是包含至少一种碱金属硅酸盐，甘油，至少一种二醇和磷酸和/或磷酸盐的水性碱性组合物。组合物可用作显影剂和补充剂，用于独立于存在于印刷版中的夹层来开发正性或负性碱性可显影平版印刷版（包括热敏板）。

3. 发明授权

US06251570B1 Resist developer saving system using material to reduce surface tension and wet resist surface 有权
标题翻译：抵抗使用材料的显影剂储存系统，以减少表面张力和抗湿表面
公开(公告)号：US06251570B1
公开(公告)日：2001-06-26
申请号：US09604372
申请日：2000-06-27
申请人： Khoi A. Phan , Ramkumar Subramanian , Bharath Rangarajan , Bhanwar Singh
发明人： Khoi A. Phan , Ramkumar Subramanian , Bharath Rangarajan , Bhanwar Singh
IPC分类号： G03F732
CPC分类号： G03F7/32 , G03F7/322 , G03F7/38
摘要： In one embodiment, the present invention relates to a method of processing a semiconductor structure including a resist thereon, involving the steps of exposing the semiconductor structure including the resist to acting radiation; contacting the semiconductor structure including the exposed resist with a solution comprising water and from about 0.01% to about 5% by weight of a surfactant; and developing the resist with a developer.
摘要翻译：在一个实施例中，本发明涉及一种处理包括其上的抗蚀剂的半导体结构的方法，包括将包括抗蚀剂的半导体结构暴露于作用辐射的步骤; 将包含曝光的抗蚀剂的半导体结构与包含水和约0.01重量％至约5重量％的表面活性剂的溶液接触; 并用开发商开发抗蚀剂。

4. 发明授权

US06232045B1 System for creating, reading and writing on rotatable information storage media, a method for producing a recording blank 失效
标题翻译：用于在可旋转信息存储介质上创建，读取和写入的系统，用于产生记录空白的方法
公开(公告)号：US06232045B1
公开(公告)日：2001-05-15
申请号：US09023971
申请日：1998-02-13
申请人： Lawrence Jacobowitz , Casimer M. DeCusatis
发明人： Lawrence Jacobowitz , Casimer M. DeCusatis
IPC分类号： G03F732
CPC分类号： G11B7/24038 , G11B7/0938 , G11B7/245 , G11B7/252 , G11B7/2534 , G11B7/254 , G11B7/2585 , G11B7/261
摘要： A photolithographic process is provided for producing a blank storage disk which includes a reference track pattern. The track pattern provides two edges as reference lines from which distances are determinable for the purpose of laser writing multiple information tracks between adjacent reference track patterns which are preferably spirals (single or interlaced) or concentric circles. The photo-lithographic process is also used to create recording blanks having multiple layers.
摘要翻译：提供了一种光刻工艺，用于生产包括参考轨迹图案的空白存储盘。轨道图案提供两个边缘作为参考线，从该距离可以确定距离，用于激光写入相邻参考轨道图案之间的多个信息轨迹，该轨迹图案优选为螺旋形（单个或隔行扫描）或同心圆。光刻工艺也用于创建具有多层的记录坯料。

5. 发明授权

US06610465B2 Process for producing film forming resins for photoresist compositions 失效
标题翻译：用于制造光致抗蚀剂组合物的成膜树脂的方法
公开(公告)号：US06610465B2
公开(公告)日：2003-08-26
申请号：US09833226
申请日：2001-04-11
申请人： M. Dalil Rahman , Douglas McKenzie , Takanori Kudo , Munirathna Padmanaban
发明人： M. Dalil Rahman , Douglas McKenzie , Takanori Kudo , Munirathna Padmanaban
IPC分类号： G03F732
CPC分类号： B01J20/28033 , B01J20/28004 , B01J20/28028 , B01J20/2803 , B01J20/28085 , B01J47/018 , B01J47/133 , C08F6/02 , C08F6/16 , G03F7/0395
摘要： The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).
摘要翻译：本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法，包括以下步骤：（a）在成膜剂中提供成膜树脂的溶液; （b）提供以下两个过滤片：（i）含有固定有微粒过滤助剂和粒状离子交换树脂颗粒的自支撑纤维基质的过滤片，其中颗粒助滤剂和离子交换树脂颗粒基本上分布均匀地遍布所述基质的横截面; 和（ii）含有固定有颗粒助滤剂和粘合剂树脂的纤维自支撑基质的过滤片; （c）用步骤（a）的溶剂冲洗步骤（b）的过滤片; 和（d）使成膜树脂的溶液通过步骤（c）的冲洗过的滤纸。

6. 发明授权

US06602654B2 Developing solution for a photoresist and a method for developing the photoresist 有权
公开(公告)号：US06602654B2
公开(公告)日：2003-08-05
申请号：US10033922
申请日：2002-01-03
申请人： Keiichi Iwata , Kazushi Gouroku , Kenichi Nakamura
发明人： Keiichi Iwata , Kazushi Gouroku , Kenichi Nakamura
IPC分类号： G03F732
CPC分类号： G03F7/322
摘要： Developing solution for a photoresist comprising an alicyclic amine compound and a non-metallic alkali compound is described. The developing solution exhibits excellent wettability and dissolution selectivity to alicyclic compound-based resists. Also, the developing solution does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns.

