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91. 发明授权

US06616898B2 Processing apparatus with pressure control and gas recirculation system 失效
标题翻译：具有压力控制和气体再循环系统的加工设备
公开(公告)号：US06616898B2
公开(公告)日：2003-09-09
申请号：US09257258
申请日：1999-02-25
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D1600
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境气体被吹送到密封真空室中，使得沿着处理部分沿预定方向产生气流。

92. 发明授权

US06584168B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06584168B2
公开(公告)日：2003-06-24
申请号：US10092280
申请日：2002-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray exposure apparatus operating in a vacuum or a reduced-pressure environment includes a mask, arranged in the vacuum or in the reduced-pressure environment, for holding a reflection X-ray mask having a mask pattern thereon, an X-ray illuminating system arranged so as to illuminate the reflection X-ray mask having the mask pattern thereon, relatively scanningly with X-rays, wherein the mask pattern being illuminated is transferred onto an object, and a cooling structure for cooling the X-ray mask held by the mask chuck.
摘要翻译：在真空或减压环境中工作的X射线曝光装置包括在真空中或在减压环境中布置的用于保持其上具有掩模图案的反射X射线掩模的掩模，X射线照明系统，其被布置成以X射线相对扫描地照射其上具有掩模图案的反射X射线掩模，其中照射的掩模图案被转印到物体上，并且用于冷却所述X射线掩模的冷却结构通过面罩卡盘。

93. 发明授权

US06310934B1 X-ray projection exposure apparatus and a device manufacturing method 有权
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06310934B1
公开(公告)日：2001-10-30
申请号：US09342897
申请日：1999-06-29
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
摘要翻译： X射线投影曝光装置包括：掩模卡盘，用于保持其上具有掩模图案的反射X射线掩模，在掩模和掩模卡盘之间形成空隙;晶片卡盘，用于保持掩模图案是转移了用于照射由掩模卡盘保持的反射X射线掩模的X射线照射系统的X射线，用于将反射X射线掩模的掩模图案投影到晶片上的X射线投影光学系统由晶片卡盘以预定的放大率保持，以及用于将形成在掩模和掩模卡盘之间的空隙供给用于冷却掩模的冷却气体的供给。

94. 发明授权

US6087053A Device manufacturing method with transfer magnification adjustment to correct thermal distortion of substrate 失效
标题翻译：装置制造方法采用传输倍率调整校正基板的热变形
公开(公告)号：US6087053A
公开(公告)日：2000-07-11
申请号：US72133
申请日：1998-05-05
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , G03F9/00
CPC分类号： G03F7/70425 , G03F7/70241 , G03F7/70258 , G03F7/70783
摘要： An exposure method includes the steps of transferring, by exposure, a pattern formed on an original to different shot regions on a substrate sequentially, and performing, during exposure of a certain shot, at least one of (i) adjusting a relative positional relation between the original and the substrate, with respect to a direction effective to correct translation of a transfer region of the substrate due to thermal distortion thereof, and (ii) adjusting a transfer magnification of the pattern of the original to the substrate so as to correct enlargement of the transfer region due to thermal distortion of the substrate. In one preferred form, the adjustment is made in accordance with a correction table related to thermal expansion of the substrate during exposure and being prepared on the basis of one of a calculation and a preparatory exposure experiment. In another preferred form, the transfer magnification is adjusted by deforming the original, and in a further preferred form, the transfer magnification is adjusted by adjusting a projection optical system for projecting the pattern of the original to the substrate.
摘要翻译：曝光方法包括以下步骤：通过曝光将形成在原稿上的图案顺序地转印到基板上的不同拍摄区域，并且在曝光期间执行以下至少之一：（i）调整相对位置关系相对于有效地校正由于其热变形而导致的基板的转印区域的平移的方向的原稿和基板，以及（ii）调整原稿的图案到基板的转印倍率，以校正放大由于基板的热变形而导致的转印区域。在一个优选形式中，根据在曝光期间与衬底的热膨胀相关的校正表进行调整，并且基于计算和预备曝光实验之一进行准备。在另一优选形式中，通过使原稿变形来调节转印倍率，并且在另一优选形式中，通过调整用于将原稿的图案投影到基底的投影光学系统来调节转印倍率。

95. 发明授权

US6069931A Mask structure and mask holding mechanism for exposure apparatus 失效
标题翻译：曝光装置的面罩结构和面罩保持机构
公开(公告)号：US6069931A
公开(公告)日：2000-05-30
申请号：US30081
申请日：1998-02-25
申请人： Takeshi Miyachi , Shinichi Hara
发明人： Takeshi Miyachi , Shinichi Hara
IPC分类号： G03F1/00 , G03F7/20 , H01L21/30
CPC分类号： G03F7/707 , G03F7/70783
摘要： A mask holding system includes a chucking mechanism for holding a mask structure including a frame and a mask substrate having a rectangular window with a mask pattern, and a load mechanism for applying, at a position along an extension of a diagonal of the rectangular window, a load to the frame in a direction along the plane of the mask, whereby the mask pattern can be distorted isotropically with the application of the load along the mask plane.
摘要翻译：掩模保持系统包括用于保持包括框架的掩模结构的夹持机构和具有带有掩模图案的矩形窗口的掩模基板，以及负载机构，用于在沿着矩形窗口的对角线的延伸部的位置处，沿着掩模平面的方向对框架的载荷，由此掩模图案可以沿着掩模平面施加负载而各向同性地变形。

96. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

97. 发明授权

US5155523A Workpiece supporting mechanism 失效
标题翻译：工作支持机制
公开(公告)号：US5155523A
公开(公告)日：1992-10-13
申请号：US350648
申请日：1989-05-11
申请人： Shinichi Hara , Shunichi Uzawa
发明人： Shinichi Hara , Shunichi Uzawa
IPC分类号： G12B5/00 , F16F15/02 , G03F7/20 , G05D19/02 , G12B9/08 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/687 , H01L41/04
CPC分类号： H01L21/67288 , F16F15/02 , G03F7/70725 , G03F7/70866 , G03F7/709 , G05D19/02 , H01L21/68785 , H01L41/042
摘要： A workpiece supporting mechanism suitably usable in an exposure apparatus, is disclosed. The mechanism includes a workpiece supporting member which is provided with a displacement sensor such as a speed sensor or an acceleration sensor. A vibrator such as a piezoelectric device is added to the supporting member or a stage which supports the supporting member. Any vibration of the workpiece or the supporting member is detected by the displacement sensor and, in accordance with the detection, the vibrator is energized to cancel the vibration of the workpiece and the workpiece supporting member.

98. 发明授权

US5093579A Exposure apparatus with a substrate holding mechanism 失效
标题翻译：具有基板保持机构的曝光装置
公开(公告)号：US5093579A
公开(公告)日：1992-03-03
申请号：US550989
申请日：1990-07-11
申请人： Mitsuaki Amemiya , Shinichi Hara , Eiji Sakamoto
发明人： Mitsuaki Amemiya , Shinichi Hara , Eiji Sakamoto
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , H01L21/683
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70866 , G03F7/70875
摘要： A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.

99. 发明授权

US4971896A Method for forming thin film pattern and method for fabricating thin film magnetic head using the same 失效
标题翻译：用于形成薄膜图案的方法和使用其制造薄膜磁头的方法
公开(公告)号：US4971896A
公开(公告)日：1990-11-20
申请号：US280828
申请日：1988-12-07
申请人： Takashi Kawabe , Ataru Kobayashi , Moriaki Fuyama , Makoto Morijiri , Eiji Ashida , Masatoshi Tsuchiya , Tetsuya Okai , Masanobu Hanazono , Shinichi Hara , Shinji Narishige , Hiroshi Ikeda
发明人： Takashi Kawabe , Ataru Kobayashi , Moriaki Fuyama , Makoto Morijiri , Eiji Ashida , Masatoshi Tsuchiya , Tetsuya Okai , Masanobu Hanazono , Shinichi Hara , Shinji Narishige , Hiroshi Ikeda
IPC分类号： G03F7/00 , G11B5/31
CPC分类号： G11B5/3163 , G03F7/0035 , Y10S430/165
摘要： A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.
摘要翻译：在具有台阶部的基底上形成薄膜图案的方法。该方法包括在基底上形成给定材料的薄膜的第一步骤，第二步骤，在包括台阶部分的下部的第一部分中的一个上形成在所述薄膜上的第一光致抗蚀剂膜的预定图案，以及第二部分，包括台阶部分的上部;第三步骤，在所述第一和第二部分中的另一个上在所述薄膜上形成第二光致抗蚀剂膜的预定图案;以及第四步骤，将所述薄片给定材料的膜使用掩模，所述第一和第二部分形成在所述薄膜上形成的第一和第二光致抗蚀剂图案。

100. 发明授权

US4894737A Magnetic head apparatus having projections extending from at least a front side thereof 失效
标题翻译：磁头装置具有至少从其前侧延伸的凸起
公开(公告)号：US4894737A
公开(公告)日：1990-01-16
申请号：US127947
申请日：1987-12-02
申请人： Junji Hamana , Shinichi Hara , Makoto Miyagi
发明人： Junji Hamana , Shinichi Hara , Makoto Miyagi
IPC分类号： G11B5/10 , G11B5/187 , G11B15/60 , G11B15/62 , G11B23/087
CPC分类号： G11B5/10 , G11B15/602 , G11B15/62 , G11B23/08771 , G11B5/1871
摘要： This invention proposes to form a pair of protruding or projecting stripe portions along the tape-gliding face of magnetic tape and to reduce the pad pressure to magnetic tape thereby reducing the gliding resistance of magnetic tape without increasing its spacing loss (first embodiment), to incline the plane of the projecting stripe portions in a decreasing direction in the vicinity of the tape-gliding face in order to stabilize the pad contact (second embodiment), to form grooves on the tape-gliding face of the magnetic core in the transversal edge portions at least in the tape entrance side thereby facilitating prevention of tape squeaking (third embodiment), to increase the height of one of the projecting stripe portions in the vicinity of head mounting position compared to that of the other stripe portion thereby preventing one-sided abrasion of the tape-gliding face (fourth embodiment), and to form tape guide members on the magnetic head for guiding the magnetic tape closer to one of the projecting stripe portion at the head mounting position and separate from the other thereby preventing one-sided abrasion of the tape-gliding face (fifth embodiment).
摘要翻译：本发明提出沿着磁带的滑翔面形成一对突出或突出的条纹部分，并且将垫压力减小到磁带，从而降低磁带的滑动阻力而不增加其间隔损耗（第一实施例），至为了稳定焊盘接触（第二实施例），在带滑动面附近沿着减小的方向倾斜突出条纹部分的平面，在横向边缘的磁芯的滑行面上形成槽至少在磁带入口侧的部分，从而有利于防止磁带吱吱声（第三实施例），以增加磁头安装位置附近的一个突出条纹部分的高度与其他条纹部分的高度相比，从而防止单面胶带滑行面的磨损（第四实施例），并且在磁头上形成带引导构件，用于将磁带引导到更靠近一个的突出条纹部分在头部安装位置处并且彼此分离，从而防止带滑动面的单面磨损（第五实施例）。

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