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91. 发明授权

US06584168B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06584168B2
公开(公告)日：2003-06-24
申请号：US10092280
申请日：2002-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray exposure apparatus operating in a vacuum or a reduced-pressure environment includes a mask, arranged in the vacuum or in the reduced-pressure environment, for holding a reflection X-ray mask having a mask pattern thereon, an X-ray illuminating system arranged so as to illuminate the reflection X-ray mask having the mask pattern thereon, relatively scanningly with X-rays, wherein the mask pattern being illuminated is transferred onto an object, and a cooling structure for cooling the X-ray mask held by the mask chuck.
摘要翻译：在真空或减压环境中工作的X射线曝光装置包括在真空中或在减压环境中布置的用于保持其上具有掩模图案的反射X射线掩模的掩模，X射线照明系统，其被布置成以X射线相对扫描地照射其上具有掩模图案的反射X射线掩模，其中照射的掩模图案被转印到物体上，并且用于冷却所述X射线掩模的冷却结构通过面罩卡盘。

92. 发明授权

US06310934B1 X-ray projection exposure apparatus and a device manufacturing method 有权
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06310934B1
公开(公告)日：2001-10-30
申请号：US09342897
申请日：1999-06-29
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
摘要翻译： X射线投影曝光装置包括：掩模卡盘，用于保持其上具有掩模图案的反射X射线掩模，在掩模和掩模卡盘之间形成空隙;晶片卡盘，用于保持掩模图案是转移了用于照射由掩模卡盘保持的反射X射线掩模的X射线照射系统的X射线，用于将反射X射线掩模的掩模图案投影到晶片上的X射线投影光学系统由晶片卡盘以预定的放大率保持，以及用于将形成在掩模和掩模卡盘之间的空隙供给用于冷却掩模的冷却气体的供给。

93. 发明授权

US6087053A Device manufacturing method with transfer magnification adjustment to correct thermal distortion of substrate 失效
标题翻译：装置制造方法采用传输倍率调整校正基板的热变形
公开(公告)号：US6087053A
公开(公告)日：2000-07-11
申请号：US72133
申请日：1998-05-05
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , G03F9/00
CPC分类号： G03F7/70425 , G03F7/70241 , G03F7/70258 , G03F7/70783
摘要： An exposure method includes the steps of transferring, by exposure, a pattern formed on an original to different shot regions on a substrate sequentially, and performing, during exposure of a certain shot, at least one of (i) adjusting a relative positional relation between the original and the substrate, with respect to a direction effective to correct translation of a transfer region of the substrate due to thermal distortion thereof, and (ii) adjusting a transfer magnification of the pattern of the original to the substrate so as to correct enlargement of the transfer region due to thermal distortion of the substrate. In one preferred form, the adjustment is made in accordance with a correction table related to thermal expansion of the substrate during exposure and being prepared on the basis of one of a calculation and a preparatory exposure experiment. In another preferred form, the transfer magnification is adjusted by deforming the original, and in a further preferred form, the transfer magnification is adjusted by adjusting a projection optical system for projecting the pattern of the original to the substrate.
摘要翻译：曝光方法包括以下步骤：通过曝光将形成在原稿上的图案顺序地转印到基板上的不同拍摄区域，并且在曝光期间执行以下至少之一：（i）调整相对位置关系相对于有效地校正由于其热变形而导致的基板的转印区域的平移的方向的原稿和基板，以及（ii）调整原稿的图案到基板的转印倍率，以校正放大由于基板的热变形而导致的转印区域。在一个优选形式中，根据在曝光期间与衬底的热膨胀相关的校正表进行调整，并且基于计算和预备曝光实验之一进行准备。在另一优选形式中，通过使原稿变形来调节转印倍率，并且在另一优选形式中，通过调整用于将原稿的图案投影到基底的投影光学系统来调节转印倍率。

94. 发明授权

US6069931A Mask structure and mask holding mechanism for exposure apparatus 失效
标题翻译：曝光装置的面罩结构和面罩保持机构
公开(公告)号：US6069931A
公开(公告)日：2000-05-30
申请号：US30081
申请日：1998-02-25
申请人： Takeshi Miyachi , Shinichi Hara
发明人： Takeshi Miyachi , Shinichi Hara
IPC分类号： G03F1/00 , G03F7/20 , H01L21/30
CPC分类号： G03F7/707 , G03F7/70783
摘要： A mask holding system includes a chucking mechanism for holding a mask structure including a frame and a mask substrate having a rectangular window with a mask pattern, and a load mechanism for applying, at a position along an extension of a diagonal of the rectangular window, a load to the frame in a direction along the plane of the mask, whereby the mask pattern can be distorted isotropically with the application of the load along the mask plane.
摘要翻译：掩模保持系统包括用于保持包括框架的掩模结构的夹持机构和具有带有掩模图案的矩形窗口的掩模基板，以及负载机构，用于在沿着矩形窗口的对角线的延伸部的位置处，沿着掩模平面的方向对框架的载荷，由此掩模图案可以沿着掩模平面施加负载而各向同性地变形。

95. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

96. 发明授权

US5593800A Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效
标题翻译：掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
申请人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
发明人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/00 , G03F1/22 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译：掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。

97. 发明授权

US5374829A Vacuum chuck 失效
标题翻译：真空吸盘
公开(公告)号：US5374829A
公开(公告)日：1994-12-20
申请号：US231785
申请日：1994-04-25
申请人： Eiji Sakamoto , Ryuichi Ebinuma , Shinichi Hara , Mitsuji Marumo
发明人： Eiji Sakamoto , Ryuichi Ebinuma , Shinichi Hara , Mitsuji Marumo
IPC分类号： C30B25/12 , C30B31/14 , H01L21/683 , H01J37/20
CPC分类号： C30B31/14 , C30B25/12 , H01L21/6838 , Y10T279/11
摘要： A wafer holding device of the vacuum attraction type includes a structural member having a protrusion for supporting a wafer and elastic members made of a material having an elasticity modulus smaller than that of the wafer and that of the structural member. The elastic members are distributed on a wafer attraction plane of the structural member.
摘要翻译：真空吸引型的晶片保持装置包括具有用于支撑晶片的突起的结构构件和由具有比晶片的弹性模量小的结构构件的弹性模量的材料制成的弹性构件。弹性构件分布在结构构件的晶片吸引面上。

98. 发明授权

US5155523A Workpiece supporting mechanism 失效
标题翻译：工作支持机制
公开(公告)号：US5155523A
公开(公告)日：1992-10-13
申请号：US350648
申请日：1989-05-11
申请人： Shinichi Hara , Shunichi Uzawa
发明人： Shinichi Hara , Shunichi Uzawa
IPC分类号： G12B5/00 , F16F15/02 , G03F7/20 , G05D19/02 , G12B9/08 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/687 , H01L41/04
CPC分类号： H01L21/67288 , F16F15/02 , G03F7/70725 , G03F7/70866 , G03F7/709 , G05D19/02 , H01L21/68785 , H01L41/042
摘要： A workpiece supporting mechanism suitably usable in an exposure apparatus, is disclosed. The mechanism includes a workpiece supporting member which is provided with a displacement sensor such as a speed sensor or an acceleration sensor. A vibrator such as a piezoelectric device is added to the supporting member or a stage which supports the supporting member. Any vibration of the workpiece or the supporting member is detected by the displacement sensor and, in accordance with the detection, the vibrator is energized to cancel the vibration of the workpiece and the workpiece supporting member.

99. 发明授权

US5093579A Exposure apparatus with a substrate holding mechanism 失效
标题翻译：具有基板保持机构的曝光装置
公开(公告)号：US5093579A
公开(公告)日：1992-03-03
申请号：US550989
申请日：1990-07-11
申请人： Mitsuaki Amemiya , Shinichi Hara , Eiji Sakamoto
发明人： Mitsuaki Amemiya , Shinichi Hara , Eiji Sakamoto
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , H01L21/683
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70866 , G03F7/70875
摘要： A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.

100. 发明授权

US4971896A Method for forming thin film pattern and method for fabricating thin film magnetic head using the same 失效
标题翻译：用于形成薄膜图案的方法和使用其制造薄膜磁头的方法
公开(公告)号：US4971896A
公开(公告)日：1990-11-20
申请号：US280828
申请日：1988-12-07
申请人： Takashi Kawabe , Ataru Kobayashi , Moriaki Fuyama , Makoto Morijiri , Eiji Ashida , Masatoshi Tsuchiya , Tetsuya Okai , Masanobu Hanazono , Shinichi Hara , Shinji Narishige , Hiroshi Ikeda
发明人： Takashi Kawabe , Ataru Kobayashi , Moriaki Fuyama , Makoto Morijiri , Eiji Ashida , Masatoshi Tsuchiya , Tetsuya Okai , Masanobu Hanazono , Shinichi Hara , Shinji Narishige , Hiroshi Ikeda
IPC分类号： G03F7/00 , G11B5/31
CPC分类号： G11B5/3163 , G03F7/0035 , Y10S430/165
摘要： A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.
摘要翻译：在具有台阶部的基底上形成薄膜图案的方法。该方法包括在基底上形成给定材料的薄膜的第一步骤，第二步骤，在包括台阶部分的下部的第一部分中的一个上形成在所述薄膜上的第一光致抗蚀剂膜的预定图案，以及第二部分，包括台阶部分的上部;第三步骤，在所述第一和第二部分中的另一个上在所述薄膜上形成第二光致抗蚀剂膜的预定图案;以及第四步骤，将所述薄片给定材料的膜使用掩模，所述第一和第二部分形成在所述薄膜上形成的第一和第二光致抗蚀剂图案。

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