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1. 发明申请

US20110043784A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：US20110043784A1
公开(公告)日：2011-02-24
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , B65G47/00 , B65G43/00
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

2. 发明授权

US08699001B2 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method 有权
标题翻译：物体移动装置，物体处理装置，曝光装置，物体检查装置和装置的制造方法
公开(公告)号：US08699001B2
公开(公告)日：2014-04-15
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , G03F7/20 , H01L21/677 , B65G49/06
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

3. 发明授权

US06538724B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06538724B1
公开(公告)日：2003-03-25
申请号：US09676932
申请日：2000-10-02
申请人： Nobutaka Fujimori , Manabu Toguchi
发明人： Nobutaka Fujimori , Manabu Toguchi
IPC分类号： G03B2742
CPC分类号： G03F7/70558
摘要： Disclosed is an exposure apparatus designed to expose the pattern of a mask through a projection optical system on a substrate by using an exposure light. This exposure apparatus comprises a line width detector for detecting the pattern line width of the mask, and a control unit for controlling the light exposure of the exposure light based on the detecting result of the line width detector. Thus, exposure is easily carried out on the substrate without any line width differences even if a plurality of masks are used.
摘要翻译：公开了一种设计用于通过使用曝光光使基板上的投影光学系统曝光掩模图案的曝光装置。该曝光装置包括用于检测掩模的图案线宽度的线宽检测器和用于根据线宽检测器的检测结果来控制曝光光的曝光的控制单元。因此，即使使用多个掩模，也容易在基板上进行曝光而没有任何线宽差异。

4. 发明申请

US20070296936A1 Exposure Apparatus, Exposure Method, and Producing Method of Microdevice 有权
标题翻译：曝光装置，曝光方法和微型装置的制作方法
公开(公告)号：US20070296936A1
公开(公告)日：2007-12-27
申请号：US11661297
申请日：2006-01-24
申请人： Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
发明人： Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70308
摘要： An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
摘要翻译：用于将通过具有多个光学单元L 1至L 13的光学系统投影的图案的图像曝光转印到对象P上的曝光装置包括：校正装置，其校正多个图像中的至少一个图像的位置通过多个光学单元L 1至L 13投射到物体P上，从而补偿光学单元L 1至L 13的位移。

5. 发明授权

US07864293B2 Exposure apparatus, exposure method, and producing method of microdevice 有权
标题翻译：曝光装置，曝光方法及微型装置的制作方法
公开(公告)号：US07864293B2
公开(公告)日：2011-01-04
申请号：US11661297
申请日：2006-01-24
申请人： Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
发明人： Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70308
摘要： An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
摘要翻译：用于将通过具有多个光学单元L1至L13的光学系统投射的图案的图像曝光转印到对象P上的曝光装置包括校正装置，其将多个图像中的至少一个的位置校正为通过多个光学单元L1至L13投影到物体P上，从而补偿光学单元L1至L13的位移。

6. 发明授权

US06873400B2 Scanning exposure method and system 有权
标题翻译：扫描曝光方法和系统
公开(公告)号：US06873400B2
公开(公告)日：2005-03-29
申请号：US09772907
申请日：2001-01-31
申请人： Masaichi Murakami , Masaki Kato , Katsuya Machino , Manabu Toguchi
发明人： Masaichi Murakami , Masaki Kato , Katsuya Machino , Manabu Toguchi
IPC分类号： H01L21/027 , G03F7/20 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： It is an object of the present invention to smoothly join divided patterns adjacent to each other in a synchronous moving direction when a mask and a substrate are moved in synchronization, and the divided patterns are joined and picture-synthesized on the substrate. According to the invention, when the mask and the substrate are moved in synchronization with respect to irradiation with an exposing light, the divided patterns of the mask are projected on the substrate, and a plurality of divided patterns adjacent on the substrate are joined and exposed, the divided patterns adjacent to each other in the synchronous moving direction partially overlap each other.
摘要翻译：本发明的一个目的是在掩模和衬底同步移动的同时沿同步移动方向平滑地连接彼此相邻的分割图案，并且分割的图案在衬底上被接合和图像合成。根据本发明，当掩模和衬底相对于曝光光的照射同步地移动时，掩模的划分图案被投射在衬底上，并且在衬底上相邻的多个分割图案被接合并暴露在同步移动方向上彼此相邻的分割图案部分地重叠。

7. 发明授权

US06506544B1 Exposure method and exposure apparatus and mask 失效
标题翻译：曝光方法和曝光装置和面罩
公开(公告)号：US06506544B1
公开(公告)日：2003-01-14
申请号：US09430179
申请日：1999-10-29
申请人： Kazuhiko Hori , Katsuya Machino , Manabu Toguchi , Masahiro Iguchi
发明人： Kazuhiko Hori , Katsuya Machino , Manabu Toguchi , Masahiro Iguchi
IPC分类号： G03C500
CPC分类号： G03F7/70466 , G03F7/70433 , G03F7/70791
摘要： In the exposure method of the invention, a first pattern and a second pattern are joined and exposed on a substrate using a mask having a pattern. The pattern on the mask has a common pattern for the first pattern and the second pattern, and a non-common pattern different from the common pattern and formed continuously with the common pattern. The common pattern and at least a part of the non-common pattern are selected to effect the joining and exposing. According to this method, the number of masks required for exposure processing accompanying screen synthesis can be reduced.
摘要翻译：在本发明的曝光方法中，使用具有图案的掩模将第一图案和第二图案接合并暴露在基板上。掩模上的图案具有用于第一图案和第二图案的共同图案，以及与公共图案不同且与公共图案连续形成的非共同图案。选择共同图案和至少一部分非共同图案以实现接合和曝光。根据该方法，可以减少伴随画面合成的曝光处理所需的掩模的数量。

