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    • 3. 发明授权
    • Transfer apparatus
    • 转运设备
    • US5253663A
    • 1993-10-19
    • US935400
    • 1992-08-26
    • Hiroshi TanakaMitsuo NishiRyuichi MizoguchiYuuji Kamikawa
    • Hiroshi TanakaMitsuo NishiRyuichi MizoguchiYuuji Kamikawa
    • H01L21/00H01L21/677B08B3/02
    • H01L21/67161H01L21/67028H01L21/67126H01L21/67173H01L21/67766H01L21/67772Y10S134/902
    • A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.
    • 用于转移半导体晶片的旋转传送臂设置在封闭的壳体中。 在壳体中形成可闭合的开口部分,传送臂可以从壳体延伸出来。 叉子设置在传送臂的远端。 在叉中形成有多个保持槽,以在它们之间以预定间隔设置多个晶片。 用于叉子的清洁器设置在壳体的上部。 清洁器具有安装在开关臂远端的清洁和干燥喷嘴。 开关臂可以在操作位置和待机位置之间枢转。 开关臂还可以沿着叉子移动清洁和干燥喷嘴。 在清洁和干燥期间,从清洁喷嘴将纯水喷射到叉子上,并且干燥气体从干燥喷嘴喷射抵靠它。
    • 4. 发明授权
    • Transfer apparatus
    • 转运设备
    • US5505577A
    • 1996-04-09
    • US312080
    • 1994-09-26
    • Mitsuo Nishi
    • Mitsuo Nishi
    • B65G49/07H01L21/677B65G65/00
    • H01L21/67781Y10S414/138
    • A transfer apparatus comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates mutually parallel to each other, a plurality of push-up members being adapted to be moved below each of the carriers for pushing up the substrates supported on the carriers through a lower opening portion of each of the carriers and having an upper surface with a plurality of equidistantly spaced grooves for receiving and lifting all of the substrates supported in one carrier as a whole, devices for bringing at least one of the plurality of push-up members into proximity to a corresponding remaining push-up member to allow the at least one push-up member to face the corresponding push-up member so that their mutually adjacent, directly-facing endmost substrates held in an endmost grooves of the mutually adjacent, directly-facing push-up members have their mutual distance adjusted to a distance equal to a pitch distance of those substrates supported by the push-up member to transfer the substrates to a support member.
    • 一种传送装置,包括:载体台,用于布置以串联排列的多个载体,以便彼此平行地保持基板;多个上推构件,适于在每个载体下移动以推动 通过每个载体的下开口部分支撑在载体上的基板,并且具有上表面,该上表面具有多个等距隔开的凹槽,用于接收和提升支撑在一个载体中的所有基板作为整体,用于使至少 多个上推构件中的一个靠近相应的剩余上推构件,以允许至少一个上推构件面对相应的上推构件,使得它们相互相邻的直接面对的最基底保持在 相互相邻的直接面向的上推构件的最前面的凹槽的相互距离被调整到等于那些基底的俯仰距离的距离 由上推构件移动以将基板转移到支撑构件。
    • 5. 发明授权
    • Cleaning apparatus
    • 清洁装置
    • US5311893A
    • 1994-05-17
    • US111473
    • 1993-08-25
    • Mitsuo Nishi
    • Mitsuo Nishi
    • H01L21/00H01L21/677B08B3/02
    • H01L21/67051H01L21/67017H01L21/67766H01L21/67781Y10S134/902
    • A cleaning apparatus includes a cleaning unit provided with cleaning tubs in which cleaning liquid is contained, and a carrying mechanism for carrying matters to be processed into and out of the cleaning unit. The carrying mechanism has holding members for holding the matters thereon. The cleaning apparatus further includes a chamber in which the carrying mechanism is housed, and a cleaning/drying system arranged in an upper portion of the chamber to clean and dry the matters-holding members of the carrying mechanism. The cleaning/drying system has cleaning and drying nozzles through which cleaning liquid and drying air are jetted against the matters-holding members of the carrying mechanism.
