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1. 发明授权

US07582885B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07582885B2
公开(公告)日：2009-09-01
申请号：US11401878
申请日：2006-04-12
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
IPC分类号： H01J1/50
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译：提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10-8Pa以下的真空度的高真空下。

2. 发明授权

US07615765B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07615765B2
公开(公告)日：2009-11-10
申请号：US11589821
申请日：2006-10-31
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/18 , H01J37/28 , H01J2237/022 , H01J2237/1825 , H01J2237/188 , H01J2237/31749
摘要： There is provided a compact charged particle beam apparatus with a non-evaporable getter pump which maintains high vacuum even during emission of an electron beam without generating foreign particles. The apparatus comprises: a charged particle source; a charged particle optics which focuses a charged particle beam emitted from the charged particle source on a sample and performs scanning; and means of vacuum pumping which evacuates the charged particle optics. The means of vacuum pumping has a differential pumping structure with two or more vacuum chambers connected through an opening in series. A pump made of non-evaporable getter alloy is placed in an upstream vacuum chamber with a high degree of vacuum, and a gas absorbing surface of the non-evaporable getter alloy is fixed without contact with another part.
摘要翻译：提供了一种具有非蒸发性吸气泵的紧凑型带电粒子束装置，即使在电子束的发射期间也能保持高真空而不产生异物。该装置包括：带电粒子源; 带电粒子光学器件，其将从带电粒子源发射的带电粒子束聚焦在样品上并执行扫描; 以及抽空带电粒子光学元件的真空泵送装置。真空泵送装置具有差分泵送结构，其中两个或多个真空室通过串联的开口连接。将由不可蒸发的吸气剂合金制成的泵放置在具有高真空度的上游真空室中，并且非蒸发性吸气剂合金的气体吸收表面固定而不与另一部分接触。

3. 发明申请

US20070102650A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20070102650A1
公开(公告)日：2007-05-10
申请号：US11589821
申请日：2006-10-31
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/18 , H01J37/28 , H01J2237/022 , H01J2237/1825 , H01J2237/188 , H01J2237/31749
摘要： There is provided a compact charged particle beam apparatus with a non-evaporable getter pump which maintains high vacuum even during emission of an electron beam without generating foreign particles. The apparatus comprises: a charged particle source; a charged particle optics which focuses a charged particle beam emitted from the charged particle source on a sample and performs scanning; and means of vacuum pumping which evacuates the charged particle optics. The means of vacuum pumping has a differential pumping structure with two or more vacuum chambers connected through an opening in series. A pump made of non-evaporable getter alloy is placed in an upstream vacuum chamber with a high degree of vacuum, and a gas absorbing surface of the non-evaporable getter alloy is fixed without contact with another part.
摘要翻译：提供了一种具有非蒸发性吸气泵的紧凑型带电粒子束装置，即使在电子束的发射期间也能保持高真空而不产生异物。该装置包括：带电粒子源; 带电粒子光学器件，其将从带电粒子源发射的带电粒子束聚焦在样品上并执行扫描; 以及抽空带电粒子光学元件的真空泵送装置。真空泵送装置具有差分泵送结构，其中两个或多个真空室通过串联的开口连接。将由不可蒸发的吸气剂合金制成的泵放置在具有高真空度的上游真空室中，并且非蒸发性吸气剂合金的气体吸收表面固定而不与另一部分接触。

4. 发明申请

US20060231773A1 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20060231773A1
公开(公告)日：2006-10-19
申请号：US11401878
申请日：2006-04-12
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
IPC分类号： G21G5/00
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译：提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10 -8 Pa以下的真空度的高真空下。

5. 发明申请

US20070284542A1 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US20070284542A1
公开(公告)日：2007-12-13
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的处理步骤（1）和用于检测初级带电粒子的中心之间的偏差的处理步骤（2）提供带电粒子束和物镜孔的中心。带电粒子束装置具有使用在处理步骤（1）中测量的对准器灵敏度和在处理步骤（2）中检测到的偏差量来确定对准器设定值的装置，使得初级带电粒子束通过物镜光圈中心，并使用对准器设定值控制对准器。

6. 发明授权

US08026491B2 Charged particle beam apparatus and method for charged particle beam adjustment 有权
标题翻译：带电粒子束装置和带电粒子束调整方法
公开(公告)号：US08026491B2
公开(公告)日：2011-09-27
申请号：US11715506
申请日：2007-03-08
申请人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
发明人： Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
IPC分类号： G01N21/00
CPC分类号： G01N23/22 , H01J37/1471 , H01J37/28 , H01J2237/1501
摘要： A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.
摘要翻译：在光学条件被修改的情况下或者由于装置的状态变化使带电粒子束的束中心轴移动的情况下，有利于调整带电粒子束的束中心轴的带电粒子束装置。当用偏转器（对准器）调整初级带电粒子束的束中心轴时，用于测量对准器的灵敏度的第一处理步骤和用于检测初级带电粒子束的中心与第一带电粒子束的中心之间的偏差的第二处理步骤提供了物镜孔的中心。带电粒子束装置使用在第一处理步骤中测量的对准器灵敏度和在第二处理步骤中检测到的偏差量来确定对准器设定值，使得初级带电粒子束通过物镜孔的中心并控制对齐器使用对准器设置值。

7. 发明授权

US07112792B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07112792B2
公开(公告)日：2006-09-26
申请号：US11139609
申请日：2005-05-31
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

8. 发明授权

US07348559B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07348559B2
公开(公告)日：2008-03-25
申请号：US11498125
申请日：2006-08-03
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

9. 发明申请

US20050263702A1 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US20050263702A1
公开(公告)日：2005-12-01
申请号：US11139609
申请日：2005-05-31
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/225 , G01N23/00 , G01N27/00 , G01R31/302 , G01R31/307 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

10. 发明授权

US08304723B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US08304723B2
公开(公告)日：2012-11-06
申请号：US12725857
申请日：2010-03-17
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

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