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1. 发明授权

US5940365A AM data multiplexing modulation apparatus 失效
标题翻译： AM数据复用调制装置
公开(公告)号：US5940365A
公开(公告)日：1999-08-17
申请号：US870016
申请日：1997-06-05
申请人： Toshiyuki Takegahara , Shoichi Suzuki , Kenichi Shiraishi , Hiroyuki Nagasaka , Ryuichi Okazaki , Atsushi Shinoda
发明人： Toshiyuki Takegahara , Shoichi Suzuki , Kenichi Shiraishi , Hiroyuki Nagasaka , Ryuichi Okazaki , Atsushi Shinoda
IPC分类号： H04L27/04 , H04J1/00 , H04J9/00 , H04L5/06 , H04L27/12 , H04L27/20 , H04L27/26 , H04J11/00
CPC分类号： H04H20/36 , H04L5/06
摘要： An AM data multiplexing modulation apparatus for multiplexing a digital signal to an AM modulation signal without adversely affecting an AM sync detection output even if AM sync detection is performed. An AM modulator AM modulates a carrier having a frequency fc by an input signal, an orthogonal modulator 3 orthogonally modulates a carrier having a frequency (fc+f.alpha.) by a QPSK baseband digital signal generated by a QPSK baseband digital signal generator 2, a sign inverter and a complex conjugate unit change the sign of a signal having the same phase as a reference carrier of vector shift and corresponding to a dibit formed by the QPSK baseband digital signal generated by the QPSK baseband digital signal generator, another orthogonal modulator orthogonally modulates a carrier having a frequency (fc-f.alpha.) by an output of the complex conjugate unit, the outputs of the two orthogonal modulators are added by an adder, this addition result is added to the output of the AM modulator by another adder which outputs an AM data multiplexing modulation output.
摘要翻译：一种AM数据多路复用调制装置，即使执行AM同步检测，也将数字信号复用到AM调制信号，而不会对AM同步检测输出产生不利影响。 AM调制器AM通过输入信号调制具有频率fc的载波，正交调制器3通过由QPSK基带数字信号发生器2产生的QPSK基带数字信号对频率（fc +fα1）进行正交调制，符号反相器和复共轭单元改变与矢量移位的参考载波具有相同相位的信号的符号，并且对应于由QPSK基带数字信号发生器产生的QPSK基带数字信号形成的二进制，另一个正交调制器正交调制通过复共轭单元的输出具有频率（fc-fα）的载波，两个正交调制器的输出由加法器相加，该相加结果通过另一个加法器相加到另一加法器的输出 AM数据复用调制输出。

2. 发明授权

US5970046A Apparatus for demodulating AM data multiplexed modulated wave signal 失效
标题翻译：用于解调AM数据多路复用调制波信号的装置
公开(公告)号：US5970046A
公开(公告)日：1999-10-19
申请号：US889575
申请日：1997-07-08
申请人： Toshiyuki Takegahara , Shoichi Suzuki , Kenichi Shiraishi , Hiroyuki Nagasaka , Atsushi Shinoda
发明人： Toshiyuki Takegahara , Shoichi Suzuki , Kenichi Shiraishi , Hiroyuki Nagasaka , Atsushi Shinoda
IPC分类号： H04B1/04 , H04B1/30 , H04J11/00
CPC分类号： H04B1/04 , H04B1/30
摘要： An apparatus for demodulating an AM data multiplexed modulated wave signal in which an analog modulated signal and digital modulated signals are multiplexed, in order to derive therefrom a baseband digital signal. The demodulation apparatus aims to derive the digital baseband signal from the AM data multiplexed modulated wave signal in which the analog modulated signal obtained by amplitude modulating a carrier having a frequency fc with an analog signal and the digital modulated signals at frequency position of (fc+f.alpha.) and (fc-f.alpha.) line-symmetrical with respect to a frequency axis of the frequency fc are multiplexed. A demodulation apparatus includes an AM type modulated wave signal eliminating circuit for removing an AM modulated wave signal from an input AM data multiplexed modulated wave signal, and a data demodulation circuit for receiving an output of the AM type modulated wave signal eliminating circuit and for deriving therefrom a baseband digital signal.
摘要翻译：一种用于解调其中模拟调制信号和数字调制信号被多路复用的AM数据复用调制波信号的装置，以便从中得到基带数字信号。解调装置旨在从AM数据复用调制波信号导出数字基带信号，其中通过对具有模拟信号的频率fc的载波进行幅度调制而获得的模拟调制信号和频率位置处的（fc + fα）和（fc-fα）相对于频率fc的频率轴线对称的多路复用。解调装置包括：AM型调制波信号消除电路，用于从输入的AM数据复用调制波信号中去除AM调制波信号;以及数据解调电路，用于接收AM型调制波信号消除电路的输出，从而提供基带数字信号。

3. 发明授权

US08089608B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08089608B2
公开(公告)日：2012-01-03
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

4. 发明申请

US20090115977A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090115977A1
公开(公告)日：2009-05-07
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

5. 发明申请

US20060139614A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060139614A1
公开(公告)日：2006-06-29
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

6. 发明授权

US08384880B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US08384880B2
公开(公告)日：2013-02-26
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58 , G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

7. 发明申请

US20100134772A1 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 审中-公开
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US20100134772A1
公开(公告)日：2010-06-03
申请号：US12656456
申请日：2010-01-29
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085 , G03F7/70925
摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

8. 发明申请

US20090225286A1 Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device 审中-公开
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US20090225286A1
公开(公告)日：2009-09-10
申请号：US11630110
申请日：2005-06-21
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085 , G03F7/70925
摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

9. 发明申请

US20080252865A1 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 审中-公开
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US20080252865A1
公开(公告)日：2008-10-16
申请号：US12155742
申请日：2008-06-09
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085 , G03F7/70925
摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸渍区域的液体接触的基底台的上表面。因此，可以防止由于与浸没区域中的液体接触的构件的污染而引起的曝光精度和测量精度的劣化。

10. 发明申请

US20060227312A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 审中-公开
公开(公告)号：US20060227312A1
公开(公告)日：2006-10-12
申请号：US11448927
申请日：2006-06-08
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

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