    • 清洁装置包括:清洁单元,设置有清洁桶,其中容纳有清洁液体;以及承载机构,用于将待加工和进出清洁单元的物品运送。 携带机构具有用于保持物品的保持构件。 清洁装置还包括容纳运送机构的室和布置在室的上部中的清洁/干燥系统,以清洁和干燥承载机构的物品保持构件。 清洁/干燥系统具有清洁和干燥喷嘴,通过该喷嘴将清洁液体和干燥空气喷射到承载机构的物品保持构件上。
    • 6. 发明授权
    • Transfer apparatus
    • 转运设备
    • US5620295A
    • 1997-04-15
    • US580430
    • 1995-12-27
    • Mitsuo Nishi
    • Mitsuo Nishi
    • B65G49/07H01L21/677B65G65/30
    • H01L21/67781Y10S414/138
    • A transfer apparatus for transferring a plurality of substrates between carriers holding these equidistantly arranged substrates thereon and a support member, comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates mutually parallel to each other, a plurality of push-up members, each of the push-up members being adapted to be moved below each of the carriers for pushing up the substrates supported on the carriers through a lower opening portion of each of the carriers, each of the push-up members having an upper surface with a plurality of equidistantly spaced grooves for receiving and lifting all of the substrates supported in one carrier as a whole, devices for bringing at least one of the plurality of push-up members into proximity to a corresponding remaining push-up member to allow the at least one push-up member to face the corresponding push-up member so that their mutually adjacent, directly-facing endmost substrates held in an endmost grooves of the mutually adjacent, directly-facing push-up members have their mutual distance adjusted to a distance equal to a pitch distance of those wafers supported by the push-up member, wherein all the substrates lifted by the plurality of the push-up members and mutually equidistantly arranged are transferred at a time from the push-up members to the support member.
    • 一种用于在保持这些等距布置的基板的载体之间传送多个基板的传送装置和支撑构件,包括用于布置串联布置的多个载体的载体台,以便彼此平行地保持基板, 多个上推构件,每个上推构件适于在每个支架的下方移动,用于将支撑在支架上的基板通过每个支架的下开口部分推压, 上部构件具有多个等间隔开的凹槽的上表面,用于接收和提升支撑在一个载体中的所有基板作为整体,用于使多个上推构件中的至少一个靠近相应的剩余推动的装置 的构件,以允许所述至少一个上推构件面对相应的上推构件,使得它们相互相邻的直接面向的最上面的子 保持在相互相邻的直接面向的上推构件的最末端的槽中的板条的相互距离被调整到等于由上推构件支撑的那些晶片的间距距离的距离,其中由多个 相互等距布置的上推构件一次从上推构件转移到支撑构件。
    • 7. 发明授权
    • Cleaning apparatus
    • 清洁装置
    • US5265632A
    • 1993-11-30
    • US880543
    • 1992-05-08
    • Mitsuo Nishi
    • Mitsuo Nishi
    • H01L21/00H01L21/677B08B11/02
    • H01L21/67051H01L21/67017H01L21/67766H01L21/67781Y10S134/902
    • A cleaning apparatus includes a cleaning unit provided with cleaning tubs in which cleaning liquid is contained, and a carrying mechanism for carrying matters to be processed into and out of the cleaning unit. The carrying mechanism has holding members for holding the matters thereon. The cleaning apparatus further includes a chamber in which the carrying mechanism is housed, and a cleaning/drying system arranged in an upper portion of the chamber to clean and dry the matters-holding members of the carrying mechanism. The cleaning/drying system has cleaning and drying nozzles through which cleaning liquid and drying air are jetted against the matters-holding members of the carrying mechanism.