7. 发明授权

US06372415B1 Resist developer 失效
标题翻译：抵制开发商
公开(公告)号：US06372415B1
公开(公告)日：2002-04-16
申请号：US09181621
申请日：1998-10-28
申请人： Shogo Nomoto , Akimitsu Sakai , Kozo Kitazawa
发明人： Shogo Nomoto , Akimitsu Sakai , Kozo Kitazawa
IPC分类号： G03F732
CPC分类号： G03F7/322
摘要： A resist developer comprising (1) a basic organic compound A and (2) a salt C of (a) a basic compound A′ and (b) an organic compound B capable of forming a salt together with said basic compound A′, wherein said basic compound A′ is the same or different from said basic organic compound A, and wherein said resist developer is prepared by combining (1) and (2), or by reacting an excess amount of said basic organic compound A with said organic compound B.
摘要翻译：一种抗蚀剂显影剂，其包含（1）碱性有机化合物A和（2）碱性化合物A'的（a）和（b）能够与所述碱性化合物A'一起形成盐的有机化合物B的盐C（其中所述碱性化合物A'与所述碱性有机化合物A相同或不同，并且其中所述抗蚀剂显影剂通过组合（1）和（2）制备，或通过使过量的所述碱性有机化合物A与所述有机化合物 B.

8. 发明授权

US06312873B1 Plate surface protective agent for lithographic printing plate, and fountain solution composition for lithographic printing plate 失效
标题翻译：平版印刷版板表面保护剂，平版印刷版用润版液组合物
公开(公告)号：US06312873B1
公开(公告)日：2001-11-06
申请号：US09556126
申请日：2000-04-20
申请人： Hiroshi Matsumoto , Yasue Harada
发明人： Hiroshi Matsumoto , Yasue Harada
IPC分类号： G03F732
CPC分类号： B41N3/08
摘要： A plate surface protective agent for a lithographic printing plate and a fountain solution composition for a lithographic printing plate are disclosed, each comprising at least one compound selected from the group consisting of the compounds represented by the following formula: wherein R, a and b are defined hereinbefore.
摘要翻译：公开了用于平版印刷版的平板表面保护剂和用于平版印刷版的润版液组合物，它们各自包含至少一种选自由下式表示的化合物的化合物：其中R，a和b是如上所述。

9. 发明授权

US06291141B1 Washing solvent designed to remove the unpolymerised part of a layer of photopolymer exposed to light 失效
标题翻译：洗涤溶剂设计用于去除暴露于光的光聚合物层的未聚合部分
公开(公告)号：US06291141B1
公开(公告)日：2001-09-18
申请号：US09535199
申请日：2000-03-27
申请人： Walter Bovati , Pier Angelo Balducci
发明人： Walter Bovati , Pier Angelo Balducci
IPC分类号： G03F732
CPC分类号： C11D7/262 , C11D7/24 , C11D7/261 , C11D7/5022 , G03F7/325
摘要： This invention relates to a washing solvent designed to remove the unpolymerised part of a photopolymer exposed to light, in particular in flexographic printing processes, characterised in that the said solvent comprises 25 to 70% in weight of an alicyclic hydrocarbon, 15 to 50% in weight of an aromatic hydrocarbon and 10 to 30% in weight of an aliphatic alcohol.
摘要翻译：本发明涉及设计用于去除暴露于光的光聚合物的未聚合部分的洗涤溶剂，特别是在柔性版印刷方法中，其特征在于所述溶剂包含25至70重量％的脂环烃，15至50重量％芳族烃的重量和10至30％重量的脂族醇。

10. 发明授权

US06284440B1 Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same 失效
标题翻译：碱性水溶液及使用其形成感光性树脂组合物的图案的方法
公开(公告)号：US06284440B1
公开(公告)日：2001-09-04
申请号：US09623372
申请日：2000-09-01
申请人： Takashi Hirano , Toshio Banba
发明人： Takashi Hirano , Toshio Banba
IPC分类号： G03F732
CPC分类号： G03F7/322 , C08G69/42 , C08K5/29 , C09D177/06 , G03F7/0233 , G03F7/0757 , C08L77/06
摘要： The present invention provides a method for formation of a pattern of a photosensitive resin composition, which method is superior in sensitivity and film-thinning ratio, generates no scum in pattern formation, and gives a high resolution. That is, the present invention lies in a method for forming a pattern of a photosensitive resin composition, which comprises coating, on a substrate or the like, a positive photosensitive resin composition composed of a polyamide of particular structure and a diazoquinone compound, subjecting the resulting material to prebaking and then to light exposure, and dissolving and removing the exposed portions of the material with an aqueous alkaline solution containing an anionic surfactant and at least one kind of compound selected from compounds of calcium, strontium and barium, to obtain a pattern. The feature of the present invention lies particularly in using such an aqueous alkaline solution as a developing solution.
摘要翻译：本发明提供一种形成感光性树脂组合物的图案的方法，该方法的灵敏度和薄膜变化率优异，在图案形成中不产生浮渣，并赋予高分辨率。也就是说，本发明在于形成感光性树脂组合物的图案的方法，其包括在基材等上涂布由特定结构的聚酰胺和重氮醌化合物组成的正性感光性树脂组合物，使得到的材料预烘烤然后曝光，并用含有阴离子表面活性剂和选自钙，锶和钡的化合物的至少一种化合物的碱性水溶液溶解和除去材料的暴露部分，以获得图案。本发明的特征特别在于使用这种碱性水溶液作为显影液。

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