8. 发明授权

US06204912B1 Exposure method, exposure apparatus, and mask 失效
标题翻译：曝光方法，曝光装置和面罩
公开(公告)号：US06204912B1
公开(公告)日：2001-03-20
申请号：US08848394
申请日：1997-05-08
申请人： Makoto Tsuchiya , Kei Nara , Nobutaka Fujimori , Manabu Toguchi , Masami Seki
发明人： Makoto Tsuchiya , Kei Nara , Nobutaka Fujimori , Manabu Toguchi , Masami Seki
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70275 , G03F7/70283 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure method, exposure apparatus and mask are suitable for manufacturing an active matrix liquid crystal display including, for example, a gate electrode layer and a source/drain electrode layer. A stitching portion between unit patterns in a second layer is offset from the stitching portion in a first layer by a predetermined distance. The stitching portions of the second layer are always positioned over unit patterns of the first layer. Accordingly, the contrast gap that occurs at the stitching portion as a boundary is defined only by an error in the exposure position of the second layer. The contrast gap is not affected by an error in the exposure position of the first layer, unlike the conventional method. Because the contrast gap caused by the error in the exposure position of the first layer is eliminated, the total contrast gap that occurs at the stitching portion as a boundary is significantly reduced.
摘要翻译：曝光方法，曝光装置和掩模适用于制造包括例如栅极电极层和源极/漏极电极层的有源矩阵液晶显示器。第二层中的单元图案之间的缝合部分在第一层中与缝合部分偏移预定距离。第二层的缝合部分总是位于第一层的单位图案之上。因此，在作为边界的缝合部分发生的对比度间隙仅由第二层的曝光位置的误差限定。与传统方法不同，对比度间隙不受第一层的曝光位置的误差的影响。由于消除了由第一层的曝光位置的误差引起的对比度间隙，所以在作为边界的缝合部分发生的总对比度间隙显着减小。

9. 发明授权

US5912726A Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system 失效
标题翻译：具有使用来自曝光照明系统的光的位置偏差检测系统的投影曝光装置和方法
公开(公告)号：US5912726A
公开(公告)日：1999-06-15
申请号：US922598
申请日：1997-09-03
申请人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
发明人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F9/7026 , G03F7/70241 , G03F7/70275
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate. A positional deviation detector detects positional deviations between the first reference marks and second reference marks when light beams from the illumination optical system are radiated onto the plurality of first reference marks to project the plurality of first reference marks through the projection optical systems onto the plurality of second reference marks. A correcting device corrects imaging characteristics of the projection optical systems, based on the positional deviations. The first reference marks can comprise a single aperture of a plurality of apertures. A reverse-type aperture may be employed. The positional deviation detector may include a single photodetector or a plurality of photodetectors.
摘要翻译：投影曝光装置包括用于照亮掩模上的多个部分区域的照明光学系统。多个投影光学系统各自投影如此照射到感光基片上的部分区域的图像。掩模台保持面具。位置检测器检测掩模台的位置。基板台保持感光基板。多个第一参考标记设置在掩模台上; 多个第一参考标记中的每一个被布置在与多个投影光学系统中的每一个对应的位置处。多个第二参考标记设置在衬底台上; 第二参考标记与第一参考标记相对于投影光学系统基本共轭，并且与掩模和感光基板的面内方向上的第一参考标记处于预定的位置关系。当将来自照明光学系统的光束照射到多个第一参考标记上时，位置偏差检测器检测第一参考标记和第二参考标记之间的位置偏差，以将多个第一参考标记通过投影光学系统突出到多个第二个参考标记。校正装置基于位置偏差校正投影光学系统的成像特性。第一参考标记可以包括多个孔的单个孔。可以采用反向孔径。位置偏差检测器可以包括单个光电检测器或多个光电检测器。

10. 发明授权

US5859690A Method of dividing and exposing patterns 失效
标题翻译：分割和曝光图案的方法
公开(公告)号：US5859690A
公开(公告)日：1999-01-12
申请号：US824268
申请日：1997-03-26
申请人： Manabu Toguchi
发明人： Manabu Toguchi
IPC分类号： G02F1/1362 , G03F7/20 , G03D27/42
CPC分类号： G03F7/70733 , G03F7/70475 , G03F7/70716 , G02F2001/13625
摘要： A method of dividing a circuit pattern to be transferred by a photoprinting apparatus from a reticle to a photosensitive surface. The circuit pattern has a display section and a conductor section. The method includes dividing the circuit pattern into a plurality of divided patterns wherein each of the divided patterns includes at least a part of the display section and a part of the conductor section; and forming a plurality of reticles, each of the reticles having at least one of the divided patterns thereon.
摘要翻译：将要由光印装置传送的电路图案从掩模版划分到感光表面的方法。电路图案具有显示部和导体部。该方法包括将电路图案划分为多个分割图案，其中每个分割图案包括显示部分的至少一部分和导体部分的一部分; 并且形成多个掩模版，每个所述标线具有至少一个所述划分图案。

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