    • 清洁装置包括:清洁单元,设置有清洁桶,其中容纳有清洁液体;以及承载机构,用于将待加工和进出清洁单元的物品运送。 携带机构具有用于保持物品的保持构件。 清洁装置还包括容纳运送机构的室和布置在室的上部中的清洁/干燥系统,以清洁和干燥承载机构的物品保持构件。 清洁/干燥系统具有清洁和干燥喷嘴,通过该喷嘴将清洁液体和干燥空气喷射到承载机构的物品保持构件上。
    • 9. 发明授权
    • Washing apparatus
    • 洗衣机
    • US5226437A
    • 1993-07-13
    • US795762
    • 1991-11-21
    • Yuji KamikawaMasafumi InoueMitsuo Nishi
    • Yuji KamikawaMasafumi InoueMitsuo Nishi
    • H01L21/00H01L21/677
    • H01L21/67017H01L21/67051H01L21/67766H01L21/67781Y10S134/902
    • A washing apparatus for performing a batch treatment of a plurality of wafers has a vessel and a wafer boat dedicated to the vessel and movable in the vertical direction. The boat has a fork, which supports the wafers in the vessel in a manner such that the wafers are spaced from one another at predetermined intervals. The wafers are received in a carrier, and are transferred to the boat by a rotary transfer arm. This arm has a fork for supporting the wafers during transfer thereof in a manner such that the wafers are spaced from one another at the predetermined intervals. Transfer of the rotary transfer arm is performed above the washing vessel by moving the boat up and down. At this time, the forks of the boat and arm engage with each other.
    • 用于执行多个晶片的批量处理的洗涤装置具有专用于容器并可在垂直方向上移动的容器和晶片舟。 该船具有叉子,该叉子以使得晶片以预定间隔彼此间隔的方式支撑在容器中的晶片。 晶片被接收在载体中,并通过旋转传递臂传送到船上。 该臂具有用于在其转移期间支撑晶片的叉,使得晶片以预定间隔彼此间隔开。 通过上下移动舟皿,在洗涤容器上方进行旋转传送臂的传送。 在这时候,船和手臂的叉子相互啮合。
    • 10. 发明授权
    • Substrate detector with light emitting and receiving elements arranged
in staggered fashion and a polarization filter
    • 具有以交错方式布置的发光和接收元件的基板检测器和偏振滤光器
    • US5319216A
    • 1994-06-07
    • US105166
    • 1993-08-12
    • Shori MokuoYoichi DeguchiMitsuo NishiShinji Tadakuma
    • Shori MokuoYoichi DeguchiMitsuo NishiShinji Tadakuma
    • G01V8/20G01V9/04
    • G01V8/20Y10S414/138
    • A substrate detector device comprises a boat or chuck for holding substrates, a light emitting section having a plurality of light emitting elements, arranged side by side, for respectively applying light beams to the substrates, a light receiving section, facing the light emitting section and having a plurality of light receiving elements, for receiving light beams passed through the substrates, the light receiving elements arranged side by side so as not face the light emitting elements, a polarization filter provided on optical axes of the respective optical beams incident on the light receiving elements, a memory for storing, as reference data, an amount of light received by a receiving element which has been measured in advance when a light beam is applied to a substrate in a state where no other substrate is present on either side of the substrate, and controller for discriminating the presence, the number, and the state of arrangement of the substrates on the holding means based on the reference data and measured data based on the amount of light received by the light receiving elements after a light beam scattered by the substrate to be detected and a light beam wraparound substrates adjacent thereto are removed by the polarization filter.
    • 基板检测器装置包括用于保持基板的船或卡盘,具有并排布置的用于分别向基板施加光束的多个发光元件的发光部分,面向发光部分的光接收部分,以及 具有多个光接收元件,用于接收通过基板的光束,并排设置为不面对发光元件的光接收元件,设置在入射到光的各个光束的光轴上的偏振滤光器 接收元件,用于存储作为参考数据的存储器,由接收元件接收的光量,该接收元件在将光束施加到基板上时已经预先测量到,在不存在其它基板的状态下 基板和控制器,用于基于保持装置识别基板的布置的存在,数量和状态 基于由被检测基板散射的光束和与其相邻的光束环绕基板之后的光接收元件所接收的光量的基准数据和测量数据被偏振滤光器去除。